Review Article: Hydrogenated graphene: A user’s guide (English)
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- New search for: Whitener, Keith E.
- New search for: Whitener, Keith E.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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36
, 5
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16
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2018
- Article (Journal) / Electronic Resource
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Title:Review Article: Hydrogenated graphene: A user’s guide
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Contributors:Whitener, Keith E. ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
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Publication date:2018-09-01
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Size:16 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 36, Issue 5
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride filmsSippola, Perttu / Pyymaki Perros, Alexander / Ylivaara, Oili M. E. / Ronkainen, Helena / Julin, Jaakko / Liu, Xuwen / Sajavaara, Timo / Etula, Jarkko / Lipsanen, Harri / Puurunen, Riikka L. et al. | 2018
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Gas-cluster ion sputtering: Effect on organic layer morphologyGoodwin, Christopher M. / Voras, Zachary E. / Beebe, Thomas P. et al. | 2018
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Superconformal coating and filling of deep trenches by chemical vapor deposition with forward-directed fluxesTalukdar, Tushar K. / Wang, Wenjiao B. / Girolami, Gregory S. / Abelson, John R. et al. | 2018
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Fabrication and characterization of transparent conducting reduced graphene oxide/Ag nanowires/ZnO:Ga composite thin films on flexible substratesChou, Ching-Tian / Wang, Fang-Hsing et al. | 2018
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Review Article: Gas and vapor sorption measurements using electronic beam balancesMinnick, David L. / Turnaoglu, Tugba / Rocha, Maria Alejandra / Shiflett, Mark B. et al. | 2018
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Atomic layer deposition of CeO2 using a heteroleptic cyclopentadienyl-amidinate precursorGolalikhani, Maryam / James, Trevor / Van Buskirk, Peter / Noh, Wontae / Lee, Jooho / Wang, Ziyun / Roeder, Jeffrey F. et al. | 2018
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Tunable resistivity in ink-jet printed electrical structures on paper by plasma conversion of particle-free, stabilizer-free silver inksSui, Yongkun / Ghosh, Souvik / Miller, Christopher / Pappas, Daphne / Mohan Sankaran, R. / Zorman, Christian A. et al. | 2018
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In situ XPS study on atomic layer etching of Fe thin film using Cl2 and acetylacetoneLin, Xi / Chen, Meixi / Janotti, Anderson / Opila, Robert et al. | 2018
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Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursorKrylov, Igor / Zoubenko, Ekaterina / Weinfeld, Kamira / Kauffmann, Yaron / Xu, Xianbin / Ritter, Dan / Eizenberg, Moshe et al. | 2018
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Oxygen-free palladium/titanium coating, a novel nonevaporable getter coating with an activation temperature of 133 °CMiyazawa, Tetsuya / Kurihara, Masashi / Ohno, Shinya / Terashima, Naoya / Natsui, Yuto / Kato, Hiroo / Kato, Yoshihiro / Hashimoto, Ayako / Kikuchi, Takashi / Mase, Kazuhiko et al. | 2018
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Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO2/SiKitajima, Takeshi / Kage, Ryosuke / Nakano, Toshiki et al. | 2018
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Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxyBoris, David R. / Anderson, Virginia R. / Nepal, Neeraj / Johnson, Scooter D. / Robinson, Zachary R. / Kozen, Alexander C. / Eddy, Charles R. / Walton, Scott G. et al. | 2018
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Thermal recrystallization of short-range ordered WS2 filmsHeyne, Markus H. / de Marneffe, Jean-François / Radu, Iuliana / Neyts, Erik C. / De Gendt, Stefan et al. | 2018
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Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabricationArias-Zapata, Javier / Ferrah, Djawhar / Mehedi, Hasan-al / Cunge, Gilles / Zelsmann, Marc et al. | 2018
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Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO2 and 2D substratesAlameri, Dheyaa / Ocola, Leonidas E. / Kuljanishvili, Irma et al. | 2018
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Silicon nitride-capped silicon nanocrystals via a nonthermal dual-plasma synthesis approachMandal, Rajib / O’Shea, Kyle / Anthony, Rebecca et al. | 2018
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Postdeposition annealing on VO2 films for resistive random-access memory selection devicesLim, Heewoo / Cho, Haewon / Kim, Hyunjung / Lee, Namgue / Shin, Seokyoon / Jung, Chanwon / Kim, Hyunjun / Lim, Kyungpil / Jeon, Hyeongtag et al. | 2018
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Conformal MgO film grown at high rate at low temperature by forward-directed chemical vapor depositionTalukdar, Tushar K. / Liu, Sumeng / Zhang, Zhejun / Harwath, Frank / Girolami, Gregory S. / Abelson, John R. et al. | 2018
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Review Article: Hydrogenated graphene: A user’s guideWhitener, Keith E. et al. | 2018
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Nitrogen acceptor in 2H-polytype synthetic MoS2 assessed by multifrequency electron spin resonanceSchoenaers, Ben / Stesmans, Andre / Afanas’ev, Valery V. et al. | 2018
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Particle behavior and its contribution to film growth in a remote silane plasmaKim, Yeonwon / Koga, Kazunori / Shiratani, Masaharu et al. | 2018
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Reactivity of heterogeneous surfaces: Modeling precursor–surface interaction using absorbing Markov chainsYanguas-Gil, Angel et al. | 2018
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Effect of ozone concentration on atomic layer deposited tin oxidePark, Hyunwoo / Park, Joohyun / Shin, Seokyoon / Ham, Giyul / Choi, Hyeongsu / Lee, Seungjin / Lee, Namgue / Kwon, Sejin / Bang, Minwook / Lee, Juhyun et al. | 2018
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Atmospheric spatial atomic layer deposition of ZnOS buffer layers for flexible Cu(In,Ga)Se2 solar cellsIlliberi, Andrea / Frijters, Corne / Ruth, Marta / Bremaud, David / Poodt, Paul / Roozeboom, Fred / Bolt, Pieter Jan et al. | 2018
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Growth and mechanical properties of 111-oriented V0.5Mo0.5Nx/Al2O3(0001) thin filmsKindlund, Hanna / Lu, Jun / Broitman, Esteban / Petrov, Ivan / Greene, J. E. / Birch, Jens / Hultman, Lars et al. | 2018
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Microwave imaging of etching-induced surface impedance modulation of graphene monolayerJi, Zhonghang / Myers, Joshua / Brockdorf, Kathleen / Engel, Nick / Mou, Shin / Huang, Hong / Zhuang, Yan et al. | 2018
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Controlling the morphology of ultrathin MoS2/MoO2 nanosheets grown by chemical vapor depositionGuo, Zongliang / Xiao, Zhiming / Wei, Aixiang / Zhao, Yu / Liu, Jun et al. | 2018
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Estimating the thermochemical properties of trimethylaluminum for thin-film processing applicationsAdomaitis, Raymond A. et al. | 2018
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Annealing of thin “Tincone” films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheresVan de Kerckhove, Kevin / Dendooven, Jolien / Detavernier, Christophe et al. | 2018
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Nano-optical imaging of monolayer MoSe2-WSe2 lateral heterostructure with subwavelength domainsXue, Wenjin / Sahoo, Prasana K. / Liu, Jiru / Zong, Haonan / Lai, Xiaoyi / Ambardar, Sharad / Voronine, Dmitri V. et al. | 2018
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Growth of S-doped MoO2 nanosheets with a controlled bandgap by chemical vapor depositionFeng, Long / Yan, Hui / Zhang, Rukang / Liu, Jiwen et al. | 2018