Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics (English)
- New search for: Wang, Qi Min
- New search for: Kim, Kwang Ho
- New search for: Wang, Qi Min
- New search for: Kim, Kwang Ho
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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26
, 5
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1258-1266
;
2008
- Article (Journal) / Electronic Resource
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Title:Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics
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Additional title:Effect of negative bias voltage on CrN films
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Contributors:Wang, Qi Min ( author ) / Kim, Kwang Ho ( author )
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Published in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 26, 5 ; 1258-1266
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Publisher:
- New search for: American Vacuum Society
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Publication date:2008-09-01
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Size:9 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 26, Issue 5
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1101
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Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in air at temperatures above 1500 (degree)CVlcek, Jaroslav et al. | 2008
- 1101
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Magnetron sputtered Si–B–C–N films with high oxidation resistance and thermal stability in air at temperatures aboveVlček, Jaroslav / Hřeben, Stanislav / Kalaš, Jiří / Čapek, Jiří / Zeman, Petr / Čerstvý, Radomír / Peřina, Vratislav / Setsuhara, Yuichi et al. | 2008
- 1101
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Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in air at temperatures above 1500 ^oCVlcek, J. / Hreben, S. / Kalas, J. / Capek, J. / Zeman, P. / Cerstvy, R. / Perina, V. / Setsuhara, Y. et al. | 2008
- 1109
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Investigation of the suppression effect of polyethylene glycol on copper electroplating by electrochemical impedance spectroscopyHung, Chi-Cheng / Lee, Wen-Hsi / Wang, Ying-Lang / Chan, Din-Yuen / Hwang, Gwo-Jen et al. | 2008
- 1115
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Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties ofBotha, R. / Haj Ibrahim, B. / Bulkin, P. / Drévillon, B. et al. | 2008
- 1120
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Low energy secondary ion mass spectrometry with sub-keV beams at glancing incidenceJiang, Z. X. / Kim, K. / Guenther, T. / Robichaud, B. / Benavides, J. / Contreras, L. / Sieloff, D. D. et al. | 2008
- 1128
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Measurement of reactive and condensable gas permeation using a mass spectrometerZhang, Xiao Dong / Lewis, Jay S. / Parker, Charles B. / Glass, Jeffrey T. / Wolter, Scott D. et al. | 2008
- 1138
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Identification and quantification of iron silicide phases in thin filmsMiquita, D. R. / González, J. C. / da Silva, M. I. N. / Rodrigues, W. N. / Moreira, M. V. B. / Paniago, R. / Ribeiro-Andrade, R. / Magalhães-Paniago, R. / Pfannes, H.-D. / de Oliveira, A. G. et al. | 2008
- 1149
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Structure and mechanical properties of diamondlike carbon films produced by hollow-cathode plasma depositionJiang, H. F. / Tian, X. B. / Yang, S. Q. / Fu, R. K. Y. / Chu, P. K. et al. | 2008
- 1154
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Wafer heating mechanisms in a molecular gas, inductively coupled plasma: in situ, real time wafer surface measurements and three-dimensional thermal modelingTitus, M. J. / Graves, D. B. et al. | 2008
- 1161
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Capillary flow meter for calibrating spinning rotor gaugesBerg, Robert F. et al. | 2008
- 1166
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Reduction in hydrogen outgassing from stainless steels by a medium-temperature heat treatmentPark, C. D. / Chung, S. M. / Liu, Xianghong / Li, Yulin et al. | 2008
- 1172
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Trench profile angle bevelingChen, Hui / Wang, Q. et al. | 2008
- 1178
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Ferroelectric properties of films using as buffer layers for nonvolatile-memory field-effect transistorsKim, Kyoung-Tae / Kim, Gwan-Ha / Woo, Jong-Chang / Kim, Chang-II et al. | 2008
- 1182
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Cyclic, cryogenic, highly anisotropic plasma etching of silicon usingIsakovic, A. F. / Evans-Lutterodt, K. / Elliott, D. / Stein, A. / Warren, J. B. et al. | 2008
- 1188
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Influence of gas pressure and negative bias voltage on the microstructure and properties of Cr–Si–N films by a hybrid coating systemWang, Qimin / Park, In-Wook / Kim, Kwangho et al. | 2008
- 1195
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Enhanced chemical immunity for negative electron affinity GaAs photoemittersMulhollan, G. A. / Bierman, J. C. et al. | 2008
- 1198
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Study of fluorocarbon plasma in 60 and capacitively coupled discharges using mass spectrometryUshakov, Andrey / Volynets, Vladimir / Jeong, Sangmin / Sung, Dougyong / Ihm, Yongho / Woo, Jehun / Han, Moonhyeong et al. | 2008
- 1208
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On the phase identification of dc magnetron sputtered Pt–Ru alloy thin filmsWarren, A. P. / Todi, R. M. / Yao, B. / Barmak, K. / Sundaram, K. B. / Coffey, K. R. et al. | 2008
- 1213
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Enhancement of metal oxide deposition rate and quality using pulsed plasma-enhanced chemical vapor deposition at low frequencySeman, Michael T. / Richards, David N. / Rowlette, Pieter C. / Kubala, Nicholas G. / Wolden, Colin A. et al. | 2008
- 1218
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Origin of hydrogen desorption during friction of stainless steel by alumina in ultrahigh vacuumNevshupa, R. A. / Roman, E. / de Segovia, J. L. et al. | 2008
- 1224
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Two-silane chemical vapor deposition treatment of polymer (nylon) and oxide surfaces that yields hydrophobic (and superhydrophobic), abrasion-resistant thin filmsSaini, Gaurav / Sautter, Ken / Hild, Frank E. / Pauley, Jerry / Linford, Matthew R. et al. | 2008
- 1235
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Growth and interface of films on H-terminated Si from a TDMAH and atomic layer deposition processHackley, Justin C. / Demaree, J. Derek / Gougousi, Theodosia et al. | 2008
- 1241
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Unique lack of chemical reactivity for 2,3-dimethyl-2-butene on a Si(100)-2 X 1 surfaceMadachik, Mark R. et al. | 2008
- 1241
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Unique lack of chemical reactivity for 2,3-dimethyl-2-butene on a surfaceMadachik, Mark R. / Teplyakov, Andrew V. et al. | 2008
- 1248
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The effectiveness of HCl and HF cleaning of surfaceSun, Yun / Liu, Zhi / Sun, Shiyu / Pianetta, Piero et al. | 2008
- 1251
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Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer depositionLiu, Jiurong / Martin, Ryan M. / Chang, Jane P. et al. | 2008
- 1258
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Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration film-growth characteristicsWang, Qi Min et al. | 2008
- 1258
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Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristicsWang, Qi Min / Kim, Kwang Ho et al. | 2008
- 1267
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Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and propertiesWang, Qi Min / Kim, Kwang Ho et al. | 2008
- 1277
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Pulsed dc self-sustained magnetron sputteringWiatrowski, A. / Posadowski, W. M. / Radzimski, Z. J. et al. | 2008
- 1282
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Feedback control of etch processing in inductively coupled plasmasLin, Chaung / Leou, Keh-Chyang / Li, Ting-Chieh / Lee, Lurng-Shehng / Tzeng, Pei-Jer et al. | 2008
- 1287
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Growth and ellipsometric characterizations of highly (111)-oriented films on platinized silicon by metal organic decomposition methodHu, Z. G. / Li, Y. W. / Zhu, M. / Yue, F. Y. / Zhu, Z. Q. / Chu, J. H. et al. | 2008
- 1293
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Deterioration of seal reliability due to noncoaxial arrangement of ConFlat type flanges and gasketKurokouchi, Satoshi et al. | 2008
- 1300
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Plasma-assisted molecular beam epitaxy and characterization of (101) on -plane sapphireWhite, M. E. / Tsai, M. Y. / Wu, F. / Speck, J. S. et al. | 2008
- 1308
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Increased metastable flux with Ar and Kr diluted oxygen plasmas and improved film properties of grown filmKitajima, Takeshi / Nakano, Toshiki / Makabe, Toshiaki et al. | 2008
- 1308
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Increased O(1D) metastable flux with Ar and Kr diluted oxygen plasmas and improved film properties of grown SiO2 filmKitajima, Takeshi et al. | 2008
- 1314
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Synthesis of nanoscale multilayered coatings by ion-beam-assisted depositionCao, M. / Li, D. J. / Deng, X. Y. / Sun, X. et al. | 2008
- 1319
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Test particle Monte Carlo study of the cryogenic pumping system of the Karlsruhe tritium neutrino experimentLuo, X. / Day, Ch. et al. | 2008
- 1326
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Contribution of statistical time delay and formative time to total electrical breakdown time delay in argon for different afterglow periodsPejovic, Momcilo M. / Pejovic, Milic M. et al. | 2008
- 1331
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Local supply of gas in vacuum: Application to a field ion sourceDescoins, Marion et al. | 2008
- 1331
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Local supply of gas in vacuum: Application to a field ion sourcea)Descoins, Marion / Hammadi, Zoubida / Morin, Roger et al. | 2008
- 1336
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Real-time scanning tunneling microscopy observations of the oxidation of a Ti-Pt(111)-(2 X 2) surface alloy using O2 and NO2Hsieh, Shuchen et al. | 2008
- 1336
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Real-time scanning tunneling microscopy observations of the oxidation of a surface alloy using and a)Hsieh, Shuchen / Liu, G. F. / Koel, Bruce E. et al. | 2008
- 1343
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Ultralow films by using a plasma-enhanced chemical vapor deposition porogen approach: Study of the precursor reaction mechanismsCastex, A. / Jousseaume, V. / Deval, J. / Bruat, J. / Favennec, L. / Passemard, G. et al. | 2008
- 1355
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Brief Reports and Comments - Bayard-Alpert ionization gauge sensitivity for C7F14Kim, S.-H. et al. | 2008
- 1355
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Bayard-Alpert ionization gauge sensitivity forKim, S.-H. / Heinrich, J. R. / Miller, M. J. / Merlino, R. L. et al. | 2008
- 1357
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Investigation of a vapor deposited thin silica film as a novel substrate for in situ Fourier transform infrared spectroscopyAnderson, A. / Ashurst, W. Robert et al. | 2008
- 1362
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Comment on ``CrN~x and Cr~1~-~xAl~xN as template films for the growth of alpha -alumina using ac reactive magnetron sputtering,'' [J. Vac. Sci. Technol. A 25, 1367 (2007)]Khanna, A. et al. | 2008
- 1362
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Comment on “ and as template films for the growth of -alumina using ac reactive magnetron sputtering,” [Khanna, Atul et al. | 2008
- 1362
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Comment on "CrNx and Cr1-xAlxN as template films for the growth of a-alumina using ac reactive magnetron sputtering," (J. Vac. Sci. Technol. A 25, 1367 (2007))Khanna, Atul et al. | 2008
- 1364
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CUMULATIVE AUTHOR INDEX| 2008
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An international journal devoted to Vacuum, Surfaces, and Films - Preliminary Program . AVS 55th International Symposium . Boston, 19-24 October 2008| 2008
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Preliminary Program of the AVS 55th International Symposium| 2008