Hard coatings produced by PACVD applied to aluminium die casting (English)
- New search for: Heim, D.
- New search for: Holler, F.
- New search for: Mitterer, C.
- New search for: Heim, D.
- New search for: Holler, F.
- New search for: Mitterer, C.
In:
SURFACE AND COATINGS TECHNOLOGY
;
116-119
, 3
;
530-536
;
1999
-
ISSN:
- Article (Journal) / Print
-
Title:Hard coatings produced by PACVD applied to aluminium die casting
-
Contributors:
-
Published in:SURFACE AND COATINGS TECHNOLOGY ; 116-119, 3 ; 530-536
-
Publisher:
- New search for: ELSEVIER SEQUOIA SA
-
Publication date:1999-01-01
-
Size:7 pages
-
ISSN:
-
Type of media:Article (Journal)
-
Type of material:Print
-
Language:English
- New search for: 671.73
- Further information on Dewey Decimal Classification
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Classification:
DDC: 671.73 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 116-119, Issue 3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Plasma-immersion ion implantation for diffusive treatmentMoller, W. / Parascandola, S. / Kruse, O. / Gunzel, R. / Richter, E. et al. | 1999
- 11
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Formation of carbon nitride films by reactive high-density plasma sputtering with excitation of m=0 mode helicon waveMiyake, S. / Setsuhara, Y. / Shibata, K. / Kumagai, M. / Sakawa, Y. / Shoji, T. et al. | 1999
- 18
-
Plasma CVD: process capabilities and economic aspectsEskildsen, S.S. / Mathiasen, C. / Foss, M. et al. | 1999
- 25
-
Plasma grafting - a method to obtain monofunctional surfacesOehr, C. / Muller, M. / Elkin, B. / Hegemann, D. / Vohrer, U. et al. | 1999
- 36
-
Nanocomposite tribological coatings for aerospace applicationsVoevodin, A.A. / O'Neill, J.P. / Zabinski, J.S. et al. | 1999
- 46
-
Adhesion of carbon nitride thin films on tool steelChowdhury, A.K.M.S. / Cameron, D.C. / Hashmi, M.S.J. et al. | 1999
- 54
-
Electrical properties of reactively sputtered carbon nitride filmsMonclus, M.A. / Cameron, D.C. / Barklie, R. / Collins, M. et al. | 1999
- 59
-
Structural and micro-mechanical studies of CN"x films deposited on silicon substrates in a remote nitrogen plasmaJama, C. / Dessaux, O. / Goudmand, P. / Soro, J.-M. / Rats, D. / von Stebut, J. et al. | 1999
- 65
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CN"xH"y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanismsShaginyan, L.R. / Fendrych, F. / Jastrabik, L. / Soukup, L. / Kulikovsky, V.Y. / Musil, J. et al. | 1999
- 74
-
Hardness versus structure in W-Si-N sputtered coatingsLouro, C. / Cavaleiro, A. et al. | 1999
- 81
-
General properties and scratch adhesion characterization of carbon-containing tungsten filmsHarry, E. / Rouzaud, A. / Juliet, P. / Pauleau, Y. et al. | 1999
- 86
-
Stress of c-BN thin films: a parameter investigationKlett, A. / Freudenstein, R. / Plass, M.F. / Kulisch, W. et al. | 1999
- 93
-
Structure investigation of BN films grown by ion-beam-assisted deposition by means of polarised IR and Raman spectroscopyBen el Mekki, M. / Djouadi, M.A. / Guiot, E. / Mortet, V. / Pascallon, J. / Stambouli, V. / Bouchier, D. / Mestres, N. / Nouet, G. et al. | 1999
- 100
-
Properties of cubic boron nitride films with buffer layer control for stress relaxation using ion-beam-assisted depositionSetsuhara, Y. / Kumagai, M. / Suzuki, M. / Suzuki, T. / Miyake, S. et al. | 1999
- 108
-
Deposition and characterisation of multilayered PVD TiN/CrN coatings on cemented carbideNordin, M. / Larsson, M. et al. | 1999
- 116
-
Intrinsic stress in dielectric thin films for micromechanical componentsKupfer, H. / Flugel, T. / Richter, F. / Schlott, P. et al. | 1999
- 121
-
The role of nickel in the oxidation resistance of tungsten-based alloysLouro, C. / Cavaleiro, A. et al. | 1999
- 128
-
Corrosion-wear response of sputtered CrN and S-phase coated austenitic stainless steelAldrich-Smith, G. / Teer, D.G. / Dearnley, P.A. et al. | 1999
- 133
-
Microstructure and properties of nitride and diboride hard coatings deposited under intense mild-energy ion bombardmentKelesoglu, E. / Mitterer, C. / Kazmanli, M.K. / Urgen, M. et al. | 1999
- 141
-
Structure and properties of PVD-coatings by means of impact testerLugscheider, E. / Knotek, O. / Wolff, C. / Barwulf, S. et al. | 1999
- 147
-
Photothermal characterization of amorphous thin filmsBein, B.K. / Bolte, J. / Dietzel, D. / Haj Daoud, A. / Kalus, G. / Macedo, F. / Linnenbrugger, A. / Bosse, H. / Pelzl, J. et al. | 1999
- 155
-
Raman microscopic studies of PVD hard coatingsConstable, C.P. / Yarwood, J. / Munz, W.-D. et al. | 1999
- 160
-
Acoustic emission monitoring of single cracking events and associated damage mechanism analysis in indentation and scratch testingvon Stebut, J. / Lapostolle, F. / Bucsa, M. / Vallen, H. et al. | 1999
- 172
-
Failure and adhesion characterization of tungsten-carbon single layers, multilayered and graded coatingsHarry, E. / Rouzaud, A. / Juliet, P. / Pauleau, Y. / Ignat, M. et al. | 1999
- 176
-
A study of the structural and mechanical properties of TiMoS"2 coatings deposited by closed field unbalanced magnetron sputter ion platingRigato, V. / Maggioni, G. / Boscarino, D. / Sangaletti, L. / Depero, L. / Fox, V.C. / Teer, D. / Santini, C. et al. | 1999
- 184
-
The m phase layer on ion nitrided austenitic stainless steel (III): an epitaxial relationship between the m phase and the @c parent phase and a review of structural identifications of this phaseMarchev, K. / Landis, M. / Vallerio, R. / Cooper, C.V. / Giessen, B.C. et al. | 1999
- 189
-
Structure and composition of expanded austenite produced by nitrogen plasma immersion ion implantation of stainless steels X6CrNiTi1810 and X2CrNiMoN2253Blawert, C. / Mordike, B.L. / Jiraskova, Y. / Schneeweiss, O. et al. | 1999
- 199
-
Further investigation of the structure and properties of austenitic stainless steel after plasma nitridingMenthe, E. / Rie, K.-T. et al. | 1999
- 205
-
Plasma nitriding of stainless steels at low temperaturesLarisch, B. / Brusky, U. / Spies, H.-J. et al. | 1999
- 212
-
Wear behaviour of plasma nitrided tool steelsDevi, M.U. / Chakraborty, T.K. / Mohanty, O.N. et al. | 1999
- 222
-
Plasma nitriding of thin molybdenum layers at low temperatureJauberteau, I. / Jauberteau, J.L. / Semeria, M.N. / Larre, A. / Piaguet, J. / Aubreton, J. et al. | 1999
- 229
-
Plasma-assisted boriding of industrial components in a pulsed d.c. glow dischargeRodrguez Cabeo, E. / Laudien, G. / Biemer, S. / Rie, K.-T. / Hoppe, S. et al. | 1999
- 234
-
Improvement of the fretting fatigue and fretting wear of Ti6Al4V by duplex surface modificationLiu, D. / Tang, B. / Zhu, X. / Chen, H. / He, J. / Celis, J.-P. et al. | 1999
- 239
-
Investigation of the mechanical and structural properties of Ti-Hf-C-N arc PVD coatingsLugscheider, E. / Knotek, O. / Zimmermann, H. / Hellmann, S. et al. | 1999
- 244
-
Investigation of coating substrate compounds using inclined spherical indentationSchwarzer, N. / Chudoba, T. / Billep, D. / Richter, F. et al. | 1999
- 253
-
Stress reduction in boron carbonitride films by ion energy-modulated multilayersKratzsch, A. / Ulrich, S. / Leiste, H. / Stuber, M. / Holleck, H. et al. | 1999
- 261
-
Inductively coupled plasma and laser-induced chemical vapour deposition of thin carbon nitride filmsPopov, C. / Bulir, J. / Ivanov, B. / Delplancke-Ogletree, M.-P. / Kulisch, W. et al. | 1999
- 269
-
General stress reduction mechanisms for the deposition of cubic boron nitride thin filmsUlrich, S. / Ehrhardt, H. / Schwan, J. / Donner, W. / Dosch, H. / Widmayer, P. / Ziemann, P. et al. | 1999
- 274
-
Interface investigations by infrared spectroscopy and X-ray reflectivity measurements of cubic boron nitride thin filmsUlrich, S. / Donner, W. / Dosch, H. / Ehrhardt, H. / Schwan, J. et al. | 1999
- 278
-
Colour control of titanium nitride coatings produced by reactive magnetron sputtering at temperature less than 100^oCRoquiny, P. / Bodart, F. / Terwagne, G. et al. | 1999
- 284
-
Structure and stress of TiAlN/CrN superlattice coatings as a function of CrN layer thicknessLewis, D.B. / Wadsworth, I. / Munz, W.-D. / Kuzel, R. / Valvoda, V. et al. | 1999
- 292
-
Evaluation of functionally gradient coatings produced by plasma-spray techniqueDemirkiran, A.S. / Avci, E. et al. | 1999
- 296
-
Electrical and colorimetric properties of TiN thin films prepared by DC reactive sputtering in a facing targets sputtering (FTS) systemNose, M. / Nagae, T. / Yokota, M. / Saji, S. / Zhou, M. / Nakada, M. et al. | 1999
- 302
-
Structure and mechanical properties of amorphous Ti-B-N coatingsWiedemann, R. / Weihnacht, V. / Oettel, H. et al. | 1999
- 310
-
Glow discharge optical spectroscopy depth profile analysis of conductive and nonconductive samples in a commercial service laboratoryAsam, T. et al. | 1999
- 313
-
Microstructure and properties of multilayer coatings with covalent bonded hard materialsLeiste, H. / Dambacher, U. / Ulrich, S. / Holleck, H. et al. | 1999
- 321
-
Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet systemSoukup, L. / Scha, M. / Fendrych, F. / Jastrabk, L. / Hubicka, Z. / Chvostova, D. / Schova, H. / Valvoda, V. / Tarasenko, A. / Studnicka, V. et al. | 1999
- 327
-
Characterisation of TiN and carbon-doped chromium thin film coatings by acoustic microscopyRobert, L. / Brunet, N. / Flaherty, T. / Randles, T. / Matthaei-Schulz, E. / Vetters, H. / Rats, D. / von Stebut, J. et al. | 1999
- 335
-
Characterization of a-C:H films with metal interlayers and mixed interfacesNothe, M. / Buuron, A. / Koch, F. / Penkalla, H.J. / Rehbach, W.P. / Bolt, H. et al. | 1999
- 342
-
X-ray diffraction measurements of plasma-nitrided Ti-6Al-4Vda Silva, S.L.R. / Kerber, L.O. / Amaral, L. / dos Santos, C.A. et al. | 1999
- 347
-
Nitriding of H-12 tool steel by direct-current and pulsed plasmasMiola, E.J. / de Souza, S.D. / Olzon-Dionysio, M. / Spinelli, D. / dos Santos, C.A. et al. | 1999
- 352
-
Nitrogen plasma immersion ion implantation for surface treatment and wear protection of austenitic stainless steel X6CrNiTi1810Blawert, C. / Mordike, B.L. et al. | 1999
- 361
-
Investigation of the influence of ion etching parameters on the structure of nitrided case in hot working steelWalkowicz, J. / Smolik, J. / Miernik, K. et al. | 1999
- 367
-
Plasma-assisted transformation of iron surfaces into magnetiteMuller, J.-P. / Gahde, J. / Mehner, H. / Menzel, M. / Guttler, B. et al. | 1999
- 370
-
Optimization of nitrided case structure in composite layers created by duplex treatment on the basis of PVD coating adhesion measurementWalkowicz, J. / Smolik, J. / Tacikowski, J. et al. | 1999
- 380
-
A way to decrease the nitriding temperature of aluminium: the low-pressure arc-assisted nitriding processRenevier, N. / Czerwiec, T. / Billard, A. / von Stebut, J. / Michel, H. et al. | 1999
- 386
-
Formation of iron boride layers on steel by d.c.-plasma boriding and deposition processesBartsch, K. / Leonhardt, A. et al. | 1999
- 391
-
Effect of plasma nitriding on the surface properties of the chromium diffusion coating layer in iron-base alloysChang, D.Y. / Lee, S.Y. / Kang, S.-S. et al. | 1999
- 398
-
Investigation of the influence of chemical composition of Ti(C"xN"1"-"x) layer on the stresses value in the multilayer coating TiC/Ti(C"xN"1"-"x)/TiNSmolik, J. / Zdunek, K. et al. | 1999
- 404
-
Some new aspects in X-ray stress analysis of thin layersGenzel, C. / Reimers, W. et al. | 1999
- 410
-
Plasma etching and ion implantation on silicon, characterized by laser-modulated optical reflectanceKiepert, W. / Obramski, H.J. / Bolte, J. / Brandt, K. / Dietzel, D. / Niebisch, F. / Bein, B.K. et al. | 1999
- 419
-
Synthesis of silicon carbonitride thin films by means of r.f.-sputtering and ion implantationLutz, H. / Bruns, M. / Link, F. / Baumann, H. et al. | 1999
- 424
-
X-ray analysis of residual stresses in TiN coatingsNovotna, Z. / Kralova, R. / Novak, R. / Marek, J. et al. | 1999
- 428
-
Effect of hidden parameters for the plasma CVD synthesis of diamond filmsDeuerler, F. / Buck, V. / Peterseim, J. / Gruner, H. et al. | 1999
- 440
-
Mechanical pretreatment for improved adhesion of diamond coatingsTonshoff, H.K. / Mohlfeld, A. / Gey, C. / Winkler, J. et al. | 1999
- 447
-
Chemical vapour deposition of polycrystalline diamond films on high-speed steelSchafer, L. / Fryda, M. / Stolley, T. / Xiang, L. / Klages, C.-P. et al. | 1999
- 452
-
Synthesis of diamond-like-carbon coatings by pulsed laser deposition: optimization of process parametersTabbal, M. / Merel, P. / Chaker, M. / El Khakani, M.A. / Herbert, E.G. / Lucas, B.N. / O'Hern, M.E. et al. | 1999
- 456
-
A model for reactive ion etching of PZT thin filmsSuchaneck, G. / Tews, R. / Gerlach, G. et al. | 1999
- 461
-
Deep plasma silicon etch for microfluidic applicationsRichter, K. / Orfert, M. / Howitz, S. / Thierbach, S. et al. | 1999
- 468
-
Influence of excitation frequency on plasma parameters and etching characteristics of radio-frequency dischargesKlick, M. / Eichhorn, L. / Rehak, W. / Kammeyer, M. / Mischke, H. et al. | 1999
- 472
-
Ion-beam deposition of nanocrystalline and epitaxial silicon films using silane plasmaKhan, H.R. / Frey, H. et al. | 1999
- 476
-
PVD coatings as an environmentally clean alternative to electroplating and electroless processesNavinsek, B. / Panjan, P. / Milosev, I. et al. | 1999
- 488
-
Dry machining and increase of endurance of machine parts with improved doped DLC coatings on steel, ceramics and aluminiumEnke, K. et al. | 1999
- 492
-
The structure of tribologically improved MoS"2-metal composite coatings and their industrial applicationsFox, V.C. / Renevier, N. / Teer, D.G. / Hampshire, J. / Rigato, V. et al. | 1999
- 498
-
Structure investigations of wear reducing non-metallic layers on TiN-coated HSS turning toolsHarju, E. / Korhonen, A.S. / Adamik, M. / Barna, P.B. et al. | 1999
- 505
-
Effects of thermal barrier coating on a turbocharged diesel engine performanceUzun, A. / Cevik, I. / Akcil, M. et al. | 1999
- 508
-
Antiabrasive coatings: application for wood processingDjouadi, M.A. / Beer, P. / Marchal, R. / Sokolowska, A. / Lambertin, M. / Precht, W. / Nouveau, C. et al. | 1999
- 517
-
Plasma treatment of thin gold surfaces for wire bond applicationsvon Arnim, V.L. / Fessmann, J. / Psotta, L. et al. | 1999
- 524
-
Influence of subsurface properties on the adhesion strength of sputtered hard coatingsTonshoff, H.K. / Karpuschewski, B. / Mohlfeld, A. / Seegers, H. et al. | 1999
- 530
-
Hard coatings produced by PACVD applied to aluminium die castingHeim, D. / Holler, F. / Mitterer, C. et al. | 1999
- 537
-
Modification of steel and aluminium by pulsed energetic ion beamsBiller, W. / Heyden, D. / Muller, D. / Wolf, G.K. et al. | 1999
- 543
-
An RF magnetron-type plasma sourceSugawara, M. et al. | 1999
- 547
-
HF plasma pencil - new source for plasma surface processingJanca, J. / Klma, M. / Slavcek, P. / Zajckova, L. et al. | 1999
- 552
-
Linearly extended plasma source for large-scale applicationsKaiser, M. / Baumgartner, K.-M. / Schulz, A. / Walker, M. / Rauchle, E. et al. | 1999
- 558
-
PIC-MCC simulation of a r.f. planar magnetron discharge and comparison with experimentMinea, T.M. / Bretagne, J. / Gousset, G. / Magne, L. / Pagnon, D. / Touzeau, M. et al. | 1999
- 564
-
Simulation of the energy and angular distribution of Ar^+ in d.c. sputtering dischargesSeebock, R.J. et al. | 1999
- 568
-
Simulation of the film growth and film-substrate mixing during the sputter deposition processLugscheider, E. / von Hayn, G. et al. | 1999
- 573
-
Boundary element numerical modelling as a surface engineering tool: application to very thin coatingsKouitat Njiwa, R. / von Stebut, J. et al. | 1999
- 580
-
Ion beam analysis and Raman characterisation of coatings deposited by cosputtering carbon and chromium in a closed field unbalanced magnetron sputter ion plating systemRigato, V. / Maggioni, G. / Boscarino, D. / Mariotto, G. / Bontempi, E. / Jones, A.H.S. / Camino, D. / Teer, D. / Santini, C. et al. | 1999
- 585
-
Parameter optimisation of Ti-DLC coatings using statistically based methodsVilliger, P. / Sprecher, C. / Peters, J.A. et al. | 1999
- 591
-
Graded layer design for stress-reduced and strongly adherent superhard amorphous carbon filmsStuber, M. / Ulrich, S. / Leiste, H. / Kratzsch, A. / Holleck, H. et al. | 1999
- 599
-
Tribological performance of mechanically lapped chemical vapor deposited diamond coatingsZeiler, E. / Klaffke, D. / Hiltner, K. / Grogler, T. / Rosiwal, S.M. / Singer, R.F. et al. | 1999
- 609
-
Deposition of hard amorphous carbon coatings by laser and arc methodsWitke, T. / Schuelke, T. / Berthold, J. / Meyer, C.F. / Schultrich, B. et al. | 1999
- 614
-
Deposition technology of a new multilayer system from twin amorphous hydrogenated materialsKazimierski, P. / Tyczkowski, J. et al. | 1999
- 618
-
Negative ion assisted silicon oxidation with transformer coupled RF biasShindo, H. / Koromogawa, T. / Fujii, T. / Kusaba, K. / Horiike, Y. et al. | 1999
- 622
-
Plasma enhanced chemical vapor deposition of SiN-films for passivation of three-dimensional substratesOrfert, M. / Richter, K. et al. | 1999
- 629
-
Gadolinium-doped organosilicon films grown by plasma chemical vapor depositionTyczkowski, J. / Szymanowski, H. / Dargis, R. et al. | 1999
- 634
-
Effect of substrate curvature on the properties of PVD coatingsKvasnicka, I. / Mala, Z. / Novak, R. / Novakova, D. et al. | 1999
- 638
-
Laser writing on gold-containing hydrocarbon matrix films deposited by a technique combining cathodic sputtering with hydrocarbon plasma polymerizationGuyard, C. / Despax, B. et al. | 1999
- 643
-
Microstructuring by selective laser sintering of metallic powderKathuria, Y.P. et al. | 1999
- 648
-
The effect of boron additions on the tribological behaviour of TiN coatings produced by electron-beam evaporative PVDRebholz, C. / Leyland, A. / Larour, P. / Charitidis, C. / Logothetidis, S. / Matthews, A. et al. | 1999
- 654
-
Life analysis of coated tools using statistical methodsDowey, S.J. / Zhang, J. / Doyle, E.D. / Matthews, A. et al. | 1999
- 662
-
Radio-frequency plasma production using a ladder-shaped antennaKawai, Y. / Yoshioka, M. / Yamane, T. / Takeuchi, Y. / Murata, M. et al. | 1999
- 666
-
Space-time spectral investigation of the distribution of pulsed plasma generated by a new coaxial hybrid sourceWalkowicz, J. / Miernik, K. et al. | 1999
- 674
-
Direct power coupling into a waveguide cavity plasma sourceMuller, A. / Emme, M. / Korzec, D. / Engemann, J. et al. | 1999
- 679
-
Computer simulations and experimental results in studies of plasma dynamics during the impulse plasma deposition processRabinski, M. / Zdunek, K. et al. | 1999
- 685
-
Analysis of plasma generation and acceleration in pulsed coaxial hybrid sourceWalkowicz, J. / Barchenko, V.T. / Miernik, K. et al. | 1999
- 690
-
Comparison of thermal stresses developed in Al"2O"3-SG, ZrO"2-(12% Si+Al) and ZrO"2-SG thermal barrier coating systems with NiAl, NiCrAlY and NiCoCrAlY interlayer materials subjected to thermal loadingTaymaz, I. / Mimaroglu, A. / Avci, E. / Ucar, V. / Gur, M. et al. | 1999
- 694
-
Substrate-rotation systems and productivity of industrial PVD processesRother, B. / Ebersbach, G. / Gabriel, H.M. et al. | 1999
- 699
-
Experimental and theoretical studies of the low-temperature growth of chromia and aluminaAshenford, D.E. / Long, F. / Hagston, W.E. / Lunn, B. / Matthews, A. et al. | 1999
- 705
-
Cost-effective PVD coatings in batch systemsEngers, B. / Bauer, H.U. et al. | 1999
- 711
-
A highly UV-selective Schottky-barrier photodiode based on a Ag-GaP contactMientus, R. / Wolf, R. / Kloth, B. / Protsch, M. / Pikhtin, A.N. et al. | 1999
- 716
-
Deposition of aluminium oxide thin films by reactive magnetron sputteringKoski, K. / Holsa, J. / Juliet, P. et al. | 1999
- 721
-
Influence of the target temperature on a reactive sputtering processBillard, A. / Mercs, D. / Perry, F. / Frantz, C. et al. | 1999
- 727
-
Chromium nitride/niobium nitride superlattice coatings deposited by combined cathodic-arc/unbalanced magnetron techniqueHovsepian, P.E. / Lewis, D.B. / Muunz, W.-D. / Rouzaud, A. / Juliet, P. et al. | 1999
- 735
-
Unbalanced magnetron sputtered Si-Al coatings: plasma conditions and film properties versus sample bias voltageJacobs, M. / Terwagne, G. / Roquiny, P. / Bodart, F. et al. | 1999
- 742
-
Variation of carbon concentration, ion energy, and ion current density of magnetron-sputtered boron carbonitride filmsUlrich, S. / Kratzsch, A. / Leiste, H. / Stuber, M. / Schloszmacher, P. / Holleck, H. / Binder, J. / Schild, D. / Westermeyer, S. / Becker, P. et al. | 1999
- 751
-
Ion assisted deposition of Zn-Mg coatings by unbalanced magnetron sputteringShedden, B.A. / Katardjiev, I.V. / Berg, S. / Samandi, M. / Window, B. et al. | 1999
- 755
-
Diagnostics and modeling of a hollow-cathode arc deposition plasmaBuuron, A. / Koch, F. / Nothe, M. / Bolt, H. et al. | 1999
- 766
-
Cathodic-arc deposition with boron-alloyed titanium cathodesBalzer, M. / Kappl, H. / Jehn, H.A. / Guther, V. et al. | 1999
- 772
-
Chemical reactions at polymer surfaces interacting with a gas plasma or with metal atoms - their relevance to adhesionFriedrich, J.F. / Unger, W.E.S. / Lippitz, A. / Koprinarov, I. / Kuhn, G. / Weidner, S. / Vogel, L. et al. | 1999
- 783
-
Improvement of bonding properties of polypropylene by low-pressure plasma treatmentMuhlhan, C. / Weidner, S. / Friedrich, J. / Nowack, H. et al. | 1999
- 788
-
Subsurface chemistry in the plasma treatment of polymersHollander, A. / Wilken, R. / Behnisch, J.J. et al. | 1999
- 792
-
Insertion of sulfur-containing functional groups into polytetrafluoroethylene (PTFE) by low pressure plasma treatmentCaro, J.C. / Lappan, U. / Lunkwitz, K. et al. | 1999
- 796
-
Selective surface functionalization of polyolefins by plasma treatment followed by chemical reductionKuhn, G. / Weidner, S. / Decker, R. / Ghode, A. / Friedrich, J. et al. | 1999
- 802
-
Plasma aminofunctionalisation of PVDF microfiltration membranes: comparison of the in plasma modifications with a grafting method using ESCA and an amino-selective fluorescent probeMuller, M. / Oehr, C. et al. | 1999
- 808
-
Process control of a plasma treatment of wool by plasma diagnosticsOsenberg, F. / Theirich, D. / Decker, A. / Engemann, J. et al. | 1999
- 812
-
Plasma pretreatment of polymer films as a key issue for high barrier food packagingsMoosheimer, U. / Bichler, C. et al. | 1999
- 820
-
Plasma-induced chemical micropatterning for cell culturing applications: a brief reviewOhl, A. / Schroder, K. et al. | 1999
- 831
-
Biomass covering of plastics substrates depending on plasma treatmentGrunz, A. / Dayss, E. / Leps, G. et al. | 1999
- 836
-
Wettability, chemical and morphological data of hydrophobic layers by plasma polymerization on smooth substratesElkin, B. / Mayer, J. / Schindler, B. / Vohrer, U. et al. | 1999
- 841
-
Gas-separating properties of membranes coated by HMDSO plasma polymerLi, K. / Meichsner, J. et al. | 1999
- 848
-
Elastomer treatment by arc metal deposition assisted with self-ion irradiationTashlykov, I.S. / Kasperovich, V.I. / Shadrukhin, M.G. / Kasperovich, A.V. / Wolf, G.K. / Wesch, W. et al. | 1999
- 853
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Simulation and development of optimized microwave plasma reactors for diamond depositionFuner, M. / Wild, C. / Koidl, P. et al. | 1999
- 863
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Tungsten deposition by dual-frequency inductively coupled plasma-assisted CVDColpo, P. / Meziani, T. / Gibson, N. / Ceccone, G. / Rossi, F. et al. | 1999
- 868
-
Silicon dioxide deposition in a microwave plasma reactorBenissad, N. / Boisse-Laporte, C. / Vallee, C. / Granier, A. / Goullet, A. et al. | 1999
- 874
-
Overall kinetics of SiO"x remote-PECVD using different organosilicon monomersBayer, C. / Bapin, E. / Rudolf von Rohr, P. et al. | 1999
- 879
-
A circulating fluidised bed for plasma-enhanced chemical vapor deposition on powders at low temperaturesKarches, M. / Bayer, C. / Rudolf von Rohr, P. et al. | 1999
- 886
-
PECVD of transition metals for the production of high-density circuitsHeinz, R. / Klusmann, E. / Meyer, H. / Schulz, R. et al. | 1999
- 891
-
Deposition of hard crystalline Al"2O"3 coatings by pulsed d.c. PACVDTaschner, C. / Ljungberg, B. / Endler, I. / Leonhardt, A. et al. | 1999
- 898
-
Microstructural characterization of binary and ternary hard coating systems for wear protection Part II: Ti(CN) PACVD coatingsDorfel, I. / Osterle, W. / Urban, I. / Bouzy, E. / Morlok, O. et al. | 1999
- 906
-
Properties of TiN-TiC multilayer coatings using plasma-assisted chemical vapor depositionKim, D.-J. / Cho, Y.-R. / Lee, M.-J. / Hong, J.-M. / Kim, Y.-K. / Lee, K.-H. et al. | 1999
- 911
-
Wear-resistant PACVD coatings of the system Ti-B-NPfohl, C. / Rie, K.-T. et al. | 1999
- 916
-
Enhanced deposition rate of high quality stoichiometric ceramic compounds reactively sputter deposited at low pressure by modulating the discharge current at low frequencyMercs, D. / Lapostolle, F. / Perry, F. / Billard, A. / Frantz, C. et al. | 1999
- 922
-
Experimental study of Ti-Si-N films obtained by radio frequency magnetron sputteringLe Brizoual, L. / Granier, A. / Clenet, F. / Briaud, P. / Lemperiere, G. / Turban, G. et al. | 1999
- 927
-
Spectroscopic optical emission tomography of direct-current magnetron sputtering discharges in argon-nitrogen gas mixturesDebal, F. / Wautelet, M. / Dauchot, J.P. / Hecq, M. et al. | 1999
- 933
-
D.c. magnetron sputtering deposition of TiO"2 films in argon-oxygen gas mixtures: theory and experimentsVancoppenolle, V. / Jouan, P.-Y. / Wautelet, M. / Dauchot, J.-P. / Hecq, M. et al. | 1999
- 938
-
The critical role of hydrogen for physical sputtering with Ar-H"2 glow dischargesBudtz-Jorgensen, C.V. / Kringhoj, P. / Bottiger, J. et al. | 1999
- 944
-
Deposition and characterization of fine-grained W-Ni-C/N ternary filmsCavaleiro, A. / Trindade, B. / Vieira, M.T. et al. | 1999
- 949
-
Influence of the process gas, gas pressure, r.f. power and geometrical arrangement on the magnetron plasma parameters for various thin film materials of the systems TiN and BCNKratzsch, A. / Ulrich, S. / Leiste, H. / Stuber, M. / Holleck, H. et al. | 1999
- 956
-
Al"2O"3 coatings deposited by filtered vacuum arc - characterization of high temperature propertiesBolt, H. / Koch, F. / Rodet, J.L. / Karpov, D. / Menzel, S. et al. | 1999
- 963
-
Pulsed vacuum arc discharges on steered arc cathodesFuchs, H. / Keutel, K. / Mecke, H. / Edelmann, C. et al. | 1999
- 969
-
The energy dependence on microstructure of (Ti-Al-V) nitrides deposited by dual ion beam sputteringHubler, R. / Tentardini, E.K. / Blando, E. / Teixeira, S.R. / Vasconcellos, M.Z. / Soares, M. / Kamijo, E. / Fujiwara, M. et al. | 1999
- 973
-
Microwave plasma polymerization of acrylic acid on poly(ethylene terephthalate) track-etched membranesNedelmann, H. / Weigel, T. / Hicke, H.G. / Muller, J. / Paul, D. et al. | 1999
- 981
-
Optical emission spectroscopy studies of titanium nitride sputtering on thermoplastic polymersNeuhauser, M. / Barwulf, S. / Hilgers, H. / Lugscheider, E. / Riester, M. et al. | 1999
- 986
-
Surface modification for improved adhesion of a polymer-metal compoundDayss, E. / Leps, G. / Meinhardt, J. et al. | 1999
- 991
-
Surface radical analysis on plasma-treated polymersWilken, R. / Hollander, A. / Behnisch, J. et al. | 1999
- 996
-
Barrier properties of plasma-polymerized thin filmsWalker, M. / Baumgartner, K.-M. / Feichtinger, J. / Kaiser, M. / Rauchle, E. / Kerres, J. et al. | 1999
- 1001
-
Morphology of sputtered titanium nitride thin films on thermoplastic polymersRiester, M. / Barwulf, S. / Lugscheider, E. / Hilgers, H. et al. | 1999
- 1006
-
Design of an UHV reactor system for plasma surface treatment of polymer materialsOhl, A. / Schleinitz, W. / Meyer-Sievers, A. / Becker, A. / Keller, D. / Schroder, K. / Conrads, J. et al. | 1999
- 1011
-
Plasma modification of polytetrafluoroethylene for immobilization of the fibrinolytic protein urokinaseKonig, U. / Nitschke, M. / Menning, A. / Sperling, C. / Simon, F. / Arnhold, C. / Werner, C. / Jacobasch, H.-J. et al. | 1999
- 1016
-
Inhomogeneous deposition of TiN by pulsed PACVD caused by a plasma dynamic effectBeer, T.A. / Laimer, J. / Stori, H. et al. | 1999
- 1024
-
Wear-resistant amorphous SiC coatings produced by plasma-enhanced CVDBlum, T. / Dresler, B. / Kaszner, S. / Hoffmann, M. et al. | 1999
- 1029
-
Influence of the interface preparation on properties of PECVD TiNZhu, X. / Huang, H. / Xu, K. / He, J. et al. | 1999
- 1033
-
Deposition of SiO"x films from O"2/HMDSO plasmasHegemann, D. / Vohrer, U. / Oehr, C. / Riedel, R. et al. | 1999
- 1037
-
Investigation of TiN deposition in different sized PACVD reactors by means of optical emission spectroscopyEckel, M. / Hardt, P. / Schmidt, M. et al. | 1999
- 1042
-
Analysis of the N"2O dissociation by r.f. discharges in a plasma reactorDate, L. / Radouane, K. / Caquineau, H. / Despax, B. / Couderc, J.P. / Yousfi, M. et al. | 1999
- 1049
-
Low temperature growth mechanism of zirconium diboride films synthesised in flowing microwave Ar-BCl"3 post-dischargesPierson, J.F. / Belmonte, T. / Michel, H. et al. | 1999
- 1055
-
Thickness effects on the mechanical properties of micro-arc discharge oxide coatings on aluminium alloysNie, X. / Leyland, A. / Song, H.W. / Yerokhin, A.L. / Dowey, S.J. / Matthews, A. et al. | 1999
- 1061
-
Effect of grit blasting of substrate on the corrosion behaviour of plasma-sprayed Al"2O"3 coatingsCelik, E. / Demirkiran, A.S. / Avci, E. et al. | 1999
- 1065
-
Determination of negative-ion density in an electron cyclotron resonance C"4F"8 plasmaShindo, M. / Hiejima, S. / Ueda, Y. / Kawakami, S. / Ishii, N. / Kawai, Y. et al. | 1999
- 1070
-
Reactive sputtering of nanostructured multilayer coatings and their tribological propertiesJensen, H. / Sorensen, G. / Mannike, I. / Muktepavela, F. / Sobota, J. et al. | 1999
- 1076
-
Optical emission diagnostics of the linear magnetron sputtering dischargeKulakowska-Pawlak, B. / Zyrnicki, W. / Miernik, K. / Walkowicz, J. et al. | 1999
- 1083
-
Automatic Langmuir probe measurement in a magnetron sputtering systemSpolaore, M. / Antoni, V. / Bagatin, M. / Buffa, A. / Cavazzana, R. / Desideri, D. / Martines, E. / Pomaro, N. / Serianni, G. / Tramontin, L. et al. | 1999
- 1089
-
Spatially resolved measurements of plasma parameters in a broad-beam ion sourceFlamm, D. / Zeuner, M. et al. | 1999
- 1093
-
Reactive DC magnetron sputtering of elemental targets in Ar/N"2 mixtures: relation between the discharge characteristics and the heat of formation of the corresponding nitridesMientus, R. / Ellmer, K. et al. | 1999
- 1102
-
Calorimetric measurements with a heat flux transducer of the total power influx onto a substrate during magnetron sputteringEllmer, K. / Mientus, R. et al. | 1999
- 1107
-
Corrosion protection of titanium by deposition of niobium thin filmsGunzel, R. / Mandl, S. / Richter, E. / Liu, A. / Tang, B.Y. / Chu, P.K. et al. | 1999
- 1111
-
Hardness and corrosion protection enhancement behaviour of surgical implant surfaces treated with ceramic thin filmsHubler, R. et al. | 1999
- 1116
-
Characterisation of gradient interfaces in thin film multilayers used to protect orthopaedic implantsHubler, R. et al. | 1999
- 1123
-
Comparative measurements of annihilation rate coefficients of fluorine radicals in a r.f. SF"6 plasma by different time-resolved actinometry techniquesShogun, V. / Tyablikov, A. / Pashkov, V. / Scharff, W. / Wallendorf, T. / Marke, S. et al. | 1999
- 1127
-
Comparative investigation of multilayer TiB"2/C and co-sputtered TiB"2-C coatings for low-friction applicationsGilmore, R. / Baker, M.A. / Gibson, P.N. / Gissler, W. et al. | 1999
- 1133
-
The effect of thermal treatments on the tribological properties of PVD hard coatingsMcConnell, M.L. / Dowling, D.P. / Donnelly, N. / Donnelly, K. / Flood, R.V. et al. | 1999
- 1138
-
The multilayer effect in abrasion - optimising the combination of hard and tough phasesBerger, M. / Wiklund, U. / Eriksson, M. / Engqvist, H. / Jacobson, S. et al. | 1999
- 1145
-
Characterisation of co-sputtered Nb:Cr coatings grown by the combined cathodic arc/unbalanced magnetron sputtering techniqueParitong, H. / Lembke, M. / Lewis, D.B. / Munz, W.-D. et al. | 1999
- 1152
-
Corrosion of CrN and TiAlN coatings in chloride-containing atmospheresCunha, L. / Andritschky, M. / Rebouta, L. / Pischow, K. et al. | 1999
- 1166
-
BCN coatings on polymer substrates by plasma CVD at low temperatureWohle, J. / Ahn, H. / Rie, K.-T. et al. | 1999
- 1172
-
Magnetron sputtered titanium nitride thin films on thermoplastic polymersLugscheider, E. / Barwulf, S. / Riester, M. / Hilgers, H. et al. | 1999
- 1179
-
Composition of the interface region of sputtered titanium nitride thin films on thermoplastic polymersRiester, M. / Barwulf, S. / Lugscheider, E. / Hilgers, H. et al. | 1999
- 1183
-
Metallization of high-temperature thermoplasts by means of ion-beam-assisted depositionKersten, H.-J. / Wolf, G.K. et al. | 1999
- 1189
-
Pulsed laser deposition of alumina and zirconia thin films on polymers and glass as optical and protective coatingsGottmann, J. / Kreutz, E.W. et al. | 1999
- 1195
-
Photochemical functionalization of polymer surfaces for subsequent metallizationBeil, S. / Horn, H. / Windisch, A. / Hilgers, C. / Pochner, K. et al. | 1999
- 1204
-
A study of defects in ultra-thin transparent coatings on polymersda Silva Sobrinho, A.S. / Czeremuszkin, G. / Latreche, M. / Dennler, G. / Wertheimer, M.R. et al. | 1999
- 1211
-
Plasma diagnostics of triode ion-plating systems by energy-resolved mass spectroscopy and comparison of TiN film propertiesKadlec, S. / Macek, M. / Wouters, S. / Meert, B. / Navinsek, B. / Panjan, P. / Quaeyhaegens, C. / Stals, L.M. et al. | 1999
- 1219
-
Functional and structural properties of thin electroceramic films by laser radiationKreutz, E.W. / Gottmann, J. / Mergens, M. / Klotzbucher, T. / Vosseler, B. et al. | 1999
- 1228
-
Process control of plasma polymerization in a large industrial reactorSpatenka, P. / Endres, H.-J. / Krumeich, J. / Cook, R.W. et al. | 1999
- 1233
-
Optical emission diagnostics of permanent and pulsed microwave discharges in H"2-CH"4-N"2 for diamond depositionChatei, H. / Bougdira, J. / Remy, M. / Alnot, P. et al. | 1999
- 1238
-
Self-polarization control of radio-frequency-sputtered lead zirconate titanate filmsSuchaneck, G. / Koehler, R. / Padmini, P. / Sandner, T. / Frey, J. / Gerlach, G. et al. | 1999
- 1244
-
Measurements of nitrogen atom loss probability versus temperature on iron surfacesLefevre, L. / Belmonte, T. / Czerwiec, T. / Ricard, A. / Michel, H. et al. | 1999
- 1249
-
Evaporation of zirconia in an inductively coupled plasmaLins, G. / Branston, D.W. et al. | 1999