Atomic layer defect-free etching for germanium using HBr neutral beam (English)
- New search for: Fujii, Takuya
- New search for: Ohori, Daisuke
- New search for: Noda, Shuichi
- New search for: Tanimoto, Yosuke
- New search for: Sato, Daisuke
- New search for: Kurihara, Hideyuki
- New search for: Mizubayashi, Wataru
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- New search for: Li, Yiming
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- New search for: Ozaki, Takuya
- New search for: Samukawa, Seiji
- New search for: Fujii, Takuya
- New search for: Ohori, Daisuke
- New search for: Noda, Shuichi
- New search for: Tanimoto, Yosuke
- New search for: Sato, Daisuke
- New search for: Kurihara, Hideyuki
- New search for: Mizubayashi, Wataru
- New search for: Endo, Kazuhiko
- New search for: Li, Yiming
- New search for: Lee, Yao-Jen
- New search for: Ozaki, Takuya
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In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
37
, 5
;
7
;
2019
- Article (Journal) / Electronic Resource
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Title:Atomic layer defect-free etching for germanium using HBr neutral beam
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Contributors:Fujii, Takuya ( author ) / Ohori, Daisuke ( author ) / Noda, Shuichi ( author ) / Tanimoto, Yosuke ( author ) / Sato, Daisuke ( author ) / Kurihara, Hideyuki ( author ) / Mizubayashi, Wataru ( author ) / Endo, Kazuhiko ( author ) / Li, Yiming ( author ) / Lee, Yao-Jen ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:2019-09-01
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Size:7 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 37, Issue 5
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Low energy electron interactions with 1-decanethiol self-assembled monolayers on Au(111)Grzeskowiak, Jodi / Ventrice, Carl A. et al. | 2019
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Ion beam sputtering of silicon: Energy distributions of sputtered and scattered ionsKalanov, Dmitry / Anders, André / Bundesmann, Carsten et al. | 2019
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Effect of varying the vanadium thickness layer of V2O5/V/V2O5 film on its microstructural and thermochromic propertiesKhanyile, Bhekumuzi Sfundo / Mtshali, Christopher / Madiba, Itani Given / Simo, Aline / Numan, Nagla / Kaviyarasu, Kasinathan / Matinise, Nolubabalo / Nkosi, Mlungisi / Moloi, Sabata Jonas / Maaza, Malik et al. | 2019
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Atomic layer defect-free etching for germanium using HBr neutral beamFujii, Takuya / Ohori, Daisuke / Noda, Shuichi / Tanimoto, Yosuke / Sato, Daisuke / Kurihara, Hideyuki / Mizubayashi, Wataru / Endo, Kazuhiko / Li, Yiming / Lee, Yao-Jen et al. | 2019
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Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2Kint, Jeroen / Mattelaer, Felix / Minjauw, Matthias / Zhao, Bo / Detavernier, Christophe et al. | 2019
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Epitaxial BaSnO3 and SrSnO3 perovskite growth on SrTiO3(001) via atomic layer depositionChen, Pei-Yu / Lam, Chon Hei / Edmondson, Bryce / Posadas, Agham B. / Demkov, Alexander A. / Ekerdt, John G. et al. | 2019
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Low-global warming potential fluoroether compounds for plasma etching of SiO2 and Si3N4 layersCha, Taehwan / Kim, Yongjae / Lee, Sangin / Cho, Yegeun / Chae, Heeyeop et al. | 2019
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Nanostructured MoOx films deposited on c-plane sapphireNovotný, Petr / Lamb, H. Henry et al. | 2019
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Polyatomic thermal creep flows through long microchannels at large temperature ratiosTantos, Christos et al. | 2019
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Comparative study and characterization of atomic layer deposition Al2O3 films as metal-insulator-metal capacitor dielectric for GaAs hetero-junction bipolar transistor technologyYota, Jiro / Janani, Mehran / Banbrook, Hal M. / Rabinzohn, Patrick / Bosund, Markus et al. | 2019
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Influence of the microstructure on the diffusion barrier performance of Nb-based coatings for cyclotron targetsPalmieri, Vincenzo / Azzolini, Oscar / Bemporad, Edoardo / Felicis, Daniele De / Johnson, Richard R. / Renzelli, Marco / Skliarova, Hanna et al. | 2019
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Hydrogen incorporation and release from nonevaporable getter coatings based on oxygen-free Pd/Ti thin filmsMatsumoto, Masuaki / Okada, Tomohiro / Miyazawa, Tetsuya / Mase, Kazuhiko / Yamanaka, Misao / Hashimoto, Ayako / Wilde, Markus / Fukutani, Katsuyuki et al. | 2019
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Review Article: Spectroscopic microreactors for heterogeneous catalysisRizkin, Benjamin A. / Popovic, Filip G. / Hartman, Ryan L. et al. | 2019
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Surface prefunctionalization of SiO2 to modify the etch per cycle during plasma-assisted atomic layer etchingGasvoda, Ryan J. / Verstappen, Yuri G. P. / Wang, Scott / Hudson, Eric A. / Agarwal, Sumit et al. | 2019
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Differential charging analysis of Nb-TiO2 thin films on SiO2 substratesBergman, Susanna L. / Sahasrabudhe, Girija / Loh, Tamie Ai Jia / Bernasek, Steven L. et al. | 2019
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Interaction of long-lived reactive species from cold atmospheric pressure plasma with polymers: Chemical modification by ozone and reactive oxygen-nitrogen speciesLuan, Pingshan / Oehrlein, Gottlieb S. et al. | 2019
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Surface characterization of poly-2-vinylpyridine—A polymer for area selective deposition techniquesSnelgrove, Matthew / Zehe, Clara / Lundy, Ross / Yadav, Pravind / Rueff, Jean-Pascal / O’Connor, Robert / Bogan, Justin / Hughes, Greg / McGlynn, Enda / Morris, Michael et al. | 2019
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Visible/infrared refractive index and phonon properties of GaN films grown on sapphire by hollow-cathode plasma-assisted atomic layer depositionGungor, Nese / Alevli, Mustafa et al. | 2019
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Homologous substrate-temperature dependence of structure and properties of TiO2, ZrO2, and HfO2 thin films deposited by reactive sputteringKusano, Eiji et al. | 2019
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Growth of Nb3Sn coating in tin vapor-diffusion processPudasaini, Uttar / Eremeev, Grigory V. / Angle, Jonathan W. / Tuggle, Jay / Reece, Charles E. / Kelley, Michael J. et al. | 2019
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Review Article: Atomic layer deposition of doped ZnO filmsGao, Zhengning / Banerjee, Parag et al. | 2019
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Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitrideShinoda, Kazunori / Miyoshi, Nobuya / Kobayashi, Hiroyuki / Izawa, Masaru / Saeki, Tomonori / Ishikawa, Kenji / Hori, Masaru et al. | 2019
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Coverage-dependent crystalline domain structures of a tetracene thin film on H/Si(001)Tersigni, Andrew / Qin, Xiao-Rong et al. | 2019
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Effects of nitrogen-argon flow ratio on the microstructural and mechanical properties of TiAlSiN/CrN multilayer coatings prepared using high power impulse magnetron sputteringLiu, Hui / Tang, Jian-Fu / Wang, Xiaojian / Li, Wei / Chang, Chi-Lung et al. | 2019
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Growth of pulsed laser deposited few-layer WS2 filmsRathod, Urmilaben P. / Cai, Bimin / Iheomamere, Chukwudi / Nyandoto, Gilbert / Voevodin, Andrey A. / Shepherd, Nigel D. et al. | 2019
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Formation mechanisms of etched feature profiles during Si etching in Cl2/O2 plasmasMori, Masahito / Osano, Yugo / Irie, Shoki / Eriguchi, Koji / Ono, Kouichi et al. | 2019
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Tailoring commensurability of hBN/graphene heterostructures using substrate morphology and epitaxial growth conditionsPennachio, Daniel J. / Ornelas-Skarin, Chance C. / Wilson, Nathaniel S. / Rosenberg, Samantha G. / Daniels, Kevin M. / Myers-Ward, Rachael L. / Gaskill, D. Kurt / Eddy, Charles R. / Palmstrøm, Christopher J. et al. | 2019
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Insights into different etching properties of continuous wave and atomic layer etching processes for SiO2 and Si3N4 films using voxel-slab modelKuboi, Nobuyuki / Tatsumi, Tetsuya / Komachi, Jun / Yamakawa, Shinya et al. | 2019
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Impact of encapsulation method on the adsorbate induced electrical instability of monolayer grapheneKalkan, Sırrı Batuhan / Yanilmaz, Alper / Çelebi, Cem et al. | 2019