In situ bio-functionalization and cell adhesion in microfluidic devices (English)
- New search for: Zhang, Z.L.
- New search for: Crozatier, C.
- New search for: Le Berre, M.
- New search for: Chen, Y.
- New search for: Zhang, Z.L.
- New search for: Crozatier, C.
- New search for: Le Berre, M.
- New search for: Chen, Y.
In:
Microelectronic Engineering
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78-79
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556-562
;
2005
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ISSN:
- Article (Journal) / Electronic Resource
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Title:In situ bio-functionalization and cell adhesion in microfluidic devices
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Contributors:
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Published in:Microelectronic Engineering ; 78-79 ; 556-562
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Publisher:
- New search for: Elsevier B.V.
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Publication date:2005-01-01
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Size:7 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 78-79
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2
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Determining the impact of statistical fluctuations on resist line edge roughnessLeunissen, L.H.A. / Ercken, M. / Patsis, G.P. et al. | 2004
- 11
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Focused ion beam lithography for two dimensional array structures for photonic applicationsCabrini, S. / Carpentiero, A. / Kumar, R. / Businaro, L. / Candeloro, P. / Prasciolu, M. / Gosparini, A. / Andreani, C. / De Vittorio, M. / Stomeo, T. et al. | 2005
- 16
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Critical dimension adapted alignment for EBDWWeidenmueller, U. / Hahmann, P. / Pain, L. / Jurdit, M. / Henry, D. / Laplanche, Y. / Manakli, S. / Todeschini, J. et al. | 2005
- 22
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A new and simple probe-based method for preventing charging in focused-ion-beam micro-samplingFukuda, Muneyuki / Tomimatsu, Satoshi / Shichi, Hiroyasu / Umemura, Kaoru et al. | 2005
- 29
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Gas-assisted etching of niobium with focused ion beamFu, X.L. / Li, P.G. / Jin, A.Z. / Chen, L.M. / Yang, H.F. / Li, L.H. / Tang, W.H. / Cui, Z. et al. | 2005
- 34
-
New method to correct eddy current in magnetic focusing-deflection systemLiu, Zhuming / Gu, Wenqi et al. | 2005
- 39
-
The mechanism of the ion beam inhibited etching formation in Gallium-FIB implanted resist filmsArshak, Khalil / Mihov, Miroslav / Nakahara, Shohei / Arshak, Arous / McDonagh, Declan et al. | 2005
- 47
-
UVIII for combined e-beam and optical exposure hybrid lithographyYasin, Shazia / Khalid, M.N. / Zhang, Y. / Hasko, D.G. et al. | 2004
- 51
-
Design aspects for the fabrication of gratings for DFB-lasers by direct write electron-beam lithographySteingrüber, R. / Möhrle, M. et al. | 2005
- 55
-
Arrayed microcolumn operation with a wafer-scale Einzel lensKim, Ho-Seob / Kim, Dae-Wook / Ahn, Seungjoon / Kim, Young Chul / Cho, Jaewon / Choi, Sang-Kook / Kim, Dae-Yong et al. | 2005
- 62
-
Manufacturable MEMS microcolumnSaini, R. / Jandric, Z. / Tsui, K. / Udeshi, T. / Tuggle, D. et al. | 2004
- 73
-
Topside release of atomic force microscopy probes with molded diamond tipsFouchier, M. / Eyben, P. / Jamieson, G. / Vandervorst, W. et al. | 2005
- 79
-
Fabrication of refractive X-ray focusing lenses by deep X-ray lithographyPérennès, F. / Matteucci, M. / Jark, W. / Marmiroli, B. et al. | 2004
- 88
-
Dry release of all-polymer structuresHaefliger, D. / Nordström, M. / Rasmussen, P.A. / Boisen, A. et al. | 2004
- 93
-
Electrocapillary force actuation of microfluidic elementsBerre, M. Le / Chen, Y. / Crozatier, C. / Zhang, Z.L. et al. | 2004
- 100
-
Microfabricated textured surfaces for super-hydrophobicity investigationsCallies, Mathilde / Chen, Yong / Marty, Frédéric / Pépin, Anne / Quéré, David et al. | 2005
- 106
-
Dry release fabrication and testing of SiC electrostatic cantilever actuatorsJiang, Liudi / Hassan, M. / Cheung, R. / Harris, A.J. / Burdess, J.S. / Zorman, C.A. / Mehregany, M. et al. | 2004
- 112
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Characterization of pneumatically activated microvalves by measuring electrical conductanceGalas, J.-C. / Studer, V. / Chen, Y. et al. | 2004
- 118
-
Polymeric film characterization for use in bimorph chemical sensorsChatzandroulis, S. / Goustouridis, D. / Raptis, I. et al. | 2005
- 125
-
Laser trapping and micro-manipulation using optical vorticesCojoc, D. / Garbin, V. / Ferrari, E. / Businaro, L. / Romanato, F. / Fabrizio, E. Di et al. | 2004
- 132
-
Glass valveless micropump using electromagnetic actuationYamahata, Christophe / Lacharme, Frédéric / Gijs, Martin A.M. et al. | 2004
- 138
-
Particle filters integrated inside a silicon waferVenstra, W.J. / Pham, N.P. / Sarro, P.M. / van Eijk, J. et al. | 2004
- 142
-
Fabrication error model and near field beam modulation analysis for phase step diffractive gratingsGao, Fuhua / Cheng, Ying / Tang, Xionggui / Yao, Jun / Qiu, Chuankai / Guo, Yongkang et al. | 2005
- 147
-
A systematic study of dry etch process for profile control of silicon tipsTao, Jiarui / Chen, Yifang / Malik, Adnan / Wang, Ling / Zhao, Xingzhong / Li, Hongwei / Cui, Zheng et al. | 2004
- 152
-
Investigation of the bond strength between the photo-sensitive polymer SU-8 and goldNordström, Maria / Johansson, Alicia / Noguerón, Encarnacion Sánchez / Clausen, Bjarne / Calleja, Montserrat / Boisen, Anja et al. | 2004
- 158
-
Development of the new thermal inkjet head on SOI waferBae, Ki Deok / Baek, Seog Soon / Lim, Hyung Taek / Kuk, Keon / Ro, Kwang Choon et al. | 2005
- 164
-
Monolithically integrated micro flow sensor for lab-on-chip applicationsSchöler, L. / Lange, B. / Seibel, K. / Schäfer, H. / Walder, M. / Friedrich, N. / Ehrhardt, D. / Schönfeld, F. / Zech, G. / Böhm, M. et al. | 2004
- 171
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Design, fabrication and characterization of force sensors for nanorobotDomanski, K. / Janus, P. / Grabiec, P. / Perez, R. / Chaillet, N. / Fahlbusch, S. / Sill, A. / Fatikow, S. et al. | 2004
- 178
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SnO2 sub-micron wires for gas sensorsCandeloro, P. / Carpentiero, A. / Cabrini, S. / Di Fabrizio, E. / Comini, E. / Baratto, C. / Faglia, G. / Sberveglieri, G. / Gerardino, A. et al. | 2005
- 185
-
A coupled cavity micro-fluidic dye ring laserGersborg-Hansen, M. / Balslev, S. / Mortensen, N.A. / Kristensen, A. et al. | 2004
- 190
-
Novel resonant cantilever mass change detection and resonant frequency tuningGrigorov, A.V. / Boisen, A. et al. | 2004
- 195
-
Geometry dependence of the energy levels in silicon isolated double quantum-dotsTanner, M.G. / Emiroglu, E.G. / Hasko, D.G. / Williams, D.A. et al. | 2005
- 201
-
Magnetic nanowires patterned in the La2/3Sr1/3MnO3 half-metalArnal, T. / Soulimane, R. / Aassime, A. / Bibes, M. / Lecoeur, Ph. / Haghiri-Gosnet, A.M. / Mercey, B. / Khvalkovskii, A.V. / Zvezdin, A.K. / Zvezdin, K.A. et al. | 2004
- 206
-
Electron beam lithography for nanometer-scale planar double-gate transistorsWeber, W. / Ilicali, G. / Kretz, J. / Dreeskornfeld, L. / Rösner, W. / Hansch, W. / Risch, L. et al. | 2004
- 212
-
Highly selective etch process for silicon-on-insulator nano-devicesWahlbrink, T. / Mollenhauer, T. / Georgiev, Y.M. / Henschel, W. / Efavi, J.K. / Gottlob, H.D.B. / Lemme, M.C. / Kurz, H. / Niehusmann, J. / Bolivar, P. Haring et al. | 2005
- 218
-
Double-island single-electron transistor operated at radio-frequency for sensitive and fast charge detectionBrenner, R. / Buehler, T.M. / Reilly, D.J. et al. | 2005
- 224
-
Fabrication of ultra-thin-film SOI transistors using the recessed channel conceptDreeskornfeld, L. / Hartwich, J. / Hofmann, F. / Kretz, J. / Landgraf, E. / Luyken, R.J. / Rösner, W. / Schröter, R. / Schulz, T. / Specht, M. et al. | 2004
- 229
-
Photovoltaic In0.5Ga0.5As/GaAs quantum dot infrared photodetector with a single-sided Al0.3Ga0.7As layerHwang, S.H. / Shin, J.C. / Song, J.D. / Choi, W.J. / Lee, J.I. / Han, H. / Lee, S.-W. et al. | 2004
- 233
-
Surface mass spectrometric analysis of SiCl4/SiF4/O2 dry etch gate recessed 120nm T-gate GaAs pHEMTsLi, X. / Elgaid, K. / McLelland, H. / Thayne, I.G. et al. | 2004
- 239
-
A hybrid CMOS–SET co-fabrication platform using nano-grain polysilicon wiresEcoffey, S. / Pott, V. / Mahapatra, S. / Bouvet, D. / Fazan, P. / Ionescu, A.M. et al. | 2004
- 244
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A Si/SiGe MOSFET utilizing low-temperature wafer bondingKoliopoulou, S. / Dimitrakis, P. / Goustouridis, D. / Chatzandroulis, S. / Normand, P. / Tsoukalas, D. / Radamson, H. et al. | 2004
- 248
-
Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogapsAnderson, M.E. / Srinivasan, Charan / Jayaraman, Raviprakesh / Weiss, P.S. / Horn, M.W. et al. | 2005
- 253
-
Maskless fabrication of nanoelectrode structures with nanogaps by using Ga focused ion beamsNagase, Takashi / Gamo, Kenji / Kubota, Tohru / Mashiko, Shinro et al. | 2004
- 260
-
Fabrication of patterned magnetic nanodots by laser interference lithographyMurillo, R. / van Wolferen, H.A. / Abelmann, L. / Lodder, J.C. et al. | 2005
- 266
-
Exploration of the ultimate patterning potential achievable with focused ion beamsGierak, J. / Bourhis, E. / Mérat Combes, M.N. / Chriqui, Y. / Sagnes, I. / Mailly, D. / Hawkes, P. / Jede, R. / Bruchhaus, L. / Bardotti, L. et al. | 2005
- 279
-
Single atom Si nanoelectronics using controlled single-ion implantationMitic, M. / Andresen, S.E. / Yang, C. / Hopf, T. / Chan, V. / Gauja, E. / Hudson, F.E. / Buehler, T.M. / Brenner, R. / Ferguson, A.J. et al. | 2005
- 287
-
Antireflection sub-wavelength gratings fabricated by spin-coating replicationKanamori, Y. / Roy, E. / Chen, Y. et al. | 2005
- 294
-
Selective deposition of gold nanoparticles on SiO2/Si nanowireSheu, J.T. / Chen, C.C. / Huang, P.C. / Hsu, M.L. et al. | 2005
- 300
-
Characterization of focused electron beam induced carbon deposits from organic precursorsBret, Tristan / Mauron, Sebastien / Utke, Ivo / Hoffmann, Patrik et al. | 2005
- 307
-
Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructuresBret, Tristan / Utke, Ivo / Hoffmann, Patrik et al. | 2005
- 314
-
Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etchingAhn, Seh-Won / Lee, Ki-Dong / Kim, Jin-Sung / Kim, Sang Hoon / Lee, Sarng H. / Park, Joo-Do / Yoon, Phil-Won et al. | 2005
- 319
-
New salicidation technology PtSi for strained SiGe deviceRong, B. / Zijlstra, T. / Tang, Y.T. / Evans, A.G.R. et al. | 2005
- 324
-
Adsorbed layer etching of fused silica by excimer laser with nanometer depth precisionZimmer, K. / Böhme, R. / Rauschenbach, B. et al. | 2005
- 331
-
Micro- and nanoxerography in liquids – controlling pattern definitionNaujoks, N. / Stemmer, A. et al. | 2005
- 338
-
Silicon nanowires fabricated by means of an underetching techniqueCiucci, S. / D’Angelo, F. / Diligenti, A. / Pellegrini, B. / Pennelli, G. / Piotto, M. et al. | 2005
- 343
-
A single-step process for making nanofluidic channels using electron beam lithographyPearson, J.L. / Cumming, D.R.S. et al. | 2005
- 349
-
Ordered quantum dots formation on engineered template by molecular beam epitaxySuraprapapich, Suwaree / Kanjanachuchai, Songphol / Thainoi, Supachok / Panyakeow, Somsak et al. | 2005
- 353
-
A novel method for making high aspect ratio solid diamond tipsWang, Zongli / Gu, Changzhi / Li, Junjie / Cui, Zheng et al. | 2005
- 359
-
Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography techniqueKuwahara, M. / Kim, J.H. / Fons, P. / Tominaga, J. et al. | 2005
- 364
-
A continuously tunable organic DFB laserWang, J. / Weimann, Th. / Hinze, P. / Ade, G. / Schneider, D. / Rabe, T. / Riedl, T. / Kowalsky, W. et al. | 2005
- 369
-
Nanoscaled niobium trilayer technology, using temperature controlled pattern transferZijlstra, T. / Kroug, M. / Rong, B. / Klapwijk, T.M. et al. | 2005
- 374
-
Building and testing submicrometer metallic (gold) air-bridges for nanotransport applicationsBorzenko, T. / Hock, V. / Supp, D. / Gould, C. / Schmidt, G. / Molenkamp, L.W. et al. | 2005
- 381
-
Maskless lithographyPease, R. Fabian et al. | 2005
- 393
-
Line end shortening in CPL mask technologyConley, Will / Kuijten, Jan Pieter / Verhappen, Arjan / van de Goor, Stefan / Litt, Lloyd / Wu, Wei / Lucas, Kevin / Roman, Bernie / Kasprowicz, Bryan / Progler, Chris et al. | 2005
- 398
-
Phase shifted addressing using a spatial light modulatorLjungblad, Ulric / Martinsson, Hans / Sandström, Torbjörn et al. | 2005
- 404
-
Evaluation of intrinsic film stress distributions from induced substrate deformationEngelstad, R.L. / Feng, Z. / Lovell, E.G. / Mikkelson, A.R. / Sohn, J. et al. | 2005
- 410
-
Space-invariant multiple-beam achromatic EUV interference lithographySolak, Harun H. et al. | 2005
- 417
-
Rapid prototyping of two-dimensional photonic crystal devices by a dual beam focused ion beam systemStomeo, T. / Visimberga, G. / Todaro, M.T. / Passaseo, A. / Cingolani, R. / De Vittorio, M. / Cabrini, S. / Carpentiero, A. / Di Fabrizio, E. et al. | 2005
- 422
-
Fabrication of photonic crystals in tantalum pentoxide filmsHuebner, Uwe / Boucher, R. / Morgenroth, W. / Kunert, J. / Roth, H. / Meyer, H.-G. / Glaser, T. / Schroeter, S. et al. | 2005
- 429
-
Artificially inscribed defects in opal photonic crystalsJonsson, Fredrik / Torres, Clivia M. Sotomayor / Seekamp, Jörg / Schniedergers, Moritz / Tiedemann, Anne / Ye, Jianhui / Zentel, Rudolf et al. | 2005
- 436
-
Growth and characterisation of birefringent films on textured silicon substratesWalsby, E.D. / Arnold, M. / Wu, Q.-h. / Hodgkinson, I.J. / Blaikie, R.J. et al. | 2005
- 442
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Fabrication of two-dimensional hybrid photonic crystals utilizing electron beam lithographyStodolka, J. / Nau, D. / Frommberger, M. / Zanke, C. / Giessen, H. / Quandt, E. et al. | 2005
- 448
-
Optical activity in chiral gold nanogratingsJefimovs, K. / Saito, N. / Ino, Yu. / Vallius, T. / Vahimaa, P. / Turunen, J. / Shimano, R. / Kauranen, M. / Svirko, Yu. / Kuwata-Gonokami, M. et al. | 2005
- 452
-
Micromachining of organic polymers by X-ray photo-etching using a 10Hz laser-plasma radiation sourceBartnik, A. / Fiedorowicz, H. / Jarocki, R. / Juha, L. / Kostecki, J. / Rakowski, R. / Szczurek, M. et al. | 2005
- 457
-
Roughness and damage of a GaAs surface after chemically assisted ion beam etching with Cl2/Ar+Dienelt, J. / Zimmer, K. / von Sonntag, J. / Rauschenbach, B. / Bundesmann, C. et al. | 2005
- 464
-
Selective dry etch process for step and flash imprint lithographyLe, Ngoc V. / Dauksher, William J. / Gehoski, Kathy A. / Resnick, Douglas J. / Hooper, A.E. / Johnson, Steve / Willson, Grant et al. | 2005
- 474
-
Increased plasma etch resistance of thin polymeric and photoresist filmsVourdas, N. / Boudouvis, A.G. / Gogolides, E. et al. | 2005
- 479
-
Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20nm MOSFET device demonstratorsKretz, J. / Dreeskornfeld, L. / Ilicali, G. / Lutz, T. / Weber, W. et al. | 2005
- 484
-
Correlation of surface roughness with edge roughness in PMMA resistYasin, Shazia / Khalid, M.N. / Hasko, D.G. / Sarfraz, S. et al. | 2005
- 490
-
Enhanced dill exposure model for thick photoresist lithographyLiu, Shijie / Du, Jinglei / Duan, Xi / Luo, Boliang / Tang, Xionggui / Guo, Yongkang / Cui, Zheng / Du, Chunlei / Yao, Jun et al. | 2005
- 496
-
Design of low Tg thermosets for short cycle time nanoimprint lithographyReuther, F. / Fink, M. / Kubenz, M. / Schuster, C. / Vogler, M. / Gruetzner, G. et al. | 2005
- 503
-
A single layer negative tone lift-off photo resist for patterning a magnetron sputtered Ti/Pt/Au contact system and for solder bumpsVoigt, A. / Heinrich, M. / Hauck, K. / Mientus, R. / Gruetzner, G. / Töpper, M. / Ehrmann, O. et al. | 2005
- 509
-
Simplified resist models for efficient simulation of contact holes and line endsTollkühn, B. / Erdmann, A. / Semmler, A. / Nölscher, C. et al. | 2005
- 515
-
Three-dimensional simulation of resist pattern deformation by surface tension at the drying processKotera, M. / Ochiai, N. et al. | 2005
- 521
-
Resist nano-modification technology for enhancing the lithography and etching performanceYou, Hsin-Chiang / Ko, Fu-Hsiang / Lei, Tan-Fu et al. | 2005
- 528
-
Novel electron beam resist material using hydrophilic protecting groupSaito, Satoshi / Nakasugi, Tetsuro et al. | 2005
- 533
-
Simulation of the energy absorption and the resist development at sub-150nm ion lithographyVutova, K. / Mladenov, G. / Tanaka, T. / Kawabata, K. et al. | 2005
- 540
-
Silicon-containing copolymers of MMA tested for a positive-tone high-resolution bi-layer e-beam resist systemMaessen, J. / van den Boogaart, S. / Verstegen, E.J.K. / Kloosterboer, J.G. / van Delft, F.C.M.J.M. / Catsburg, W. / Habraken, F.H.P.M. et al. | 2005
- 546
-
An ultra sensitive DNA detection by using gold nanoparticle multilayer in nano-gap electrodesTsai, Chien-Ying / Chang, Tien-Li / Chen, Chun-Chi / Ko, Fu-Hsiang / Chen, Ping-Hei et al. | 2005
- 556
-
In situ bio-functionalization and cell adhesion in microfluidic devicesZhang, Z.L. / Crozatier, C. / Le Berre, M. / Chen, Y. et al. | 2005
- 563
-
A disposable capillary electrophoresis microchip with an indium tin oxide decoupler/amperometric detectorKim, Ju-Ho / Kang, C.J. / Jeon, D. / Kim, Yong-Sang et al. | 2005
- 571
-
Towards a planar sample support for in situ experiments in structural biologyGullo, M.R. / Akiyama, T. / Frederix, P.L.T.M. / Tonin, A. / Staufer, U. / Engel, A. / de Rooij, N.F. et al. | 2005
- 575
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Biological samples micro-manipulation by means of optical tweezersFerrari, E. / Emiliani, V. / Cojoc, D. / Garbin, V. / Zahid, M. / Durieux, C. / Coppey-Moisan, M. / Fabrizio, E. Di et al. | 2005
- 582
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Nanofabrication of protein-patterned substrates for future cell adhesion experimentsKünzi, P.A. / Lussi, J. / Aeschimann, L. / Danuser, G. / Textor, M. / de Rooij, N.F. / Staufer, U. et al. | 2005
- 587
-
Development of impedance biosensors with nanometer gaps for marker-free analytical measurementsMalavé, A. / Tewes, M. / Gronewold, T. / Löhndorf, M. et al. | 2005
- 593
-
Fabrication of hybrid organic–inorganic vertical microcavities through imprint technologyMartiradonna, L. / De Vittorio, M. / Troisi, L. / Todaro, M.T. / Mazzeo, M. / Stomeo, T. / Anni, M. / Cingolani, R. / Gigli, G. et al. | 2005
- 598
-
Temperature-reduced nanoimprint lithography for thin and uniform residual layersBogdanski, N. / Wissen, M. / Ziegler, A. / Scheer, H.-C. et al. | 2005
- 605
-
Hybrid bendable stamp copies for molding fabricated by nanoimprint lithographySchift, Helmut / Park, Sunggook / Gobrecht, Jens / Meier, Fabian / Raupach, Werner / Vogelsang, Konrad et al. | 2005
- 612
-
Nanoimprint lithography for planar chiral photonic meta-materialsChen, Yifang / Tao, Jiarui / Zhao, Xingzhong / Cui, Zheng / Schwanecke, Alexander S. / Zheludev, Nikolay I. et al. | 2005
- 618
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Instrumented indentation testing for local characterisation of polymer properties after nanoimprintCross, G.L.W. / O’Connell, B.S. / Pethica, J.B. / Schulz, H. / Scheer, H.-C. et al. | 2005
- 625
-
Choice of the molecular weight of an imprint polymer for hot embossing lithographySchulz, H. / Wissen, M. / Bogdanski, N. / Scheer, H.-C. / Mattes, K. / Friedrich, Ch. et al. | 2005
- 633
-
Distortion and overlay performance of UV step and repeat imprint lithographyChoi, Jin / Nordquist, Kevin / Cherala, Ashuman / Casoose, Lester / Gehoski, Kathy / Dauksher, William J. / Sreenivasan, S.V. / Resnick, Douglas J. et al. | 2005
- 641
-
Fine pattern transfer by nanocasting lithographyHirai, Yoshihiko / Yoshikawa, Takashi / Morimatsu, Masatoshi / Nakajima, Masaki / Kawata, Hiroaki et al. | 2005
- 647
-
Fabrication of PDMS stamps for the patterned growth of carbon nanotubesArgyrakis, P. / Teo, L. / Stevenson, T. / Cheung, R. et al. | 2005
- 653
-
Nanoimprint lithography of sub-100 nm 3D structuresKonijn, M. / Alkaisi, M.M. / Blaikie, R.J. et al. | 2005
- 659
-
Implication of the light polarisation for UV curing of pre-patterned resistsWissen, M. / Bogdanski, N. / Scheer, H.-C. / Bitz, A. / Ahrens, G. / Gruetzner, G. et al. | 2005
- 665
-
Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stackTao, Jiarui / Chen, Yifang / Zhao, Xingzhong / Malik, Adnan / Cui, Zheng et al. | 2005
- 670
-
A study of resist flow during nanoimprint lithographyMacintyre, D.S. / Thoms, S. et al. | 2004
- 676
-
Replication of sub-40nm gap nanoelectrodes over an 8-in. substrate by nanoimprint lithographyTallal, J. / Peyrade, D. / Lazzarino, F. / Berton, K. / Perret, C. / Gordon, M. / Gourgon, C. / Schiavone, P. et al. | 2005
- 682
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Chemical patterning of sub-50-nm half pitches via nanoimprint lithographyPark, Sunggook / Saxer, Sina / Padeste, Celestino / Solak, Harun H. / Gobrecht, Jens / Schift, Helmut et al. | 2005
- 689
-
Enhanced UV imprint ability with a tri-layer stamp configurationRoy, E. / Kanamori, Y. / Belotti, M. / Chen, Y. et al. | 2005
- 695
-
Production of structures for microfluidics using polymer imprint techniquesMills, C.A. / Martinez, E. / Bessueille, F. / Villanueva, G. / Bausells, J. / Samitier, J. / Errachid, A. et al. | 2005
- 701
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Author Index| 2005
- CO2
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Editorial board| 2005
- v
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Table of Contents| 2005