Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times (English)
- New search for: Padhi, Partha Sarathi
- New search for: Ajimsha, R. S.
- New search for: Rai, S. K.
- New search for: Bhartiya, Sushmita
- New search for: Bose, Aniruddha
- New search for: Das, Bidyadhar
- New search for: Tiwari, Manoj Kumar
- New search for: Misra, Pankaj
- New search for: Padhi, Partha Sarathi
- New search for: Ajimsha, R. S.
- New search for: Rai, S. K.
- New search for: Bhartiya, Sushmita
- New search for: Bose, Aniruddha
- New search for: Das, Bidyadhar
- New search for: Tiwari, Manoj Kumar
- New search for: Misra, Pankaj
In:
Journal of Vacuum Science & Technology A
;
41
, 6
;
13
;
2023
- Article (Journal) / Electronic Resource
-
Title:Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times
-
Contributors:Padhi, Partha Sarathi ( author ) / Ajimsha, R. S. ( author ) / Rai, S. K. ( author ) / Bhartiya, Sushmita ( author ) / Bose, Aniruddha ( author ) / Das, Bidyadhar ( author ) / Tiwari, Manoj Kumar ( author ) / Misra, Pankaj ( author )
-
Published in:Journal of Vacuum Science & Technology A ; 41, 6 ; 13
-
Publisher:
- New search for: American Vacuum Society
-
Publication date:2023-12-01
-
Size:13 pages
-
ISSN:
-
DOI:
-
Type of media:Article (Journal)
-
Type of material:Electronic Resource
-
Language:English
-
Keywords:
-
Source:
Table of contents – Volume 41, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
-
Effects of C4F8 plasma polymerization film on etching profiles in the Bosch processNonaka, Tomoyuki / Takahashi, Kazuo / Uchida, Akimi / Lundgaard, Stefan / Tsuji, Osamu et al. | 2023
-
Significance of plasma-surface interactions in the etch behavior of low-k materialsPranda, Adam / Grzeskowiak, Steven / Tsai, Yu- Hao / Yoshida, Yusuke / Liu, Eric / Han, Yun / Biolsi, Peter / Kobayashi, Ken / Ikezawa, Nobuyuki et al. | 2023
-
Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatingsZheng, Yu / Xu, Peng / Li, Long / Liu, Qibin / Guo, Shanzhu et al. | 2023
-
High-mass metal ion irradiation enables growth of high-entropy sublattice nitride thin films from elemental targetsRogoz, Vladyslav / Pshyk, Oleksandr / Wicher, Bartosz / Palisaitis, Justinas / Lu, Jun / Primetzhofer, Daniel / Petrov, Ivan / Hultman, Lars / Greczynski, Grzegorz et al. | 2023
-
Tribological behavior and wear mechanism of nanomultilayer AlCrN/AlTiSiN coatings at elevated temperaturesXiao, Baijun / Zhang, Teng Fei et al. | 2023
-
Thermal transport and structural improvements due to annealing of wafer bonded β-Ga2O3|4H-SiCLiao, Michael E. / Huynh, Kenny / Cheng, Zhe / Shi, Jingjing / Graham, Samuel / Goorsky, Mark S. et al. | 2023
-
Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H2SLee, Jinwoo / Lee, Soo Hyun / Shong, Bonggeun et al. | 2023
-
Real-time artificial intelligence enhanced defect engineering in CeO2 nanostructuresKumar, Udit / Arunachalam, Ayush / Feit, Corbin / Berriel, S. Novia / Basu, Kanad / Banerjee, Parag / Seal, Sudipta et al. | 2023
-
Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopyVella, Joseph R. / Hao, Qinzhen / Donnelly, Vincent M. / Graves, David B. et al. | 2023
-
Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubesOgawa, Daisuke / Nakamura, Keiji et al. | 2023
-
Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodologyBroitman, Esteban / Kadin, Yuri / Andric, Predrag et al. | 2023
-
Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitrideKim, Hankyu / Kim, Miso / Kim, Bumsang / Shong, Bonggeun et al. | 2023
-
Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin filmsMathew, Femi / Poonkottil, Nithin / Solano, Eduardo / Poelman, Dirk / Hens, Zeger / Detavernier, Christophe / Dendooven, Jolien et al. | 2023
-
Ultrahigh density InGaN/GaN nanopyramid quantum dots for visible emissions with high quantum efficiencyLiu, Cheng / Pokharel, Nikhil / Lin, Qinchen / Betancourt Ponce, Miguel A. / Sun, Jian / Lane, Dominic / De Prinse, Thomas J. / Tansu, Nelson / Gopalan, Padma / Gupta, Chirag et al. | 2023
-
Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound targetFarahani, M. / Kozák, T. / Pajdarová, A. D. / Bahr, A. / Riedl, H. / Zeman, P. et al. | 2023
-
Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching processHu, Ziyi / Shao, Hua / Li, Junjie / Lai, Panpan / Wang, Wenrui / Li, Chen / Yan, Qi / He, Xiaobin / Li, Junfeng / Yang, Tao et al. | 2023
-
Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kineticsCampos-Silva, I. / Castillo-Vela, L. E. / Mejía-Caballero, I. / Rosales-Lopez, J. L. / Olivares-Luna, M. / Chaparro-Pérez, K. D. / Espino-Cortes, F. P. / González-Carmona, J. M. et al. | 2023
-
Formation of thin films via cold-rolled/annealed nickel sputtering targetsLi, Sixie / Wen, Ming / Wang, Chuanjun / Wang, Yiqing / Shen, Yue et al. | 2023
-
Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer depositionMontalvo-Urquizo, J. / Mazón-Montijo, D. A. / Ortíz-Atondo, A. A. / Martínez-García, A. L. / Mendivil-Palma, M. I. / Ramírez-Esquivel, O. Y. / Montiel-González, Z. et al. | 2023
-
MOCVD grown ultraviolet microlight-emitting diodes with an InGaN/GaN/AlGaN active region designWang, Guangying / Li, Yuting / Liu, Cheng / Lin, Qinchen / Sanyal, Surjava / Gupta, Chirag / Pasayat, Shubhra S. et al. | 2023
-
CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputteringPísaříková, A. / Olejníček, J. / Venkrbcová, I. / Nožka, L. / Cichoň, S. / Azinfar, A. / Hippler, R. / Helm, C. A. / Mašláň, M. / Machala, L. et al. | 2023
-
Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicalsHarumningtyas, Anjar Anggraini / Ito, Tomoko / Isobe, Michiro / Zajíčková, Lenka / Hamaguchi, Satoshi et al. | 2023
-
Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germaniumOishi, Naoto / Yasuoka, Tatsuya / Kawaharamura, Toshiyuki / Nitta, Noriko et al. | 2023
-
Fabrication and characterization of a hybrid magnetic structure based on highly ordered metallic nanotube arraysAltama, Alfreda Krisna / Kong, Fanhua / Sugiarto, Natanael Ardi / Hsu, Peikai / Chen, Shih-Yun / Yiu, Pakman / Chu, Jinn P. et al. | 2023
-
Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasmaKang, Wangu / Ahn, Ji Sang / Han, Jeong Hwan et al. | 2023
-
Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma dischargeZgheib, J. / Berthelot, L. / Tranchant, J. / Ginot, N. / Besland, M.-P. / Caillard, A. / Minea, T. / Rhallabi, A. / Jouan, P.-Y. et al. | 2023
-
Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer modelHerrera-Gomez, Alberto / Guzman-Bucio, Dulce Maria / Mayorga-Garay, Marisol / Cortazar-Martinez, Orlando et al. | 2023
-
β-Ga2O3 orientation dependence of band offsets with SiO2 and Al2O3Wan, Hsiao-Hsuan / Li, Jian-Sian / Chiang, Chao-Ching / Xia, Xinyi / Hays, David C. / Ren, Fan / Pearton, Stephen J. et al. | 2023
-
Effect of nitrogen pressure on the fabrication of AlCrFeCoNiCu0.5 high entropy nitride thin films via cathodic arc depositionJiang, Tenghao / Zhao, Hong / Tsoutas, Kostadinos / Sun, Lixian / Liu, Hongwei / Liu, Yanping / Xu, Fanjun / Zheng, Zhong / Bilek, Marcela M. / Liu, Zongwen et al. | 2023
-
Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflectorJang, In-Kyu / Lee, Hyung-Joo / Kim, Dae-Kwang / Kwac, Lee-Ku / Cho, Sung Woon et al. | 2023
-
LixCoyOz thin-films deposition through thermal atomic layer depositionPeisert, Antoine / Adjeroud, Noureddine / Lenoble, Damien / Lamblin, Guillaume et al. | 2023
-
Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas annealCollings, Michael A. / Junige, Marcel / Cavanagh, Andrew S. / Wang, Victor / Kummel, Andrew C. / George, Steven M. et al. | 2023
-
Electrochromic properties of NiO films prepared by atomic layer depositionSu, Xi / Tu, Zexin / Ji, Liwei / Wu, Hao / Xu, Hongxing / Liu, Chang et al. | 2023
-
Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasmaHossain, Azmain A. / Wang, Haozhe / Catherall, David S. / Leung, Martin / Knoops, Harm C. M. / Renzas, James R. / Minnich, Austin J. et al. | 2023
-
Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma sprayingGhadami, Farzin / Davoudabadi, Mohammad Amin / Ghadami, Soheil et al. | 2023
-
Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatingsLi, Xin / Zhou, Zixiang / Wang, Chenglei / Qin, Haiqing / Yang, Jijie / Liu, Weijie / Liang, Mulin / Liu, Chong / Tan, Hong / Zhang, Zhenjun et al. | 2023
-
Unveiling interface structure and polarity of wurtzite ZnO film epitaxially grown on a-plane sapphire substrateLu, Lu / Meng, Weiwei / Wang, Yingmin / Qiang, Jianbing / Mi, Shao-Bo et al. | 2023
-
Ultrathin VO2 grown with oxygen plasma molecular beam epitaxy on TiO2 (001) and Al2O3 (0001)Spitzig, Alyson / Hoffman, Jennifer E. / Hoffman, Jason D. et al. | 2023
-
Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer filmsGao, Weilong / Zhang, Ruizhi / Wang, Jin / Huang, Zihao / Li, Zhiguo / Fu, Yajun / Luo, Guoqiang / Tu, Rong et al. | 2023
-
Standing wave patterns in graphene systems studied using scanning tunneling spectroscopyJang, Won-Jun / Chang, Min Hui / Kang, Min Jeong / Song, Young Jae / Kahng, Se-Jong et al. | 2023
-
Anticorrosive coatings made from polydopamine modified graphitic C3N4 composites with synergistic anticorrosion effectsLi, Lijuan / Yao, Hongrui / Bi, Wenya / Fu, Wanlu / Wang, Na et al. | 2023
-
Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxidesLee, Sanghun / Seo, Seunggi / Lee, Woo-Jae / Noh, Wontae / Kwon, Se-Hun / Oh, Il-Kwon / Kim, Hyungjun et al. | 2023
-
Germanium surface cleaning and ALD of a protective boron nitride overlayerOmolere, Olatomide B. / Adesope, Qasim / Alhowity, Samar / Agbara, Tochi L. / Kelber, Jeffry A. et al. | 2023
-
Solid-source metal-organic MBE for elemental Ir and Ru filmsNair, Sreejith / Noordhoek, Kyle / Lee, Dooyong / Bartel, Christopher J. / Jalan, Bharat et al. | 2023
-
Microscopic study of submonolayer nucleation characteristics during GaN (0001) homoepitaxial growthSu, Peng / Ai, Wensen / Chen, Xuejiang / Liu, Lijun et al. | 2023
-
Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arcUnutulmazsoy, Yeliz / Kalanov, Dmitry / Oh, Kyunghwan / Karimi Aghda, Soheil / Gerlach, Jürgen W. / Braun, Nils / Munnik, Frans / Lotnyk, Andriy / Schneider, Jochen M. / Anders, André et al. | 2023
-
Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge timesPadhi, Partha Sarathi / Ajimsha, R. S. / Rai, S. K. / Bhartiya, Sushmita / Bose, Aniruddha / Das, Bidyadhar / Tiwari, Manoj Kumar / Misra, Pankaj et al. | 2023
-
Band-engineered LaFeO3–LaNiO3 thin film interfaces for electrocatalysis of waterPaudel, Rajendra / Burton, Andricus R. / Kuroda, Marcelo A. / Farnum, Byron H. / Comes, Ryan B. et al. | 2023
-
Some considerations in nanoindentation measurement and analysis by atomic force microscopyRosenhek-Goldian, Irit / Cohen, Sidney R. et al. | 2023
-
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputteringFeng, Yiqun / Chung, Tsai-Fu / Hsiao, Chien-Nan / Huang, Jia-Hong et al. | 2023
-
Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni3Al coatingsTiwari, Sunil Kumar / Rao, Akula Umamaheswara / Kharb, Archana Singh / Chawla, Vipin / Sardana, Neha / Avasthi, Devesh Kumar / Chawla, Amit Kumar et al. | 2023
-
Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed solLi, Yufan / Zheng, Yong / Du, Yuze / Zhang, Xi / Wang, Wangwang / Lv, Jin et al. | 2023
-
Influence of nitrogen vacancies on the decomposition route and age hardening of wurtzite Ti1−xAlxNy thin filmsSalamania, J. / Farhadizadeh, A. F. / Kwick, K. M. Calamba / Schramm, I. C. / Hsu, T. W. / Johnson, L. J. S. / Rogström, L. / Odén, M. et al. | 2023
-
Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theoryStach, T. / Seif, A. / Ambrosetti, A. / Silvestrelli, P. L. / Burghaus, U. et al. | 2023
-
Al2O3 atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistanceWidmer, Jack T. / George, Steven M. et al. | 2023
-
Evolution of β-Ga2O3 to γ-Ga2O3 solid-solution epitaxial films after high-temperature annealingJiang, Kunyao / Tang, Jingyu / Xu, Chengchao / Xiao, Kelly / Davis, Robert F. / Porter, Lisa M. et al. | 2023
-
Oxygen plasma treatment of TeO2—B2O3 (boro-tellurite) thin filmsDemirkol, Uğur / Durmuş, Çağrı / Akan, Tamer et al. | 2023
-
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detectionChu, Jinn P. / Yeh, Yi-Jui / Liu, Chih-Yu / Yang, Yi-Xiang / Altama, Alfreda Krisna / Chang, Ting-Hao / Chiang, Wei-Hung / Yiu, Pakman / Tung, Kuo-Lun et al. | 2023
-
Multielectronic and multiatomic effects in the U O4,5 x-ray absorption spectroscopy of uranium dioxideTobin, J. G. / Ramanantoanina, H. / Daul, C. / Yu, S.-W. et al. | 2023
-
Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal arrayYang, Jing / Wang, Linwei / Chen, Zhang / Xue, Zhongjun / Zhao, Shuwen / Ding, Dongzhou et al. | 2023
-
Ion track formation and porosity in InSb induced by swift heavy ion irradiationAlwadi, Taleb / Notthoff, Christian / Dutt, Shankar / Wierbik, Jessica / Afrin, Nahid / Kiy, Alexander / Kluth, Patrick et al. | 2023
-
Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer depositionSong, Seokhwi / Kim, Eungju / Kim, Kyunghoo / Bae, Jangho / Lee, Jinho / Jung, Chang Hwa / Lim, Hanjin / Jeon, Hyeongtag et al. | 2023
-
Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxyWeng, Joan / Shin, Hyungki / Godin, Simon / Oudah, Mohamed / Sutarto, Ronny / Pons, Rebecca / Davidson, Bruce A. / Zou, Ke et al. | 2023
-
Selective mask deposition using SiCl4 plasma for highly selective etching processMatsui, Miyako / Miura, Makoto / Kuwahara, Kenichi et al. | 2023
-
Self-joule heating assisted field emission following the Child–Langmuir lawNeo, Yoichiro / Oda, Rikuto / Moon, Jonghyun et al. | 2023
-
Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloyGül, Canser / Durmuş, Hülya / Albayrak, Sevda / Çömez, Nilay et al. | 2023
-
Density functional theory calculations of mechanical and electronic properties of W1−xTaxN6, W1−xMoxN6, and Mo1−xTaxN6 (0 ≤ x ≤ 1) alloys in a hexagonal structureKandel, S. R. / Gall, D. / Khare, S. V. et al. | 2023
-
Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition timeWeber, Jennifer Stefani / Piroli, Vanessa / Goldbeck, Michael Cristian / Perotti, Bruna Louise / Boeira, Carla Daniela / Fukumasu, Newton Kiyoshi / Michels, Alexandre Fassini / Figueroa, Carlos Alejandro et al. | 2023
-
Phase composition of polycrystalline HfNx (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical propertiesSeo, Hwan-Seok / Lee, Taeyoon / Kim, Hyungjun / Petrov, Ivan / Greene, J. E. et al. | 2023
-
Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboronSouqui, Laurent / Högberg, Hans / Pedersen, Henrik et al. | 2023
-
Materials characterization: Can artificial intelligence be used to address reproducibility challenges?Lau, Miu Lun / Burleigh, Abraham / Terry, Jeff / Long, Min et al. | 2023
-
Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer depositionWon, Jong Hyeon / Jo, Hyeonhui / Youn, Pil Ju / Park, Bo Keun / Chung, Taek-Mo / Han, Jeong Hwan et al. | 2023
-
Application of machine learning to spectrum and image dataAoyagi, Satoka et al. | 2023
-
Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging modelsGardner, Wil / Winkler, David A. / Alexander, David L. J. / Ballabio, Davide / Muir, Benjamin W. / Pigram, Paul J. et al. | 2023
-
Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterizationGarza, Raquel / Bartlett, Nathan / Crouse, Jameson / Herschberg, Andrew / Mohan Sankaran, R. / Amzad Hossain, Md. / Ruzic, David N. et al. | 2023
-
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputteringA. F. Lahiji, Faezeh / Bairagi, Samiran / Magnusson, Roger / Sortica, Mauricio A. / Primetzhofer, Daniel / Ekström, Erik / Paul, Biplab / le Febvrier, Arnaud / Eklund, Per et al. | 2023
-
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A PerspectiveBagus, Paul S. / Nelin, Connie J. / Brundle, C. R. et al. | 2023