Review of pumping by thermal molecular pressure (English)
- New search for: Hobson, J. P.
- New search for: Salzman, D. B.
- New search for: Hobson, J. P.
- New search for: Salzman, D. B.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
18
, 4
;
1758-1765
;
2000
- Article (Journal) / Electronic Resource
-
Title:Review of pumping by thermal molecular pressure
-
Contributors:Hobson, J. P. ( author ) / Salzman, D. B. ( author )
-
Published in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 18, 4 ; 1758-1765
-
Publisher:
- New search for: American Vacuum Society
-
Publication date:2000-07-01
-
Size:8 pages
-
ISSN:
-
DOI:
-
Type of media:Article (Journal)
-
Type of material:Electronic Resource
-
Language:English
-
Keywords:
-
Source:
Table of contents – Volume 18, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1051
-
Simulation and correction of geometric distortions in scanning Kelvin probe microscopyEfimov, Anton / Cohen, Sidney R. et al. | 2000
- 1051
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Imaging and Small Area Analysis - Simulation and correction of geometric distortions in scanning Kelvin probe microscopyEfimov, Anton et al. | 2000
- 1051
-
Applied Surface Science - Imaging and Small Area Analysis| 2000
- 1056
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Ion Beam Analysis and Depth Profiling - Secondary ion mass spectrometry and x-ray photoelectron spectroscopy correlation study of nitrided gate oxideBradbury, C.A. et al. | 2000
- 1056
-
Applied Surface Science - Ion Beam Analysis and Depth Profiling| 2000
- 1056
-
Secondary ion mass spectrometry and x-ray photoelectron spectroscopy correlation study of nitrided gate oxideBradbury, C. A. / Blackmer, C. et al. | 2000
- 1061
-
Channeling effects during focused-ion-beam micromachining of copperPhillips, J. R. / Griffis, D. P. / Russell, P. E. et al. | 2000
- 1061
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Ion Beam Analysis and Depth Profiling - Channeling effects during focused-ion-beam micromachining of copperPhillips, J.R. et al. | 2000
- 1066
-
Oxide-free phosphate films on copper probed by core and valence-band x-ray photoelectron spectroscopic studies in an anaerobic cellRotole, John A. / Sherwood, Peter M. A. et al. | 2000
- 1066
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Modeling in Applied Surface Science - Oxide-free phosphate films on copper probed by core and valence-band x-ray photoelectron spectroscopic studies in an anaerobic cellRotole, John A. et al. | 2000
- 1066
-
Applied Surface Science - Modeling in Applied Surface Science| 2000
- 1072
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Applied Surface Science Poster Session - Core-level satellites and outer core-level multiplet splitting in Mn model compoundsNelson, A.J. et al. | 2000
- 1072
-
Core-level satellites and outer core-level multiplet splitting in Mn model compoundsNelson, A. J. / Reynolds, John G. / Roos, Joseph W. et al. | 2000
- 1072
-
Applied Surface Science - Applied Surface Science Poster Session| 2000
- 1077
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Applied Surface Science Poster Session - X-ray photoemission spectroscopy and scanning tunneling spectroscopy study on the thermal stability of WO3 thin filmsSantucci, S. et al. | 2000
- 1077
-
X-ray photoemission spectroscopy and scanning tunneling spectroscopy study on the thermal stability of thin filmsSantucci, S. / Cantalini, C. / Crivellari, M. / Lozzi, L. / Ottaviano, L. / Passacantando, M. et al. | 2000
- 1083
-
Consistent, combined quantitative Auger electron spectroscopy and x-ray photoelectron spectroscopy digital databases: Convergence of theory and experimentSeah, M. P. / Gilmore, I. S. / Spencer, S. J. et al. | 2000
- 1083
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Gaede-Langmuir Award Address and Quantitative Surface Analysis - Consistent, combined quantitative Auger electron spectroscopy and x-ray photoelectron spectroscopy digital databases: Convergence of theory and experimentSeah, M.P. et al. | 2000
- 1083
-
Applied Surface Science - Gaede-Langmuir Award Address and Quantitative Surface Analysis| 2000
- 1089
-
Applied Surface Science - Oxides and Insulators| 2000
- 1089
-
Adsorption probabilities of CO on O–ZnO: A molecular beam studyBecker, Th. / Boas, Ch. / Burghaus, U. / Wöll, Ch. et al. | 2000
- 1089
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Oxides and Insulators - Adsorption probabilities of CO on O-ZnO: A molecular beam studyBecker, Th et al. | 2000
- 1093
-
Compositional heterogeneity in ceria-based mixed oxides observed by x-ray photoelectron spectroscopyGraham, G. W. / Roe, C. L. / Haack, L. P. / Straccia, A. M. et al. | 2000
- 1093
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Oxides and Insulators - Compositional heterogeneity in ceria-based mixed oxides observed by x-ray photoelectron spectroscopyGraham, G.W. et al. | 2000
- 1096
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Oxides and Insulators - Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor depositionColpo, P. et al. | 2000
- 1096
-
Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor depositionColpo, P. / Ceccone, G. / Sauvageot, P. / Baker, M. / Rossi, F. et al. | 2000
- 1102
-
Applied Surface Science - Real World Surface Analysis| 2000
- 1102
-
Adhesion effect of polyimide passivation layer on lead-on-chip die attachmentJiang, T. Tom / Bradbury, Cynthia A. / Canavan, Michael et al. | 2000
- 1102
-
Real World Surface Analysis| 2000
- 1102
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Real World Surface Analysis - Adhesion effect of polyimide passivation layer on lead-on-chip die attachmentJiang, T.Tom et al. | 2000
- 1107
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - Real World Surface Analysis - Identification of surface chemical functional groups correlated to failure of reverse osmosis polymeric membranesBeverly, Sharon et al. | 2000
- 1107
-
Identification of surface chemical functional groups correlated to failure of reverse osmosis polymeric membranesBeverly, Sharon / Seal, Sudipta / Hong, Seungkwan et al. | 2000
- 1114
-
New or Improved Surface Related Analytical Techniques| 2000
- 1114
-
Applied Surface Science - New or Improved Surface Related Analytical Techniques| 2000
- 1114
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science - New or Improved Surface Related Analytical Techniques - Self-assembled monolayers for polymer and protein cationization with time-of-flight secondary ion mass spectrometryMichel, Roger et al. | 2000
- 1114
-
Self-assembled monolayers for polymer and protein cationization with time-of-flight secondary ion mass spectrometryMichel, Roger / Luginbühl, Reto / Graham, Daniel J. / Ratner, Buddy D. et al. | 2000
- 1119
-
Sputter deposition and annealing of Ta, and composite films and their application in next generation lithography masksRacette, Kenneth / Brooks, Cameron / Guarnieri, C. Richard / Hendy, Dennis et al. | 2000
- 1119
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Applied Surface Science II - Applied Surface Science for Microelectronics - Sputter deposition and annealing of Ta, TaSix, and TaBx composite films and their application in next generation lithography masksRacette, Kenneth et al. | 2000
- 1119
-
Applied Surface Science II - Applied Surface Science for Microelectronics| 2000
- 1125
-
Model for detection of immobilized superparamagnetic nanosphere assay labels using giant magnetoresistive sensorsTondra, Mark / Porter, Marc / Lipert, Robert J. et al. | 2000
- 1125
-
Biomaterial Interfaces - Biosensor-Biology Interface| 2000
- 1125
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Biomaterial Interfaces - Biosensor-Biology Interface - Model for detection of immobilized superparamagnetic nanosphere assay labels using giant magnetoresistive sensorsTondra, Mark et al. | 2000
- 1130
-
Selective area growth of GaN on Si(111) by chemical beam epitaxyKim, Esther / Tempez, A. / Medelci, N. / Berishev, I. / Bensaoula, A. et al. | 2000
- 1130
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Nitride Epitaxy - Selective area growth of GaN on Si(111) by chemical beam epitaxyKim, Esther et al. | 2000
- 1130
-
Electronic Materials and Processing - Nitride Epitaxy| 2000
- 1135
-
Electronic Materials and Processing - Nitride Processing and Characterization| 2000
- 1135
-
High breakdown voltage Au/Pt/GaN Schottky diodesDang, G. T. / Zhang, A. P. / Mshewa, M. M. / Ren, F. / Chyi, J.-I. / Lee, C.-M. / Chuo, C. C. / Chi, G. C. / Han, J. / Chu, S. N. G. et al. | 2000
- 1135
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Nitride Processing and Characterization - High breakdown voltage Au-Pt-GaN Schottky diodesDang, G.T. et al. | 2000
- 1139
-
Inductively coupled plasma-induced etch damage of GaN junctionsShul, R. J. / Zhang, L. / Baca, A. G. / Willison, C. G. / Han, J. / Pearton, S. J. / Ren, F. et al. | 2000
- 1139
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Nitride Processing and Characterization - Inductively coupled plasma-induced etch damage of GaN p-n junctionsShul, R.J. et al. | 2000
- 1144
-
Schottky diode measurements of dry etch damage in n- and p-type GaNCao, X. A. / Zhang, A. P. / Dang, G. T. / Ren, F. / Pearton, S. J. / Shul, R. J. / Zhang, L. et al. | 2000
- 1144
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Nitride Processing and Characterization - Schottky diode measurements of dry etch damage in n- and p-type GaNCao, X.A. et al. | 2000
- 1149
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Nitride Processing and Characterization - Effect of N2 discharge treatment on AlGaN-GaN high electron mobility transistor ohmic contacts using inductively coupled plasmaZhang, A.P. et al. | 2000
- 1149
-
Effect of discharge treatment on AlGaN/GaN high electron mobility transistor ohmic contacts using inductively coupled plasmaZhang, A. P. / Dang, G. T. / Ren, F. / Van Hove, J. M. / Klaassen, J. J. / Chow, P. P. / Cao, X. A. / Pearton, S. J. et al. | 2000
- 1153
-
Electronic Materials and Processing - Si Surface Chemistry and Etching, Passivation and Oxidation| 2000
- 1153
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Si Surface Chemistry and Etching, Passivation and Oxidation - Scanning tunneling microscopy study of surface morphology of Si(111) after synchrotron radiation stimulated desorption of SiO2Gao, Y. et al. | 2000
- 1153
-
Scanning tunneling microscopy study of surface morphology of Si(111) after synchrotron radiation stimulated desorption ofGao, Y. / Mekaru, H. / Miyamae, T. / Urisu, T. et al. | 2000
- 1158
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - High Dielectric Constant Materials and Thin Oxides - Investigation of titanium nitride gates for tantalum pentoxide and titanium dioxide dielectricsGilmer, D. et al. | 2000
- 1158
-
Investigation of titanium nitride gates for tantalum pentoxide and titanium dioxide dielectricsGilmer, D. / Hobbs, C. / Hegde, R. / La, L. / Adetutu, O. / Conner, J. / Tiner, M. / Prabhu, L. / Bagchi, S. / Tobin, P. et al. | 2000
- 1158
-
Electronic Materials and Processing - High Dielectric Constant Materials and Thin Oxides| 2000
- 1163
-
Separate and independent reductions in direct tunneling in oxide/nitride stacks with monolayer interface nitridation associated with the (i) interface nitridation and (ii) increased physical thicknessLucovsky, G. / Wu, Y. / Niimi, H. / Yang, H. / Keister, J. / Rowe, J. E. et al. | 2000
- 1163
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - High Dielectric Constant Materials and Thin Oxides - Separate and independent reductions in direct tunneling in oxide-nitride stacks with monolayer interface nitridation associated with the (i) interface nitridation and (ii) increased physical thicknessLucovsky, G. et al. | 2000
- 1169
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Comparison of plasma chemistries for dry etching of Ta2O5Lee, K.P. et al. | 2000
- 1169
-
Electronic Materials and Processing - Electronic Materials and Processing Poster Session| 2000
- 1169
-
Comparison of plasma chemistries for dry etching ofLee, K. P. / Jung, K. B. / Singh, R. K. / Pearton, S. J. / Hobbs, C. / Tobin, P. et al. | 2000
- 1173
-
Study of the impact of the time-delay effect on the critical dimension of a tungsten silicide/polysilicon gate after reactive ion etchingLin, Shih-Po / Ou, Chen-Hsien / Lee, Szetsen / Tien, Yu-Chung / Hsu, Chin-Fa et al. | 2000
- 1173
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Study of the impact of the time-delay effect on the critical dimension of a tungsten silicide-polysilicon gate after reactive ion etchingLin, Shih-Po et al. | 2000
- 1176
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Formation of Ni silicides on (001)Si with a thin interposing Pt layerCheng, L.W. et al. | 2000
- 1176
-
Formation of Ni silicides on (001)Si with a thin interposing Pt layerCheng, L. W. / Cheng, S. L. / Chen, L. J. / Chien, H. C. / Lee, H. L. / Pan, F. M. et al. | 2000
- 1180
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - Electronic Materials and Processing Poster Session - Silicon nanodots fabricated on a Si(100) surface via thermal nitridation and oxygen etching reactionsHa, Jeong Sook et al. | 2000
- 1180
-
Silicon nanodots fabricated on a Si(100) surface via thermal nitridation and oxygen etching reactionsHa, Jeong Sook / Park, Kang-Ho / Yun, Wan Soo et al. | 2000
- 1184
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - In Situ Monitoring and Growth - Real-time optical characterization of heteroepitaxy by organometallic chemical vapor depositionBell, K.A. et al. | 2000
- 1184
-
Electronic Materials and Processing - In Situ Monitoring and Growth| 2000
- 1184
-
Real-time optical characterization of heteroepitaxy by organometallic chemical vapor depositionBell, K. A. / Ebert, M. / Yoo, S. D. / Flock, K. / Aspnes, D. E. et al. | 2000
- 1190
-
Real-time thickness and compositional control of growth using p-polarized reflectanceWoods, V. / Dietz, N. / Ito, K. / Lauko, I. et al. | 2000
- 1190
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - In Situ Monitoring and Growth - Real-time thickness and compositional control of Ga1 - xInxP growth using p-polarized reflectanceWoods, V. et al. | 2000
- 1196
-
Deposition of polycrystalline Si and SiGe by ultra-high vacuum chemical molecular epitaxyChen, K. M. / Huang, H. J. / Chang, C. Y. / Chen, L. P. / Huang, G. W. et al. | 2000
- 1196
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing - In Situ Monitoring and Growth - Deposition of polycrystalline Si and SiGe by ultra-high vacuum chemical molecular epitaxyChen, K.M. et al. | 2000
- 1202
-
Electronic Materials and Processing I - Cu, Low-k Dielectrics and Interfaces| 2000
- 1202
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing I - Cu, Low-k Dielectrics and Interfaces - Strength of nanoscale copper under shearHeino, P. et al. | 2000
- 1202
-
Strength of nanoscale copper under shearHeino, P. / Holloway, P. / Ristolainen, E. et al. | 2000
- 1207
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing I - Cu, Low-k Dielectrics and Interfaces - Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applicationsHu, J.C. et al. | 2000
- 1207
-
Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applicationsHu, J. C. / Chang, T. C. / Wu, C. W. / Chen, L. J. / Hsiung, C. S. / Hsieh, W. Y. / Lur, W. / Yew, T. R. et al. | 2000
- 1211
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing I - Cu, Low-k Dielectrics and Interfaces - Surface modification and cleaning enhancement of TaSi(N) films with dilute hydrofluoric acidMangat, P.J.S. et al. | 2000
- 1211
-
Surface modification and cleaning enhancement of TaSi(N) films with dilute hydrofluoric acidMangat, P. J. S. / Dauksher, W. J. / Whig, R. / O’Brien, W. L. et al. | 2000
- 1216
-
Low-k Si–O–C–H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursorKim, Yoon-Hae / Lee, Seok-Kiu / Kim, Hyeong Joon et al. | 2000
- 1216
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing I - Cu, Low-k Dielectrics and Interfaces - Low-k Si-O-C-H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursorKim, Yoon-Hae et al. | 2000
- 1220
-
Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmasLee, J. W. / Devre, M. W. / Reelfs, B. H. / Johnson, D. / Sasserath, J. N. / Clayton, F. / Hays, D. / Pearton, S. J. et al. | 2000
- 1220
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing II - Dielectric Passivation-Oxides on Compound Semiconductors - Advanced selective dry etching of GaAs-AlGaAs in high density inductively coupled plasmasLee, J.W. et al. | 2000
- 1220
-
Electronic Materials and Processing II - Dielectric Passivation-Oxides on Compound Semiconductors| 2000
- 1225
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing II - Silicon Carbide and Dielectrics on Si - Characterization of plasma enhanced chemical vapor deposited SiC and its application in advanced reticle technology-scattering with angular limitation in projection electron beam lithography membraneHan, S.-I. et al. | 2000
- 1225
-
Electronic Materials and Processing II - Silicon Carbide and Dielectrics on Si| 2000
- 1225
-
Characterization of plasma enhanced chemical vapor deposited SiC and its application in advanced reticle technology–scattering with angular limitation in projection electron beam lithography membraneHan, S.-I. / Mangat, P. J. S. / Smith, S. M. / Dauksher, W. J. / Convey, D. / Gregory, R. B. et al. | 2000
- 1230
-
New approach for the fabrication of device-quality interfaces using low temperature remote plasma processingJohnson, R. S. / Niimi, H. / Lucovsky, G. et al. | 2000
- 1230
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Electronic Materials and Processing II - Silicon Carbide and Dielectrics on Si - New approach for the fabrication of device-quality Ge-GeO2-SiO2 interfaces using low temperature remote plasma processingJohnson, R.S. et al. | 2000
- 1234
-
Flat Panel Displays - Luminescent Thin Films| 2000
- 1234
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Flat Panel Displays - Luminescent Thin Films - Multicolor-emitting thin-film electroluminescent devices using Ga2O3 phosphors co-doped with Mn and CrMinami, Tadatsugu et al. | 2000
- 1234
-
Multicolor-emitting thin-film electroluminescent devices using phosphors co-doped with Mn and CrMinami, Tadatsugu / Nakatani, Toshikuni / Miyata, Toshihiro et al. | 2000
- 1239
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - New Magnetic Materials - Intrinsic and extrinsic magnetic properties of the naturally layered manganitesBerger, A. et al. | 2000
- 1239
-
Magnetic Interfaces and Nanostructures - New Magnetic Materials| 2000
- 1239
-
Intrinsic and extrinsic magnetic properties of the naturally layered manganitesBerger, A. / Mitchell, J. F. / Miller, D. J. / Jiang, J. S. / Bader, S. D. et al. | 2000
- 1247
-
Ferromagnetic semiconductor heterostructures based on (GaMn)AsTanaka, M. / Shimizu, H. / Hayashi, T. / Shimada, H. / Ando, K. et al. | 2000
- 1247
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - New Magnetic Materials - Ferromagnetic semiconductor heterostructures based on (GaMn)AsTanaka, M. et al. | 2000
- 1254
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - New Magnetic Materials - Low-temperature gaseous nitriding and subsequent oxidation of epitaxial Ni-FE bilayersMijiritskii, A.V. et al. | 2000
- 1254
-
Low-temperature gaseous nitriding and subsequent oxidation of epitaxial Ni/Fe bilayersMijiritskii, A. V. / Boerma, D. O. et al. | 2000
- 1259
-
Magnetic Interfaces and Nanostructures - Magnetic Spectroscopies| 2000
- 1259
-
Surface-sensitive, element-specific magnetometry with x-ray linear dichroismSchumann, F. O. / Willis, R. F. / Tobin, J. G. et al. | 2000
- 1259
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - Magnetic Spectroscopies - Surface-sensitive, element-specific magnetometry with x-ray linear dichroismSchumann, F.O. et al. | 2000
- 1264
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - Giant Magnetoresistance - Exchange bias in Fe-Cr double superlatticesJiang, J.S. et al. | 2000
- 1264
-
Magnetic Interfaces and Nanostructures - Giant Magnetoresistance| 2000
- 1264
-
Exchange bias in Fe/Cr double superlatticesJiang, J. S. / Felcher, G. P. / Inomata, A. / Goyette, R. / Nelson, C. S. / Bader, S. D. et al. | 2000
- 1269
-
Magnetic stability of novel exchange coupled systemsInomata, A. / Jiang, J. S. / You, C.-Y. / Pearson, J. E. / Bader, S. D. et al. | 2000
- 1269
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - Giant Magnetoresistance - Magnetic stability of novel exchange coupled systemsInomata, A. et al. | 2000
- 1273
-
Effects of ultraviolet illumination on dry etch rates of NiFe-based magnetic multilayersCho, H. / Lee, K. P. / Hahn, Y. B. / Lambers, E. S. / Pearton, S. J. et al. | 2000
- 1273
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - Giant Magnetoresistance - Effects of ultraviolet illumination on dry etch rates of NiFe-based magnetic multilayersCho, H. et al. | 2000
- 1278
-
Growth of ultrathin Co/Cu/Si(110) filmsMaat, S. / Liu, C. / Eads, W. / Umlor, M. T. / Mankey, G. J. et al. | 2000
- 1278
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Magnetic Interfaces and Nanostructures - Magnetic Thin Films - Growth of ultrathin Co-Cu-Si(110) filmsMaat, S. et al. | 2000
- 1278
-
Magnetic Interfaces and Nanostructures - Magnetic Thin Films| 2000
- 1282
-
Manufacturing Science and Technology - Ultra-Clean Society and Contamination Free Manufacturing| 2000
- 1282
-
Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back processMoriya, Tsuyoshi / Ito, Natsuko / Uesugi, Fumihiko / Hayashi, Yuji / Okamura, Koji et al. | 2000
- 1282
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Ultra-Clean Society and Contamination Free Manufacturing - Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back processMoriya, Tsuyoshi et al. | 2000
- 1287
-
Manufacturing Science and Technology - Interconnect and Integration| 2000
- 1287
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Interconnect and Integration - Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategyChemali, Chadi El et al. | 2000
- 1287
-
Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategyEl Chemali, Chadi / Moyne, James / Khan, Kareemullah / Nadeau, Rock / Smith, Paul / Colt, John / Chapple-Sokol, Jonathan / Parikh, Tarun et al. | 2000
- 1297
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Metrology I - Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch toolGarvin, Craig et al. | 2000
- 1297
-
Manufacturing Science and Technology - Metrology I| 2000
- 1297
-
Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch toolGarvin, Craig / Grizzle, J. W. et al. | 2000
- 1303
-
Real time control of plasma deposited optical filters by multiwavelength ellipsometryHeitz, T. / Hofrichter, A. / Bulkin, P. / Drevillon, B. et al. | 2000
- 1303
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Metrology I - Real time control of plasma deposited optical filters by multiwavelength ellipsometryHeitz, T. et al. | 2000
- 1308
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Manufacturing Science and Technology Poster Session - Effects of trapped charges on Hg-Schottky capacitance-voltage measurements of n-type epitaxial silicon wafersWang, Q. et al. | 2000
- 1308
-
Manufacturing Science and Technology - Manufacturing Science and Technology Poster Session| 2000
- 1308
-
Effects of trapped charges on Hg-Schottky capacitance–voltage measurements of n-type epitaxial silicon wafersWang, Q. / Liu, D. / Virgo, J. T. / Yeh, J. / Hillard, R. J. et al. | 2000
- 1313
-
Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technologySchiltz, André / Palatini, Laëtitia / Paoli, Maryse / Rivoire, Maurice / Prola, Alain et al. | 2000
- 1313
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Manufacturing Science and Technology - Manufacturing Science and Technology Poster Session - Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 mm shallow trench isolation technologySchiltz, André et al. | 2000
- 1321
-
Nanometer-Scale Science and Technology - Nanotechnology| 2000
- 1321
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanotechnology - Experimental and theoretical results of room-temperature single-electron transistor formed by the atomic force microscope nano-oxidation processGotoh, Y. et al. | 2000
- 1321
-
Experimental and theoretical results of room-temperature single-electron transistor formed by the atomic force microscope nano-oxidation processGotoh, Y. / Matsumoto, K. / Maeda, T. / Cooper, E. B. / Manalis, S. R. / Fang, H. / Minne, S. C. / Hunt, T. / Dai, H. / Harris, J. et al. | 2000
- 1326
-
Fabrication of bismuth nanowires with a silver nanocrystal shadowmaskChoi, S. H. / Wang, K. L. / Leung, M. S. / Stupian, G. W. / Presser, N. / Morgan, B. A. / Robertson, R. E. / Abraham, M. / King, E. E. / Tueling, M. B. et al. | 2000
- 1326
-
Nanometer-Scale Science and Technology - Nanopatterning| 2000
- 1326
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanopatterning - Fabrication of bismuth nanowires with a silver nanocrystal shadowmaskChoi, S.H. et al. | 2000
- 1329
-
Fabrication of metal nanowire using carbon nanotube as a maskYun, Wan Soo / Kim, Jinhee / Park, Kang-Ho / Ha, Jeong Sook / Ko, Young-Jo / Park, Kyoungwan / Kim, Seong Keun / Doh, Yong-Joo / Lee, Hu-Jong / Salvetat, Jean-Paul et al. | 2000
- 1329
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanopatterning - Fabrication of metal nanowire using carbon nanotube as a maskYun, Wan Soo et al. | 2000
- 1333
-
Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session| 2000
- 1333
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session - Fabrication of a nanosize metal aperture for a near field scanning optical microscopy sensor using photoresist removal and sputtering techniquesJung, M.Y. et al. | 2000
- 1333
-
Fabrication of a nanosize metal aperture for a near field scanning optical microscopy sensor using photoresist removal and sputtering techniquesJung, M. Y. / Lyo, I. W. / Kim, D. W. / Choi, S. S. et al. | 2000
- 1338
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology - Nanometer-Scale Science and Technology Poster Session - Nondestructive one-dimensional scanning capacitance microscope dopant profile determination method and its application to three-dimensional dopant profilesKang, Eu-Seok et al. | 2000
- 1338
-
Nondestructive one-dimensional scanning capacitance microscope dopant profile determination method and its application to three-dimensional dopant profilesKang, Eu-Seok / Kang, Jeong-Won / Hwang, Ho-Jung / Lee, Jun-Ha et al. | 2000
- 1345
-
Nanometer-Scale Science and Technology I - Nanoscale Tribology and Adhesion| 2000
- 1345
-
Scanning probe microscopy tip–sample interactions in primary alcohols of varying chain lengthRalich, R. M. / Wu, Y. / Ramsier, R. D. / Henriksen, P. N. et al. | 2000
- 1345
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology I - Nanoscale Tribology and Adhesion - Scanning probe microscopy tip-sample interactions in primary alcohols of varying chain lengthRalich, R.M. et al. | 2000
- 1349
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Nanometer-Scale Science and Technology II - Molecular Electronics - Isolating, imaging, and electrically characterizing individual organic molecules on the Si(100) surface with the scanning tunneling microscopeHersam, M.C. et al. | 2000
- 1349
-
Nanometer-Scale Science and Technology II - Molecular Electronics| 2000
- 1349
-
Isolating, imaging, and electrically characterizing individual organic molecules on the Si(100) surface with the scanning tunneling microscopeHersam, M. C. / Guisinger, N. P. / Lyding, J. W. et al. | 2000
- 1354
-
Plasma Science and Technology - Plasma Science and Technology Poster Session| 2000
- 1354
-
Etching characteristics of film with plasmaSeo, Jung-Woo / Lee, Do-Haing / Lee, Won-Jae / Yu, Byoung-Gon / Kwon, Kwang-Ho / Yeom, Geun-Young / Chang, Eui-Goo / Kim, Chang-Il et al. | 2000
- 1354
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Etching characteristics of SrBi2Ta2O9 film with Ar-CHF3 plasmaSeo, Jung-Woo et al. | 2000
- 1359
-
Optical emission studies and neutral stream characterization of a surface reflection materials processing sourceTang, Xianmin / Manos, Dennis M. et al. | 2000
- 1359
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Optical emission studies and neutral stream characterization of a surface reflection materials processing sourceTang, Xianmin et al. | 2000
- 1366
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during CH4-H2 plasma etchingRhallabi, A. et al. | 2000
- 1366
-
Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during plasma etchingRhallabi, A. / Houlet, L. / Turban, G. et al. | 2000
- 1373
-
Effects of addition on gas in inductively coupled plasmas for lead zirconate titanate etchingAn, Tae-Hyun / Park, Joon-Yong / Yeom, Geun-Young / Chang, Eui-Goo / Kim, Chang-Il et al. | 2000
- 1373
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Effects of BCl3 Addition on Ar-Cl2 gas in inductively coupled plasmas for lead zirconate titanate etchingAn, Tae-Hyun et al. | 2000
- 1377
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Roles of N2 gas in etching of platinum by inductively coupled Ar-Cl2-N2 plasmasRyu, Jae-Heung et al. | 2000
- 1377
-
Roles of gas in etching of platinum by inductively coupled plasmasRyu, Jae-Heung / Kim, Nam-Hoon / Kim, Hyeon-Soo / Yeom, Geun-Young / Chang, Eui-Goo / Kim, Chang-Il et al. | 2000
- 1381
-
Etching mechanism of films in high density plasmaKim, Seung-Bum / Lee, Yong-Hyuk / Kim, Tae-Hyung / Yeom, Geun-Young / Kim, Chang-Il et al. | 2000
- 1381
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Etching mechanism of (Ba, Sr)TiO3 films in high density Cl2-BCl3-Ar plasmaKim, Seung-Bum et al. | 2000
- 1385
-
Deceleration of silicon etch rate at high aspect ratiosKiihamäki, J. et al. | 2000
- 1385
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Deceleration of silicon etch rate at high aspect ratiosKiihamäki, J. et al. | 2000
- 1390
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Science and Technology Poster Session - Magnetized inductively coupled plasma etching of GaN in Cl2-BCl3 PlasmasLee, Y.H. et al. | 2000
- 1390
-
Magnetized inductively coupled plasma etching of GaN in plasmasLee, Y. H. / Sung, Y. J. / Yeom, G. Y. / Lee, J. W. / Kim, T. I. et al. | 2000
- 1395
-
Plasma Science and Technology - Plasma Diagnostics II| 2000
- 1395
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Plasma Diagnostics II - Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectorsMoshkalyov, S.A. et al. | 2000
- 1395
-
Diagnostic of rf discharge plasma by Thomson scattering with gated intensified charge coupled device detectorsMoshkalyov, S. A. / Thompson, C. / Morrow, T. / Graham, W. G. et al. | 2000
- 1401
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology - Dielectric Etching - Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 mm ultralarge scale integration technology and beyondKim, Jeong-Ho et al. | 2000
- 1401
-
Plasma Science and Technology - Dielectric Etching| 2000
- 1401
-
Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 μm ultralarge scale integration technology and beyondKim, Jeong-Ho / Yu, Jae-Seon / Ku, Ja-Chun / Ryu, Choon-Kun / Oh, Su-Jin / Kim, Si-Bum / Kim, Jin-Woong / Hwang, Jeong-Mo / Lee, Su-Youb / Kouichiro, Inazawa et al. | 2000
- 1411
-
Plasma Science and Technology I - High Fidelity Pattern Transfer| 2000
- 1411
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology I - High Fidelity Pattern Transfer - Transfer etching of bilayer resists in oxygen-based plasmasMahorowala, A.P. et al. | 2000
- 1411
-
Transfer etching of bilayer resists in oxygen-based plasmasMahorowala, A. P. / Babich, K. / Lin, Q. / Medeiros, D. R. / Petrillo, K. / Simons, J. / Angelopoulos, M. / Sooriyakumaran, R. / Hofer, D. / Reynolds, G. W. et al. | 2000
- 1420
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology I - High Fidelity Pattern Transfer - Integration of metal masking and etching for deep submicron patterningGabriel, Calvin T. et al. | 2000
- 1420
-
Integration of metal masking and etching for deep submicron patterningGabriel, Calvin T. / Kim, Robert Y. / Baker, Daniel C. et al. | 2000
- 1425
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology I - High Fidelity Pattern Transfer - Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memoryStojakovic, G. et al. | 2000
- 1425
-
Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memoryStojakovic, G. / Ning, X. J. et al. | 2000
- 1431
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Plasma Science and Technology II - Pulsed Plasmas - Characterization of process-induced charging damage in scaled-down devices and reliability improvement using time-modulated plasmaNoguchi, Ko et al. | 2000
- 1431
-
Plasma Science and Technology II - Pulsed Plasmas| 2000
- 1431
-
Characterization of process-induced charging damage in scaled-down devices and reliability improvement using time-modulated plasmaNoguchi, Ko / Samukawa, Seiji / Ohtake, Hiroto / Mukai, Tomonori et al. | 2000
- 1437
-
Surface Science - Surface Science Poster Session| 2000
- 1437
-
Insertion process and electrical conduction of conjugated molecules in n-alkanethiol self-assembled monolayers on Au(111)Ishida, Takao / Mizutani, Wataru / Tokumoto, Hiroshi / Choi, Nami / Akiba, Uichi / Fujihira, Masamichi et al. | 2000
- 1437
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Insertion process and electrical conduction of conjugated molecules in n-alkanethiol self-assembled monolayers on Au(111)Ishida, Takao et al. | 2000
- 1443
-
Decomposition of 1,3-butadiene on Ru(001): Evidence for a metallacycleWeiss, Michael J. / Hagedorn, Christopher J. / Weinberg, W. Henry et al. | 2000
- 1443
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Decomposition of 1,3-butadiene on Ru(001): Evidence for a (CH)4 metallacycleWeiss, Michael J. et al. | 2000
- 1448
-
Study of boron effects on the reaction of Co and at various temperaturesHuang, H. J. / Chen, K. M. / Chang, C. Y. / Huang, T. Y. / Chang, T. C. / Chen, L. P. / Huang, G. W. et al. | 2000
- 1448
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Study of boron effects on the reaction of Co and Si1 - xGex at various temperaturesHuang, H.J. et al. | 2000
- 1455
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - The adsorption and desorption of CO on the W(111) surfaceLee, S.Y. et al. | 2000
- 1455
-
The adsorption and desorption of CO on the W(111) surfaceLee, S. Y. / Kim, Y.-D. / Yang, T. S. / Boo, J.-H. / Park, S. C. / Lee, S. B. / Park, C. Y. / Kwak, H. T. et al. | 2000
- 1460
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Surface structure of MnO-Rh(100) studied by scanning tunneling microscopy and low-energy electron diffractionNishimura, H. et al. | 2000
- 1460
-
Surface structure of MnO/Rh(100) studied by scanning tunneling microscopy and low-energy electron diffractionNishimura, H. / Tashiro, T. / Fujitani, T. / Nakamura, J. et al. | 2000
- 1464
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - In situ study of the formation of SiC thin films on Si(III) surfaces with 1,3-disilabutene: Adsorption properties and initial deposition characteristicsYoon, H.G. et al. | 2000
- 1464
-
In situ study of the formation of SiC thin films on Si(111) surfaces with 1,3-disilabutane: Adsorption properties and initial deposition characteristicsYoon, H. G. / Boo, J.-H. / Liu, W. L. / Lee, S.-B. / Park, S.-C. / Kang, H. / Kim, Y. et al. | 2000
- 1469
-
Site preferences of oxygen and boron atoms during dissociative reaction of molecules onto the Si(111)-7×7 surfaceKaikoh, T. / Miyake, K. / Li, Y. J. / Morita, R. / Yamashita, M. / Shigekawa, H. et al. | 2000
- 1469
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Site preferences of oxygen and boron atoms during dissociative reaction of HBO2 molecules onto the Si(111)-7X7 surfaceKaikoh, T. et al. | 2000
- 1473
-
Cesium-induced structural transformation from the to the surfaceHwang, C. C. / An, K. S. / Kim, S. H. / Kim, Y. K. / Park, C. Y. / Kwon, S. N. / Song, H. S. / Jung, K. H. / Kinoshita, T. / Kakizaki, A. et al. | 2000
- 1473
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Cesium-induced structural transformation from the Si(113)3X2 to the 3X1 surfaceHwang, C.C. et al. | 2000
- 1478
-
Cyclic voltammetry, x-ray photoelectron spectroscopy, secondary-ion-mass spectrometry, and ion-scattering spectrometry examination of zirconium passive film breakdown in the presence of sulfateSchennach, R. / Mamun, A. / Kunamneni, N. / Cocke, D. L. et al. | 2000
- 1478
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Cyclic voltammetry, x-ray photoelectron spectroscopy, secondary-ion-mass spectrometry, and ion-scattering spectrometry examination of zirconium passive film breakdown in the presence of sulfateSchennach, R. et al. | 2000
- 1484
-
Ultrahigh vacuum compatible matrix assisted laser desorption/ionization time-of-flight mass spectrometerPorter, T. L. / Hermann, S. et al. | 2000
- 1484
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science - Surface Science Poster Session - Ultrahigh vacuum compatible matrix assisted laser desorption-ionization time-of-flight mass spectrometerPorter, T.L. et al. | 2000
- 1488
-
Surface Science I - Surface Structure| 2000
- 1488
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science I - Surface Structure - Na- and Li-induced Ge(111)3X1 reconstruction: Different electronic configurations revealed by scanning tunneling microscopy imagesLee, Geunseop et al. | 2000
- 1488
-
Na- and Li-induced Ge(111)3×1 reconstruction: Different electronic configurations revealed by scanning tunneling microscopy imagesLee, Geunseop / Kim, Jonggeol / Mai, H. / Chizhov, Ilya / Willis, R. F. et al. | 2000
- 1492
-
Reflection high-energy electron diffraction and scanning tunneling microscopy study of InP(001) surface reconstructionsLaBella, V. P. / Ding, Z. / Bullock, D. W. / Emery, C. / Thibado, P. M. et al. | 2000
- 1492
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science I - Surface Structure - Reflection high-energy electron diffraction and scanning tunneling microscopy study of InP(001) surface reconstructionsLaBella, V.P. et al. | 2000
- 1497
-
Reactions of gas-phase atomic hydrogen and deuterium with chemically modified Ir(111) surfacesHagedorn, Christopher J. / Weiss, Michael J. / Weinberg, W. Henry et al. | 2000
- 1497
-
Surface Science II - Catalysis on Metals| 2000
- 1497
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Catalysis on Metals - Reactions of gas-phase atomic hydrogen and deuterium with chemically modified Ir(111) surfacesHagedorn, Christopher J. et al. | 2000
- 1503
-
Reaction between NO and CO on rhodium (100): How lateral interactions lead to auto-accelerating kineticsHopstaken, M. J. P. / Niemantsverdriet, J. W. et al. | 2000
- 1503
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Reactions on Metals - Reaction between NO and CO on rhodium (100): How lateral interactions lead to auto-accelerating kineticsHopstaken, M.J.P. et al. | 2000
- 1503
-
Surface Science II - Reactions on Metals| 2000
- 1509
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Reactions on Metals - Coverage dependence of activation barriers: Nitrogen on Ru(0001)Diekhöner, L. et al. | 2000
- 1509
-
Coverage dependence of activation barriers: Nitrogen on Ru(0001)Diekhöner, L. / Mortensen, H. / Baurichter, A. / Luntz, A. C. et al. | 2000
- 1514
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science II - Model Catalysts - Microreactor for studies of low surface area model catalysts made by electron-beam lithographyJohansson, Stefan et al. | 2000
- 1514
-
Microreactor for studies of low surface area model catalysts made by electron-beam lithographyJohansson, Stefan / Fridell, Erik / Kasemo, Bengt et al. | 2000
- 1514
-
Surface Science II - Model Catalysts| 2000
- 1520
-
Surface Science III - Water-Surface Interactions| 2000
- 1520
-
Water adsorption structures on flat and stepped Ru(0001) surfacesHoffmann, Wolfgang / Benndorf, Carsten et al. | 2000
- 1520
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science III - Water-Surface Interactions - Water adsorption structures on flat and stepped Ru(0001) surfacesHoffmann, Wolfgang et al. | 2000
- 1526
-
Surface Science III - Diffusion on Surfaces| 2000
- 1526
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART I - Surface Science III - Diffusion on Surfaces - Monte Carlo derived diffusion parameters for Ga on the GaAs(001)-(2X4) surface: A molecular beam opitaxy-scanning tunneling microscopy studyLaBella, V.P. et al. | 2000
- 1526
-
Monte Carlo derived diffusion parameters for Ga on the GaAs(001)- surface: A molecular beam epitaxy–scanning tunneling microscopy studyLaBella, V. P. / Bullock, D. W. / Ding, Z. / Emery, C. / Harter, W. G. / Thibado, P. M. et al. | 2000
- 1532
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - CUMULATIVE AUTHOR INDEX| 2000
- 1532
-
CUMULATIVE AUTHOR INDEX| 2000
- 1533
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Ionized sputter deposition using an extremely high plasma density pulsed magnetron dischargeMacák, Karol et al. | 2000
- 1533
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Fundamentals and Applications of Ionized PVD| 2000
- 1533
-
Ionized sputter deposition using an extremely high plasma density pulsed magnetron dischargeMacák, Karol / Kouznetsov, Vladimir / Schneider, Jochen / Helmersson, Ulf / Petrov, Ivan et al. | 2000
- 1538
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Origin and evolution of sculptured thin filmsMessier, Russell et al. | 2000
- 1538
-
Origin and evolution of sculptured thin filmsMessier, Russell / Venugopal, Vijayakumar C. / Sunal, Paul D. et al. | 2000
- 1546
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallizationKlawuhn, E. et al. | 2000
- 1546
-
Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallizationKlawuhn, E. / D’Couto, G. C. / Ashtiani, K. A. / Rymer, P. / Biberger, M. A. / Levy, K. B. et al. | 2000
- 1550
-
Effects of copper seedlayer deposition method for electroplatingCooney, E. C. / Strippe, D. C. / Korejwa, J. W. et al. | 2000
- 1550
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Effects of copper seedlayer deposition method for electroplatingCooney III, E.C. et al. | 2000
- 1555
-
PART II - Thin Films - Fundamentals and Applications of Ionized PVD - Steel coating by self-induced ion plating, a new high throughput metallization ion plating techniqueBrande, P.Vanden et al. | 2000
- 1555
-
Steel coating by self-induced ion plating, a new high throughput metallization ion plating techniqueBrande, P. Vanden / Weymeersch, A. et al. | 2000
- 1561
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Thin Film Poster Session| 2000
- 1561
-
PART II - Thin Films - Thin Film Poster Session - Effect of HCl catalyst in the formation of flat structures of Ta(sub 2)O5 thin films by sol-gel techniqueCantalini, C. et al. | 2000
- 1561
-
Effect of HCl catalyst in the formation of flat structures of thin films by sol-gel techniqueCantalini, C. / Pelino, M. / Phani, R. A. / Passacantando, M. / Picozzi, P. / Santucci, S. et al. | 2000
- 1567
-
PART II - Thin Films - Thin Film Poster Session - Mechanical properties and residual stress in AIN films prepared by ion beam assisted depositionWatanabe, Yoshihisa et al. | 2000
- 1567
-
Mechanical properties and residual stress in AlN films prepared by ion beam assisted depositionWatanabe, Yoshihisa / Kitazawa, Nobuaki / Nakamura, Yoshikazu / Li, Chunliang / Sekino, Tohru / Niihara, Koichi et al. | 2000
- 1571
-
Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti, Al)N films at ambient and liquid temperaturesSeal, S. / Kale, A. / Sundaram, K. B. / Jimenez, D. et al. | 2000
- 1571
-
PART II - Thin Films - Thin Film Poster Session - Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti, Al)N films at ambient and liquid N2 temperaturesSeal, S. et al. | 2000
- 1579
-
PART II - Thin Films - Thin Film Poster Session - Improved light stability of colored Si02 coatings containing organic and metalorganic dye moleculesDiaz-Flores, L.L. et al. | 2000
- 1579
-
Improved light stability of colored coatings containing organic and metalorganic dye moleculesDı́az-Flores, L. L. / Pérez-Bueno, J. J. / Ramı́rez-Bon, R. / Espinoza-Beltrán, F. J. / Vorobiev, Y. V. / González-Hernández, J. et al. | 2000
- 1584
-
PART II - Thin Films - Thin Film Poster Session - Origin of electrical property distribution on the surface of ZnO:Al films prepared by magnetron sputteringMinami, Tadatsugu et al. | 2000
- 1584
-
Origin of electrical property distribution on the surface of ZnO:Al films prepared by magnetron sputteringMinami, Tadatsugu / Miyata, Toshihiro / Yamamoto, Takashi / Toda, Hidenobu et al. | 2000
- 1590
-
PART II - Thin Films - Thin Film Poster Session - Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor depositionBoo, Jin-Hyo et al. | 2000
- 1590
-
Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor depositionBoo, Jin-Hyo / Heo, Cheol Ho / Cho, Yong Ki / Han, Jeon-Geon et al. | 2000
- 1595
-
Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition methodJeon, Hyeongtag / Lee, June-Woo / Kim, Young-Do / Kim, Deok-Soo / Yi, Kyoung-Soo et al. | 2000
- 1595
-
PART II - Thin Films - Thin Film Poster Session - Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition methodJeon, Hyeongtag et al. | 2000
- 1599
-
PART II - Thin Films - Thin Film Poster Session - Alternative procedure for the fabrication of close-spaced sublimated CdTe solar cellsMoutinho, H.R. et al. | 2000
- 1599
-
Alternative procedure for the fabrication of close-spaced sublimated CdTe solar cellsMoutinho, H. R. / Dhere, R. G. / Ballif, C. / Al-Jassim, M. M. / Kazmerski, L. L. et al. | 2000
- 1604
-
CdS/CdTe interface analysis by transmission electron microscopyDhere, R. G. / Al-Jassim, M. M. / Yan, Y. / Jones, K. M. / Moutinho, H. R. / Gessert, T. A. / Sheldon, P. / Kazmerski, L. L. et al. | 2000
- 1604
-
PART II - Thin Films - Thin Film Poster Session - CdS-CdTe interface analysis by transmission electron microscopyDhere, R.G. et al. | 2000
- 1609
-
PART II - Thin Films - Thin Film Poster Session - Synthesis of highly oriented piezoelectric AIN films by reactive sputter depositionEngelmark, F. et al. | 2000
- 1609
-
Synthesis of highly oriented piezoelectric AlN films by reactive sputter depositionEngelmark, F. / Fucntes, G. / Katardjiev, I. V. / Harsta, A. / Smith, U. / Berg, S. et al. | 2000
- 1613
-
PART II - Thin Films - Thin Film Poster Session - Surface morphology analysis in correlation with crystallinity of CeO2(110) layers on Si(100) substratesInoue, T. et al. | 2000
- 1613
-
Surface morphology analysis in correlation with crystallinity of layers on Si(100) substratesInoue, T. / Nakamura, T. / Nihei, S. / Kamata, S. / Sakamoto, N. / Yamamoto, Y. et al. | 2000
- 1619
-
PART II - Thin Films - Thin Film Poster Session - X-ray photoelectron spectroscopy and Auger electron spectroscopy investigation on the oxidation resistance of plasma-treated copper leadframesWong, A.S.W. et al. | 2000
- 1619
-
X-ray photoelectron spectroscopy and Auger electron spectroscopy investigation on the oxidation resistance of plasma-treated copper leadframesWong, A. S. W. / Krishnan, R. Gopal / Sarkar, G. et al. | 2000
- 1632
-
PART II - Thin Films - Thin Film Poster Session - Optimization of the reflectivity of magnetron sputter deposited silver filmsVergöhl, M. et al. | 2000
- 1632
-
Optimization of the reflectivity of magnetron sputter deposited silver filmsVergöhl, M. / Malkomes, N. / Szyszka, B. / Neumann, F. / Matthée, T. / Bräuer, G. et al. | 2000
- 1638
-
PART II - Thin Films - Thin Film Poster Session - Preparation and characterization of rf-sputtered SrTiO3 thin filmsRadhakrishnan, K. et al. | 2000
- 1638
-
Preparation and characterization of rf-sputtered thin filmsRadhakrishnan, K. / Tan, C. L. / Zheng, H. Q. / Ng, G. I. et al. | 2000
- 1642
-
PART II - Thin Films - Advanced Thin Film Formation Chemistry - Organic films prepared by polymer sputteringBiederman, Hynek et al. | 2000
- 1642
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Advanced Thin Film Formation Chemistry| 2000
- 1642
-
Organic films prepared by polymer sputteringBiederman, Hynek et al. | 2000
- 1649
-
PART II - Thin Films - Fundamentals of Si and Dielectrics PVD - Preparation of Co and CoNx thin films by unbalanced radio frequency magnetron sputteringTanaka, T. et al. | 2000
- 1649
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Fundamentals of Si and Dielectrics PVD| 2000
- 1649
-
Preparation of Co and thin films by unbalanced radio frequency magnetron sputteringTanaka, T. / Kawabata, K. / Kitabatake, A. et al. | 2000
- 1653
-
Chemical vapor deposition of alpha aluminum oxide for high-temperature aerospace sensorsNiska, Raymond H. / Constant, Alan P. / Witt, Tony / Gregory, Otto J. et al. | 2000
- 1653
-
PART II - Thin Films - Fundamentals of Si and Dielectrics PVD - Chemical vapor deposition of alpha aluminum oxide for high-temperature aerospace sensorsNiska, Raymond H. et al. | 2000
- 1659
-
Phase development of radio-frequency magnetron sputter-deposited (90/10) thin filmsLee, Jeon-Kook / Park, Dongkyun / Cheong, Deok-Soo / Park, Jong-Wan / Park, Chul Soon et al. | 2000
- 1659
-
PART II - Thin Films - Fundamentals of Si and Dielectrics PVD - Phase development of radio-frequency magnetron sputter-deposited Pb(Mg1-3Nb2-3)O3-PbTiO3 (90-10) thin filmsLee, Jeon-Kook et al. | 2000
- 1663
-
Electrical properties and surface morphology of heteroepitaxial-grown tin-doped indium oxide thin films deposited by molecular-beam epitaxyTaga, Naoaki / Shigesato, Yuzo / Kamei, Masayuki et al. | 2000
- 1663
-
PART II - Thin Films - Transparent Conductive Oxides - Electrical properties and surface morphology of heteroepitaxial-grown tin-doped indium oxide thin films deposited by molecular-beam epitaxyTaga, Naoaki et al. | 2000
- 1663
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Transparent Conductive Oxides| 2000
- 1668
-
PART II - Thin Films - Transparent Conductive Oxides - Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputteringMeng, Li-Jian et al. | 2000
- 1668
-
Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputteringMeng, Li-Jian / dos Santos, M. P. et al. | 2000
- 1672
-
p-type transparent conducting thin films prepared by reactive electron beam evaporation techniqueAsbalter, J. / Subrahmanyam, A. et al. | 2000
- 1672
-
PART II - Thin Films - Transparent Conductive Oxides - p-type transparent conducting In2O3-Ag2O thin films prepared by reactive electron beam evaporation techniqueAsbalter, J. et al. | 2000
- 1677
-
PART II - Thin Films - Transparent Conductive Oxides - Mott-Schottky analysis of thin ZnO filmsWindisch Jr, Charles F. et al. | 2000
- 1677
-
Mott–Schottky analysis of thin ZnO filmsWindisch, Charles F. / Exarhos, Gregory J. et al. | 2000
- 1681
-
Structural determination of wear debris generated from sliding wear tests on ceramic coatings using Raman microscopyConstable, C. P. / Yarwood, J. / Hovsepian, P. / Donohue, L. A. / Lewis, D. B. / Münz, W.-D. et al. | 2000
- 1681
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - Ex-Situ Characterization| 2000
- 1681
-
PART II - Thin Films - Ex-Situ Characterization - Structural determination of wear debris generated from sliding wear tests on ceramic coatings using Raman microscopyConstable, C.P. et al. | 2000
- 1690
-
PART II - Thin Films - Ex-Situ Characterization - Effect of rapid thermal annealing temperature on the formation of CoSi studied by x-ray photoelectron spectroscopy and micro-Raman spectroscopyZhao, Jin et al. | 2000
- 1690
-
Effect of rapid thermal annealing temperature on the formation of CoSi studied by x-ray photoelectron spectroscopy and micro-Raman spectroscopyZhao, Jin / Ballast, Lynette K. / Hossain, Tim Z. / Trostel, Rebecca E. / Bridgman, William C. et al. | 2000
- 1694
-
Temperature dependence of structure and electrical properties of germanium–antimony–tellurium thin filmGonzález-Hernández, J. / Prokhorov, E. / Vorobiev, Yu. et al. | 2000
- 1694
-
PART II - Thin Films - Ex-Situ Characterization - Temperature dependence of structure and electrical properties of germanium-antimony-tellurium thin filmGonzález-Hernández, J. et al. | 2000
- 1701
-
In-situ characterization of thin films by the focused ion beamChoi, S. H. / Li, R. / Pak, M. / Wang, K. L. / Leung, M. S. / Stupian, G. W. / Presser, N. et al. | 2000
- 1701
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Thin Films - In-Situ Characterization and Material Process Imaging| 2000
- 1701
-
PART II - Thin Films - In-Situ Characterization and Material Process Imaging - In-situ characterization of thin films by the focused ion beamChoi, S.H. et al. | 2000
- 1704
-
PART II - Thin Films - In-Situ Characterization and Material Process Imaging - Integrated measurement of Ti and TiN thickness and optical constants using reflectance data through a vacuum chamber windowTabet, Milad F. et al. | 2000
- 1704
-
Integrated measurement of Ti and TiN thickness and optical constants using reflectance data through a vacuum chamber windowTabet, Milad F. / Kelkar, Umesh / McGahan, William A. et al. | 2000
- 1709
-
Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnosticsVergöhl, M. / Hunsche, B. / Malkomes, N. / Matthée, T. / Szyszka, B. et al. | 2000
- 1709
-
PART II - Thin Films - In-Situ Characterization and Material Process Imaging - Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnosticsVergöhl, M. et al. | 2000
- 1713
-
PART II - Vacuum Metallurgy - Vacuum Metallurgy Poster Session - Growth of SiC thin films on graphite for oxidation-protective coatingBoo, J.-H. et al. | 2000
- 1713
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Metallurgy - Vacuum Metallurgy Poster Session| 2000
- 1713
-
Growth of SiC thin films on graphite for oxidation-protective coatingBoo, J.-H. / Kim, M. C. / Lee, S.-B. / Park, S.-J. / Han, J.-G. et al. | 2000
- 1718
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Metallurgy - Advanced Surface Treatments and Coatings| 2000
- 1718
-
PART II - Vacuum Metallurgy - Advanced Surface Treatments and Coatings - Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc-unbalanced magnetron deposition systemSchönjahn, C. et al. | 2000
- 1718
-
Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc/unbalanced magnetron deposition systemSchönjahn, C. / Donohue, L. A. / Lewis, D. B. / Münz, W.-D. / Twesten, R. D. / Petrov, I. et al. | 2000
- 1724
-
PART II - Vacuum Technology - Total and Partial Pressure Gauging - Compact wide-range cold-cathode gaugesKendall, B.R.F. et al. | 2000
- 1724
-
Compact wide-range cold-cathode gaugesKendall, B. R. F. / Drubetsky, E. et al. | 2000
- 1724
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Total and Partial Pressure Gauging| 2000
- 1730
-
PART II - Vacuum Technology - Total and Partial Pressure Gauging - New enhanced performance low-pressure capacitance manometerGrudzien, C.P. et al. | 2000
- 1730
-
New enhanced performance low-pressure capacitance manometerGrudzien, C. P. / Lischer, D. J. et al. | 2000
- 1736
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Vacuum Contributions to the Semiconductor Industry (1950-1975)| 2000
- 1736
-
PART II - Vacuum Technology - Vacuum Contributions to the Semiconductor Industry (1950-1975) - Evolution of integrated-circuit vacuum processes: 1959-1975Waits, Robert K. et al. | 2000
- 1736
-
Evolution of integrated-circuit vacuum processes: 1959–1975Waits, Robert K. et al. | 2000
- 1746
-
PART II - Vacuum Technology - Vacuum Contributions to the Semiconductor Industry (1950-1975) - History of industrial and commercial ion implantation 1906-1978Yarling, C.B. et al. | 2000
- 1746
-
History of industrial and commercial ion implantation 1906–1978Yarling, C. B. et al. | 2000
- 1751
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Application of porcelain enamel as an ultra-high-vacuum-compatible electrical insulatorBiscardi, C. et al. | 2000
- 1751
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Vacuum Technology Poster Session| 2000
- 1751
-
Application of porcelain enamel as an ultra-high-vacuum-compatible electrical insulatorBiscardi, C. / Hseuh, H. / Mapes, M. et al. | 2000
- 1755
-
Fundamental functions of a new type of leak detector using oxygen-ion conductorTatenuma, K. / Noguchi, T. / Uchida, K. / Saeki, H. / Ando, A. / Momose, T. et al. | 2000
- 1755
-
PART II - Vacuum Technology - Vacuum Technology Poster Session - Fundamental functions of a new type of leak detector using oxygen-ion conductorTatenuma, K. et al. | 2000
- 1758
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Review of pumping by thermal molecular pressureHobson, J.P. et al. | 2000
- 1758
-
Review of pumping by thermal molecular pressureHobson, J. P. / Salzman, D. B. et al. | 2000
- 1758
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Vacuum Pumping Systems| 2000
- 1766
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Inner pressure measurement of turbo molecular pumpCheng, H.-P. et al. | 2000
- 1766
-
Inner pressure measurement of turbo molecular pumpCheng, H.-P. / Jou, R.-Y. / Lin, J.-C. / Chen, C.-J. / Huang, W.-H. et al. | 2000
- 1772
-
Measurement of axial pressure distribution on a rotor of a helical grooved molecular drag pumpSawada, T. / Sugiyama, W. / Takano, K. et al. | 2000
- 1772
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Measurement of axial pressure distribution on a rotor of a helical grooved molecular drag pumpSawada, T. et al. | 2000
- 1777
-
PART II - Vacuum Technology - Vacuum Pumping Systems - Dry vacuum pumps for semiconductor processes: Guidelines for primary pump selectionLessard, Philip A. et al. | 2000
- 1777
-
Dry vacuum pumps for semiconductor processes: Guidelines for primary pump selectionLessard, Philip A. et al. | 2000
- 1782
-
PART II - Vacuum Technology - Dry Pumping Systems - Dry vacuum pumps: A method for the evaluation of the degree of dryDavis, R.P. et al. | 2000
- 1782
-
Dry vacuum pumps: A method for the evaluation of the degree of dryDavis, R. P. / Abreu, R. A. / Chew, A. D. et al. | 2000
- 1782
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Dry Pumping Systems| 2000
- 1789
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers| 2000
- 1789
-
PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers - Experiments with a thin-walled stainless-steel vacuum chamberNemanic, Vincenc et al. | 2000
- 1789
-
Experiments with a thin-walled stainless-steel vacuum chamberNemanič, Vincenc / Šetina, Janez et al. | 2000
- 1794
-
PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers - Laser Interferometer Gravitational-Wave Observatory beam tube component and module leak testingCarpenter, W.A. et al. | 2000
- 1794
-
Laser Interferometer Gravitational-Wave Observatory beam tube component and module leak testingCarpenter, W. A. / Shaw, P. B. / Jones, L. / Weiss, R. et al. | 2000
- 1800
-
Decay rate of photoresist outgassing from ion implantationPerel, A. S. / Horsky, T. N. et al. | 2000
- 1800
-
PART II - Vacuum Technology - Outgassing, Leaks, and Mass Flow Controllers - Decay rate of photoresist outgassing from ion implantationPerel, A.S. et al. | 2000
- 1804
-
PART II - Applied Surface Science-Magnetic Interfaces and Nanostructures-Vacuum Metallurgy - Magnetic Recording: Chemical Integration and Tribology - Evolution of the corrosion process on thin-film mediaYing, JiFeng et al. | 2000
- 1804
-
Evolution of the corrosion process on thin-film mediaYing, JiFeng / Anoikin, Tatiana / Martner, Cecilia et al. | 2000
- 1804
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Applied Surface Science-Magnetic Interfaces and Nanostructures-Vacuum Metallurgy - Magnetic Recording: Chemical Integration and Tribology| 2000
- 1809
-
Tribochemistry of monodispersed ZDOL with hydrogenated carbon overcoatsChen, Chao-Yuan / Bogy, David B. / Bhatia, C. Singh et al. | 2000
- 1809
-
PART II - Applied Surface Science-Magnetic Interfaces and Nanostructures-Vacuum Metallurgy - Magnetic Recording: Chemical Integration and Tribology - Tribochemistry of monodispersed ZDOL with hydrogenated carbon overcoatsChen, Chao-Yuan et al. | 2000
- 1818
-
PART II - Flat Panel Displays-Vacuum Technology - Field Emission Displays and Vacuum Packaging Issues - New field-emission device with improved vacuum featuresMammana, V.P. et al. | 2000
- 1818
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Flat Panel Displays-Vacuum Technology - Field Emission Displays and Vacuum Packaging Issues| 2000
- 1818
-
New field-emission device with improved vacuum featuresMammana, V. P. / Degasperi, F. T. / Monteiro, O. R. / Vuolo, J. H. / Salvadori, M. C. / Brown, I. G. et al. | 2000
- 1823
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Flat Panel Displays-Organic Electronic Materials-Electronic Materials and Processing - Thin Film Transistor Materials and Devices| 2000
- 1823
-
Excimer laser processing for a-Si and poly-Si thin film transistors for imager applicationsLu, J. P. / Mei, P. / Fulks, R. T. / Rahn, J. / Ho, J. / Wang, Y. / Boyce, J. B. / Street, R. A. et al. | 2000
- 1823
-
PART II - Flat Panel Display-Organic Electronic Materials-Electronic Materials and Processing - Thin Film Transistor Materials and Devices - Excimer laser processing for a-Si and poly-Si thin film transistors for imager applicationsLu, J.P. et al. | 2000
- 1830
-
PART II - Magnetic Interfaces and Nanostructures-Electronic Materials and Processing - Spin-Dependent Tunneling and Transport - Pinhole decoration in magnetic tunnel junctionsAllen, D. et al. | 2000
- 1830
-
Pinhole decoration in magnetic tunnel junctionsAllen, D. / Schad, R. / Zangari, G. / Zana, I. / Yang, D. / Tondra, M. C. / Wang, D. et al. | 2000
- 1830
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Magnetic Interfaces and Nanostructures-Electronic Materials and Processing - Spin-Dependent Tunneling and Transport| 2000
- 1834
-
PART II - Magnetic Interfaces and Nanostructures-Electronic Materials and Processing - Spin-Dependent Tunneling and Transport - Characterization and analysis of a novel hybrid magnetoelectronic device for magnetic field sensingSchaadt, D.M. et al. | 2000
- 1834
-
Characterization and analysis of a novel hybrid magnetoelectronic device for magnetic field sensingSchaadt, D. M. / Yu, E. T. / Sankar, S. / Berkowitz, A. E. et al. | 2000
- 1838
-
PART II - Magnetic Interfaces and Nanostructures-Nanometer-Scale Science and Technology - Patterned or Self-Assembled Magnetic Nanostructures - Periodic magnetic microstructures by glancing angle depositionDick, B. et al. | 2000
- 1838
-
Periodic magnetic microstructures by glancing angle depositionDick, B. / Brett, M. J. / Smy, T. J. / Freeman, M. R. / Malac, M. / Egerton, R. F. et al. | 2000
- 1838
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Magnetic Interfaces and Nanostructures-Nanometer-Scale Science and Technology - Patterned or Self-Assembled Magnetic Nanostructures| 2000
- 1845
-
PART II - Magnetic Interfaces and Nanostructures-Nanometer-Scale Science and Technology - Patterned or Self-Assembled Magnetic Nanostructures - Variable temperature and ex situ spin-polarized low-energy electron microscopeTober, E.D. et al. | 2000
- 1845
-
Variable temperature and ex situ spin-polarized low-energy electron microscopeTober, E. D. / Witte, G. / Poppa, H. et al. | 2000
- 1848
-
Cryogenic etching of deep narrow trenches in siliconAachboun, S. / Ranson, P. / Hilbert, C. / Boufnichel, M. et al. | 2000
- 1848
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Micro-Electro-Mechanical Systems-Magnetic Interfaces and Nanostructures - Processing and Integration Technology| 2000
- 1848
-
PART II - Micro-Electro-Mechanical Systems-Magnetic Interfaces and Nanostructures - Processing and Integration Technology - Cryogenic etching of deep narrow trenches in siliconAachboun, S. et al. | 2000
- 1853
-
Polycrystalline silicon thin films with hydrofluoric acid permeability for underlying oxide etching and vacuum encapsulationKageyama, Y. / Tsuchiya, T. / Funabashi, H. / Sakata, J. et al. | 2000
- 1853
-
PART II - Micro-Electro-Mechanical Systems-Magnetic Interfaces and Nanostructures - Processing and Integration Technology - Polycrystalline silicon thin films with hydrofluoric acid permeability for underlying oxide etching and vacuum encapsulationKageyama, Y. et al. | 2000
- 1859
-
Etching of organic low dielectric constant material SiLK™ on the Lam Research Corporation 4520XLE™Janowiak, C. / Ellingboe, S. / Morey, I. et al. | 2000
- 1859
-
PART II - Manufacturing Science and Technology-Plasma Science and Technology - Diagnostics and Processes in Etching - Etching of organic low dielectric constant material SiLKTM on the Lam Research Corporation 4520XLETMJanowiak, C. et al. | 2000
- 1859
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Manufacturing Science and Technology-Plasma Science and Technology - Diagnostics and Processes in Etching| 2000
- 1864
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology Poster Session| 2000
- 1864
-
PART II - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology - Emerging Opportunities and Issues in Nanotubes and Nanoelectrics-Nanometer-Scale Science and Technology-Electronic Materials and Processing-Manufacturing Science and Technology Poster Session - Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperatureChoi, Young Chul et al. | 2000
- 1864
-
Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperatureChoi, Young Chul / Bae, Dong Jae / Lee, Young Hee / Lee, Byung Soo / Park, Gyeong-Su / Choi, Won Bong / Lee, Nae Sung / Kim, Jong Min et al. | 2000
- 1869
-
PART II - Organic Electronic Materials-Electronic Materials and Processing-Applied Surface Science - Organic Thin Film Growth - Influence of copper phthalocynanine on the charge injection and growth modes for organic light emitting diodesForsythe, E.W. et al. | 2000
- 1869
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Organic Electronic Materials-Electronic Materials and Processing-Applied Surface Science - Organic Thin Film Growth| 2000
- 1869
-
Influence of copper phthalocynanine on the charge injection and growth modes for organic light emitting diodesForsythe, E. W. / Abkowitz, M. A. / Gao, Yongli / Tang, C. W. et al. | 2000
- 1875
-
PART II - Organic Electronic Materials-Electronic Materials and Processing-Applied Surface Science - Organic Thin Film Growth - Growth and characterization of poly(arylamine) thin films prepared by vapor depositionSzulczewski, G.J. et al. | 2000
- 1875
-
Growth and characterization of poly(arylamine) thin films prepared by vapor depositionSzulczewski, G. J. / Selby, T. D. / Kim, K.-Y. / Hassenzahl, J. D. / Blackstock, S. C. et al. | 2000
- 1881
-
PART II - Plasma Science and Technology-Surface Science - Ion-Surface Interactions II - Desorption species from fluorocarbon film by Ar+ ion beam bombardmentHayashi, M. et al. | 2000
- 1881
-
Desorption species from fluorocarbon film by ion beam bombardmentHayashi, M. / Karahashi, K. et al. | 2000
- 1881
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Plasma Science and Technology-Surface Science - Ion-Surface Interactions II| 2000
- 1887
-
PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY - PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides| 2000
- 1887
-
Reactions of maleic anhydride over (001) single crystal surfacesWilson, J. N. / Titheridge, D. J. / Kieu, L. / Idriss, H. et al. | 2000
- 1887
-
PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Reactions of maleic anhydride over TiO2 (001) single crystal surfacesWilson, J.N. et al. | 2000
- 1893
-
Interaction of HCOOH with stoichiometric and reduced surfacesWang, Li-Qiong / Ferris, K. F. / Herman, G. S. / Engelhard, M. H. et al. | 2000
- 1893
-
PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Interaction of HCOOH with stoichiometric and reduced SrTiO 3)(100) surfacesWang, Li-Qiong et al. | 2000
- 1900
-
PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Reactions of acetic acid on UO2(111) single crystal surfacesChong, S.V. et al. | 2000
- 1900
-
Reactions of acetic acid on single crystal surfacesChong, S. V. / Idriss, H. et al. | 2000
- 1906
-
PART II - Surface Science I-Electronic Materials and Processing - Chemistry on Oxides - Surface reduction of Cr-V2O3 by COToledano, David S. et al. | 2000
- 1906
-
Surface reduction of by COToledano, David S. / Henrich, Victor E. / Metcalf, Patricia et al. | 2000
- 1915
-
Optimized structural properties of wurtzite GaN on SiC(0001) grown by molecular beam epitaxyRamachandran, V. / Feenstra, R. M. / Sarney, W. L. / Salamanca-Riba, L. / Greve, D. W. et al. | 2000
- 1915
-
PART II - Surface Science I-Electronic Materials and Processing - Nitrides and Compound Semiconductors - Optimized structural properties of wurtzite GaN on SiC(0001) grown by molecular beam epitaxyRamachandran, V. et al. | 2000