Chemical surface analysis on materials and devices under functional conditions – Environmental photoelectron spectroscopy as non-destructive tool for routine characterization (Unknown)
- New search for: Dietrich, Paul M.
- New search for: Bahr, Stephan
- New search for: Yamamoto, Takashi
- New search for: Meyer, Michael
- New search for: Thissen, Andreas
- New search for: Dietrich, Paul M.
- New search for: Bahr, Stephan
- New search for: Yamamoto, Takashi
- New search for: Meyer, Michael
- New search for: Thissen, Andreas
In:
Journal of electron spectroscopy and related phenomena
;
231
;
118-126
;
2019
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ISSN:
- Article (Journal) / Print
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Title:Chemical surface analysis on materials and devices under functional conditions – Environmental photoelectron spectroscopy as non-destructive tool for routine characterization
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Contributors:Dietrich, Paul M. ( author ) / Bahr, Stephan ( author ) / Yamamoto, Takashi ( author ) / Meyer, Michael ( author ) / Thissen, Andreas ( author )
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Published in:Journal of electron spectroscopy and related phenomena ; 231 ; 118-126
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Publisher:
- New search for: Elsevier Science B.V., Amsterdam.
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Publication date:2019-01-01
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Size:9 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:Unknown
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 231
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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PrefaceBare, Simon R. / Thevuthasan, Suntharampillai / Brundle, C. Richard et al. | 2019
- 2
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Applications of XPS in the characterization of Battery materialsShutthanandan, Vaithiyalingam / Nandasiri, Manjula / Zheng, Jianming / Engelhard, Mark H. / Xu, Wu / Thevuthasan, Suntharampillai / Murugesan, Vijayakumar et al. | 2019
- 11
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Industrial applications of X-Ray Photoelectron Spectroscopy (XPS) in IndiaAddepalli, Swarnagowri et al. | 2019
- 43
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The impact of the scanning XPS microprobe on industrial applications of X-ray photoelectron spectroscopyMoulder, J.F. et al. | 2019
- 50
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Applying XPS to support industrial research and manufacturingStickle, W.F. / Young, C.N. et al. | 2019
- 57
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Characterization of film materials in wafer processing technology development by XPSSaheli, Ghazal / Liu, Wei / Lazik, Christopher / Uritsky, Yuri / Bevan, Malcolm / Tang, Wei / Ma, Paul / Venkatasubramanian, Eswaranand / Bobek, Sarah / Kulshreshtha, Prashant et al. | 2019
- 68
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Trends in XPS instrumentation for industrial surface analysis and materials characterisationRoberts, A.J. / Moffitt, C.E. et al. | 2019
- 75
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XPS in industry—Problems with binding energies in journals and binding energy databasesCrist, B. Vincent et al. | 2019
- 88
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Characterization of organic light emitting diodes (OLED) using depth-profiling XPS techniqueZhang, Lei / Lloyd, Kathy / Fennimore, Adam et al. | 2019
- 94
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Using photoelectron spectroscopy in the integration of 2D materials for advanced devicesAddou, Rafik / Wallace, Robert M. et al. | 2019
- 104
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Damage and repair of organic and inorganic surfaces by Ar+ ion and gas cluster ion beam sputteringYancey, David F. / Reinhardt, Carl et al. | 2019
- 109
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Imaging XPS for industrial applicationsMorgan, David J. et al. | 2019
- 118
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Chemical surface analysis on materials and devices under functional conditions – Environmental photoelectron spectroscopy as non-destructive tool for routine characterizationDietrich, Paul M. / Bahr, Stephan / Yamamoto, Takashi / Meyer, Michael / Thissen, Andreas et al. | 2019
- 127
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Application of X-ray photoelectron spectroscopy to studies of electrodes in fuel cells and electrolyzersArtyushkova, K. / Serov, A. / Doan, H. / Danilovic, N. / Capuano, C.B. / Sakamoto, T. / Kishi, H. / Yamaguchi, S. / Mukerjee, S. / Atanassov, P. et al. | 2019
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Editorial Board| 2019