Time-dependent density functional theory calculations of the photoabsorption of fluorinated alkanes (English)
- New search for: Zhan, Chang-Guo
- New search for: Dixon, David A.
- New search for: Matsuzawa, Nobuyuki N.
- New search for: Ishitani, Akihiko
- New search for: Uda, Tsuyoshi
- New search for: Zhan, Chang-Guo
- New search for: Dixon, David A.
- New search for: Matsuzawa, Nobuyuki N.
- New search for: Ishitani, Akihiko
- New search for: Uda, Tsuyoshi
In:
Journal of Fluorine Chemistry
;
122
, 1
;
27-35
;
2003
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ISSN:
- Article (Journal) / Electronic Resource
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Title:Time-dependent density functional theory calculations of the photoabsorption of fluorinated alkanes
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Contributors:Zhan, Chang-Guo ( author ) / Dixon, David A. ( author ) / Matsuzawa, Nobuyuki N. ( author ) / Ishitani, Akihiko ( author ) / Uda, Tsuyoshi ( author )
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Published in:Journal of Fluorine Chemistry ; 122, 1 ; 27-35
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Publisher:
- New search for: Elsevier Science B.V.
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Publication date:2003-01-01
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Size:9 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 122, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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PrefaceSmart, Bruce E. et al. | 2003
- 3
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Fluorine—an enabler in advanced photolithographyRothschild, M. / Bloomstein, T.M. / Fedynyshyn, T.H. / Liberman, V. / Mowers, W. / Sinta, R. / Switkes, M. / Grenville, A. / Orvek, K. et al. | 2003
- 11
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Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nmFeiring, A.E. / Crawford, M.K. / Farnham, W.B. / Feldman, J. / French, R.H. / Leffew, K.W. / Petrov, V.A. / Schadt, F.L. III / Wheland, R.C. / Zumsteg, F.C. et al. | 2003
- 17
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Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithographyTrinque, Brian C. / Chambers, Charles R. / Osborn, Brian P. / Callahan, Ryan P. / Lee, Geun Su / Kusumoto, Shiro / Sanders, Daniel P. / Grubbs, Robert H. / Conley, Willard E. / Willson, C.Grant et al. | 2003
- 27
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Time-dependent density functional theory calculations of the photoabsorption of fluorinated alkanesZhan, Chang-Guo / Dixon, David A. / Matsuzawa, Nobuyuki N. / Ishitani, Akihiko / Uda, Tsuyoshi et al. | 2003
- 37
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Quantum chemical modeling for 157 nm photolithographyWaterland, Robert L / Dobbs, Kerwin D / Rinehart, Amy M / Feiring, Andrew E / Wheland, Robert C / Smart, Bruce E et al. | 2003
- 47
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Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generatorsHoulihan, F.M. / Nalamasu, O. / Reichmanis, E. et al. | 2003
- 57
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Iodonium zwitterionsDesMarteau, Darryl D. / Pennington, William T. / Montanari, Vittorio / Thomas, Brian H. et al. | 2003
- 63
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Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparencyFrench, Roger H / Wheland, Robert C / Qiu, Weiming / Lemon, M.F / Zhang, Edward / Gordon, Joseph / Petrov, Viacheslav A / Cherstkov, Victor F / Delaygina, Nina I et al. | 2003
- 81
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Properties and production of F-doped silica glassSmith, Charlene M. / Moore, Lisa A. et al. | 2003
- 87
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Fluorinated compounds for advanced IC interconnect applications: a survey of chemistries and processesMocella, Michael T. et al. | 2003
- 93
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Fluorocarbon dielectrics via hot filament chemical vapor depositionLau, Kenneth K.S. / Murthy, Shashi K. / Lewis, Hilton G.Pryce / Caulfield, Jeffrey A. / Gleason, Karen K. et al. | 2003
- 97
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Parylene-AF4: a polymer with exceptional dielectric and thermal propertiesDolbier, William R. Jr. / Beach, William F. et al. | 2003
- 105
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Fluorinated gases for semiconductor manufacture: process advances in chemical vapor deposition chamber cleaningAllgood, Charles C. et al. | 2003
- 113
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Perfluoroelastomer and fluoroelastomer seals for semiconductor wafer processing equipmentWang, Shuhong / Legare, John M. et al. | 2003
- 121
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The use of fluoropolymers to protect semiconductor materialsExtrand, C.W. et al. | 2003
- CO2
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IFC| 2003
- v
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Graphical Abstracts| 2003