Spherical-periodic order and relevant short-range structural units in simple crystal structures (English)
- New search for: Zhang, Shuang
- New search for: Dong, Chuang
- New search for: Häussler, Peter
- New search for: Zhang, Shuang
- New search for: Dong, Chuang
- New search for: Häussler, Peter
In:
Journal of Vacuum Science & Technology A
;
40
, 2
;
7
;
2022
- Article (Journal) / Electronic Resource
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Title:Spherical-periodic order and relevant short-range structural units in simple crystal structures
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Contributors:
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Published in:Journal of Vacuum Science & Technology A ; 40, 2 ; 7
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Publisher:
- New search for: American Vacuum Society
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Publication date:2022-03-01
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Size:7 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 40, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer depositionGe, Beibei / Ohori, Daisuke / Chen, Yi-Ho / Ozaki, Takuya / Endo, Kazuhiko / Li, Yiming / Tarng, Jenn-Hwan / Samukawa, Seiji et al. | 2022
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Flow-modulated deposition of sp2-boron nitride using diborane and ammonia on chemomechanically polished (0001) 4H-SiC substratesJean-Remy, Philip M. / Cabral, Matthew J. / Davis, Robert F. et al. | 2022
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Atomic layer deposition of GdF3 thin filmsAtosuo, Elisa / Mizohata, Kenichiro / Mattinen, Miika / Mäntymäki, Miia / Vehkamäki, Marko / Leskelä, Markku / Ritala, Mikko et al. | 2022
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High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidationMayandi, Jeyanthinath / Schrade, Matthias / Vajeeston, Ponniah / Stange, Marit / Lind, Anna M. / Sunding, Martin F. / Deuermeier, Jonas / Fortunato, Elvira / Løvvik, Ole M. / Ulyashin, Alexander G. et al. | 2022
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Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performancePolyakov, Alexander Y. / Nikolaev, Vladimir I. / Yakimov, Eugene B. / Ren, Fan / Pearton, Stephen J. / Kim, Jihyun et al. | 2022
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Erratum: “Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths” [J. Vac. Sci. Technol. A 39, 043408 (2021)]Beliaev, Leonid Yu. / Shkondin, Evgeniy / Lavrinenko, Andrei V. / Takayama, Osamu et al. | 2022
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Preface for the special topic collection commemorating the career of Charles S. FadleyHerman, Gregory S. / Thevuthasan, Suntharampillai / Tran, Thuy T. et al. | 2022
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Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lithium batteriesBuchner, Florian / Forster-Tonigold, Katrin / Bolter, Tim / Rampf, Alexander / Klein, Jens / Groß, Axel / Behm, R. Jürgen et al. | 2022
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Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth ratesLaFollette, Diana K. / Canova, Kinsey L. / Zhang, Zhejun V. / Abelson, John R. et al. | 2022
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Preparation of Nd1.85Ce0.15CuO4 superconducting thin film by pulsed laser depositionJia, Jiqiang / Liu, Chen / Guo, Mengjiao / Lei, Li et al. | 2022
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Tunable alignment of liquid crystals between anisotropic polyacrylamide thin layerLee, Dong-Wook / Kim, Dong-Hyun / Oh, Jin-Young / Seo, Dae-Shik et al. | 2022
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High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilaneHwang, Su Min / Kim, Harrison Sejoon / Le, Dan N. / Sahota, Akshay / Lee, Jaebeom / Jung, Yong Chan / Kim, Sang Woo / Kim, Si Joon / Choi, Rino / Ahn, Jinho et al. | 2022
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Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorinationLee, Yebin / Kim, Yongjae / Son, Jiwon / Chae, Heeyeop et al. | 2022
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Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etchingFischer, Andreas / Routzahn, Aaron / Gasvoda, Ryan J. / Sims, Jim / Lill, Thorsten et al. | 2022
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Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer depositionGungor, Nese / Alevli, Mustafa et al. | 2022
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Origin of enhanced thermal atomic layer etching of amorphous HfO2Mullins, Rita / Gutiérrez Moreno, José Julio / Nolan, Michael et al. | 2022
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Influence of the carrier wafer during GaN etching in Cl2 plasmaMeyer, Thibaut / Petit-Etienne, Camille / Pargon, Erwine et al. | 2022
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Many-body effects for the Mg 2s XPS of MgOBagus, Paul S. / Nelin, Connie J. / Brundle, C. R. / Vincent Crist, B. et al. | 2022
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Atomic step disorder on polycrystalline surfaces leads to spatially inhomogeneous work functionsBerg, Morgann / Smith, Sean W. / Scrymgeour, David A. / Brumbach, Michael T. / Lu, Ping / Dickens, Sara M. / Michael, Joseph R. / Ohta, Taisuke / Bussmann, Ezra / Hjalmarson, Harold P. et al. | 2022
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Pulsed chemical vapor deposition of cobalt and cobalt carbide thin filmsChen, Sen / Zhang, Xiangyu / Liu, Bowen / Liu, Zhongwei et al. | 2022
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Optoelectronic properties of transparent oxide semiconductor ASnO3 (A = Ba, Sr, and Ca) epitaxial films and thin film transistorsSanchela, Anup V. / Wei, Mian / Cho, Hai Jun / Ohta, Hiromichi et al. | 2022
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Spherical-periodic order and relevant short-range structural units in simple crystal structuresZhang, Shuang / Dong, Chuang / Häussler, Peter et al. | 2022
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Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theoryCano, Austin M. / Kondati Natarajan, Suresh / Partridge, Jonathan L. / Elliott, Simon D. / George, Steven M. et al. | 2022
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Magnetic transition behavior in epitaxial Fe47Rh47Pd6 filmsSato, Hideo / Pachauri, Neha / Keshavarz, Sahar / Joshi, Chhatra R. / Lee, Hwachol / Mankey, Gary J. / LeClair, Patrick et al. | 2022
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Atomic layer deposition of titanium phosphate onto reinforcing fibers using titanium tetrachloride, water, and tris(trimethylsilyl) phosphate as precursorsDill, Pauline / Ren, Xiang / Hintersatz, Helen / Franz, Mathias / Dentel, Doreen / Tegenkamp, Christoph / Ebert, Susann et al. | 2022
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Surface-to-bulk core level shift in CoFe2O4 thin filmsSubedi, Arjun / Yang, Detian / Yun, Yu / Xu, Xiaoshan / Dowben, Peter A. et al. | 2022
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Reconstruction changes drive surface diffusion and determine the flatness of oxide surfacesFranceschi, Giada / Schmid, Michael / Diebold, Ulrike / Riva, Michele et al. | 2022
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Emergent phenomena at oxide interfaces studied with standing-wave photoelectron spectroscopyKuo, Cheng-Tai / Conti, Giuseppina / Rault, Julien E. / Schneider, Claus M. / Nemšák, Slavomír / Gray, Alexander X. et al. | 2022
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Reaction mechanism studies on atomic layer deposition process of AlF3Nieminen, Heta-Elisa / Ritala, Mikko et al. | 2022
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Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argonYoshida, Kazuki / Nagata, Issei / Saito, Kentaro / Miura, Masanori / Kanomata, Kensaku / Ahmmad, Bashir / Kubota, Shigeru / Hirose, Fumihiko et al. | 2022
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Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer depositionOyakhire, Solomon T. / Ablat, Hayrensa / Richey, Nathaniel E. / Bent, Stacey F. et al. | 2022
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Partial densities of states from x-ray absorption and Auger electron spectroscopy: Use of core-hole memoryShirley, Eric L. / Weiland, C. / Woicik, J. C. et al. | 2022
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Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopesSchönhense, Gerd / Elmers, Hans-Joachim et al. | 2022
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Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styreneVarga, Atilla C. / Barry, Seán T. et al. | 2022
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Sulfur-enhanced dynamics of coinage metal(111) surfaces: Step edges versus terraces as locations for metal-sulfur complex formationLiu, Da-Jiang / Evans, James W. et al. | 2022
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Photoactivated Ru chemical vapor deposition using (η3-allyl)Ru(CO)3X (X = Cl, Br, I): From molecular adsorption to Ru thin film depositionSalazar, Bryan G. / Brewer, Christopher R. / McElwee-White, Lisa / Walker, Amy V. et al. | 2022