Nitrogen incorporation and trace element analysis of nanocrystalline diamond thin films by secondary ion mass spectrometry (English)
- New search for: Zhou, D.
- New search for: Stevie, F. A.
- New search for: Chow, L.
- New search for: McKinley, J.
- New search for: Gnaser, H.
- New search for: Desai, V. H.
- New search for: Zhou, D.
- New search for: Stevie, F. A.
- New search for: Chow, L.
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In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
17
, 4
;
1135-1140
;
1999
- Article (Journal) / Electronic Resource
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Title:Nitrogen incorporation and trace element analysis of nanocrystalline diamond thin films by secondary ion mass spectrometry
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Contributors:Zhou, D. ( author ) / Stevie, F. A. ( author ) / Chow, L. ( author ) / McKinley, J. ( author ) / Gnaser, H. ( author ) / Desai, V. H. ( author )
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Published in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 17, 4 ; 1135-1140
-
Publisher:
- New search for: American Vacuum Society
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Publication date:1999-07-01
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Size:6 pages
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ISSN:
-
DOI:
-
Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 17, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1652
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Analysis of high-index Si(001) surfaces by reflectance difference spectroscopyMantese, L. / Xue, Q. K. / Sakurai, T. / Aspnes, D. E. et al. | 1999
- 165???
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Mg clusters on MgO surfaces: Characterization with metastable impact electron spectroscopy, ultraviolet photoelectron spectroscopy (Hel), and temperature programmed desorptionGuenster, J. / Stultz, J. / Krischok, S. / Goodman, D. W. / Stracke, P. / Kempter, V. et al. | 1999
- 223
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Nanometer-Scale Science and Technology-Applied Surface Science - Innovative Force, Near-Field Optics, and Tunneling Measurements - Recent progress in the functionalization of atomic force microscope probes using electron-beam nanolithographyZhou, H. et al. | 1999
- 224
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Nanometer-Scale Science and Technology-Applied Surface Science - Innovative Force, Near-Field Optics, and Tunneling Measurements - Surface derivatization of nanoscale tungsten probes for interfacial force microscopyGraham, J.F. et al. | 1999
- 1079
-
X-ray photoelectron spectroscopy investigations of the chemistries of soilsBarr, T. L. / Hoppe, E. E. / Hardcastle, S. / Seal, S. et al. | 1999
- 1079
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PART I - Applied Surface Science - Oxides and Insulators -- Surface Characterization and Applications - X-ray photoelectron spectroscopy investigations of the chemistries of soilsBarr, T.L. et al. | 1999
- 1086
-
Characterization of silicon oxynitride thin films by x-ray photoelectron spectroscopyShallenberger, J. R. / Cole, D. A. / Novak, S. W. et al. | 1999
- 1086
-
PART I - Applied Surface Science - Oxides and Insulators -- Surface Characterization and Applications - Characterization of silicon oxynitride thin films by x-ray photoelectron spectroscopyShallenberger, J.R. et al. | 1999
- 1091
-
PART I - Applied Surface Science - Oxides and Insulators -- Surface Characterization and Applications - Valence band x-ray photoelectron spectroscopic studies to distinguish between oxidized aluminum speciesRotole, John A. et al. | 1999
- 1091
-
Valence band x-ray photoelectron spectroscopic studies to distinguish between oxidized aluminum speciesRotole, John A. / Sherwood, Peter M. A. et al. | 1999
- 1097
-
Aspects of Applied Surface Science Poster Session Interface matching in oxides of rocksalt/rocksalt(001) and rocksalt/perovskite(001)Chern, G. / Cheng, C. et al. | 1999
- 1097
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Interface matching in oxides of rocksalt/rocksalt(001) and rocksalt/perovskite(001)Chern, G. / Cheng, C. et al. | 1999
- 1097
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PART I - Applied Surface Science - Aspects of Applied Surface Science Poster Session - Interface matching in oxides of rocksalt-rocksalt(001) and rocksalt-perovskite(001)Chem, G. et al. | 1999
- 1103
-
PART I - Applied Surface Science - Aspects of Applied Surface Science Poster Session - Optical and structural characterization of copper-based colloidal particles in SiO2 coatingsMendoza-Galván, A. et al. | 1999
- 1103
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Optical and structural characterization of copper-based colloidal particles in coatingsMendoza-Galván, A. / Pérez-Robles, J. F. / Espinoza-Beltrán, F. J. / Ramı́rez-Bon, R. / Vorobiev, Y. V. / González-Hernández, J. / Martı́nez, G. et al. | 1999
- 1109
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Role of surface chemistry on the nature of passive oxide film growth on Fe–Cr (low and high) steels at high temperaturesSeal, S. / Nardelli, R. / Kale, A. / Desai, V. / Armacanqui, E. et al. | 1999
- 1109
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PART I - Applied Surface Science - Aspects of Applied Surface Science Poster Session - Role of surface chemistry on the nature of passive oxide film growth on Fe-Cr (low and high) steels at high temperaturesSeal, S. et al. | 1999
- 1116
-
Improvements to the analysis of x-ray photoelectron spectra using a maximum entropy method for deconvolutionMcIntyre, N. S. / Do, T. / Piao, H. / Splinter, S. J. et al. | 1999
- 1116
-
PART I - Applied Surface Science - Gaede-Langmuir Award Address and Quantitative Surface Analysis - Improvements to the analysis of x-ray photoelectron spectra using a maximum entropy method for deconvolutionMcIntyre, N.S. et al. | 1999
- 1122
-
PART I - Applied Surface Science - Gaede-Langmuir Award Address and Quantitative Surface Analysis - Consistency of calculated and measured electron inelastic mean free pathsPowell, C.J. et al. | 1999
- 1122
-
Consistency of calculated and measured electron inelastic mean free pathsPowell, C. J. / Jablonski, A. et al. | 1999
- 1127
-
Quantitative high-resolution imaging with sputter-initiated resonance ionization spectroscopyWilley, K. F. / Arlinghaus, H. F. / Whitaker, T. J. et al. | 1999
- 1127
-
PART I - Applied Surface Science - Gaede-Langmuir Award Address and Quantitative Surface Analysis - Quantitative high-resolution imaging with sputter-initiated resonance ionization spectroscopyWilley, K.F. et al. | 1999
- 1130
-
PART I - Applied Surface Science - SIMS -- Depth Profiling and Molecular Surface Analysis - Secondary ion mass spectrometry of deep trench capacitors in dynamic random access memoryParks, C.C. et al. | 1999
- 1130
-
Secondary ion mass spectrometry of deep trench capacitors in dynamic random access memoryParks, C. C. / Glawischnig, H. / Levy, M. / Stengl, R. / Dieseldorff, Chr. et al. | 1999
- 1135
-
Nitrogen incorporation and trace element analysis of nanocrystalline diamond thin films by secondary ion mass spectrometryZhou, D. / Stevie, F. A. / Chow, L. / McKinley, J. / Gnaser, H. / Desai, V. H. et al. | 1999
- 1135
-
PART I - Applied Surface Science - SIMS -- Depth Profiling and Molecular Surface Analysis - Nitrogen incorporation and trace element analysis of nanocrystalline diamond thin films by secondary ion mass spectrometryZhou, D. et al. | 1999
- 1141
-
Atomic force microscopy observation of human lymphoid cells chronically infected with the human immunodeficiency virusCricenti, A. / Generosi, R. / Girasole, M. / Scarselli, M. A. / Perfetti, P. / Bach, S. / Colizzi, V. et al. | 1999
- 1141
-
PART I - Biomaterial Interfaces - Biomaterial Interfaces Poster Session - Atomic force microscopy observation of human lymphoid cells chronically infected with the human immunodeficiency virusCricenti, A. et al. | 1999
- 1145
-
Fundamental issues in wafer bondingGösele, U. / Bluhm, Y. / Kästner, G. / Kopperschmidt, P. / Kräuter, G. / Scholz, R. / Schumacher, A. / Senz, St. / Tong, Q.-Y. / Huang, L.-J. et al. | 1999
- 1145
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PART I - Electronic Materials and Processing - Processing for Advanced Technology - Fundamental issues in wafer bondingGösele, U. et al. | 1999
- 1153
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Reduced carbon contaminant, low-temperature silicon substrate preparation for “defect-free” homoepitaxyTaylor, Patrick J. / Jesser, W. A. / Martinka, M. / Singley, K. M. / Dinan, J. H. / Lareau, R. T. / Wood, M. C. / Clark, W. W. et al. | 1999
- 1153
-
PART I - Electronic Materials and Processing - Fundamentals of Si Cleaning and CMP - Reduced carbon contaminant, low-temperature silicon substrate preparation for "defect-free" homoepitaxyTaylor, Patrick J. et al. | 1999
- 1160
-
PART I - Electronic Materials and Processing - Fundamentals of Si Cleaning and CMP - Process optimization of dielectrics chemical mechanical planarization processes for ultralarge scale integration multilevel metallizationTreichel, H. et al. | 1999
- 1160
-
Process optimization of dielectrics chemical mechanical planarization processes for ultralarge scale integration multilevel metallizationTreichel, H. / Frausto, R. / Srivatsan, S. / Whithers, B. / Meyer, T. / Morishige, R. et al. | 1999
- 1168
-
Studies on passivation behavior of tungsten in application to chemical mechanical polishingTamboli, D. / Seal, S. / Desai, V. / Maury, A. et al. | 1999
- 1168
-
PART I - Electronic Materials and Processing - Fundamentals of Si Cleaning and CMP - Studies on passivation behavior of tungsten in application to chemical mechanical polishingTamboli, D. et al. | 1999
- 1174
-
Low damage dry etching of III–V materials for heterojunction bipolar transistor applications using a chlorinated inductively coupled plasmaEtrillard, J. / Bresse, J. F. / Daguet, C. / Riet, M. / Mba, J. et al. | 1999
- 1174
-
PART I - Electronic Materials and Processing - Compound Semiconductor Surface Chemistry - Low damage dry etching of III-V materials for heterojunction bipolar transistor applications using a chlorinated inductively coupled plasmaEtrillard, J. et al. | 1999
- 1182
-
Comparison of morphology and interfacial composition of Pd ultrathin films on 6H–SiC and 4H–SiC at different annealing temperaturesLu, W. J. / Shi, D. T. / Burger, A. / Collins, W. E. et al. | 1999
- 1182
-
Comparison of morphology and interracial composition of Pd ultrathin films on 6H-SIC and 4H-SiC at different annealing temperaturesLu, W. J. / Shi, D. T. / Burger, A. / Collins, W. E. et al. | 1999
- 1182
-
PART I - Electronic Materials and Processing - Compound Semiconductor Surface Chemistry - Comparison of morphology and interfacial composition of Pd ultrathin films on 6H-SiC and 4H-SiC at different annealing temperaturesLu, W.J. et al. | 1999
- 1191
-
Field emission from as-grown and surface modified BN and CN thin filmsBadi, N. / Tempez, A. / Starikov, D. / Bensaoula, A. / Ageev, V. P. / Karabutov, A. / Ugarov, M. V. / Frolov, V. / Loubnin, E. / Waters, K. et al. | 1999
- 1191
-
PART I - Electronic Materials and Processing - Compound Semiconductor Surface Chemistry - Field emission from as-grown and surface modified BN and CN thin filmsBadi, N. et al. | 1999
- 1196
-
Synthesis and current–voltage characterization of tin dioxide varistorsKale, A. S. / Seal, S. / Date, S. K. / Santhosh, P. N. / Barve, R. N. et al. | 1999
- 1196
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Synthesis and current-voltage characterization of tin dioxide varistorsKale, A.S. et al. | 1999
- 1201
-
Side-wall damage in a transmission electron microscopy specimen of crystalline Si prepared by focused ion beam etchingKato, N. I. / Kohno, Y. / Saka, H. et al. | 1999
- 1201
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Side-wall damage in a transmission electron microscopy specimen of crystalline Si prepared by focused !on beam etchingKato, N.I. et al. | 1999
- 1205
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Heat transfer in ultrahigh vacuum scanning thermal microscopyMüller-Hirsch, W. et al. | 1999
- 1205
-
Heat transfer in ultrahigh vacuum scanning thermal microscopyMüller-Hirsch, W. / Kraft, A. / Hirsch, M. T. / Parisi, J. / Kittel, A. et al. | 1999
- 1211
-
Effects of variously configured magnets on the characteristics of inductively coupled plasmasHwang, S. W. / Lee, Y. J. / Han, H. R. / Yoo, J. B. / Yeom, G. Y. et al. | 1999
- 1211
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Effects of variously configured magnets on the characteristics of inductively coupled plasmasHwang, S.W. et al. | 1999
- 1217
-
Enhanced electrical performance of Au/n-GaN Schottky diodes by novel processingHe, L. / Wang, X. J. / Zhang, R. et al. | 1999
- 1217
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Enhanced electrical performance of Au-n-GaN Schottky diodes by novel processingHe, L. et al. | 1999
- 1221
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - W and WSix Ohmic contacts on p- and n-type GaNCao, X.A. et al. | 1999
- 1221
-
W and Ohmic contacts on p- and n-type GaNCao, X. A. / Ren, F. / Pearton, S. J. / Zeitouny, A. / Eizenberg, M. / Zolper, J. C. / Abernathy, C. R. / Han, J. / Shul, R. J. / Lothian, J. R. et al. | 1999
- 1226
-
Redistribution and activation of implanted S, Se, Te, Be, Mg, and C in GaNWilson, R. G. / Zavada, J. M. / Cao, X. A. / Singh, R. K. / Pearton, S. J. / Guo, H. J. / Pennycook, S. J. / Fu, M. / Sekhar, J. A. / Scarvepalli, V. et al. | 1999
- 1226
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Redistribution and activation of implanted S, Se, Te, Be, Mg, and C in GaNWilson, R.G. et al. | 1999
- 1230
-
Facet formation of a GaN-based device using chemically assisted ion beam etching with a photoresist maskLee, W. J. / Kim, H. S. / Yeom, G. Y. / Lee, J. W. / Kim, T. I. et al. | 1999
- 1230
-
PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Facet formation of a GaN-based device using chemically assisted ion beam etching with a photoresist maskLee, W.J. et al. | 1999
- 1235
-
PART I - Electronic Materials and Processing - Fabrication and Characterization of Semiconductor Device Layers - Metal-insulator-semiconductor Schottky barrier structures fabricated using interfacial BN layers grown on GaN and SIC for optoelectronic device applicationsStarikov, D. et al. | 1999
- 1235
-
Metal–insulator–semiconductor Schottky barrier structures fabricated using interfacial BN layers grown on GaN and SiC for optoelectronic device applicationsStarikov, D. / Badi, N. / Berishev, I. / Medelci, N. / Kameli, O. / Sayhi, M. / Zomorrodian, V. / Bensaoula, A. et al. | 1999
- 1239
-
PART I - Electronic Materials and Processing - Fabrication and Characterization of Semiconductor Device Layers - Carbon incorporation in SiGeC alloys grown by ultrahigh vacuum chemical vapor depositionMocuta, A.C. et al. | 1999
- 1239
-
Carbon incorporation in SiGeC alloys grown by ultrahigh vacuum chemical vapor depositionMocuta, A. C. / Greve, D. W. et al. | 1999
- 1244
-
X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry study of the role of Ti and TiN caps on the interfaceConard, T. / Kondoh, E. / De Witte, H. / Maex, K. / Vandervorst, W. et al. | 1999
- 1244
-
PART I - Electronic Materials and Processing - Fabrication and Characterization of Semiconductor Device Layers - X-ray photoelectron spectroscopy and time-of-flight secondary !on mass spectrometry study of the role of Ti and TiN caps on the cobalt-SiO2 interfaceConard, T. et al. | 1999
- 1250
-
Structure of ultrathin interfaces studied by photoelectron spectroscopyKeister, J. W. / Rowe, J. E. / Kolodziej, J. J. / Niimi, H. / Tao, H.-S. / Madey, T. E. / Lucovsky, G. et al. | 1999
- 1250
-
PART I - Electronic Materials and Processing - Si Surface Chemistry - Structure of ultrathin SiO2-Si(111) interfaces studied by photoelectron spectroscopyKeister, J.W. et al. | 1999
- 1258
-
Cathodoluminescence spectroscopy of nitrided interfacesYoung, A. P. / Bandhu, R. / Schäfer, J. / Niimi, H. / Lucovsky, G. et al. | 1999
- 1258
-
PART I - Electronic Materials and Processing - Dielectrics - Cathodoluminescence spectroscopy of nitrided SiO2-Si interfacesYoung, A.P. et al. | 1999
- 1263
-
Effect of substrate temperature in films deposited by electron cyclotron resonancedel Prado, A. / Martı́nez, F. L. / Mártil, I. / González-Dı́az, G. / Fernández, M. et al. | 1999
- 1263
-
PART I - Electronic Materials and Processing - Dielectrics - Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonancePrado, A.del et al. | 1999
- 1269
-
PART I - Electronic Materials and Processing - Dielectrics - Roughness at Si-SiO2 interfaces and silicon oxidationChen, Xidong et al. | 1999
- 1269
-
Roughness at interfaces and silicon oxidationChen, Xidong / Gibson, J. M. et al. | 1999
- 1275
-
PART I - Electronic Materials and Processing - Dielectrics - Ultrathin silicon oxide film on Si(100) fabricated by highly concentrated ozone at atmospheric pressureNakamura, K. et al. | 1999
- 1275
-
Ultrathin silicon oxide film on Si(100) fabricated by highly concentrated ozone at atmospheric pressureNakamura, K. / Ichimura, S. / Kurokawa, A. / Koike, K. / Inoue, G. / Fukuda, T. et al. | 1999
- 1280
-
Thermal stability of films deposited by plasma electron cyclotron resonanceMartı́nez, F. L. / del Prado, A. / Bravo, D. / López, F. / Mártil, I. / González-Dı́az, G. et al. | 1999
- 1280
-
PART I - Electronic Materials and Processing - Dielectrics - Thermal stability of a-SiNx:H films deposited by plasma electron cyclotron resonanceMartinez, F.L. et al. | 1999
- 1285
-
Two-dimensional carrier profiling of InP-based structures using scanning spreading resistance microscopyDe Wolf, P. / Geva, M. / Reynolds, C. L. / Hantschel, T. / Vandervorst, W. / Bylsma, R. B. et al. | 1999
- 1285
-
PART I - Electronic Materials and Processing - Application of Scanning Probes to Electronic Materials - Two-dimensional carrier profiling of InP-based structures using scanning spreading resistance microscopyWolf, P.De et al. | 1999
- 1289
-
PART I - Electronic Materials and Processing - Application of Scanning Probes to Electronic Materials - Temperature dependence of molecular beam epitaxy of GaN on SiC (0001)Ramachandran, V. et al. | 1999
- 1289
-
Temperature dependence of molecular beam epitaxy of GaN on SiC (0001)Ramachandran, V. / Smith, A. R. / Feenstra, R. M. / Greve, D. W. et al. | 1999
- 1294
-
Silicon nitride islands as oxidation masks for the formation of silicon nanopillarsHa, Jeong Sook / Park, Kang-Ho / Yun, Wan Soo / Lee, El-Hang et al. | 1999
- 1294
-
PART I - Electronic Materials and Processing - Application of Scanning Probes to Electronic Materials - Silicon nitride islands as oxidation masks for the formation of silicon nanopillarsHa, Jeong Sook et al. | 1999
- 1300
-
Real-time optical control of film growth by p-polarized reflectanceDietz, N. / Woods, V. / Ito, K. / Lauko, I. et al. | 1999
- 1300
-
PART I - Electronic Materials and Processing - Non-destructive Testing and In Situ Diagnostics - Real-time optical control of Ga1-xInxP film growth by p-polarized reflectanceDietz, N. et al. | 1999
- 1307
-
In situ formation, reactions, and electrical characterization of molecular beam epitaxy-grown metal/semiconductor interfacesChen, L. C. / Caldwell, D. A. / Finstad, T. G. / Palmstro/m, C. J. et al. | 1999
- 1307
-
PART I - Electronic Materials and Processing - Non-destructive Testing and In Situ Diagnostics - In situ formation, reactions, and electrical characterization of molecular beam epitaxy-grown metal-semiconductor interfacesChen, L.C. et al. | 1999
- 1313
-
Investigation of resonant photoemission in Gd with x-ray linear dichroismMishra, S. R. / Cummins, T. R. / Waddill, G. D. / Gammon, W. J. / van der Laan, G. / Goodman, K. W. / Tobin, J. G. et al. | 1999
- 1313
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PART I - Magnetic Interfaces and Nanostructures - Magnetic Spectroscopies - Investigation of resonant photoemission in Gd with x-ray linear dichroismMishra, S.R. et al. | 1999
- 1319
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Spectroscopies - Unoccupied band structure of strained gadoliniumKomesu, Takashi et al. | 1999
- 1319
-
Unoccupied band structure of strained gadoliniumKomesu, Takashi / Waldfried, C. / Dowben, P. A. et al. | 1999
- 1322
-
Fermi surface study of pseudomorphic and thin films on Cu(100)Hochstrasser, M. / Schumann, F. O. / Willis, R. F. / Cummins, T. / Waddill, G. D. / Mishra, S. R. / Tobin, J. G. / Rotenberg, E. et al. | 1999
- 1322
-
PART I - Magnetic Interfaces and Nanostructures - Structure and Magnetism of Surfaces and Interfaces - Fermi surface study of pseudomorphic Fe1-xNix and Co1-xNix thin films on Cu(100)Hochstrasser, M. et al. | 1999
- 1326
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Interfaces and Nanostructures Poster Session - Comparison Of Cl2 and F2 based chemistries for the inductively coupled plasma etching of NiMnSb thin filmsHong, J. et al. | 1999
- 1326
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Comparison of and based chemistries for the inductively coupled plasma etching of NiMnSb thin filmsHong, J. / Caballero, J. A. / Lambers, E. S. / Childress, J. R. / Pearton, S. J. et al. | 1999
- 1331
-
PART I - Magnetic Interfaces and Nanostructures - Magnetic Interfaces and Nanostructures Poster Session - Reversal behavior in a bimodal magneto-optical mediumFry, R.A. et al. | 1999
- 1331
-
Reversal behavior in a bimodal magneto-optical mediumFry, R. A. / Bennett, L. H. / Della Torre, E. et al. | 1999
- 1335
-
Magnetization dynamics: A study of the ferromagnet/antiferromagnet interface and exchange biasingCamley, R. E. / McGrath, B. V. / Astalos, R. J. / Stamps, R. L. / Kim, Joo-Von / Wee, Leonard et al. | 1999
- 1335
-
PART I - Magnetic Interfaces and Nanostructures - Magnetization Dynamics and Magneto-Optics - Magnetization dynamics: A study of the ferromagnet-antiferromagnet interface and exchange biasingCamley, R.E. et al. | 1999
- 1340
-
PART I - Manufacturing Science and Technology - Overview: Integration for Manufacturing - Reaction-annealing pathways for forming ultrathin silicon nitride films for composite oxide-nitride gate dielectrics with nitrided crystalline silicon-dielectric interfaces for application in advanced complementary metal-oxide-semiconductor devicesLucovsky, G. et al. | 1999
- 1340
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Reaction/annealing pathways for forming ultrathin silicon nitride films for composite oxide–nitride gate dielectrics with nitrided crystalline silicon–dielectric interfaces for application in advanced complementary metal–oxide–semiconductor devicesLucovsky, G. et al. | 1999
- 1352
-
PART I - Manufacturing Science and Technology - Process, Integration, and Modeling - Design of a 300 mm chemical vapor deposition tungsten reactor using computational fluid dynamicsMcInerney, E.J. et al. | 1999
- 1352
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Design of a 300 mm chemical vapor deposition tungsten reactor using computational fluid dynamicsMcInerney, E. J. / Pratt, T. M. / Taheri, A. et al. | 1999
- 1356
-
Plasma-induced nitridation of gate oxide dielectrics: Linked equipment-feature atomic scale simulationsSukharev, Valeriy / Aronowitz, Sheldon / Zubkov, Vladimir / Puchner, Helmut / Haywood, John / Kimball, Jim et al. | 1999
- 1356
-
PART I - Manufacturing Science and Technology - Process, Integration, and Modeling - Plasma-induced nitridation of gate oxide dielectrics: Linked equipment-feature atomic scale simulationsSukharev, Valeriy et al. | 1999
- 1364
-
PART I - Manufacturing Science and Technology - Advanced Process Equipment and ES&H - Complete solvent free stripping of via structures using NF3-H2O-O2 ashing chemistryAu, Wing kei et al. | 1999
- 1364
-
Complete solvent free stripping of via structures using ashing chemistryAu, Wing kei / Solis, Randy / Bersin, Richard / Xu, Han / Boumerzoug, M. et al. | 1999
- 1369
-
Using historical wafermap data for automated yield analysisTobin, Kenneth W. / Karnowski, Thomas P. / Gleason, Shaun S. / Jensen, David / Lakhani, Fred et al. | 1999
- 1369
-
PART I - Manufacturing Science and Technology - Process Control and Yield from Tool to Factory - Using historical wafermap data for automated yield analysisTobin, Kenneth W. et al. | 1999
- 1377
-
Advances in broadband radio-frequency sensing for real-time control of plasma-based semiconductor processingGarvin, Craig / Grimard, Dennis S. / Grizzle, J. W. et al. | 1999
- 1377
-
PART I - Manufacturing Science and Technology - Sensors and Support Technology - Advances in broadband radio-frequency sensing for real-time control of plasma-based semiconductor processingGarvin, Craig et al. | 1999
- 1384
-
On-line patterned wafer thickness control of chemical-mechanical polishingSmith, Taber H. / Fang, Simon J. / Stefani, Jerry A. / Shinn, Greg B. / Boning, Duane S. / Butler, Stephanie W. et al. | 1999
- 1384
-
PART I - Manufacturing Science and Technology - Sensors and Support Technology - On-line patterned wafer thickness control of chemical-mechanical polishingSmith, Taber H. et al. | 1999
- 1391
-
Surface cleaning on aluminum for ultrahigh vacuum using supercritical fluid with and NaCl as additivesMomose, T. / Yoshida, H. / Sherverni, Z. / Ebina, T. / Tatenuma, K. / Ikushima, Y. et al. | 1999
- 1391
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PART I - Manufacturing Science and Technology - Manufacturing Science and Technology Poster Session - Surface cleaning on aluminum for ultrahigh vacuum using supercritical fluid CO2 with H2O and NaCl as additivesMomose, T. et al. | 1999
- 1394
-
Quantum-dot cellular automataSnider, G. L. / Orlov, A. O. / Amlani, I. / Zuo, X. / Bernstein, G. H. / Lent, C. S. / Merz, J. L. / Porod, W. et al. | 1999
- 1394
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PART I - Nanometer-Scale Science and Technology - Quantum Structures and Molecular Electronics - Quantum-dot cellular automataSnider, G.L. et al. | 1999
- 1399
-
Proposal of atom/molecule switching devicesWada, Yasuo et al. | 1999
- 1399
-
PART I - Nanometer-Scale Science and Technology - Quantum Structures and Molecular Electronics - Proposal of atom-molecule switching devicesWada, Yasuo et al. | 1999
- 1406
-
Self-organized Ge quantum wires on Si(111) substratesJin, G. / Tang, Y. S. / Liu, J. L. / Wang, K. L. et al. | 1999
- 1406
-
PART I - Nanometer-Scale Science and Technology - Quantum Wires and Quantum Dots - Self-organized Ge quantum wires on Si(111) substratesJin, G. et al. | 1999
- 1410
-
Formation and characterization of metal atom nanostructures on Si(112) facet surfacesProkes, S. M. / Glembocki, O. J. et al. | 1999
- 1410
-
PART I - Nanometer-Scale Science and Technology - Quantum Wires and Quantum Dots - Formation and characterization of metal atom nanostructures on Si(112) facet surfacesProkes, S.M. et al. | 1999
- 1410
-
Formation and characterization of metal atom nanostructures on S1(112) facet surfacesProkes, S. M. / Glembocki, O. J. et al. | 1999
- 1415
-
Self-assembled nanostructures on siliconPetrovykh, D. Y. / Viernow, J. / Lin, J.-L. / Leibsle, F. M. / Men, F. K. / Kirakosian, A. / Himpsel, F. J. et al. | 1999
- 1415
-
PART I - Nanometer-Scale Science and Technology - Quantum Wires and Quantum Dots - Self-assembled CaF2 nanostructures on siliconPetrovykh, D.Y. et al. | 1999
- 1420
-
Raman scattering and infrared absorption in multiple boron-doped Ge dotsLiu, J. L. / Wu, W. G. / Tang, Y. S. / Wang, K. L. / Radetic, T. / Gronsky, R. et al. | 1999
- 1420
-
PART I - Nanometer-Scale Science and Technology - Quantum Wires and Quantum Dots - Raman scattering and Infrared absorption in multiple boron-doped Ge dotsLiu, J.L. et al. | 1999
- 1425
-
PART I - Nanometer-Scale Science and Technology - Nanoscale Patterning and Modification - Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmaskChoi, S.H. et al. | 1999
- 1425
-
Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmaskChoi, S. H. / Wang, K. L. / Leung, M. S. / Stupian, G. W. / Presser, N. / Chung, S. W. / Markovich, G. / Kim, S. H. / Heath, J. R. et al. | 1999
- 1428
-
Polycrystalline nanopore arrays with hexagonal ordering on aluminumLi, A. P. / Müller, F. / Birner, A. / Nielsch, K. / Gösele, U. et al. | 1999
- 1428
-
PART I - Nanometer-Scale Science and Technology - Nanoscale Patterning and Modification - Polycrystalline nanopore arrays with hexagonal ordering on aluminumLi, A.P. et al. | 1999
- 1432
-
PART I - Nanometer-Scale Science and Technology - Nanoscale Patterning and Modification - Proximity x-ray lithography of slioxane and polymer films containing benzyl chloride functional groupsDressick, W.J. et al. | 1999
- 1432
-
Proximity x-ray lithography of siloxane and polymer films containing benzyl chloride functional groupsDressick, W. J. / Dulcey, C. S. / Brandow, S. L. / Witschi, H. / Neeley, P. F. et al. | 1999
- 1441
-
Field-induced manipulation of Ag clusters for tailoring of nanostructures on a silicon surfacePark, Kang-Ho / Ha, Jeong Sook / Yun, Wan Soo / Lee, El-Hang et al. | 1999
- 1441
-
PART I - Nanometer-Scale Science and Technology - Nanoscale Manipulation and Chemical Modification - Field-induced manipulation of Ag clusters for tailoring of nanostructures on a silicon surfacePark, Kang-Ho et al. | 1999
- 1445
-
Two mechanisms of scanning tunneling microscopy assisted nanostructure formation using precursor moleculesLyubinetsky, I. / Mezhenny, S. / Choyke, W. J. / Yates, J. T. et al. | 1999
- 1445
-
PART I - Nanometer-Scale Science and Technology - Nanoscale Manipulation and Chemical Modification - Two mechanisms of scanning tunneling microscopy assisted nanostructure formation using precursor moleculesLyubinetsky, I. et al. | 1999
- 1451
-
PART I - Nanometer-Scale Science and Technology - Nanoscale Manipulation and Chemical Modification - Current-induced nanochemistry: Local oxidation of thin metal filmsMartel, R. et al. | 1999
- 1451
-
Current-induced nanochemistry: Local oxidation of thin metal filmsMartel, R. / Schmidt, T. / Sandstrom, R. L. / Avouris, Ph. et al. | 1999
- 1457
-
Automated, high precision measurement of critical dimensions using the atomic force microscopeChernoff, Donald A. / Burkhead, David L. et al. | 1999
- 1457
-
PART I - Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session - Automated, high precision measurement of critical dimensions using the atomic force microscopeChernoff, Donald A. et al. | 1999
- 1463
-
Substrate effects on electronic properties of atomic chainsYamada, Toshishige et al. | 1999
- 1463
-
PART I - Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session - Substrate effects on electronic properties of atomic chainsYamada, Toshishige et al. | 1999
- 1469
-
PART I - Partial Pressure Measurements and Process Control - RGA Characteristics and Calibration - Semiconductor and thin film applications of a quadrupole mass spectrometerWaits, Robert K. et al. | 1999
- 1469
-
Semiconductor and thin film applications of a quadrupole mass spectrometerWaits, Robert K. et al. | 1999
- 1479
-
Increase of etch resistance of deep ultraviolet photoresist by implantationOng, K. K. / Liang, M. H. / Chan, L. H. / Soo, C. P. et al. | 1999
- 1479
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session I - Increase of etch resistance of deep ultraviolet photoresist by implantationOng, K.K. et al. | 1999
- 1483
-
Etch characteristics of optical waveguides using inductively coupled plasmas with multidipole magnetsAn, K. J. / Lee, D. H. / Yoo, J. B. / Lee, J. / Yeom, G. Y. et al. | 1999
- 1483
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session I - Etch characteristics of optical waveguides using inductively coupled plasmas with multidipole magnetsAn, K.J. et al. | 1999
- 1488
-
In situ cleaning of GaAs and surfaces and production of ohmic contacts using an atomic hydrogen source based on a reflected arc dischargeKagadei, V. A. / Proskurovsky, D. I. et al. | 1999
- 1488
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session I - In situ cleaning of GaAs and AlxGa1-xAs surfaces and production of ohmic contacts using an atomic hydrogen source based on a reflected arc dischargeKagadei, V.A. et al. | 1999
- 1494
-
PART I - Plasma Science and Technology - Plasma Damage - Gate oxide damage: Testing approaches and methodologiesGabriel, Calvin T. et al. | 1999
- 1494
-
Gate oxide damage: Testing approaches and methodologiesGabriel, Calvin T. et al. | 1999
- 1501
-
Evaluation of charging damage test structures for ion implantation processesGoeckner, M. J. / Felch, S. B. / Weeman, J. / Mehta, S. / Reedholm, J. S. et al. | 1999
- 1501
-
PART I - Plasma Science and Technology - Plasma Damage - Evaluation of charging damage test structures for !on implantation processesGoeckner, M.J. et al. | 1999
- 1510
-
Reactive ion etching of Si by Cl and Cl2 ions: Molecular dynamics simulations with comparisons to experimentHanson, D. E. / Kress, J. D. / Voter, A. F. et al. | 1999
- 1510
-
PART I - Plasma Science and Technology - Plasma-Surface Interactions I - Reactive ion etching of Si by Cl and Cl2 ions: Molecular dynamics simulations with comparisons to experimentHanson, D.E. et al. | 1999
- 1514
-
PART I - Plasma Science and Technology - Diagnostics II - Characterization of 100 MHz inductively coupled plasma (ICP) by comparison with 13.56 MHz ICPNakagawa, H. et al. | 1999
- 1514
-
Characterization of 100 MHz inductively coupled plasma (ICP) by comparison with 13.56 MHz ICPNakagawa, H. / Morishita, S. / Noda, S. / Okigawa, M. / Inoue, M. / Sekine, M. / Ito, K. et al. | 1999
- 1520
-
PART I - Plasma Science and Technology - Diagnostics II - Volume-surface effects on electron energy and dissociation reactions in large-volume plasma reactorsKinoshita, Keizo et al. | 1999
- 1520
-
Volume/surface effects on electron energy and dissociation reactions in large-volume plasma reactorsKinoshita, Keizo / Noda, Shuichi / Morishita, Satoshi / Itabashi, Naoshi / Okigawa, Mitsuru / Sekine, Makoto / Inoue, Masami et al. | 1999
- 1526
-
PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session II - Improvement on lithography pattern profile by plasma treatmentSoo, C.P. et al. | 1999
- 1526
-
Improvement on lithography pattern profile by plasma treatmentSoo, C. P. / Bourdillon, A. J. / Valiyaveettil, S. / Huan, A. / Wee, A. / Fan, M. H. / Ang, T. C. / Chan, L. H. et al. | 1999
- 1531
-
Formation of large positive silicon-cluster ions in a remote silane plasmaKessels, W. M. M. / Leewis, C. M. / Leroux, A. / van de Sanden, M. C. M. / Schram, D. C. et al. | 1999
- 1531
-
PART I - Plasma Science and Technology - Plasma-Surface Interactions II - Formation of large positive silicon-cluster ions in a remote silane plasmaKessels, W.M.M. et al. | 1999
- 1536
-
PART I - Plasma Science and Technology - Environmental Issues and Emerging Technologies - Challenges in plasma etching and patterning for fabrication of new systems and devicesEngelhardt, M. et al. | 1999
- 1536
-
Challenges in plasma etching and patterning for fabrication of new systems and devicesEngelhardt, M. / Weinrich, V. / Nagel, N. / Hartner, W. et al. | 1999
- 1539
-
PART I - Plasma Science and Technology - Environmental Issues and Emerging Technologies - Use of a one atmosphere uniform glow discharge plasma to kill a broad spectrum of microorganismsKelly-Wintenberg, K. et al. | 1999
- 1539
-
Use of a one atmosphere uniform glow discharge plasma to kill a broad spectrum of microorganismsKelly-Wintenberg, K. / Hodge, Amanda / Montie, T. C. / Deleanu, Liliana / Sherman, Daniel / Reece Roth, J. / Tsai, Peter / Wadsworth, Larry et al. | 1999
- 1545
-
Ion and neutral species in and dielectric etch dischargesJayaraman, RaviPrakash / McGrath, Robert T. / Hebner, G. A. et al. | 1999
- 1545
-
PART I - Plasma Science and Technology - Diagnostics I - Ion and neutral species in C2F6 and CHF3 dielectric etch dischargesJayaraman, RaviPrakash et al. | 1999
- 1552
-
Studies of ion bombardment in high density plasmas containingOlthoff, J. K. / Wang, Yicheng et al. | 1999
- 1552
-
PART I - Plasma Science and Technology - Diagnostics I - Studies of !on bombardment in high density plasmas containing CF4Olthoff, J.K. et al. | 1999
- 1556
-
PART I - Plasma Science and Technology - Oxide Etching - Microloading effect in ultrafine SiO2 hole-trench etchingFeurprier, Y. et al. | 1999
- 1556
-
Microloading effect in ultrafine hole/trench etchingFeurprier, Y. / Chinzei, Y. / Ogata, M. / Kikuchi, T. / Ozawa, M. / Ichiki, T. / Horiike, Y. et al. | 1999
- 1562
-
PART I - Plasma Science and Technology - Oxide Etching - Etch rate control in a 27 MHz reactive ion etching system for ultralarge scale integrated circuit processingTatsumi, T. et al. | 1999
- 1562
-
Etch rate control in a 27 MHz reactive ion etching system for ultralarge scale integrated circuit processingTatsumi, T. / Hikosaka, Y. / Morishita, S. / Matsui, M. / Sekine, M. et al. | 1999
- 1570
-
PART I - Selected Energy Epitaxy - Seeded Supersonic Beam Epitaxial Growth - Selected energy epitaxial deposition of GaN and AlN on SiC(0001) using seeded supersonic free jets of NH3 in heliumTorres, V.M. et al. | 1999
- 1570
-
Selected energy epitaxial deposition of GaN and AIN on SIC(0001) using seeded supersonic free jets of NH~3 in heliumTorres, V. M. / Doak, R. B. / Wilkens, B. J. / Smith, D. J. / Tsong, I. S. T. et al. | 1999
- 1570
-
Selected energy epitaxial deposition of GaN and AlN on SiC(0001) using seeded supersonic free jets of in heliumTorres, V. M. / Doak, R. B. / Wilkens, B. J. / Smith, D. J. / Tsong, I. S. T. et al. | 1999
- 1577
-
Adsorption structures of NO/Pt(111) investigated by scanning tunneling microscopyMatsumoto, M. / Tatsumi, N. / Fukutani, K. / Okano, T. / Yamada, T. / Miyake, K. / Hate, K. / Shigekawa, H. et al. | 1999
- 1581
-
Nickelocene adsorption on single-crystal surfacesPugmire, D. L. / Woodbridge, C. M. / Root, S. / Langell, M. A. et al. | 1999
- 1581
-
PART I - Surface Science - Surface Science Poster Session - Nickelocene adsorption on single-crystal surfacesPugmire, D.L. et al. | 1999
- 1587
-
Atom probe analysis of the dissociation of CO and gases on a W(110)-oriented tipShimizu, Tetsuo / Ohi, Akihiko / Tokumoto, Hiroshi et al. | 1999
- 1587
-
PART I - Surface Science - Surface Science Poster Session - Atom probe analysis of the dissociation of CO and N2 gases on a W(110)-oriented tipShimizu, Tetsuo et al. | 1999
- 1592
-
PART I - Surface Science - Surface Science Poster Session - Synthesis and decomposition of formats on Cu(111) and Cu(110) surfaces: Structure sensitivityNakamura, I. et al. | 1999
- 1592
-
Synthesis and decomposition of formate on Cu(111) and Cu(110) surfaces: Structure sensitivityNakamura, I. / Nakano, H. / Fujitani, T. / Uchijima, T. / Nakamura, J. et al. | 1999
- 1596
-
Intermediate structures appearing in the phase transition of to induced by molecular irradiationMiyake, K. / Kaikoh, T. / Hata, K. / Morita, R. / Yamashita, M. / Shigekawa, H. et al. | 1999
- 1596
-
PART I - Surface Science - Surface Science Poster Session - Adsorption structures of NO-Pt(111) investigated by scanning tunneling microscopyMatsumoto, M. et al. | 1999
- 1596
-
Intermediate structures appearing in the phase transition of Si(111)-7X7 to (3X3)R30^ induced by HBO~2 molecular irradiationMiyake, K. / Kaikoh, T. / Hata, K. / Morita, R. / Yamashita, M. / Shigekawa, H. et al. | 1999
- 1596
-
PART I - Surface Science - Surface Science Poster Session - Intermediate structures appearing in the phase transition of Si(111)-7x7 to (v3 x v3) R300 induced by HBO2 molecular irradiationMiyake, K. et al. | 1999
- 1602
-
GaCl molecular beam cell for surface dynamics studiesOhashi, Masafumi / Ozeki, Masashi et al. | 1999
- 1602
-
PART I - Surface Science - Surface Science Poster Session - GaCl molecular beam cell for surface dynamics studiesOhashi, Masafumi et al. | 1999
- 1606
-
PART I - Surface Science - Surface Science Poster Session - Conversion efficiency of graphite atomic-scale defects to etched pits in thermal oxidation reactionHahn, J.R. et al. | 1999
- 1606
-
Conversion efficiency of graphite atomic-scale defects to etched pits in thermal oxidation reactionHahn, J. R. / Kang, H. et al. | 1999
- 1610
-
Control of atomic step arrangements on a patterned Si(111) substrate by using molecular beam epitaxyOmi, H. / Ogino, T. et al. | 1999
- 1610
-
PART I - Surface Science - Surface Science Poster Session II - Control of atomic step arrangements on a patterned Si(111) substrate by using molecular beam epitaxyOmi, H. et al. | 1999
- 1615
-
PART I - Surface Science - Surface Science Poster Session II - Reconstructions of Ag on high-index silicon surfacesBlankenship, S.R. et al. | 1999
- 1615
-
Reconstructions of Ag on high-index silicon surfacesBlankenship, S. R. / Song, H. H. / Baski, A. A. / Carlisle, J. A. et al. | 1999
- 1621
-
PART I - Surface Science - Surface Science Poster Session II - Photoelectron diffraction Intensity calculation by using tensor low-energy electron diffraction theoryOmori, Shinji et al. | 1999
- 1621
-
Photoelectron diffraction intensity calculation by using tensor low-energy electron diffraction theoryOmori, Shinji / Nihei, Yoshimasa et al. | 1999
- 1626
-
Disappearance of element-specific Kikuchi bands from fluoride surfacesOmori, Shinji / Nihei, Yoshimasa et al. | 1999
- 1626
-
PART I - Surface Science - Surface Science Poster Session II - Disappearance of element-specific Kikuchi bands from fluoride surfacesOmori, Shinji et al. | 1999
- 1630
-
Structure and electronic states of single-crystal Fe~1~-~xNi~xO~y (0less than or equal toxless than or equal to 1) thin filmsChern, G. / Chang, C. L. / Chen, C. L. / Dong, C. L. et al. | 1999
- 1630
-
PART I - Surface Science - Surface Science Poster Session II - Structure and electronic states of single-crystal Fe1-xNixOy (0 <= x <= 1) thin filmsChern, G. et al. | 1999
- 1630
-
Structure and electronic states of single-crystal thin filmsChern, G. / Chang, C. L. / Chen, C. L. / Dong, C. L. et al. | 1999
- 1635
-
PART I - Surface Science - Surface Science Poster Session II - Low-energy electron diffraction study of the multilayer relaxation of Cu(211)Seylier, Th et al. | 1999
- 1635
-
Low-energy electron diffraction study of the multilayer relaxation of Cu(211)Seyller, Th. / Diehl, R. D. / Jona, F. et al. | 1999
- 1639
-
Scanning tunneling microscopy and spectroscopy of tungsten oxide thin films in airSantucci, S. / Lozzi, L. / Passacantando, M. / Odorisio, L. / Cantalini, C. et al. | 1999
- 1639
-
PART I - Surface Science - Surface Science Poster Session II - Scanning tunneling microscopy and spectroscopy of tungsten oxide thin films in airSantucci, S. et al. | 1999
- 1647
-
Auger electron spectroscopy low energy electron diffraction study of the growth mode of Ag on Au(111), (311), and (554) single-crystal surfacesRooryck, V. / Buess-Herman, C. / Attard, G. A. / Reniers, F. et al. | 1999
- 1647
-
PART I - Surface Science - Surface Science Poster Session II - Auger electron spectroscopy low energy electron diffraction study of the growth mode of Ag on Au(111), (311), and (554) single-crystal surfacesRooryck, V. et al. | 1999
- 1652
-
PART I - Surface Science - Issues in Surface Electronic Structure - Analysis of high-index Si(001) surfaces by reflectance difference spectroscopyMantese, L. et al. | 1999
- 1657
-
Mg clusters on MgO surfaces: Characterization with metastable impact electron spectroscopy, ultraviolet photoelectron spectroscopy (HeI), and temperature programmed desorptionGünster, J. / Stultz, J. / Krischok, S. / Goodman, D. W. / Stracke, P. / Kempter, V. et al. | 1999
- 1657
-
PART I - Surface Science - Issues in Surface Electronic Structure - Mg clusters on MgO surfaces: Characterization with metastable impact electron spectroscopy, ultraviolet photoelectron spectroscopy (Hel), and temperature programmed desorptionGünster, J. et al. | 1999
- 1663
-
Effect of tensile strain on B-type step energy on Si(001)-(2 x 1) surfaces determined by switch-kink countingHeller, E. R. / Jones, D. E. / Pelz, J. P. / Xie, Y. H. / Silverman, P. J. et al. | 1999
- 1663
-
Effect of tensile strain on -type step energy on surfaces determined by switch-kink countingHeller, E. R. / Jones, D. E. / Pelz, J. P. / Xie, Y. H. / Silverman, P. J. et al. | 1999
- 1663
-
PART I - Surface Science - Semiconductor Surface Structure - Effect of tensile strain on B-type step energy on Si(001) - (2 x 1 ) surfaces determined by switch-kink countingHeller, E.R. et al. | 1999
- 1670
-
Scanning tunneling microscope studies of boron-doped Si(001)Nielsen, J.-F. / Im, H.-J / Pelz, J. P. / Krueger, M. / Borovsky, B. / Ganz, E. et al. | 1999
- 1670
-
PART I - Surface Science - Semiconductor Surface Structure - Scanning tunneling microscope studies of boron-doped Si(001)Nielsen, J.-F. et al. | 1999
- 1676
-
PART I - Surface Science - Semiconductor Surface Structure - Thallium overlayers on Si(111): Structures of a "new" group III elementVitaii, Lucia et al. | 1999
- 1676
-
Thallium overlayers on Si(111): Structures of a “new” group III elementVitali, Lucia / Leisenberger, Friedrich P. / Ramsey, Michael G. / Netzer, Falko P. et al. | 1999
- 1683
-
Ultrathin Cu films on Si(111): Schottky barrier formation and sensor applicationsNienhaus, H. / Bergh, H. S. / Gergen, B. / Majumdar, A. / Weinberg, W. H. / McFarland, E. W. et al. | 1999
- 1683
-
PART I - Surface Science - Physics of Semiconductors - Ultrathin Cu films on Si(111): Schottky barrier formation and sensor applicationsNienhaus, H. et al. | 1999
- 1688
-
Reconstructed oxide structures stable in air: Silicate monolayers on hexagonal SiC surfacesStarke, U. / Schardt, J. / Bernhardt, J. / Heinz, K. et al. | 1999
- 1688
-
PART I - Surface Science - Physics of Semiconductors - Reconstructed oxide structures stable in air: Silicate monolayers on hexagonal SiC surfacesStarke, U. et al. | 1999
- 1693
-
Electromigration induced dynamics of surface dislocations and atomic stepsShimoni, N. / Biham, O. / Millo, O. et al. | 1999
- 1693
-
PART I - Surface Science - Electromigration and Surface Transport - Electromigration induced dynamics of surface dislocations and atomic stepsShimoni, N. et al. | 1999
- 1696
-
PART I - Surface Science - Electromigration and Surface Transport - Growth of Ag rows on Si(5 5 12)Song, H.H. et al. | 1999
- 1696
-
Growth of Ag rows on Si(5 5 12)Song, H. H. / Jones, K. M. / Baski, A. A. et al. | 1999
- 1700
-
Enantiospecific adsorption of chiral hydrocarbons on naturally chiral Pt and Cu surfacesPower, Timothy D. / Sholl, David S. et al. | 1999
- 1700
-
PART I - Surface Science - Surface Structure and Strain - Enantiospecific adsorption of chiral hydrocarbons on naturally chiral Pt and Cu surfacesPower, Timothy D. et al. | 1999
- 1705
-
PART I - Surface Science - Molecular Adsorbates on Metals - Role of steps and kinks in catalytic activityFord, L.P. et al. | 1999
- 1705
-
Role of steps and kinks in catalytic activityFord, L. P. / Blowers, P. / Masel, R. I. et al. | 1999
- 1710
-
Theoretical studies of surface reactions on metals: I. Ethyl to ethylene conversion on platinum; II. Photodissociation of methane on platinumWhitten, J. L. et al. | 1999
- 1710
-
PART I - Surface Science - Molecular Adsorbates on Metals - Theoretical studies of surface reactions on metals: I. Ethyl to ethylene conversion on platinum; II. Photodissociation of methane on platinumWhitten, J.L. et al. | 1999
- 1717
-
PART I - Surface Science - Noble Metal Catalysis - Oxygen adsorption on well-defined gold particles on TiO2(110)Bondzie, V.A. et al. | 1999
- 1717
-
Oxygen adsorption on well-defined gold particles onBondzie, V. A. / Parker, S. C. / Campbell, C. T. et al. | 1999
- 1721
-
Monte Carlo simulations of the kinetics of catalytic reactions on nanometer-sized particles, with diffusion over facet boundariesPersson, H. / Thormählen, P. / Zhdanov, V. P. / Kasemo, B. et al. | 1999
- 1721
-
PART I - Surface Science - Noble Metal Catalysis - Monte Carlo simulations of the kinetics of catalytic reactions on nanometer-sized particles, with diffusion over facet boundariesPersson, H. et al. | 1999
- 1727
-
Initial stages of Al(111) oxidation by oxygen: Temperature and surface morphology effectsZhukov, V. / Popova, I. / Yates, J. T. et al. | 1999
- 1727
-
PART I - Surface Science - Gas Surface Dynamics - Initial stages of Al(111) oxidation by oxygen: Temperature and surface morphology effectsZhukov, V. et al. | 1999
- 1733
-
PART I - Surface Science - Photochemistry and Deposition - Synchrotron-radiation stimulated desorption Of SiO2 thin films on Si(111) surfaces observed by scanning tunneling microscopyMiyamae, T. et al. | 1999
- 1733
-
Synchrotron-radiation stimulated desorption of thin films on Si(111) surfaces observed by scanning tunneling microscopyMiyamae, T. / Uchida, H. / Munro, I. H. / Urisu, T. et al. | 1999
- 1737
-
Effect of growth rate on the nucleation of on by oxygen-plasma-assisted molecular beam epitaxyYi, S. I. / Liang, Y. / Chambers, S. A. et al. | 1999
- 1737
-
PART I - Surface Science - Oxide Growth and Structure - Effect of growth rate on the nucleation of a-Fe2O3 on a-Al2O3(0001) by oxygen-plasma-assisted molecular beam epitaxyYi, S.I. et al. | 1999
- 1743
-
PART I - Surface Science - Oxide Growth and Structure - Nature, growth, and stability of vanadium oxides on Pd(111)Leisenberger, F.P. et al. | 1999
- 1743
-
Nature, growth, and stability of vanadium oxides on Pd(111)Leisenberger, F. P. / Surnev, S. / Vitali, L. / Ramsey, M. G. / Netzer, F. P. et al. | 1999
- 1750
-
Formation of hydronium and methoxonium on Pt(110): Ab initio determination of spectroscopically observed speciesBlowers, P. / Chen, N. / Masel, R. I. et al. | 1999
- 1750
-
PART I - Surface Science - Water and Ice Interfaces - Formation of hydronium and methoxonium on Pt(110): Ab initio determination of spectroscopically observed speciesBlowers, P. et al. | 1999
- 1756
-
Dynamics of the striped nanostructure of the oxidized Cu(110) surface: A momentum-resolved electron stimulated desorption ion angular distribution studyMocuta, D. / Ahner, J. / Lee, J.-G. / Denev, S. / Yates, J. T. et al. | 1999
- 1756
-
PART I - Surface Science - Surface Dynamics and Roughening - Dynamics of the striped nanostructure of the oxidized Cu(110) surface: A momentum-resolved electron stimulated desorption !on angular distribution studyMocuta, D. et al. | 1999
- 1761
-
Photoemission spectroscopy analysis of ZnO:Ga films for display applicationsForsythe, E. W. / Gao, Yongli / Provost, L. G. / Tompa, G. S. et al. | 1999
- 1761
-
PART II - Thin Film - Transparent Conductive Oxides| 1999
- 1761
-
Thin Film - Transparent Conductive Oxides - Photoemission spectroscopy analysis of ZnO:Ga films for display applicationsForsythe, E.W. et al. | 1999
- 1765
-
Thin Film - Transparent Conductive Oxides - Transparent and conductive multicomponent oxide films prepared by magnetron sputteringMinami, Tadatsugu et al. | 1999
- 1765
-
Transparent and conductive multicomponent oxide films prepared by magnetron sputteringMinami, Tadatsugu et al. | 1999
- 1773
-
Work function modification of indium–tin–oxide used in organic light emitting devicesTadayyon, S. M. / Griffiths, K. / Norton, P. R. / Tripp, C. / Popovic, Z. et al. | 1999
- 1773
-
Thin Film - Transparent Conductive Oxides - Work function modification of indium-tin-oxide used in organic light emitting devicesTadayyon, S.M. et al. | 1999
- 1779
-
Thin Film - Mechanical Properties of Thin Films - Implications of contact mechanics models for mechanical properties measurements using scanning force microscopyUnertl, W.N. et al. | 1999
- 1779
-
PART II - Thin Film - Mechanical Properties of Thin Films| 1999
- 1779
-
Implications of contact mechanics models for mechanical properties measurements using scanning force microscopyUnertl, W. N. et al. | 1999
- 1787
-
Nanotribology of single crystal ZnO surfaces: Restructuring at high temperature annealingNainaparampil, J. J. / Zabinski, J. S. / Prasad, S. V. et al. | 1999
- 1787
-
Nanotrlbology of single crystal ZnO surfaces: Restructuring at high temperature annealingNainaparampil, J. J. / Zabinski, J. S. / Prasad, S. V. et al. | 1999
- 1787
-
Thin Film - Mechanical Properties of Thin Films - Nanotribology of single crystal ZnO surfaces: Restructuring at high temperature annealingNainaparampil, J.J. et al. | 1999
- 1793
-
Investigation of induced recrystallization and stress in close-spaced sublimated and radio-frequency magnetron sputtered CdTe thin filmsMoutinho, H. R. / Dhere, R. G. / Al-Jassim, M. M. / Levi, D. H. / Kazmerski, L. L. et al. | 1999
- 1793
-
Thin Film - Mechanical Properties of Thin Films - Investigation of induced recrystallization and stress in close-spaced sublimated and radio-frequency magnetron sputtered CdTe thin filmsMoutinho, H.R. et al. | 1999
- 1799
-
Thin Film - Thin Film Poster Session - Characterization of thin metal films processed at different temperaturesSiewenie, J.E. et al. | 1999
- 1799
-
PART II - Thin Film - Thin Film Poster Session| 1999
- 1799
-
Characterization of thin metal films processed at different temperaturesSiewenie, J. E. / He, L. et al. | 1999
- 1805
-
Optical properties of Ge:Sb:Te ternary alloysGarcı́a-Garcı́a, E. / Mendoza-Galván, A. / Vorobiev, Y. / Morales-Sánchez, E. / González-Hernández, J. / Martı́nez, G. / Chao, B. S. et al. | 1999
- 1805
-
Thin Film - Thin Film Poster Session - Optical properties of Ge:Sb:Te ternary alloysGarcia-Garcia, E. et al. | 1999
- 1811
-
Influence of annealing temperature on the formation and characteristics of sol-gel prepared ZnO filmsCastanedo-Pérez, R. / Jiménez-Sandoval, O. / Jiménez-Sandoval, S. / Márquez-Marı́n, J. / Mendoza-Galván, A. / Torres-Delgado, G. / Maldonado-Alvarez, A. et al. | 1999
- 1811
-
Thin Film - Thin Film Poster Session - Influence of annealing temperature on the formation and characteristics of sol-gel prepared ZnO filmsCastanedo-Pérez, R. et al. | 1999
- 1817
-
Growth and characterization of epitaxial films of tungsten-doped vanadium oxides on sapphire (110) by reactive magnetron sputteringJin, P. / Tazawa, M. / Ikeyama, M. / Tanemura, S. / Macák, K. / Wang, X. / Olafsson, S. / Helmersson, U. et al. | 1999
- 1817
-
Thin Film - Thin Film Poster Session - Growth and characterization of epitaxial films of tungsten-doped vanadium oxides on sapphire (110) by reactive magnetron sputteringJin, P. et al. | 1999
- 1822
-
Stability of transparent conducting oxide films for use at high temperaturesMinami, Tadatsugu / Miyata, Toshihiro / Yamamoto, Takashi et al. | 1999
- 1822
-
Thin Film - Thin Film Poster Session - Stability of transparent conducting oxide films for use at high temperaturesMinami, Tadatsugu et al. | 1999
- 1827
-
Target compound layer formation during reactive sputteringJonsson, L. B. / Nyberg, T. / Berg, S. et al. | 1999
- 1827
-
Thin Film - Thin Film Poster Session - Target compound layer formation during reactive sputteringJonsson, L.B. et al. | 1999
- 1832
-
Porous polycrystalline silicon conductivity sensorHan, P. G. / Wong, H. / Poon, M. C. / Wang, N. et al. | 1999
- 1832
-
Thin Film - Thin Film Poster Session - Porous polycrystalline silicon conductivity sensorHan, P.G. et al. | 1999
- 1836
-
Thickness and index measurement of transparent thin films using neural network processed reflectance dataTabet, Milad F. / McGahan, William A. et al. | 1999
- 1836
-
Thin Film - Thin Film Poster Session - Thickness and index measurement of transparent thin films using neural network processed reflectance dataTabet, Milad F. et al. | 1999
- 1840
-
Thin Film - Thin Film Poster Session - Density measurement of thin glass layers for gas barrier filmsFukugami, Norihito et al. | 1999
- 1840
-
Density measurement of thin glass layers for gas barrier filmsFukugami, Norihito / Nishino, Hideo / Yanaka, Masa-aki / Tomiyama, Kozue / Tsukahara, Yusuke et al. | 1999
- 1843
-
Thin Film - Thin Film Poster Session - Accurate and rapid determination of thickness, n and k spectra, and resistivity of indium-tin-oxide filmsZhang, K. et al. | 1999
- 1843
-
Accurate and rapid determination of thickness, n and k spectra, and resistivity of indium–tin–oxide filmsZhang, K. / Forouhi, A. R. / Bloomer, I. et al. | 1999
- 1848
-
Dislocation network developed in titanium nitride by ion implantationPerry, Anthony J. / Sharkeev, Yuri P. / Geist, Daniel E. / Fortuna, Sergey V. et al. | 1999
- 1848
-
Thin Film - Thin Film Poster Session - Dislocation network developed in titanium nitride by !on implantationPerry, Anthony J. et al. | 1999
- 1854
-
PART II - Thin Film - Thin Films for Sensing and Data Storage| 1999
- 1854
-
Obtaining optical constants of thin films from measurements of reflection and transmissionTsu, David V. et al. | 1999
- 1854
-
Thin Film - Thin Films for Sensing and Data Storage - Obtaining optical constants of thin GexSbyTez films from measurements of reflection and transmissionTsu, David V. et al. | 1999
- 1861
-
Process monitoring of hemispherical-grained silicon thin films for dynamic random access memory applicationsHayzelden, Clive / Bivas, Albert / Ygartua, Carlos L. / Chan, Kin-Chung et al. | 1999
- 1861
-
Thin Film - Thin Films for Sensing and Data Storage - Process monitoring of hemispherical-grained silicon thin films for dynamic random access memory applicationsHayzelden, Clive et al. | 1999
- 1866
-
Thin-film gas sensors based on high-temperature-operated metal oxidesFleischer, M. / Meixner, H. et al. | 1999
- 1866
-
Thin Film - Thin Films for Sensing and Data Storage - Thin-film gas sensors based on high-temperature-operated metal oxidesFleischer, M. et al. | 1999
- 1873
-
Characterization of sol-gel prepared WO3 thin films as a gas sensorCantalini, C. / Atashbar, M. Z. / Li, Y. / Ghantasala, M. K. / Santucci, S. / Wlodarski, W. / Passacantando, M. et al. | 1999
- 1873
-
Thin Film - Thin Films for Sensing and Data Storage - Characterization of sol-gel prepared WO3 thin films as a gas sensorCantalini, C. et al. | 1999
- 1880
-
PART II - Thin Film - In Situ Characterization of Thin Films| 1999
- 1880
-
In situ study of interface reactions of ion beam sputter deposited films on Si, and IrGao, Y. / Mueller, A. H. / Irene, E. A. / Auciello, O. / Krauss, A. / Schultz, J. A. et al. | 1999
- 1880
-
Thin Film - In Situ Characterization of Thin Films - In situ study of interface reactions of ion beam sputter deposited (Ba0.5Sr0.5)TIO3 films on Si, SiO2, and IrGao, Y. et al. | 1999
- 1887
-
Ordered binary oxide films of onGuo, Q. / Kim, D. Y. / Street, S. C. / Goodman, D. W. et al. | 1999
- 1887
-
Thin Film - In Situ Characterization of Thin Films - Ordered binary oxide films Of V2O3(0001) on Al2O3Guo, Q. et al. | 1999
- 1893
-
Thin Film - ULSI Metallization and Interconnects - Ultralarge scale Integrated metallization and interconnectsWhitman, Christine et al. | 1999
- 1893
-
Ultralarge scale integrated metallization and interconnectsWhitman, Christine / Moslehi, Mehrdad M. / Paranjpe, Ajit / Velo, Lino / Omstead, Tom et al. | 1999
- 1893
-
PART II - Thin Film - ULSI Metallization and Interconnects| 1999
- 1898
-
Thin Film - ULSI Metallization and Interconnects - Effects of collimator aspect ratio and deposition temperature on copper sputtered seedlayersCooney III, E.C. et al. | 1999
- 1898
-
Effects of collimator aspect ratio and deposition temperature on copper sputtered seedlayersCooney, E. C. / Strippe, D. C. / Korejwa, J. W. / Simon, A. H. / Uzoh, C. et al. | 1999
- 1904
-
Thin Film - ULSI Metallization and Interconnects - Cobalt sputtering target and sputter deposition of Co thin films for cobalt silicide metallizationZhang, Hao et al. | 1999
- 1904
-
Cobalt sputtering target and sputter deposition of Co thin films for cobalt silicide metallizationZhang, Hao / Poole, John / Eller, Rick / Keefe, Mark et al. | 1999
- 1911
-
Thin Film - ULSI Metallization and Interconnects - Improvement of morphological stability of Ag thin film on a TIN layer with a thin interposing metal layerHong, C.Y. et al. | 1999
- 1911
-
Improvement of morphological stability of Ag thin film on a TiN layer with a thin interposing metal layerHong, C. Y. / Peng, Y. C. / Chen, L. J. / Hsieh, W. Y. / Hsieh, Y. F. et al. | 1999
- 1916
-
Preferential sputtering effects in thin film processingBerg, S. / Katardjiev, I. V. et al. | 1999
- 1916
-
Thin Film - Advances in Sputtering - Preferential sputtering effects in thin film processingBerg, S. et al. | 1999
- 1916
-
PART II - Thin Film - Advances in Sputtering| 1999
- 1926
-
Thin Film - Advances in Sputtering - Reactor-scale models for rf diode sputtering of metal thin filmsDesa, S. et al. | 1999
- 1926
-
Reactor-scale models for rf diode sputtering of metal thin filmsDesa, S. / Ghosal, S. / Kosut, R. L. / Ebert, J. L. / Abrahamson, T. E. / Kozak, A. / Zou, D. W. / Zhou, X. / Groves, J. F. / Wadley, H. N. G. et al. | 1999
- 1934
-
Using pulsed direct current power for reactive sputtering ofBelkind, A. / Freilich, A. / Scholl, R. et al. | 1999
- 1934
-
Thin Film - Advances in Sputtering - Using pulsed direct current power for reactive sputtering of Al2O3Belkind, A. et al. | 1999
- 1941
-
Novel approach to collimated physical vapor depositionKools, J. C. S. / Paranjpe, A. P. / Heimanson, D. H. / Schwartz, P. V. / Song, K. / Bergner, B. / McAllister, S. / Van Ysseldyk, R. W. et al. | 1999
- 1941
-
Thin Film - Advances in Sputtering - Novel approach to collimated physical vapor depositionKools, J.C.S. et al. | 1999
- 1946
-
Thin Film - Thin Films for Flat Panel Applications - Polysilicon thin film transistors fabricated on low temperature plastic substratesCarey, Paul G. et al. | 1999
- 1946
-
Polysilicon thin film transistors fabricated on low temperature plastic substratesCarey, Paul G. / Smith, Patrick M. / Theiss, Steven D. / Wickboldt, Paul et al. | 1999
- 1946
-
PART II - Thin Film - Thin Films for Flat Panel Applications| 1999
- 1950
-
PART II - Thin Film - Ex Situ Characterization of Thin Films| 1999
- 1950
-
Ex situ characterization of phase transformations and associated microstructures in polycrystalline thin filmsBarmak, K. / Rickman, J. M. / Michaelsen, C. / Ristau, R. A. / Kim, J. / Lucadamo, G. A. / Carpenter, D. T. / Tong, W. S. et al. | 1999
- 1950
-
Thin Film - Ex Situ Characterization of Thin Films - Ex situ characterization of phase transformations and associated microstructures in polycrystalline thin filmsBarmak, K. et al. | 1999
- 1958
-
Structure and electronic properties of the novel semiconductor alloyLópez-López, S. / Torres-Delgado, G. / Jiménez-Sandoval, S. / Jiménez-Sandoval, O. / Castanedo-Pérez, R. / Meléndez-Lira, M. et al. | 1999
- 1958
-
Thin Film - Ex Situ Characterization of Thin Films - Structure and electronic properties of the novel semiconductor alloy Cd1-xCuxTeLopez-Lopez, S. et al. | 1999
- 1963
-
Annealing of copper electrodepositsSeah, C. H. / Mridha, S. / Chan, L. H. et al. | 1999
- 1963
-
Thin Film - Mechanical Properties of Thin Films - Annealing of copper electrodepositsSeah, C.H. et al. | 1999
- 1968
-
Thin Film - Mechanical Properties of Thin Films - Polymerized C-Si films on metal substrates: Cu adhesion-diffusion barriers for ultralarge scale Integration?Chen, Li et al. | 1999
- 1968
-
Polymerized C-Si films on metal substrates: Cu adhesion/diffusion barriers for ultralarge scale integration?Chen, Li / Kelber, Jeffry A. et al. | 1999
- 1974
-
Ultrahigh rate, wide area, plasma polymerized films from high molecular weight/low vapor pressure liquid or solid monomer precursorsAffinito, J. D. / Gross, M. E. / Mounier, P. A. / Shi, M.-K. / Graff, G. L. et al. | 1999
- 1974
-
Thin Film - Mechanical Properties of Thin Films - Ultrahigh rate, wide area, plasma polymerized films from high molecular weight-low vapor pressure liquid or solid monomer precursorsAffinito, J.D. et al. | 1999
- 1982
-
Structural and electrical properties of thin films prepared by plasma enhanced metalorganic chemical vapor depositionHahn, Y. B. / Kim, D. O. et al. | 1999
- 1982
-
Thin Film - Mechanical Properties of Thin Films - Structural and electrical properties of SrTIO3 thin films prepared by plasma enhanced metalorganic chemical vapor depositionHahn, Y.B. et al. | 1999
- 1987
-
Assessment of as-deposited microcrystalline silicon films on polymer substrates using electron cyclotron resonance-plasma enhanced chemical vapor depositionBae, Sanghoon / Fonash, Stephen J. et al. | 1999
- 1987
-
Thin Film - Mechanical Properties of Thin Films - Assessment of as-deposited microcrystalline silicon films on polymer substrates using electron cyclotron resonance-plasma enhanced chemical vapor depositionBae, Sanghoon et al. | 1999
- 1991
-
PART II - Vacuum Metallurgy - Plasma Assisted Surface Treatments and Coatings| 1999
- 1991
-
Unbalanced magnetron sputtered carbon composite coatingsZeng, X. T. et al. | 1999
- 1991
-
Vacuum Metallurgy - Plasma Assisted Surface Treatments and Coatings - Unbalanced magnetron sputtered carbon composite coatingsZeng, X.T. et al. | 1999
- 1996
-
Tribological modification of aluminum by electron-cyclotron resonance plasma source ion implantationPopovici, D. / Bolduc, M. / Terreault, B. / Sarkissian, A. H. / Stansfield, B. L. / Paynter, R. W. / Bourgoin, D. et al. | 1999