A large angle electrostatic deflection, variable shaped, electron beam exposure system (English)
- New search for: Moriya, Shigeru
- New search for: Komatsu, Kazuhiko
- New search for: Harada, Katsuhiro
- New search for: Kitayama, Toyoki
- New search for: Moriya, Shigeru
- New search for: Komatsu, Kazuhiko
- New search for: Harada, Katsuhiro
- New search for: Kitayama, Toyoki
In:
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
;
1
, 4
;
990-994
;
1983
- Article (Journal) / Electronic Resource
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Title:A large angle electrostatic deflection, variable shaped, electron beam exposure system
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Additional title:A large angle electrostatic deflection
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Contributors:Moriya, Shigeru ( author ) / Komatsu, Kazuhiko ( author ) / Harada, Katsuhiro ( author ) / Kitayama, Toyoki ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:1983-10-01
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Size:5 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 1, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 865
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Photoemission study of GeAs(2̄01): A model for the As‐stabilized Ge surface on GaAs/Ge heterojunctionsStucki, F. / Lapeyre, G. J. / Bauer, Robert S. / Zurcher, P. / Mikkelsen, J. C. et al. | 1983
- 871
-
Solid‐phase‐epitaxial growth and formation of metastable alloys in ion implanted siliconNarayan, J. / Holland, O. W. / Appleton, B. R. et al. | 1983
- 888
-
The use of pulsed laser irradiation in silicon molecular beam epitaxy: A comparative low energy electron diffraction studyde Jong, T. / Douma, W. A. S. / Smit, L. / Korablev, V. V. / Saris, F. W. et al. | 1983
- 899
-
Study of the stepwise oxidation and nitridation of Si(111): Electron stimulated desorption, Auger spectroscopy, and electron loss spectroscopyKnotek, M. L. / Houston, J. E. et al. | 1983
- 915
-
Early stages of silicide formation on W, Ni, and Pt surfaces, an atom probe, and field ion microscope studyTsong, T. T. / Wang, S. C. / Liu, F. H. / Cheng, H. / Ahmad, M. et al. | 1983
- 923
-
Kinetics of the ablative photodecomposition of organic polymers in the far ultraviolet (193 nm)Srinivasan, R. et al. | 1983
- 927
-
Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardmentWinters, Harold F. et al. | 1983
- 932
-
Ammonium fluoride deposition during plasma etching of silicon nitrideBrewer, J. A. / Miller, G. W. et al. | 1983
- 935
-
Plasma enhanced beam deposition of thin films at low temperaturesChang, R. P. H. / Darack, S. / Lane, E. / Chang, C. C. / Allara, D. / Ong, E. et al. | 1983
- 943
-
Optical monitoring for rate and uniformity control of low power plasma‐enhanced CVDDautremont‐Smith, W. C. / Lopata, J. et al. | 1983
- 959
-
Molecular level fabrication techniques and molecular electronic devicesCarter, Forrest L. et al. | 1983
- 969
-
A review of laser–microchemical processingEhrlich, D. J. / Tsao, J. Y. et al. | 1983
- 985
-
Maskless etching of a nanometer structure by focused ion beamsKomuro, Masanori / Hiroshima, Hiroshi / Tanoue, Hisao / Kanayama, Toshihiko et al. | 1983
- 990
-
A large angle electrostatic deflection, variable shaped, electron beam exposure systemMoriya, Shigeru / Komatsu, Kazuhiko / Harada, Katsuhiro / Kitayama, Toyoki et al. | 1983
- 995
-
Design aspects of the optics of the VLS‐1000 electron‐beam direct‐write lithography systemPetric, P. F. / Taylor, N. J. / Utlaut, M. et al. | 1983
- 999
-
Dot matrix electron beam lithographyNewman, T. H. / Pease, R. F. W. / DeVore, W. et al. | 1983
- 1003
-
EL‐3 application to 0.5 μm semiconductor lithographyDavis, D. E. / Gillespie, S. J. / Silverman, S. L. / Stickel, W. / Wilson, A. D. et al. | 1983
- 1007
-
Edge contrast: A new definition for comparative lithography tool characterizationStickel, W. / Langner, G. O. et al. | 1983
- 1011
-
A field emission e‐beam system for nanometer lithographyStephani, D. / Kratschmer, E. / Beneking, H. et al. | 1983
- 1014
-
Performance results of an electron beam lithography machine and process by means of dc electrical test structuresRissman, Paul / Liu, En‐Den / Owen, Geraint et al. | 1983
- 1020
-
The magnitude and significance of proximity effects in electron image projector defined layersNicholas, K. H. / Ford, R. A. / Brockman, H. E. / Stemp, I. J. et al. | 1983
- 1023
-
Registration mark detection in electron beam proximity printingNehmiz, P. / Behringer, U. / Bohlen, H. / Kallmeyer, M. et al. | 1983
- 1028
-
Chemically assisted ion beam etching for submicron structuresChinn, J. D. / Adesida, I. / Wolf, E. D. et al. | 1983
- 1033
-
Local plasma oxidation and reactive ion etching of metal films for ultrafine line pattern inversion and transferNulman, J. / Krusius, J. P. et al. | 1983
- 1037
-
Reactive ion etching for submicron structures of refractory metal silicides and polycidesZhang, M. / Li, J. Z. / Adesida, I. / Wolf, E. D. et al. | 1983
- 1043
-
Large area ion beam assisted etching of GaAs with high etch rates and controlled anisotropyLincoln, G. A. / Geis, M. W. / Pang, S. / Efremow, N. N. et al. | 1983
- 1047
-
Maskless etching of GaAs and InP using a scanning microplasmaOchiai, Yukinori / Gamo, Kenji / Namba, Susumu et al. | 1983
- 1050
-
Reactive ion etching of GaAs using CCl2F2 and the effect of Ar additionChaplart, J. / Fay, B. / Linh, Nuyen T. et al. | 1983
- 1053
-
Reactive ion etching of GaAs and InP using SiCl4Stern, M. B. / Liao, P. F. et al. | 1983
- 1056
-
Focused ion beam microlithography using an etch‐stop process in gallium‐doped siliconLa Marche, P. H. / Levi‐Setti, R. / Wang, Y. L. et al. | 1983
- 1059
-
High resolution patterning of silicon by selective gallium dopingBerry, I. L. / Caviglia, A. L. et al. | 1983
- 1062
-
Deep‐UV photolithographic applications of copolymer (methacrylonitrile–methacrylic acid)Hiraoka, H. / Welsh, W. L. / Bargon, J. et al. | 1983
- 1066
-
Poly(chloromethylstyrene): A high performance x‐ray resistChoong, Hsia S. / Kahn, Frederic J. et al. | 1983
- 1072
-
Conventional novolak resists for storage ring x‐ray lithographyLane, J. G. / Maldonado, J. R. / Cleland, A. N. / Haelbich, R. P. / Silverman, J. P. / Warlaumont, J. M. et al. | 1983
- 1076
-
Direct engraving on positive resists by synchrotron radiationIchimura, S. / Hirata, M. / Tanino, H. / Atoda, N. / Ono, M. / Hoh, K. et al. | 1983
- 1080
-
Submicrometer‐gate GaAs FET fabrication using masked ion beam/optical hybrid lithographyAdesida, I. / Zhang, M. / Sadler, R. / Tiberio, R. / Wolf, E. D. et al. | 1983
- 1084
-
Read‐only memory with electron‐beam programmable floating‐gate transistorsShaver, D. C. et al. | 1983
- 1088
-
Fabrication of a high density storage medium for electron beam memoryOro, James A. / Wolfe, J. C. et al. | 1983
- 1091
-
Fabrication of apertures, slots, and grooves at the 8–80 nm scale in silicon and metal filmsMuray, A. / Isaacson, M. / Adesida, I. / Whitehead, B. et al. | 1983
- 1096
-
Practical aspects of microfabrication in the 100 nm regimeKern, D. P. / Houzego, P. J. / Coane, P. J. / Chang, T. H. P. et al. | 1983
- 1101
-
Electron beam lithography from 20 to 120 keV with a high quality beamHoward, R. E. / Craighead, H. G. / Jackel, L. D. / Mankiewich, P. M. / Feldman, M. et al. | 1983
- 1105
-
Generation of <50 nm period gratings using edge defined techniquesFlanders, D. C. / Efremow, N. N. et al. | 1983
- 1109
-
Applications of surface textures produced with natural lithographyDeckman, H. W. / Dunsmuir, J. H. et al. | 1983
- 1113
-
Selective Si and Be implantation in GaAs using a 100 kV mass‐separating focused ion beam system with an Au–Si–Be liquid metal ion sourceMiyauchi, Eizo / Arimoto, Hiroshi / Hashimoto, Hisao / Utsumi, Takao et al. | 1983
- 1117
-
100 keV focused ion beam system with a E×B mass filter for maskless ion implantationShiokawa, Takao / Kim, Pil Hyon / Toyoda, Koichi / Namba, Susumu / Matsui, Takao / Gamo, Kenji et al. | 1983
- 1121
-
A new submicron ion probe systemTsumagari, T. / Ohiwa, H. / Okutani, T. / Noda, T. et al. | 1983
- 1125
-
Computer simulations of submicron FIB system opticsThompson, W. / Honjo, I. / Utlaut, Mark / Enge, H. et al. | 1983
- 1129
-
Use of a modified paraxial formalism for particle beam dynamics: Application to liquid metal ion sourcesMiskovsky, N. M. / Cutler, P. H. / Feuchtwang, T. E. et al. | 1983
- 1132
-
High resolution mass spectrometry of liquid metal ion sourcesWilkens, B. / Venkatesan, T. et al. | 1983
- 1137
-
Improvement of electrostatic lenses for ion beam lithographySzilagyi, M. et al. | 1983
- 1141
-
Space charge effects in focused ion beamsYau, Y. W. / Groves, T. R. / Pease, R. F. W. et al. | 1983
- 1145
-
Characteristics of an advanced electrohydrodynamic ion source with additional mode of surface ionizationOkutani, T. / Fukuda, M. / Noda, T. / Tamura, H. / Watanabe, H. / Shepherd, C. et al. | 1983
- 1148
-
SiO2 films deposited on Si by an ionized cluster beamMinowa, Y. / Yamanishi, K. / Tsukamoto, K. et al. | 1983
- 1152
-
Silicon nitride stencil masks for high resolution ion lithography proximity printingRandall, J. N. / Flanders, D. C. / Economou, N. P. / Donnelly, J. P. / Bromley, E. I. et al. | 1983
- 1156
-
Application of chlorinated polymethylstyrene, CPMS, to electron beam lithographyKamoshida, Yoichi / Koshiba, Mitsunobu / Yoshimoto, Hiroshi / Harita, Yoshiyuki / Harada, Kunihiro et al. | 1983
- 1160
-
Copolymers of itaconic acid and methyl methacrylate as positive electron beam resistsNamasté, Y. M. N. / Obendorf, S. K. / Anderson, C. C. / Krasicky, P. D. / Rodriguez, F. / Tiberio, R. et al. | 1983
- 1166
-
PMMA electron resists with narrow molecular weight distributionDeckman, H. W. / Dunsmuir, J. H. et al. | 1983
- 1171
-
Direct pattern fabrication on silicone resin by vapor phase electron beam polymerizationMorita, Masao / Imamura, Saburo / Tamamura, Toshiaki / Kogure, Osamu / Murase, Kei et al. | 1983
- 1174
-
High resolution patterning with Ag2S/As2S3 inorganic electron‐beam resist and reactive ion etchingSingh, B. / Beaumont, S. P. / Webb, A. / Bower, P. G. / Wilkinson, C. D. W. et al. | 1983
- 1178
-
Nitrocellulose as a self‐developing resist with submicrometer resolution and processing stabilityGeis, M. W. / Randall, J. N. / Deutsch, T. F. / Efremow, N. N. / Donnelly, J. P. / Woodhouse, J. D. et al. | 1983
- 1182
-
Resist exposure with light ionsAdesida, I. / Anderson, C. / Wolf, E. D. et al. | 1983
- 1186
-
Contact lithography at 157 nm with an F2 excimer laserCraighead, H. G. / White, J. C. / Howard, R. E. / Jackel, L. D. / Behringer, R. E. / Sweeney, J. E. / Epworth, R. W. et al. | 1983
- 1190
-
A critical examination of submicron optical lithography using simulated projection imagesRosenbluth, Alan E. / Goodman, Douglas / Lin, B. J. et al. | 1983
- 1196
-
A precision wide‐range optical gap measurement techniqueFlanders, D. C. / Lyszczarz, T. M. et al. | 1983
- 1200
-
Deep‐UV spatial‐frequency doubling by combining multilayer mirrors with diffraction gratingsHawryluk, A. M. / Smith, Henry I. / Ehrlich, D. J. et al. | 1983
- 1204
-
An improved technique for resist‐profile control in holographic lithographyLezec, Henri J. / Anderson, Erik H. / Smith, Henry I. et al. | 1983
- 1207
-
Fabrication of submicron crossed square wave gratings by dry etching and thermoplastic replication techniquesLehmann, H. W. / Widmer, R. / Ebnoether, M. / Wokaun, A. / Meier, M. / Miller, S. K. et al. | 1983
- 1211
-
Electron beam fabrication of high resolution masksKenty, J. L. / Puzio, L. C. / Schauerte, F. J. et al. | 1983
- 1215
-
Use of antireflective coating in bilayer resist processLin, Yi‐Ching / Jones, Sue / Fuller, Gene et al. | 1983
- 1219
-
Submicrometer contact hole delineation with a two‐layer deep‐UV portable conformable masking systemPetrillo, K. E. / Chao, V. W. / Lin, B. J. et al. | 1983
- 1225
-
Multilayer resist technique for submicron optical lithographyTing, C. H. / Liauw, K. L. et al. | 1983
- 1235
-
Planarization phenomena in multilayer resist processingWhite, L. K. et al. | 1983
- 1241
-
A novel bilevel resist systemMcCullough, A. W. / Pavelchek, E. / Windischmann, H. et al. | 1983
- 1247
-
A two‐layer photoresist process for patterning high‐reflectivity substratesOng, E. / Baker, R. M. / Hale, L. P. et al. | 1983
- 1251
-
Enhanced brightness x‐ray sourceLeslie, B. / Neukermans, A. / Simon, T. / Foster, J. et al. | 1983
- 1257
-
Design parameters for a small storage ring optimized as an x‐ray lithography sourceGrobman, Warren D. et al. | 1983
- 1262
-
Design and performance of an x‐ray lithography beam line at a storage ringHaelbich, R. P. / Silverman, J. P. / Grobman, W. D. / Maldonado, J. R. / Warlaumont, J. M. et al. | 1983
- 1267
-
Diffraction effects on pattern replication with synchrotron radiationAtoda, N. / Kawakatsu, H. / Tanino, H. / Ichimura, S. / Hirata, M. / Hoh, K. et al. | 1983
- 1271
-
Investigations of x‐ray exposure using plane scanning mirrorsBieber, M. / Scheunemann, H.‐U / Betz, H. / Heuberger, A. et al. | 1983
- 1276
-
A dual grating alignment technique for x‐ray lithographyKinoshita, Hiroo / Une, Atsunobu / Iki, Makoto et al. | 1983
- 1280
-
A zone plate shadow camera for 100 keV x rays and 6 MeV protonsStone, G. F. / Ceglio, N. M. et al. | 1983
- 1285
-
X‐ray phase lens design and fabricationCeglio, N. M. / Hawryluk, A. M. / Schattenburg, M. et al. | 1983
- 1289
-
In‐lens deflection system with nonequisectored‐type multipole electrostatic deflectorsGoto, E. / Soma, T. / Idesawa, M. / Sasaki, T. / Goto, T. / Konno, S. / Someya, T. / Tanaka, K. / Miyauchi, S. et al. | 1983
- 1293
-
Electron beam optical system with large field coverage for submicron lithographyHosokawa, Teruo / Morita, Hirofumi et al. | 1983
- 1298
-
Optimization of the optical parameters in variable shape electron beam lithographyJones, G. A. C. / Rao, V. R. M. / Sun, H. T. / Ahmed, H. et al. | 1983
- 1303
-
A simplified focusing and deflection system with vertical beam landingKuroda, Katsuhiro / Ozasa, Susumu / Komoda, Tsutomu et al. | 1983
- 1307
-
Trajectory displacement due to local space‐charge forceSasaki, Tateaki et al. | 1983
- 1312
-
Correction of spherical aberration in charged particle lenses using aspherical foilsvan Gorkum, Aart A. et al. | 1983
- 1316
-
A large area deflection system with very low aberrationKuo, H. P. / Groves, T. R. et al. | 1983
- 1322
-
Numerical considerations on multipole‐type electrostatic deflectorsIdesawa, M. / Soma, T. / Goto, E. / Sasaki, T. et al. | 1983
- 1327
-
Electron beam tool/resist interdependenceEib, Nicholas K. / Jones, Fletcher et al. | 1983
- 1331
-
Computer simulation of high dose reactive‐ion implants into siliconDobson, R. M. / Arrowsmith, R. P. / Hemment, P. L. F. et al. | 1983
- 1334
-
Effects of dry etching on GaAsPang, S. W. / Lincoln, G. A. / McClelland, R. W. / DeGraff, P. D. / Geis, M. W. / Piacentini, W. J. et al. | 1983
- 1338
-
A high performance electron energy loss spectrometer for use with a dedicated STEMIsaacson, M. / Scheinfein, M. et al. | 1983
- 1344
-
Surface potential measurements on floating targets with a parallel beam techniqueBrunner, M. / Menzel, E. et al. | 1983
- 1348
-
Characterization and performance improvement of secondary electron analyzersMenzel, E. / Brunner, M. et al. | 1983
- 1352
-
Heating and temperature‐induced distortions of silicon x‐ray masksHeinrich, K. / Betz, H. / Heuberger, A. et al. | 1983
- 1358
-
Simulation of backscattered electron signals for x‐ray mask inspectionRosenfield, M. G. / Neureuther, A. R. / Viswanathan, R. et al. | 1983
- 1364
-
A technique for the determination of stress in thin filmsBromley, E. I. / Randall, J. N. / Flanders, D. C. / Mountain, R. W. et al. | 1983
- 1367
-
Exposure and development simulations for nanometer electron beam lithographySamoto, N. / Shimizu, R. / Hashimoto, H. / Adesida, I. / Wolf, E. / Namba, S. et al. | 1983
- 1372
-
Polysiloxane resist as a probe for energy deposited in electron beam exposed resistsParaszczak, J. / Kern, D. / Hatzakis, M. / Bucchignano, J. / Arthur, E. / Rosenfield, M. et al. | 1983
- 1378
-
Proximity effect correction on substrates of variable material compositionVettiger, Peter / Forster, Theo / Kern, Dieter P. et al. | 1983
- 1383
-
An image processing approach to fast, efficient proximity correction for electron beam lithographyChow, D. G. L. / McDonald, J. F. / King, D. C. / Smith, W. / Molnar, K. / Steckl, A. J. et al. | 1983
- 1391
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Spatial resolution limits in electron beam nanolithographyKyser, David F. et al. | 1983