POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited) (English)
- New search for: Lagniel, J.-M.
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In:
Review of scientific instruments
;
71
, 2
; 830-835
;
2000
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ISSN:
- Article (Journal) / Print
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Title:POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited)
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Contributors:Lagniel, J.-M. ( author ) / Beauvais, P.-Y. / Bogard, D. / Bourdelle, G. / Charruau, G. / Delferrière, O. / Menezes, D.De / France, A. / Ferdinand, R. / Gauthier, Y.
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Published in:Review of scientific instruments ; 71, 2 ; 830-835
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Publisher:
- New search for: AIP
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Place of publication:Melville, NY
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Publication date:2000
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ISSN:
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ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Source:
Table of contents – Volume 71, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 335
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A novel method to characterize photorefractive damage in quasiphase-matched wavelength convertersXu, C. Q. / Okayama, H. / Ogawa, Y. et al. | 2000
- 335
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - A novel method to characterize photorefractive damage in quasiphase-matched wavelength convertersXu, C.Q. et al. | 2000
- 338
-
Lossless beam combiners for nearly equal laser frequenciesHaubrich, D. / Dornseifer, M. / Wynands, R. et al. | 2000
- 338
-
ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Lossless beam combiners for nearly equal laser frequenciesHaubrich, D. et al. | 2000
- 341
-
Laser frequency stabilization using linear magneto-opticsYashchuk, Valeriy V. / Budker, Dmitry / Davis, John R. et al. | 2000
- 341
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Laser frequency stabilization using linear magneto-opticsYashchuk, Valeriy V. et al. | 2000
- 347
-
A laser-locked cavity ring-down spectrometer employing an analog detection schemeSpence, T. G. / Harb, C. C. / Paldus, B. A. / Zare, R. N. / Willke, B. / Byer, R. L. et al. | 2000
- 347
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - A laser-locked cavity ring-down spectrometer employing an analog detection schemeSpence, T.G. et al. | 2000
- 354
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Time-correlated photon counting technique robust against multiple photon events using a multianode photomultiplier tubeOhsuka, Shinji et al. | 2000
- 354
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Time-correlated photon counting technique robust against multiple photon events using a multianode photomultiplier tubeOhsuka, Shinji / Ohsugi, Akira / Takamoto, Hisayoshi et al. | 2000
- 361
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ARTICLES - OPTICS; ATOMS and MOLECULES; SPECTROSCOPY - Data acquisition card for fluctuation correlation spectroscopy allowing full access to the detected photon sequenceEid, John S. et al. | 2000
- 361
-
Data acquisition card for fluctuation correlation spectroscopy allowing full access to the detected photon sequenceEid, John S. / Mu¨ller, Joachim D. / Gratton, Enrico et al. | 2000
- 369
-
Toward the experimental observation of nonlinear effects in laser-electron beam scatteringMatsukado, Koji / Endo, Ichita / Takahashi, Tohru / Tauchi, Toshiaki et al. | 2000
- 369
-
ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - Toward the experimental observation of nonlinear effects in laser-electron beam scatteringMatsukado, Koji et al. | 2000
- 376
-
ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - Pulsed magnetic quadrupole lenses for high rigidity beamsLi, G. et al. | 2000
- 376
-
Pulsed magnetic quadrupole lenses for high rigidity beamsLi, G. / Czok, U. / Kalimov, A. / Winkler, M. / Wollnik, H. et al. | 2000
- 380
-
ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - Production of radioactive ion beams using the in-flight techniqueHarss, B. et al. | 2000
- 380
-
Production of radioactive ion beams using the in-flight techniqueHarss, B. / Pardo, R. C. / Rehm, K. E. / Borasi, F. / Greene, J. P. / Janssens, R. V. F. / Jiang, C. L. / Nolen, J. / Paul, M. / Schiffer, J. P. et al. | 2000
- 388
-
High current, low pressure plasma cathode electron gunGoebel, Dan M. / Watkins, Ron M. et al. | 2000
- 388
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ARTICLES - CHARGED PARTICLE SOURCES, OPTICS and ACCELERATION - High current, low pressure plasma cathode electron gunGoebel, Dan M. et al. | 2000
- 399
-
Pneumatic repetitive injector with a porous pellet generator for steady-state plasma fuelingViniar, I. / Sudo, S. et al. | 2000
- 399
-
ARTICLES - NUCLEAR PHYSICS, FUSION and PLASMAS - Pneumatic repetitive injector with a porous pellet generator for steady-state plasma fuelingViniar, I. et al. | 2000
- 403
-
ARTICLES - NUCLEAR PHYSICS, FUSION and PLASMAS - Effect of harmonic rf fields on the emissive probe characteristicsLho, T. et al. | 2000
- 403
-
Effect of harmonic rf fields on the emissive probe characteristicsLho, T. / Hershkowitz, N. / Kim, G-H. et al. | 2000
- 406
-
ARTICLES - BASIC PHENOMENA - Spatio-temporal measurements of Trichel corona discharge using capacitive probe diagnosticGupta, Deepak K. et al. | 2000
- 406
-
Spatio-temporal measurements of Trichel corona discharge using capacitive probe diagnosticGupta, Deepak K. / Ramachandran, H. / John, P. I. et al. | 2000
- 413
-
Comparison between the discharge development in the two- and three-electrode spark gap switchesGolnabi, Hossein et al. | 2000
- 413
-
ARTICLES - BASIC PHENOMENA - Comparison between the discharge development in the two- and three-electrode spark gap switchesGolnabi, Hossein et al. | 2000
- 420
-
ARTICLES - MICROSCOPY and IMAGING - Servomechanism for locking scanning tunneling microscope tip over surface nanostructuresIto, K.J. et al. | 2000
- 420
-
Servomechanism for locking scanning tunneling microscope tip over surface nanostructuresIto, K. J. / Uehara, Y. / Ushioda, S. / Ito, K. et al. | 2000
- 424
-
ARTICLES - MICROSCOPY and IMAGING - A low-temperature ultrahigh vacuum scanning tunneling microscope with a split-coil magnet and a rotary motion stepper motor for high spatial resolution studies of surface magnetismPietzsch, O. et al. | 2000
- 424
-
A low-temperature ultrahigh vacuum scanning tunneling microscope with a split-coil magnet and a rotary motion stepper motor for high spatial resolution studies of surface magnetismPietzsch, O. / Kubetzka, A. / Haude, D. / Bode, M. / Wiesendanger, R. et al. | 2000
- 431
-
ARTICLES - MICROSCOPY and IMAGING - Variable temperature fluid stage for atomic force microscopyWorkman, R.K. et al. | 2000
- 431
-
Variable temperature fluid stage for atomic force microscopyWorkman, R. K. / Manne, S. et al. | 2000
- 437
-
ARTICLES - MICROSCOPY and IMAGING - Dynamics of a plezoelectric tuning fork-optical fiber assembly in a near-field scanning optical microscopeShelimov, Konstantin B. et al. | 2000
- 437
-
Dynamics of a piezoelectric tuning fork/optical fiber assembly in a near-field scanning optical microscopeShelimov, Konstantin B. / Davydov, Dmitri N. / Moskovits, Martin et al. | 2000
- 444
-
ARTICLES - MICROSCOPY and IMAGING - Real time imaging of two-dimensional charge on dielectric surfacesBudakian, R. et al. | 2000
- 444
-
Real time imaging of two-dimensional charge on dielectric surfacesBudakian, R. / Putterman, S. J. et al. | 2000
- 450
-
ARTICLES - CONDENSED MATTER; MATERIALS - Nuclear magnetic resonance spectrometer with a frequency range extended below the megahertz regionSitnikov, R. et al. | 2000
- 450
-
Nuclear magnetic resonance spectrometer with a frequency range extended below the megahertz regionSitnikov, R. / Furo´, I. / Henriksson, U. / To´th, F. et al. | 2000
- 458
-
ARTICLES - CONDENSED MATTER; MATERIALS - An efficient 8 T extraction vector magnetometer with sample rotation for routine operationDufeu, D. et al. | 2000
- 458
-
An efficient 8 T extraction vector magnetometer with sample rotation for routine operationDufeu, D. / Eyraud, E. / Lethuillier, P. et al. | 2000
- 462
-
Density-of-states effective mass and scattering parameter measurements by transport phenomena in thin filmsYoung, D. L. / Coutts, T. J. / Kaydanov, V. I. et al. | 2000
- 462
-
ARTICLES - CONDENSED MATTER; MATERIALS - Density-of-states effective mass and scattering parameter measurements by transport phenomena in thin filmsYoung, D.L. et al. | 2000
- 467
-
Electron cyclotron resonance plasma source for ion assisted deposition of thin filmsVargheese, K. Deenamma / Rao, G. Mohan et al. | 2000
- 467
-
ARTICLES - CONDENSED MATTER; MATERIALS - Electron cyclotron resonance plasma source for ion assisted deposition of thin filmsVargheese, K.Deenamma et al. | 2000
- 473
-
Measurement of the complex dielectric constant down to helium temperatures. I. Reflection method from 1 MHz to 20 GHz using an open ended coaxial lineMartens, H. C. F. / Reedijk, J. A. / Brom, H. B. et al. | 2000
- 473
-
ARTICLES - CONDENSED MATTER; MATERIALS - Measurement of the complex dielectric constant down to helium temperatures. I. Reflection method from 1 MHz to 20 GHz using an open ended coaxial lineMartens, H.C.F. et al. | 2000
- 478
-
Measurement of the complex dielectric constant down to helium temperatures. II. Quasioptical technique from 0.03 to 1 THzReedijk, J. A. / Martens, H. C. F. / Smits, B. J. G. / Brom, H. B. et al. | 2000
- 478
-
ARTICLES - CONDENSED MATTER; MATERIALS - Measurement of the complex dielectric constant down to helium temperatures. II. Quasioptical technique from 0.03 to 1 THzReedijk, J.A. et al. | 2000
- 482
-
ARTICLES - CONDENSED MATTER; MATERIALS - Thermal scanning alternating current susceptometry with multiple pick-up coils for ranging local phenomena in high Tc superconductorsLaiho, R. et al. | 2000
- 482
-
Thermal scanning alternating current susceptometry with multiple pick-up coils for ranging local phenomena in high Tc superconductorsLaiho, R. / La¨hderanta, E. / Bo´di, A. C. et al. | 2000
- 486
-
ARTICLES - CONDENSED MATTER; MATERIALS - Development and evaluation of an electrically detected magnetic resonance spectrometer operating at 900 MHzSato, Toshiyuki et al. | 2000
- 486
-
Development and evaluation of an electrically detected magnetic resonance spectrometer operating at 900 MHzSato, Toshiyuki / Yokoyama, Hidekatsu / Ohya, Hiroaki / Kamada, Hitoshi et al. | 2000
- 494
-
A technique for preparing submicrometer-size liquid film: Development of a new type of optical cellSakaguchi, Yoshifumi / Tamura, Kozaburo et al. | 2000
- 494
-
ARTICLES - CONDENSED MATTER; MATERIALS - A technique for preparing submicrometer-size liquid film: Development of a new type of optical cellSakaguchi, Yoshifumi et al. | 2000
- 499
-
ARTICLES - CONDENSED MATTER; MATERIALS - Metallic work function measurement in the range 2-3.3 eV using a blue light-emitting diode sourceSchletti, Reto et al. | 2000
- 499
-
Metallic work function measurement in the range 2–3.3 eV using a blue light-emitting diode sourceSchletti, Reto / Wurz, Peter / Fro¨hlich, Theo et al. | 2000
- 504
-
ARTICLES - CONDENSED MATTER; MATERIALS - A compact ultrahigh-vacuum system for the in situ investigation of III-V semiconductor surfacesGeng, Peter et al. | 2000
- 504
-
A compact ultrahigh-vacuum system for the in situ investigation of III/V semiconductor surfacesGeng, Peter / Ma´rquez, Juan / Geelhaar, Lutz / Platen, Jutta / Setzer, Carsten / Jacobi, Karl et al. | 2000
- 509
-
The National Institute of Standards and Technology glow discharge resonance ionization mass spectrometry systemPibida, L. / Hutchinson, J. M. R. / Wen, Jesse / Karam, L. et al. | 2000
- 509
-
ARTICLES - CHEMISTRY - The National Institute of Standards and Technology glow discharge resonance ionization mass spectrometry systemPibida, L. et al. | 2000
- 516
-
Electrochemical cell system for voltammetry of high purity solventsMay, Michael A. / Gupta, Vijay K. / Hounsokou, Karen et al. | 2000
- 516
-
ARTICLES - CHEMISTRY - Electrochemical cell system for voltammetry of high purity solventsMay, Michael A. et al. | 2000
- 519
-
ARTICLES - CHEMISTRY - Continuous heatable Langmuir probe for flowing afterglow measurementsLaubé, Sylvain et al. | 2000
- 519
-
Continuous heatable Langmuir probe for flowing afterglow measurementsLaube´, Sylvain / Mostefaoui, Toufik / Rowe, Bertrand et al. | 2000
- 522
-
ARTICLES - BIOLOGY and MEDICINE - Phase-sensitive multichannel detection system for chemical and biosensor arrays and fluorescence lifetime-based imagingRabinovich, Emmanuil et al. | 2000
- 522
-
Phase-sensitive multichannel detection system for chemical and biosensor arrays and fluorescence lifetime-based imagingRabinovich, Emmanuil / O’Brien, Michael J. / Brueck, Steven R. J. / Lopez, Gabriel P. et al. | 2000
- 530
-
Inflatable belt for the application of electrode arraysSadleir, R. J. / Fox, R. A. / Turner, V. F. et al. | 2000
- 530
-
ARTICLES - BIOLOGY and MEDICINE - Inflatable belt for the application of electrode arraysSadleir, R.J. et al. | 2000
- 536
-
Laser time-of-flight mass spectrometry for spaceBrinckerhoff, W. B. / Managadze, G. G. / McEntire, R. W. / Cheng, A. F. / Green, W. J. et al. | 2000
- 536
-
ARTICLES - GRAVITY; GEOPHYSICS; ASTRONOMY and ASTROPHYSICS - Laser time-of-flight mass spectrometry for spaceBrinckerhoff, W.B. et al. | 2000
- 546
-
ARTICLES - GRAVITY; GEOPHYSICS; ASTRONOMY and ASTROPHYSICS - Long-path monitoring of atmospheric aerosol extinction with an automated laser positioning systemWidada, Wahyu et al. | 2000
- 546
-
Long-path monitoring of atmospheric aerosol extinction with an automated laser positioning systemWidada, Wahyu / Kuze, Hiroaki / Xue, Yanqun / Maeda, Kazuhito / Takeuchi, Nobuo et al. | 2000
- 551
-
Extraction of radio frequency from electromagnetic surface waves guided by metallic stripsFriedman, M. et al. | 2000
- 551
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Extraction of radio frequency from electromagnetic surface waves guided by metallic stripsFriedman, M. et al. | 2000
- 554
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Compact THz-radiation source consisting of a bulk semiconductor, a mode-locked fiber laser, and a 2 T permanent magnetOno, Shingo et al. | 2000
- 554
-
Compact THz-radiation source consisting of a bulk semiconductor, a mode-locked fiber laser, and a 2 T permanent magnetOno, Shingo / Tsukamoto, Takeyo / Sakai, Masahiro / Liu, Zhenlin / Ohtake, Hideyuki / Sarukura, Nobuhiko / Nishizawa, Seizi / Nakanishi, Akio / Yoshida, Makoto et al. | 2000
- 557
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Very low frequency quadrature oscillatorBayard, J. et al. | 2000
- 557
-
Very low frequency quadrature oscillatorBayard, J. et al. | 2000
- 563
-
High voltage multichannel wave form generator for liquid crystal researchMatuszczyk, T. / Beccherelli, R. et al. | 2000
- 563
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - High voltage multichannel wave form generator for liquid crystal researchMatuszczyk, T. et al. | 2000
- 567
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Eddy current testing probe with dual half-cylindrical coilsBae, Byung-Hoon et al. | 2000
- 567
-
Eddy current testing probe with dual half-cylindrical coilsBae, Byung-Hoon / Choi, Jung-Mi / Kim, Soo-Yong et al. | 2000
- 571
-
ARTICLES - ELECTRONICS; ELECTROMAGNETIC TECHNOLOGY; MICROWAVES - Two-dimensional finite element model for a long rectangular eddy current surface coilPtchelintsev, Andrei et al. | 2000
- 571
-
Two-dimensional finite element model for a long rectangular eddy current surface coilPtchelintsev, Andrei / de Halleux, Benoit et al. | 2000
- 577
-
Comparison of dc and ac excitation of a sealed CO2 laserLee, Dong-Hoon / Chung, Hyun-Ju / Kim, Hee-Je et al. | 2000
- 577
-
NOTES - Comparison of dc and ac excitation of a sealed CO2 laserLee, Dong-Hoon et al. | 2000
- 579
-
Pulse stretching due to partial temporal overlap of two modes in a TEA CO2 laserNilaya, J. Padma / Biswas, Dhruba J. et al. | 2000
- 579
-
NOTES - Pulse stretching due to partial temporal overlap of two modès in a TEA CO2 laserNilaya, J.Padma et al. | 2000
- 581
-
NOTES - Versatile sample viewing system with large magnification rangeOcker, K.D. et al. | 2000
- 581
-
Versatile sample viewing system with large magnification rangeOcker, K. D. / Thonnard, N. / Joyner, C. F. et al. | 2000
- 583
-
NOTES - Contact-free determination of ultralow resistances of micron-sized wiresRossmy, T. et al. | 2000
- 583
-
Contact-free determination of ultralow resistances of micron-sized wiresRossmy, T. / Skwirblies, S. / Ko¨tzler, J. et al. | 2000
- 585
-
A W–InSb point contact diode for harmonic generation and mixing in the visibleMoretti, A. / Maccioni, E. / Nannizzi, M. et al. | 2000
- 585
-
NOTES - A W-InSb point contact diode for harmonic generation and mixing in the visibleMoretti, A. et al. | 2000
- 587
-
Measuring the Hall weighting function for square and cloverleaf geometriesScherschligt, Julia K. / Koon, Daniel W. et al. | 2000
- 587
-
NOTES - Measuring the Hall weighting function for square and cloverleaf geometriesScherschligt, Julia K. et al. | 2000
- 589
-
A simple technique for height calibration for z piezo with Angstrom resolution of scanning probe microscopesPal, S. / Banerjee, S. et al. | 2000
- 589
-
NOTES - A simple technique for height calibration for z plezo with Angstrom resolution of scanning probe microscopesPal, S. et al. | 2000
- 591
-
A practical all-metal flange-seal for high and low temperaturesMoreh, R. / Finkelstein, Y. et al. | 2000
- 591
-
NOTES - A practical all-metal flange-seal for high and low temperaturesMoreh, R. et al. | 2000
- 593
-
ARTICLES - NEW INSTRUMENTS, MATERIALS, and COMPONENTS New Instruments| 2000
- 596
-
ARTICLES - NEW INSTRUMENTS, MATERIALS, and COMPONENTS New Materials and Components| 2000
- 600
-
CUMULATIVE AUTHOR INDEX| 2000
- 603
-
PLENARY SESSION - Heavy-ion sources: The Star, or the Cinderella, of the ion-implantation firmament? (invited)Freeman, Harry et al. | 2000
- 603
-
Heavy-ion sources: The Star, or the Cinderella, of the ion-implantation firmament? (invited)Freeman, Harry et al. | 2000
- 612
-
ECR ION SOURCES (I) - The electron cyclotron resonance (1 + n+) systems and the ISOL radioactive beam facilities (invited)Geller, R. et al. | 2000
- 612
-
The electron cyclotron resonance (1+n+) systems and the ISOL radioactive beam facilities (invited)Geller, R. et al. | 2000
- 617
-
ECR ION SOURCES (I) - Electron cyclotron resonance charge breeder (invited)Sortais, P. et al. | 2000
- 617
-
Electron cyclotron resonance charge breeder (invited)Sortais, P. / Bruandet, J. F. / Bouly, J. L. / Chauvin, N. / Curdy, J. C. / Geller, R. / Lamy, T. / Sole, P. / Vieux-Rochaz, J. L. et al. | 2000
- 623
-
ECR ION SOURCES (I) - Role of low charge state ions in electron cyclotron resonance ion source plasmasDrentje, A.G. et al. | 2000
- 623
-
Role of low charge state ions in electron cyclotron resonance ion source plasmasDrentje, A. G. / Girard, A. / Hitz, D. / Melin, G. et al. | 2000
- 627
-
ECR ION SOURCES (II) - The interaction of slow highly charged ions on surfaces (invited)Briand, J.-P. et al. | 2000
- 627
-
The interaction of slow highly charged ions on surfaces (invited)Briand, J.-P. / Giardino, G. / Borsoni, G. / Le Roux, V. / Be´chu, N. / Dreuil, S. / Tu¨ske, O. / Machicoane, G. et al. | 2000
- 631
-
ECR ION SOURCES (II) - The contribution of the INFN-LNS to the development of electron cyclotron resonance on sources (invited)Gammino, S. et al. | 2000
- 631
-
The contribution of the INFN-LNS to the development of electron cyclotron resonance ion sources (invited)Gammino, S. / Ciavola, G. et al. | 2000
- 637
-
Recent performance of Japanese electron cyclotron resonance ion sources (invited)Nakagawa, T. / Yano, Y. et al. | 2000
- 637
-
ECR ION SOURCES (II) - Recent performance of Japanese electron cyclotron resonance ion sources (invited)Nakagawa, T. et al. | 2000
- 643
-
ECR ION SOURCES (II) - Design of an electron cyclotron resonance !on source for the isotope separator and accelerator at TRIUMFYuan, D. et al. | 2000
- 643
-
Design of an electron cyclotron resonance ion source for the isotope separator and accelerator at TRIUMFYuan, D. / Jayamanna, K. / Dombsky, M. / Louie, D. / Kadantsev, S. / Keitel, R. / Kuo, T. / McDonald, M. / Olivo, M. / Schmor, P. et al. | 2000
- 646
-
ECR ION SOURCES (II) - Development of ECR ion sources in China (invited)Zhao, H.W. et al. | 2000
- 646
-
Development of ECR ion sources in China (invited)Zhao, H. W. / Wei, B. W. / Liu, Z. W. / Wang, Y. F. / Zhao, W. J. et al. | 2000
- 651
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production and Extraction - Investigation of different oven types for sample evaporation in the CAPRICE electron cyclotron resonance ion sourceLang, R. et al. | 2000
- 651
-
Investigation of different oven types for sample evaporation in the CAPRICE electron cyclotron resonance ion sourceLang, R. / Bossler, J. / Schulte, H. / Tinschert, K. et al. | 2000
- 654
-
Selective minority-ion heating in the afterglow of an electron cyclotron resonance ion sourceNadzeyka, A. / Meyer, D. / Barzangy, F. / Drentje, A. G. / Wiesemann, K. et al. | 2000
- 654
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production and Extraction - Selective minority-ion heating in the afterglow of an electron cyclotron resonance ion sourceNadzeyka, A. et al. | 2000
- 657
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production and Extraction - Enhanced production of multi-charged ions using pulse-modulated microwave in a 2.45 GHz electron cyclotron resonance sourceKato, Yushi et al. | 2000
- 657
-
Enhanced production of multi-charged ions using pulse-modulated microwave in a 2.45 GHz electron cyclotron resonance sourceKato, Yushi / Kobayashi, Shigeki / Ishii, Shigeyuki et al. | 2000
- 660
-
Influence of plasma-wall interaction on high charge state production in electron cyclotron resonance ion sourcesMeyer, D. / Schmitz, H. / Daube, Th. / Mannel, C. / Wiesemann, K. et al. | 2000
- 660
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations for ECR Ion Sources - Influence of plasma-wall interaction on high charge state production in electron cyclotron resonance ion sourcesMeyer, D. et al. | 2000
- 663
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations for ECR Ion Sources - Ionization equilibria and efficiency for electron cyclotron resonance ion sourcesCavenago, M. et al. | 2000
- 663
-
Ionization equilibria and efficiency for electron cyclotron resonance ion sourcesCavenago, M. et al. | 2000
- 666
-
A one-dimensional axial electron cyclotron resonance source modelEdgell, D. H. / Kim, J. S. / Wong, S. K. / Pardo, R. C. / Vondrasek, R. et al. | 2000
- 666
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations for ECR Ion Sources - A one-dimensional axial electron cyclotron resonance source modelEdgell, D.H. et al. | 2000
- 669
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - Formation of multi-charged ions and plasma stability at quasigasdynamic plasma confinement in a mirror magnetic trapGolubev, S.V. et al. | 2000
- 669
-
Formation of multi-charged ions and plasma stability at quasigasdynamic plasma confinement in a mirror magnetic trapGolubev, S. V. / Razin, S. V. / Semenov, V. E. / Smirnov, A. N. / Vodopyanov, A. V. / Zorin, V. G. et al. | 2000
- 672
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - On the use of magnetic buckets for ion beam profile tailoringMacGill, R.A. et al. | 2000
- 672
-
On the use of magnetic buckets for ion beam profile tailoringMacGill, R. A. / Vizir, A. / Brown, I. G. et al. | 2000
- 675
-
An investigation into the mechanism of pseudospark producing metal ion beamsCai, C. G. / Zhao, W. J. / Yan, S. / Le, X. Y. / Han, B. X. / Xue, J. M. / Wang, Y. G. / Jiang, X. L. et al. | 2000
- 675
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - An investigation into the mechanism of pseudospark producing metal ion beamsCai, C.G. et al. | 2000
- 678
-
Approximation of the plasma inhomogeneity by broad-beam measurements and simulationTartz, M. / Hartmann, E. / Deltschew, R. / Neumann, H. et al. | 2000
- 678
-
POSTER SESSION A - I. FUNDAMENTAL PHENOMENA FOR ION SOURCES - C. Diagnostics and Simulations (Except ECR Sources) - Approximation of the plasma inhomogeneity by broad-beam measurements and simulationTartz, M. et al. | 2000
- 681
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Characteristics of the beam line at the Tokyo electron beam ion trapShimizu, Hiroshi et al. | 2000
- 681
-
Characteristics of the beam line at the Tokyo electron beam ion trapShimizu, Hiroshi / Currell, Frederick J. / Ohtani, Shunsuke / Sokell, Emma J. / Yamada, Chikashi / Hirayama, Takato / Sakurai, Makoto et al. | 2000
- 684
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Injection of various metallic elements into an electron beam ion trap: Techniques needed for systematic investigations of isoelectronic sequencesNakamura, Nobuyuki et al. | 2000
- 684
-
Injection of various metallic elements into an electron beam ion trap: Techniques needed for systematic investigations of isoelectronic sequencesNakamura, Nobuyuki / Kinugawa, Tohru / Shimizu, Hiroshi / Watanabe, Hirofumi / Ito, Satoshi / Ohtani, Shunsuke / Yamada, Chikashi / Okazaki, Kiyohiko / Sakurai, Makoto / Tarbutt, Michael R. et al. | 2000
- 687
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - High energy operation of the Tokyo-electron beam ion trap-present statusKuramoto, Hideharu et al. | 2000
- 687
-
High energy operation of the Tokyo-electron beam ion trap/present statusKuramoto, Hideharu / Shimizu, Hiroshi / Nakamura, Nobuyuki / Currell, Fredric J. / Kato, Daiji / Kinugawa, Tohru / Tong, Xiao M. / Watanabe, Hirofumi / Fukami, Tsunemitsu / Li, Yueming et al. | 2000
- 690
-
POSTER SESSION A - NOVEL ION SOURCES - A. Electron Beam Ion Sources and Electron Beam Ion Traps - Highly charged ions produced in a warm electron beam ion trapOvsyannikov, V.P. et al. | 2000
- 690
-
Highly charged ions produced in a warm electron beam ion trapOvsyannikov, V. P. / Zschornack, G. / Grossmann, F. / Landgraf, S. / Ullmann, F. / Werner, T. et al. | 2000
- 693
-
POSTER SESSION A - NOVEL ION SOURCES - B. Hydrogen Negative Ion Sources - H- ion source using a localized virtual magnetic filter in the plasma electrode: Type-I localized virtual magnetic filterOka, Y. et al. | 2000
- 693
-
H− ion source using a localized virtual magnetic filter in the plasma electrode: Type-I localized virtual magnetic filterOka, Y. / Kaneko, O. / Tsumori, K. / Takeiri, Y. / Osakabe, M. / Kawamoto, T. / Asano, E. / Akiyama, R. et al. | 2000
- 696
-
A new scheme of direct beam chopping in a negative hydrogen ion sourceShinto, K. / Takagi, A. / Ikegami, K. / Mori, Y. et al. | 2000
- 696
-
POSTER SESSION A - NOVEL ION SOURCES - B. Hydrogen Negative Ion Sources - A new scheme of direct beam chopping in a negative hydrogen ion sourceShinto, K. et al. | 2000
- 698
-
Axial ion charge state distribution in the vacuum arc plasma jetKeidar, M. / Brown, I. G. / Beilis, I. I. et al. | 2000
- 698
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Axial ion charge state distribution in the vacuum arc plasma jetKeidar, M. et al. | 2000
- 701
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Enhanced ion charge states in vacuum arc plasmas using a "current spike" methodBugaev, A.S. et al. | 2000
- 701
-
Enhanced ion charge states in vacuum arc plasmas using a “current spike” methodBugaev, A. S. / Oks, E. M. / Yushkov, G. Yu. / Anders, A. / Brown, I. G. et al. | 2000
- 704
-
Very broad vacuum arc ion and plasma sources with extended large area cathodesRyabchikov, A. I. / Stepanov, I. B. / Dektjarev, S. V. / Lukonin, E. I. / Shulepov, I. A. et al. | 2000
- 704
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Very broad vacuum arc ion and plasma sources with extended large area cathodesRyabchikov, A.I. et al. | 2000
- 707
-
Metal vapor vacuum arc ion source development at GSIReich, H. / Spa¨dtke, P. / Oks, E. M. et al. | 2000
- 707
-
POSTER SESSION A - NOVEL ION SOURCES - C Vacuum Arc Ion Sources - Metal vapor vacuum arc ion source development at GSIReich, H. et al. | 2000
- 710
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Holey-plate ion sourceYoshida, Yoshikazu et al. | 2000
- 710
-
Holey-plate ion sourceYoshida, Yoshikazu et al. | 2000
- 713
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Improvement of microwave ion source for higher B+ ion currentOkada, M. et al. | 2000
- 713
-
Improvement of microwave ion source for higher B+ ion currentOkada, M. / Sakudo, N. / Hayashi, K. / Ikenaga, N. / Okuji, S. / Onogawa, T. / Maesaka, T. / Nishiyama, Y. / Takahashi, M. / Ito, S. et al. | 2000
- 716
-
POSTER SESSION A - NOVEL ION SOURCES - D. Microwave Ion Sources - Large-area ion source combining microwaves with inductively coupled plasmaOkuji, S. et al. | 2000
- 716
-
Large-area ion source combining microwaves with inductively coupled plasmaOkuji, S. / Sakudo, N. / Hayashi, K. / Okada, M. / Onogawa, T. / Maesaka, T. / Nishiyama, Y. / Toyoda, K. / Yashima, S. / Ishida, T. et al. | 2000
- 719
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept Ion Sources - Characteristics of ion beams extracted from a compact powdery sample ion sourceWada, M. et al. | 2000
- 719
-
Characteristics of ion beams extracted from a compact powdery sample ion sourceWada, M. / Kasuya, T. / Sasao, M. / Kawano, H. et al. | 2000
- 722
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Nanobeam production with the multicusp ion sourceLee, Y. et al. | 2000
- 722
-
Nanobeam production with the multicusp ion sourceLee, Y. / Ji, Q. / Leung, K. N. / Zahir, N. et al. | 2000
- 725
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Criterion for decrease of electric field at ionization point of liquid-metal ion sourcesGotoh, Y. et al. | 2000
- 725
-
Criterion for decrease of electric field at ionization point of liquid-metal ion sourcesGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 728
-
Further development of a gaseous ion source based on low-pressure hollow cathode glowVizir, A. V. / Yushkov, G. Yu. / Oks, E. M. et al. | 2000
- 728
-
POSTER SESSION A - NOVEL ION SOURCES - E. New Concept'Ion Sources - Further development of a gaseous ion source based on low-pressure hollow cathode glowVizir, A.V. et al. | 2000
- 731
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Space Propulsion - Electron energy distribution function in a Hall-type thruster (abstract)Bacal, M. et al. | 2000
- 731
-
Electron energy distribution function in a Hall-type thruster (abstract)Bacal, M. / Fedotov, V. Yu. / Guerrini, G. / Ivanov, A. A. / Vesselovzorov, A. N. et al. | 2000
- 732
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Space Propulsion - Broad-beam modeling and experiments for electric spacecraft propulsionTartz, M. et al. | 2000
- 732
-
Broad-beam modeling and experiments for electric spacecraft propulsionTartz, M. / Hartmann, E. / Deltschew, R. / Neumann, H. et al. | 2000
- 735
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. AMS and Surface Analysis - Magnetic field profile dependence of zirconium flux in sputtering ion sourcesSuzuki, T. et al. | 2000
- 735
-
Magnetic field profile dependence of zirconium flux in sputtering ion sourcesSuzuki, T. / Kawai, Y. / Saburi, T. / Fujii, Y. / Kitayama, N. et al. | 2000
- 738
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Steady state operation of an ampere-class hydrogen negative ion sourceMiyamoto, Naoki et al. | 2000
- 738
-
Steady state operation of an ampere-class hydrogen negative ion sourceMiyamoto, Naoki / Fujiwara, Yukio / Miyamoto, Kenji / Okumura, Yoshikazu et al. | 2000
- 741
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Recovery of cesium in the hydrogen negative ion sourcesBelchenko, Yu I. et al. | 2000
- 741
-
Recovery of cesium in the hydrogen negative ion sourcesBelchenko, Yu. I. / Oka, Y. / Kaneko, O. / Takeiri, Y. / Krivenko, A. S. / Osakabe, M. / Tsumori, K. / Asano, E. / Kawamoto, T. / Akiyama, R. et al. | 2000
- 744
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Neutral beams for the International Thermonuclear Experimental ReactorInoue, T. et al. | 2000
- 744
-
Neutral beams for the International Thermonuclear Experimental ReactorInoue, T. / Di Pietro, E. / Mondino, P. L. / Bayetti, P. / Hemsworth, R. S. / Massmann, P. / Fujiwara, Y. / Hanada, M. / Miyamoto, K. / Okumura, Y. et al. | 2000
- 747
-
Computational studies on ion source plasmas of the neutral beam injection systemKashiwagi, M. / Ido, S. / Okumura, Y. et al. | 2000
- 747
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Computational studies on ion source plasmas of the neutral beam injection systemKashiwagi, M. et al. | 2000
- 751
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Power flow in the negative-Ion based neutral beam injection for JT-60Kuriyama, M. et al. | 2000
- 751
-
Power flow in the negative-ion based neutral beam injection for JT-60Kuriyama, M. / Akino, N. / Ebisawa, N. / Grisham, L. / Hikita, S. / Honda, A. / Itoh, T. / Kawai, M. / Kazawa, M. / Kusaka, M. et al. | 2000
- 755
-
Study of plasma uniformity on JT-60U negative ion sourceKawai, M. / Grisham, L. / Itoh, T. / Kazawa, M. / Kuriyama, M. / Mogaki, K. / Okumura, Y. / Watanabe, K. et al. | 2000
- 755
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Neutral Beam Injector for Fusion - Study of plasma uniformity on JT-60U negative ion sourceKawai, M. et al. | 2000
- 758
-
Alice ion source and its high voltage platformCavenago, M. / Kulevoy, T. et al. | 2000
- 758
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Alice ion source and its high voltage platformCavenago, M. et al. | 2000
- 761
-
ATLAS 10 GHz electron cyclotron resonance ion source upgrade projectMoehs, D. P. / Vondrasek, R. / Pardo, R. C. / Xie, D. et al. | 2000
- 761
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - ATLAS 10 GHz electron cyclotron resonance ion source upgrade projectMoehs, D.P. et al. | 2000
- 764
-
Ion source development for isotope separator on-line based radioactive nuclear beam facility at KEK-TanashiJeong, S. C. / Ishiyama, H. / Ishida, Y. / Kawakami, H. / Kawashima, H. / Miyatake, H. / Mizutani, S. / Oyaizu, M. / Takaku, S. / Tojyo, E. et al. | 2000
- 764
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Ion source development for isotope separator on-line based radioactive nuclear beam facility at KEK-TanashiJeong, S.C. et al. | 2000
- 767
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Proton injector operational results on a high-power continuous-wave radio-frequency quadrupole acceleratorSherman, Joseph D. et al. | 2000
- 767
-
Proton injector operational results on a high-power continuous-wave radio-frequency quadrupole acceleratorSherman, Joseph D. / Bolme, Gerald O. / Hansborough, Lash D. / Hardek, Thomas W. / Kerstiens, Debora M. / Meyer, Earl A. / Schneider, J. David / Smith, H. Vernon / Stettler, Matthew W. / Stevens, Ralph R. et al. | 2000
- 771
-
TRIPS: The high intensity proton source for the TRASCO projectCelona, L. / Ciavola, G. / Gammino, S. / Gobin, R. / Ferdinand, R. et al. | 2000
- 771
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - TRIPS: The high intensity proton source for the TRASCO projectCelona, L. et al. | 2000
- 774
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - Status report on electron cyclotron resonance Ion source operation at the Flerov Laboratory of Nuclear Reactions (Joint Institute for Nuclear Research) cyclotronsKutner, V.B. et al. | 2000
- 774
-
Status report on electron cyclotron resonance ion source operation at the Flerov Laboratory of Nuclear Reactions (Joint Institute for Nuclear Research) cyclotronsKutner, V. B. / Bogomolov, S. L. / Efremov, A. A. / Lebedev, A. N. / Loginov, V. N. / Yazvitsky, N. Yu. et al. | 2000
- 777
-
A plan for on-line production and acceleration of radioactive isotope beams by use of electron cyclotron resonance ion source NANOGANMatsuta, K. / Fukuda, M. / Mihara, M. / Minamisono, T. / Mizobuchi, A. / Kitagawa, A. / Hattori, T. / Sasaki, M. / Kaminaka, S. / Hashimoto, K. et al. | 2000
- 777
-
POSTER SESSION A - ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - D. Accelerator Injection - A plan for on-line production and acceleration of radioactive isotope beams by use of electron cyclotron resonance ion source NANOGANMatsuta, K. et al. | 2000
- 780
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Molecular ion implanter equipped with liquid-metal alloy ion sourceGotoh, Y. et al. | 2000
- 780
-
Molecular ion implanter equipped with liquid-metal alloy ion sourceGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 783
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - High current and high intensity pulsed ion-beam sources for combined treatment of materialsRyabchikov, A.I. et al. | 2000
- 783
-
High current and high intensity pulsed ion-beam sources for combined treatment of materialsRyabchikov, A. I. / Petrov, A. V. / Stepanov, I. B. / Shulepov, I. A. / Tolmachjeva, V. G. et al. | 2000
- 786
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - The L3A facility at the Vinca Institute: Surface modification of materials, by heavy Ion beams from an electron cyclotron resonance Ion sourceDobrosavljevic, A. et al. | 2000
- 786
-
The L3A facility at the Vincˇa Institute: Surface modification of materials, by heavy ion beams from an electron cyclotron resonance ion sourceDobrosavljevic´, A. / Milosavljevic´, M. / Bibic´, N. / Efremov, A. et al. | 2000
- 789
-
Specific modification of polysulfone with cluster bombardment with assistance of Ar ion irradiationXu, Guochun / Hibino, Y. / Awazu, K. / Tanihara, M. / Imanishi, Y. et al. | 2000
- 789
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Specific modification of polysulfone with cluster bombardment with assistance of Ar ion irradiationXu, Guochun et al. | 2000
- 793
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Theoretical analysis of the embedded layer formed by high-energy Au implantation into Si(II)Nakagawa, S.T. et al. | 2000
- 793
-
Theoretical analysis of the embedded layer formed by high-energy Au implantation into Si(II)Nakagawa, S. T. / Nakano, S. / Ogiso, H. / Iwaki, M. / Hashimoto, M. / Eckstein, W. et al. | 2000
- 797
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - A negative ion beam application to artificial formation of neuron network in cultureTsuji, Hiroshi et al. | 2000
- 797
-
A negative ion beam application to artificial formation of neuron network in cultureTsuji, Hiroshi / Sato, Hiroko / Baba, Takahiro / Gotoh, Yasuhito / Ishikawa, Junzo et al. | 2000
- 800
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Microwave plasma source for high current ion beam neutralizationKorzec, D. et al. | 2000
- 800
-
Microwave plasma source for high current ion beam neutralizationKorzec, D. / Mu¨ller, A. / Engemann, J. et al. | 2000
- 804
-
Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beadsTsuji, Hiroshi / Kido, Shunsuke / Sasaki, Hitoshi / Gotoh, Yasuhito / Ishikawa, Junzo et al. | 2000
- 804
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beadsTsuji, Hiroshi et al. | 2000
- 807
-
High current injectors for heavy ion driven inertial fusionKwan, J. W. et al. | 2000
- 807
-
POSTER SESSION A - 4. APPLICATION OF ION SOURCES AND BEAMS - High current injectors for heavy ion driven inertial fusionKwan, J.W. et al. | 2000
- 810
-
Electron beam ion sources in the reflex mode of operation (review and progress report) (invited)Donets, E. D. et al. | 2000
- 810
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Electron beam ion sources in the reflex mode of operation (review and progress report) (invited)Donets, E.D. et al. | 2000
- 816
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Electron beam ion sources and traps (invited)Becker, Reinard et al. | 2000
- 816
-
Electron beam ion sources and traps (invited)Becker, Reinard et al. | 2000
- 820
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Simulation of ion extraction and beam transport (invited)Spädtke, P. et al. | 2000
- 820
-
Simulation of ion extraction and beam transport (invited)Spa¨dtke, P. / Mu¨hle, C. et al. | 2000
- 826
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Status of vacuum arc ion sources (invited) (abstract)Brown, Ian et al. | 2000
- 826
-
Status of vacuum arc ion sources (invited) (abstract)Brown, Ian et al. | 2000
- 827
-
POSTER SESSION A - EBIS AND ION EXTRACTION - Pulsed vacuum-arc ion source operated with a "triggerless" arc initiation methodAnders, A. et al. | 2000
- 827
-
Pulsed vacuum-arc ion source operated with a “triggerless” arc initiation methodAnders, A. / Schein, J. / Qi, N. et al. | 2000
- 830
-
Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited)Lagniel, J.-M. / Beauvais, P.-Y. / Bogard, D. / Bourdelle, G. / Charruau, G. / Delferrie`re, O. / De Menezes, D. / France, A. / Ferdinand, R. / Gauthier, Y. et al. | 2000
- 830
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode (invited)Lagniel, J.-M. et al. | 2000
- 836
-
The Frankfurt 200 mA proton sourceHollinger, R. / Beller, P. / Volk, K. / Weber, M. / Klein, H. et al. | 2000
- 836
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - The Frankfurt 200 mA proton sourceHollinger, R. et al. | 2000
- 839
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Fundamental aspects of electron cyclotron resonance ion sources: From classical to large superconducting devices (invited)Hitz, Denis et al. | 2000
- 839
-
Fundamental aspects of electron cyclotron resonance ion sources: From classical to large superconducting devices (invited)Hitz, Denis / Melin, Ge´rard / Girard, Alain et al. | 2000
- 846
-
Dynamic simulations of the interchange instability, ion production, and electron heating processes in an electron cyclotron resonance ion source plasmaNiimura, M. / Lamoureux, M. / Goto, A. / Yano, Y. et al. | 2000
- 846
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Dynamic simulations of the interchange instability, ion production, and electron heating processes in an electron cyclotron resonance ion source plasmaNiimura, M. et al. | 2000
- 850
-
Multicomponent consideration of electron fraction of electron-cyclotron resonance source plasmaShirkov, G. et al. | 2000
- 850
-
POSTER SESSION A - PROTON ION SOURCES AND ECR ION SOURCES (III) - Multicomponent consideration of electron fraction of electron-cyclotron resonance source plasmaShirkov, G. et al. | 2000
- 853
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Selection of the powdery metal hydride best for producing H- by thermal desorptionKawano, H. et al. | 2000
- 853
-
Selection of the powdery metal hydride best for producing H− by thermal desorptionKawano, H. / Tanaka, A. / Sugimoto, S. / Iseki, T. / Zhu, Y. / Wada, M. / Sasao, M. et al. | 2000
- 856
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Selection of the substrate metal best for thermal positive ionizationKawano, H. et al. | 2000
- 856
-
Selection of the substrate metal best for thermal positive ionizationKawano, H. / Mine, H. / Moriyama, M. / Tanigawa, M. / Zhu, Y. et al. | 2000
- 859
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Influence of electron injection on electron cyclotron resonance plasma properties and reflected mode electrons (abstract)Ovsyannikov, V.P. et al. | 2000
- 859
-
Influence of electron injection on electron cyclotron resonance plasma properties and reflected mode electrons (abstract)Ovsyannikov, V. P. / Ullmann, F. / Zschornack, G. et al. | 2000
- 860
-
Production of intense 48Ca ion beam at the U-400 cyclotronKutner, V. B. / Bogomolov, S. L. / Efremov, A. A. / Lebedev, A. N. / Lebedev, V. Ya. / Loginov, V. N. / Yakushev, A. B. / Yazvitsky, N. Yu. et al. | 2000
- 860
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Production of intense 48Ca ion beam at the U-400 cyclotronKutner, V.B. et al. | 2000
- 863
-
Effect of a biased probe on the afterglow operation of an ECR4 ion sourceHill, C. E. / Ku¨chler, D. / Wenander, F. / Wolf, B. H. et al. | 2000
- 863
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Effect of a biased probe on the afterglow operation of an ECR4 ion sourceHill, C.E. et al. | 2000
- 866
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Comparison of electron cyclotron resonance plasma characteristics discharged by 7.0, 8.0, and 9.4 GHzKawai, Y. et al. | 2000
- 866
-
Comparison of electron cyclotron resonance plasma characteristics discharged by 7.0, 8.0, and 9.4 GHzKawai, Y. / Saburi, T. / Kim, S-H. / Fujii, Y. / Suzuki, T. et al. | 2000
- 869
-
Production of highly charged ions in electron cyclotron resonance ion sources using an electrode in two modesBiri, S. / Kene´z, L. / Valek, A. / Nakagawa, T. / Kidera, M. / Yano, Y. et al. | 2000
- 869
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Production of highly charged ions in electron cyclotron resonance ion sources using an electrode in two modesBiri, S. et al. | 2000
- 872
-
Increasing the space-charge limit and other effects of cesium seeding in hydrogen negative ion sourcesWhealton, J. H. / Bacal, M. / Bruneteau, J. / Raridon, R. J. et al. | 2000
- 872
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Increasing the space-charge limit and other effects of cesium seeding in hydrogen negative ion sourcesWhealton, J.H. et al. | 2000
- 875
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Beam instability excited by the magnetic filterNaitou, Hiroshi et al. | 2000
- 875
-
Beam instability excited by the magnetic filterNaitou, Hiroshi / Ohi, Kazuo / Fukumasa, Osamu et al. | 2000
- 877
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Relation between vapor Cs and adsorbed Cs in H- ion sourceOgasawara, M. et al. | 2000
- 877
-
Relation between vapor Cs and adsorbed Cs in H− ion sourceOgasawara, M. / Morishita, T. / Hatayama, A. et al. | 2000
- 880
-
Numerical simulation of cesium cooling effects in H− ion sourceMorishita, T. / Ogasawara, M. / Hatayama, A. et al. | 2000
- 880
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Numerical simulation of cesium cooling effects in H- ion sourceMorishita, T. et al. | 2000
- 883
-
Monte Carlo simulation of negative ion production in the negative hydrogen ion sourceUematsu, M. / Morishita, T. / Hatayama, A. / Sakurabayashi, T. / Ogasawara, M. et al. | 2000
- 883
-
POSTER SESSION B - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Simulations - Monte Carlo simulation of negative ion production in the negative hydrogen ion sourceUematsu, M. et al. | 2000
- 887
-
Theory and simulations of electron beam ion source in reflex modeDonets, E. D. / Donets, E. E. / Syresin, E. M. et al. | 2000
- 887
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Theory and simulations of electron beam ion source in reflex modeDonets, E.D. et al. | 2000
- 890
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Compact electron-beam ion trap using NdFeB permanent magnetsMotohashi, Kenji et al. | 2000
- 890
-
Compact electron-beam ion trap using NdFeB permanent magnetsMotohashi, Kenji / Moriya, Akihiko / Yamada, Hiroyuki / Tsurubuchi, Seiji et al. | 2000
- 893
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Status of the Brookhaven National Laboratory high current electron beam ion source test standBeebe, E. et al. | 2000
- 893
-
Status of the Brookhaven National Laboratory high current electron beam ion source test standBeebe, E. / Alessi, J. / Bellavia, S. / Hershcovitch, A. / Kponou, A. / Lockey, R. / Pikin, A. / Prelec, K. / Stein, P. / Kuznetsov, G. et al. | 2000
- 896
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - A study of electron strings and their use for efficient production of highly charged ionsDonets, E.D. et al. | 2000
- 896
-
A study of electron strings and their use for efficient production of highly charged ionsDonets, E. D. / Donets, D. E. / Donets, E. E. / Salnikov, V. V. / Shutov, V. B. / Syresin, E. M. / Bjorkhage, M. / Carle, P. / Liljeby, L. / Rensfelt, K.-G. et al. | 2000
- 899
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devicesBieth, C. et al. | 2000
- 899
-
Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devicesBieth, C. / Bouly, J. L. / Curdy, J. C. / Kantas, S. / Sortais, P. / Sole, P. / Vieux-Rochaz, J. L. et al. | 2000
- 902
-
POSTER SESSION B - 2. NOVEL ION SOURCES - A. Electron Beam Ion Sources - New improvements on the Kansas State University cryogenic electron beam ion source, a user facility for low energy, highly charged ionsStockli, M.P. et al. | 2000
- 902
-
New improvements on the Kansas State University cryogenic electron beam ion source, a user facility for low energy, highly charged ionsStockli, M. P. / Carnes, K. / Cocke, C. L. / DePaola, B. D. / Ehrenreich, T. / Fehrenbach, C. / Fry, D. / Gibson, P. E. / Kelly, S. / Lehnert, U. et al. | 2000
- 906
-
Magnetic field modification of 18 GHz electron cyclotron resonance ion source at the Japan Atomic Energy Research InstituteYokota, W. / Saitoh, Y. / Nara, T. / Ishii, Y. / Arakawa, K. et al. | 2000
- 906
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Magnetic field modification of 18 GHz electron cyclotron resonance ion source at the Japan Atomic Energy Research InstituteYokota, W. et al. | 2000
- 909
-
Design of electron cyclotron resonance ion source using liquid-helium-free superconducting solenoid coilsKurita, Tetsuro / Nakagawa, Takahide / Kawaguchi, Takeo / Lee, Sang-Moo et al. | 2000
- 909
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Design of electron cyclotron resonance ion source using liquid-helium-free superconducting solenoid coilsKurita, Tetsuro et al. | 2000
- 912
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Time resolved experiments at the Frankfurt 14 GHz electron cyclotron resonance ion sourceRunkel, S. et al. | 2000
- 912
-
Time resolved experiments at the Frankfurt 14 GHz electron cyclotron resonance ion sourceRunkel, S. / Hohn, O. / Stiebing, K. E. / Schempp, A. / Schmidt-Bo¨cking, H. / Mironov, V. / Shirkov, G. et al. | 2000
- 915
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Progress report on the mVINIS ion sourceDobrosavljevic, A. et al. | 2000
- 915
-
Progress report on the mVINIS ion sourceDobrosavljevic´, A. / Efremov, A. / Draganic´, I. / Dekic´, S. / Stalevski, T. et al. | 2000
- 918
-
Influence of the secondary electrons emitted by a cylindrical metal-dielectric structure on the Frankfurt 14 GHz electron cyclotron resonance ion source performancesScha¨chter, L. / Stiebing, K. E. / Dobrescu, S. / Badescu-Singureanu, Al. I. / Runkel, S. / Hohn, O. / Schmidt, L. / Schempp, A. / Schmidt-Bo¨cking, H. et al. | 2000
- 918
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Influence of the secondary electrons emitted by a cylindrical metal-dielectric structure on the Frankfurt 14 GHz electron cyclotron resonance ion source performancesSchächter, L. et al. | 2000
- 921
-
Tornado-type closed magnetic trap for an electron cyclotron resonance ion sourceAbramova, K. B. / Smirnov, A. N. / Voronin, A. V. / Zorin, V. G. et al. | 2000
- 921
-
POSTER SESSION B - 2. NOVEL ION SOURCES - B. ECR Ion Sources - Tornado-type closed magnetic trap for an electron cyclotron resonance ion sourceAbramova, K.B. et al. | 2000
- 924
-
Status of the CO2 laser ion source at CERNFournier, P. / Gre´goire, G. / Kugler, H. / Haseroth, H. / Lisi, N. / Meyer, C. / Ostroumov, P. / Schnuriger, J.-C. / Scrivens, R. / Rodriguez, F. Varela et al. | 2000
- 924
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Status of the CO2 laser ion source at CERNFournier, P. et al. | 2000
- 927
-
Properties of iodine laser-produced stream of multiply charged heavy ions of different elementsLa´ska, L. / Kra´sa, J. / Masˇek, K. / Pfeifer, M. / Rohlena, K. / Kra´likova´, B. / Ska´la, J. / Woryna, E. / Parys, P. / Wolowski, J. et al. | 2000
- 927
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Properties of iodine laser-produced stream of multiply charged heavy ions of different elementsLáska, L. et al. | 2000
- 931
-
POSTER SESSION B - 2. NOVEL ION SOURCES - C. Laser Ion Sources - Energetic-multiple-charged-ion sources on short-laser-pulse irradiated foilsZhidkov, A. et al. | 2000
- 931
-
Energetic-multiple-charged-ion sources on short-laser-pulse irradiated foilsZhidkov, A. / Sasaki, A. / Tajima, T. et al. | 2000
- 935
-
Electron cyclotron resonance negative ion sourceFukumasa, Osamu / Matsumori, Masanori et al. | 2000
- 935
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Electron cyclotron resonance negative ion sourceFukumasa, Osamu et al. | 2000
- 939
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Development of large radio frequency driven negative ion sources for fusionVollmer, O. et al. | 2000
- 939
-
Development of large radio frequency driven negative ion sources for fusionVollmer, O. / Falter, H. / Frank, P. / Heinemann, B. / Kraus, W. / Massmann, P. / McNeely, P. / Riedl, R. / Speth, E. / Trainham, R. et al. | 2000
- 943
-
Feasibility study of a new negative ion source using a transformer coupled plasma sourceHwang, Y. S. / Lee, G. H. et al. | 2000
- 943
-
POSTER SESSION B - 2. NOVEL ION SOURCES - D. Hydrogen Negative Ion Sources - Feasibility study of a new negative ion source using a transformer coupled plasma sourceHwang, Y.S. et al. | 2000
- 946
-
Efficiency and transient time studies of an electron cyclotron resonance ion source for radioactive ion beam production at ISAC/TRIUMFJayamanna, K. / Yuan, D. / Bishop, D. / Dale, D. / Dombsky, M. / Kuo, T. / Kadantsev, S. / Keitel, R. / Louie, D. / McDonald, M. et al. | 2000
- 946
-
POSTER SESSION B - 2. NOVEL ION SOURCES - E. Microwave Ion Sources - Efficiency and transient time studies of an electron cyclotron resonance ion source for radioactive ion beam production at ISAC-TRIUMFJayamanna, K. et al. | 2000
- 949
-
Laser produced Ag ions for direct implantationWoryna, E. / Wolowski, J. / Kra´likova´, B. / Kra´sa, J. / La´ska, L. / Pfeifer, M. / Rohlena, K. / Ska´la, J. / Perˇina, V. / Boody, F. P. et al. | 2000
- 949
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Laser produced Ag ions for direct implantationWoryna, E. et al. | 2000
- 952
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - High-current microwave ion source for wide-energy-range O+ ion implantationTokiguchi, K. et al. | 2000
- 952
-
High-current microwave ion source for wide-energy-range O+ ion implantationTokiguchi, K. / Seki, T. / Ito, J. / Sato, T. / Mera, K. et al. | 2000
- 955
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Production of Ce negative ions in a Cs sputter ion sourceSaitoh, Y. et al. | 2000
- 955
-
Production of Ce negative ions in a Cs sputter ion sourceSaitoh, Y. / Yotsombat, B. / Mizuhashi, K. / Tajima, S. et al. | 2000
- 958
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Profile control of the large area ribbon beam ion source using 500 MHz ultrahigh frequency dischargeSakai, Shigeki et al. | 2000
- 958
-
Profile control of the large area ribbon beam ion source using 500 MHz ultrahigh frequency dischargeSakai, Shigeki / Takahashi, Masato / Tanjyo, Masayasu et al. | 2000
- 960
-
Change of diborane ion species depending on the magnitude of magnetic field using 100 MHz very high frequency dischargeSakai, Shigeki / Takahashi, Masato / Tanjyo, Masayasu et al. | 2000
- 960
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Material Modification - Change of diborane ion species depending on the magnitude of magnetic field using 100 MHz very high frequency dischargeSakai, Shigeki et al. | 2000
- 963
-
Development of high intensity deuteron ion source for the fusion intense neutron sourceKinsho, M. / Sugimoto, M. / Seki, M. / Oguri, H. / Okumura, Y. et al. | 2000
- 963
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Development of high intensity deuteron ion source for the fusion intense neutron sourceKinsho, M. et al. | 2000
- 966
-
Experiments with a microwave plasma as a cathode for cold or hot reflex discharge ion sourceCojocaru, G. et al. | 2000
- 966
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Experiments with a microwave plasma as a cathode for cold or hot reflex discharge ion sourceCojocaru, G. et al. | 2000
- 969
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - High-current ion source development for the Korea Multipurpose Accelerator ComplexCho, Y.S. et al. | 2000
- 969
-
High-current ion source development for the Korea Multipurpose Accelerator ComplexCho, Y. S. / Choi, B. H. / Hong, I. S. / Hwang, Y. S. et al. | 2000
- 972
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Status of the HIMAC pulsed Penning sourceMiyata, T. et al. | 2000
- 972
-
Status of the HIMAC pulsed Penning sourceMiyata, T. / Sakamoto, H. / Yamamoto, M. / Okada, T. / Kobayasi, C. / Honda, Y. / Fujimoto, T. / Takasugi, W. / Yokoyama, T. / Kageyama, Y. et al. | 2000
- 975
-
Development of a H− ion source for the high intensity proton linac at Japan Atomic Energy Research InstituteOguri, H. / Tomisawa, T. / Kinsho, M. / Okumura, Y. / Mizumoto, M. et al. | 2000
- 975
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Development of a H- ion source for the high intensity proton linac at Japan Atomic Energy Research InstituteOguri, H. et al. | 2000
- 978
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Accelerator Injection - Commissioning and initial operation of a radioactive beam ion source at ISACDombsky, M. et al. | 2000
- 978
-
Commissioning and initial operation of a radioactive beam ion source at ISACDombsky, M. / Bishop, D. / Bricault, P. / Dale, D. / Hurst, A. / Jayamanna, K. / Keitel, R. / Olivo, M. / Schmor, P. / Stanford, G. et al. | 2000
- 981
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Optimization of the radial magnetic field of an 10 GHz electron cyclotron resonance ion source at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. et al. | 2000
- 981
-
Optimization of the radial magnetic field of an 18 GHz electron cyclotron resonance ion source at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. / Muramatsu, M. / Sekiguchi, M. / Yamada, S. / Jincho, K. / Okada, T. / Yamamoto, M. / Biri, S. / Uno, K. et al. | 2000
- 984
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Development of the compact electron cyclotron resonance ion source for heavy-ion therapyMuramatsu, M. et al. | 2000
- 984
-
Development of the compact electron cyclotron resonance ion source for heavy-ion therapyMuramatsu, M. / Kitagawa, A. / Sato, S. / Sato, Y. / Yamada, S. / Hattori, T. / Shibuya, S. et al. | 2000
- 987
-
Performance test of electron cyclotron resonance ion sources for the Hyogo Ion Beam Medical CenterSawada, K. / Sawada, J. / Sakata, T. / Uno, K. / Okanishi, K. / Harada, H. / Itano, A. / Higashi, A. / Akagi, T. / Yamada, S. et al. | 2000
- 987
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Performance test of electron cyclotron resonance ion sources for the Hyogo Ion Beam Medical CenterSawada, K. et al. | 2000
- 990
-
Compact injector with alternating phase focusing–interdigital H-mode linac and superconducting electron cyclotron resonance ion source for heavy ion cancer therapyHayashizaki, Noriyosu / Hattori, Toshiyuki / Matsui, Shinjiro / Tomizawa, Hiromitsu / Yoshida, Toru / Isokawa, Katsushi / Kitagawa, Atsushi / Muramatsu, Masayuki / Yamada, Satoru / Okamura, Masahiro et al. | 2000
- 990
-
POSTER SESSION B - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - C. Medical Treatment - Compact injector with alternating phase focusing-interdigital H-mode linac and superconducting electron cyclotron resonance ion source for heavy ion cancer therapyHayashizaki, Noriyosu et al. | 2000
- 993
-
Initial growth temperature of crystalline SiC by simultaneous irradiation of energetic 28Si− and 12C+Tsubouchi, Nobuteru / Chayahara, Akiyoshi / Kinomura, Atsushi / Horino, Yuji et al. | 2000
- 993
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Initial growth temperature of crystalline SiC by simultaneous irradiation of energetic 28Si- and 12C+Tsubouchi, Nobuteru et al. | 2000
- 996
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Preparation of giant magnetostrictive thin film by magnetron and ion beam sputtering processesNakazato, K. et al. | 2000
- 996
-
Preparation of giant magnetostrictive thin film by magnetron and ion beam sputtering processesNakazato, K. / Hashimoto, M. / Uchida, H. / Matsumura, Y. et al. | 2000
- 999
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - MgO thin film formation by ion enhanced deposition processesHashimoto, M. et al. | 2000
- 999
-
MgO thin film formation by ion enhanced deposition processesHashimoto, M. / Onozaki, Y. / Uchida, H. / Matsumura, Y. et al. | 2000
- 1002
-
Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devicesGotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 1002
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devicesGotoh, Y. et al. | 2000
- 1006
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Experimental study of three-dimensional microfabrication by focused ion beam technologyYongqi, Fu et al. | 2000
- 1006
-
Experimental study of three-dimensional microfabrication by focused ion beam technologyYongqi, Fu / Kok, Ngoi / Bryan, Ann / Hung, N. P. / Shing, Ong Nan et al. | 2000
- 1009
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etchingFu, Yongqi et al. | 2000
- 1009
-
Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etchingFu, Yongqi / Bryan, Ngoi Kok Ann / Shing, Ong Nan et al. | 2000
- 1012
-
POSTER SESSION B - 4. APPLICATION OF ION SOURCES AND BEAMS - Sputtering and thermal effect during ion microbeam patterning of polymeric filmsEktessabi, A.M. et al. | 2000
- 1012
-
Sputtering and thermal effect during ion microbeam patterning of polymeric filmsEktessabi, A. M. / Sano, T. et al. | 2000
- 1016
-
Microwave ion sources for industrial applications (invited)Sakudo, N. et al. | 2000
- 1016
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Microwave ion sources for industrial applications (invited)Sakudo, N. et al. | 2000
- 1023
-
Ion sources for large area processing (invited)Naito, M. / Ando, Y. / Inouchi, Y. / Tanaka, H. / Miyamoto, N. et al. | 2000
- 1023
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Ion sources for large area processing (invited)Naito, M. et al. | 2000
- 1029
-
Radio frequency linear ion beam source with 6 cm×66 cm beamSiegfried, D. / Buchholtz, B. / Burtner, D. / Foster, W. et al. | 2000
- 1029
-
POSTER SESSION B - ION SOURCES FOR IMPLANTATION AND SURFACE MODIFICATION - Radio frequency linear ion beam source with 6 cmx66 cm beamSiegfried, D. et al. | 2000
- 1032
-
The production and use of ultralow energy ion beamsGoldberg, R. D. / Armour, D. G. / van den Berg, J. A. / Cook, C. E. A. / Whelan, S. / Zhang, S. / Knorr, N. / Foad, M. A. / Ohno, H. et al. | 2000
- 1032
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - The production and use of ultralow energy ion beamsGoldberg, R.D. et al. | 2000
- 1036
-
Applications of heavy-negative-ion sources for materials science (invited)Ishikawa, Junzo et al. | 2000
- 1036
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - Applications of heavy-negative-ion sources for materials science (invited)Ishikawa, Junzo et al. | 2000
- 1042
-
A 2.45 GHz microwave negative hydrogen ion sourceTakagi, A. / Mori, Y. et al. | 2000
- 1042
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - A 2.45 GHz microwave negative hydrogen ion sourceTakagi, A. et al. | 2000
- 1045
-
POSTER SESSION B - NEGATIVE ION SOURCES AND ION SOURCES FOR INDUSTRIAL APPLICATIONS - Intense pulsed ion beam sources for industrial applicationsZhao, W.J. et al. | 2000
- 1045
-
Intense pulsed ion beam sources for industrial applicationsZhao, W. J. / Remnev, G. E. / Yan, S. / Opekounov, M. S. / Le, X. Y. / Matvienko, V. M. / Han, B. X. / Xue, J. M. / Wang, Y. G. et al. | 2000
- 1049
-
POSTER SESSION B - MISCELLANEOUS ION SOURCES AND BEAM TRANSPORT - Ion source of multiply charged C60 fullerene and fullerene linear acceleratorHattori, Toshiyuki et al. | 2000
- 1049
-
Ion source of multiply charged C60 fullerene and fullerene linear acceleratorHattori, Toshiyuki / Hayashizaki, Noriyosu / Matsui, Shinjirou / Tomizawa, Hiromitsu / Yoshida, Toru / Gates, Stephen John / Sasa, Kimikazu / Majima, Satoshi / Isokawa, Katsushi / Ito, Takashi et al. | 2000
- 1052
-
Effects of indirect ionization on the charge state distributions observed with highly charged ion sourcesStockli, M. P. / Lehnert, U. / Becker, R. / Delferriere, O. / Gebel, Th. / Ullmann, F. / Kobayashi, N. / Matsumoto, J. et al. | 2000
- 1052
-
POSTER SESSION B - MISCELLANEOUS ION SOURCES AND BEAM TRANSPORT - Effects of indirect ionization on the charge state distributions observed with highly charged ion sourcesStockli, M.P. et al. | 2000
- 1056
-
Medical accelerators in Japan (invited)Soga, F. et al. | 2000
- 1056
-
POSTER SESSION B - ION SOURCES FOR MEDICAL APPLICATIONS AND LASER ION SOURCES - Medical accelerators in Japan (invited)Soga, F. et al. | 2000
- 1061
-
POSTER SESSION B - ION SOURCES FOR MEDICAL APPLICATIONS AND LASER ION SOURCES - Status report on electron cyclotron resonance ion sources at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. et al. | 2000
- 1061
-
Status report on electron cyclotron resonance ion sources at the Heavy Ion Medical Accelerator in ChibaKitagawa, A. / Muramatsu, M. / Sekiguchi, M. / Yamada, S. / Jincho, K. / Okada, T. / Yamamoto, M. / Hattori, T. / Biri, S. / Baskaran, R. et al. | 2000
- 1064
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - The application and status of the radio frequency driven multi-cusp ion source (invited)Leung, Ka-Ngo et al. | 2000
- 1064
-
The application and status of the radio frequency driven multi-cusp ion source (invited)Leung, Ka-Ngo et al. | 2000
- 1069
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Negative ion sources for high energy accelerators (invited)Peters, J. et al. | 2000
- 1069
-
Negative ion sources for high energy accelerators (invited)Peters, J. et al. | 2000
- 1075
-
Performance of the NANOGUN™ electron cyclotron resonance ion source applied for nuclear astrophysicsItahashi, T. / Kudomi, K. / Kume, K. / Takahisa, K. / Yoshida, S. / Ejiri, H. / Toki, H. / Nagai, Y. / Ohsumi, H. / Komori, M. et al. | 2000
- 1075
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Performance of the NANOGUNTM electron cyclotron resonance ion source applied for nuclear astrophysicsItahashi, T. et al. | 2000
- 1079
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Hydrogen negative ion source with LaB6 insertsBelchenko, Yu I. et al. | 2000
- 1079
-
Hydrogen negative ion source with LaB6 insertsBelchenko, Yu. I. / Kuznetsov, G. I. / Grigoryev, E. A. et al. | 2000
- 1082
-
POSTER SESSION B - NEGATIVE ION SOURCES FOR ACCELERATORS AND FUSION (I) - Effect of cesium and xenon seeding in negative hydrogen ion sourcesBacal, M. et al. | 2000
- 1082
-
Effect of cesium and xenon seeding in negative hydrogen ion sourcesBacal, M. / Bruneteau, A. M. / Deniset, C. / Elizarov, L. I. / Sube, F. / Tontegode, A. Y. / Whealton, J. H. et al. | 2000
- 1086
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Some consequences to ion source behavior of high plasma drift velocityBrown, I.G. et al. | 2000
- 1086
-
Some consequences to ion source behavior of high plasma drift velocityBrown, I. G. / Monteiro, O. R. / Bilek, M. M. M. / Keidar, M. / Oks, E. M. / Vizir, A. et al. | 2000
- 1090
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Bipolar extraction neutralization: Time resolved characterizationKorzec, D. et al. | 2000
- 1090
-
Bipolar extraction neutralization: Time resolved characterizationKorzec, D. / Dahlhaus, R. / Engemann, J. et al. | 2000
- 1094
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Numerical simulation and optimization of multicomponent ion beam from RIKEN electron cyclotron resonance ion sourcesAlexandrov, V. et al. | 2000
- 1094
-
Numerical simulation and optimization of multicomponent ion beam from RIKEN electron cyclotron resonance ion sourcesAlexandrov, V. / Nakagawa, T. / Shevtsov, V. / Shirkov, G. et al. | 2000
- 1097
-
Aberrations due to solenoid focusing of a multiply charged high-current ion beamGre´goire, G. / Kugler, H. / Lisi, N. / Schnuriger, J.-C. / Scrivens, R. / Tambini, J. et al. | 2000
- 1097
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - A. Ion Production, Extraction, and Beam Transport - Aberrations due to solenoid focusing of a multiply charged high-current ion beamGrégoire, G. et al. | 2000
- 1100
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Calibration of the Galileo microchannel plates with the Xe2+-Xe13+ and C2+-C6+ ions in the energy range from 0.5 to 150 keV-q (abstract)Mroz, W. et al. | 2000
- 1100
-
Calibration of the Galileo microchannel plates with the Xe2+–Xe13+ and C2+–C6+ ions in the energy range from 0.5 to 150 keV/q (abstract)Mro´z, W. / Sto¨ckli, M. P. / Fry, D. / Prokopiuk, A. / Walch, B. et al. | 2000
- 1101
-
Energy analysis of negative hydrogen ions using detached electronsTakahashi, M. / Yoshimoto, M. / Shinto, K. / Takagi, A. / Ikegami, K. / Mori, Y. et al. | 2000
- 1101
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Energy analysis of negative hydrogen ions using detached electronsTakahashi, M. et al. | 2000
- 1104
-
A comparative study of emittance measurements using different techniquesHamabe, M. / Kuroda, T. / Sasao, M. / Nishiura, M. / Wada, M. / Guharay, S. K. et al. | 2000
- 1104
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - A comparative study of emittance measurements using different techniquesHamabe, M. et al. | 2000
- 1107
-
POSTER SESSION C - 1. FUNDAMENTAL PHENOMENA FOR ION SOURCES - B. Diagnostics - Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion sourceJakob, A. et al. | 2000
- 1107
-
Time resolving diagnostic of the compensation process of pulsed ion beams at high-intensity light ion sourceJakob, A. / Beauvais, P-Y. / Gobin, R. / Klein, H. / LeMaire, J-L. / LeRoy, P-A. / Pozimski, J. et al. | 2000
- 1110
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Beam extraction from a compact Ku-band electron cyclotron resonance ion source with double resonance modesTojyo, E. et al. | 2000
- 1110
-
Beam extraction from a compact Ku-band electron cyclotron resonance ion source with double resonance modesTojyo, E. / Oyaizu, M. / Jeong, S. C. / Ishiyama, H. / Ishida, Y. / Kawakami, H. / Miyatake, H. / Katayama, I. / Nomura, T. et al. | 2000
- 1113
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Design of a small electron cyclotron resonance ion source with partially pulsed magnetic fieldOyaizu, M. et al. | 2000
- 1113
-
Design of a small electron cyclotron resonance ion source with partially pulsed magnetic fieldOyaizu, M. / Tojyo, E. / Jeong, S. C. / Ishiyama, H. / Miyatake, H. / Ishida, Y. / Kawakami, H. / Katayama, I. / Nomura, T. et al. | 2000
- 1116
-
Electron cyclotron resonance ion trap: A hybrid magnetic system with very high mirror ratio for highly charged ion production and trappingBiri, S. / Simons, L. / Hitz, D. et al. | 2000
- 1116
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Electron cyclotron resonance ion trap: A hybrid magnetic system with very high mirror ratio for highly charged ion production and trappingBiri, S. et al. | 2000
- 1119
-
Preliminary tests for the electron cyclotron resonance ion source coupled to a laser ion source for charge state enhancement experimentGammino, S. / Ciavola, G. / Torrisi, L. / Celona, L. / Wolowski, J. / Woryna, E. / Parys, P. / La`ska, L. / Kra`sa, J. / Shirkov, G. D. et al. | 2000
- 1119
-
POSTER SESSION C - 2. NOVEL ION SOURCES - A. ECR Ion Sources - Preliminary tests for the electron cyclotron resonance ion source coupled to a laser ion source for charge state enhancement experimentGammino, S. et al. | 2000
- 1122
-
POSTER SESSION C - 2. NOVEL ION SOURCES - B. Sputter Negative Ion Sources - Energy distribution of negative carbon ion beam extracted from a plasma-sputter-type negative ion sourceOomori, H. et al. | 2000
- 1122
-
Energy distribution of negative carbon ion beam extracted from a plasma-sputter-type negative ion sourceOomori, H. / Kasuya, T. / Wada, M. / Horino, Y. / Tsubouchi, N. et al. | 2000
- 1125
-
Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell systemTanaka, M. / Amemiya, K. et al. | 2000
- 1125
-
POSTER SESSION C - 2. NOVEL ION SOURCES - B. Sputter Negative Ion Sources - Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell systemTanaka, M. et al. | 2000
- 1128
-
Ion bombardment-type high frequency metal ion source for compact ion beam deposition apparatusYamashita, Mutsuo et al. | 2000
- 1128
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Ion bombardment-type high frequency metal ion source for compact ion beam deposition apparatusYamashita, Mutsuo et al. | 2000
- 1131
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Ion energy width of a dc metal arc plasma under high vacuumTamba, Moritake et al. | 2000
- 1131
-
Ion energy width of a dc metal arc plasma under high vacuumTamba, Moritake / Amemiya, Hiroshi et al. | 2000
- 1134
-
Improvement of the lifetime of radio frequency antenna for plasma generationReijonen, J. / Eardley, M. / Gough, R. / Keller, R. / Leung, K. / Thomae, R. / Pickard, D. / Williams, M. D. et al. | 2000
- 1134
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Improvement of the lifetime of radio frequency antenna for plasma generationReijonen, J. et al. | 2000
- 1137
-
POSTER SESSION C - 2. NOVEL ION SOURCES - C. New Concept Ion Sources - Beam diagnostics extracted from radio frequency driven ion sourceAbdelaziz, M.E. et al. | 2000
- 1137
-
Beam diagnostics extracted from radio frequency driven ion sourceAbdelaziz, M. E. / Zakhary, S. G. / Ragheb, M. S. et al. | 2000
- 1140
-
Discharge characteristics of a long pulse ion source for the Korea Superconducting Tokamak Advanced Research neutral beam systemOh, B. H. / Kim, K. R. / Choi, B. H. et al. | 2000
- 1140
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Discharge characteristics of a long pulse ion source for the Korea Superconducting Tokamak Advanced Research neutral beam systemOh, B.H. et al. | 2000
- 1144
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Development of a steady-state microwave ion source with large spherical electrodes for geometrical focusingKawakami, T. et al. | 2000
- 1144
-
Development of a steady-state microwave ion source with large spherical electrodes for geometrical focusingKawakami, T. / Shimada, T. / Yonezawa, T. / Ueda, Y. / Nishikawa, M. et al. | 2000
- 1148
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Investigation of a radio frequency-driven multicusp ion source of the diagnostic neutral beam for the Hanbit device at Korea Basic Science InstituteYang, H.L. et al. | 2000
- 1148
-
Investigation of a radio frequency-driven multicusp ion source of the diagnostic neutral beam for the Hanbit device at Korea Basic Science InstituteYang, H. L. / Yoo, S. J. / Hwang, S. M. / Chung, K. H. et al. | 2000
- 1151
-
Comparison of H−/D− measurement in the magnetically filtered region of the large negative ion sourceHamabe, M. / Oka, Y. / Osakabe, M. / Takeiri, Y. / Tsumori, K. / Kaneko, O. et al. | 2000
- 1151
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Comparison of H--D- measurement in the magnetically filtered region of the large negative ion sourceHamabe, M. et al. | 2000
- 1154
-
Calculations of stray electron trajectory for designing negative ion accelerators of neutral beam injectorAsano, Shiro / Okuyama, Toshihisa / Suzuki, Yasuo / Kaneko, Osamu et al. | 2000
- 1154
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - A. Neutral Beam Injector for Fusion - Calculations of stray electron trajectory for designing negative ion accelerators of neutral beam injectorAsano, Shiro et al. | 2000
- 1157
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Production of organosilicon ions for SIC epitaxyKiuchi, Masato et al. | 2000
- 1157
-
Production of organosilicon ions for SiC epitaxyKiuchi, Masato / Matsumoto, Takashi / Mimoto, Kazuhiko / Takeuchi, Takae / Goto, Seiichi et al. | 2000
- 1160
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Compact microwave ion source for extremely low energy ion irradiation systemGotoh, Y. et al. | 2000
- 1160
-
Compact microwave ion source for extremely low energy ion irradiation systemGotoh, Y. / Kubo, H. / Tsuji, H. / Ishikawa, J. et al. | 2000
- 1163
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Ion source for ion beam deposition employing a novel electrode assemblyHayes, A.V. et al. | 2000
- 1163
-
Ion source for ion beam deposition employing a novel electrode assemblyHayes, A. V. / Kanarov, V. / Yevtukhov, R. / Hegde, H. / Druz, B. / Yakovlevitch, D. / Cheesman, W. / Mirkov, V. et al. | 2000
- 1168
-
Development and properties of a Freeman-type hybrid ion sourceMatsumoto, T. / Mimoto, K. / Goto, S. / Ohba, M. / Agawa, Y. / Kiuchi, M. et al. | 2000
- 1168
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Development and properties of a Freeman-type hybrid ion sourceMatsumoto, T. et al. | 2000
- 1171
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Development of a compact multicusp ion source of He+Nishiura, M. et al. | 2000
- 1171
-
Development of a compact multicusp ion source of He+Nishiura, M. / Sasao, M. / Wada, M. / Hamabe, M. / Kuroda, T. / Guharay, S. K. et al. | 2000
- 1174
-
Prolongation of a filament lifetime using SF6 plasma methodOhkoshi, Kiyonori / Saitoh, Yuichi / Kamiya, Tomihiro / Sakai, Takuro / Tajima, Satoshi et al. | 2000
- 1174
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Prolongation of a filament lifetime using SF6 plasma methodOhkoshi, Kiyonori et al. | 2000
- 1177
-
Design and performance of a versatile, cost-effective microwave electron cyclotron resonance plasma source for surface and thin film processingAnton, R. / Wiegner, Th. / Naumann, W. / Liebmann, M. / Klein, Chr. / Bradley, Chr. et al. | 2000
- 1177
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Design and performance of a versatile, cost-effective microwave electron cyclotron resonance plasma source for surface and thin film processingAnton, R. et al. | 2000
- 1181
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - A 13.56 MHz multicusp ion source for high intensity Ar beamBoonyawan, D. et al. | 2000
- 1181
-
A 13.56 MHz multicusp ion source for high intensity Ar beamBoonyawan, D. / Chirapatpimol, N. / Sanguansak, N. / Vilaithong, T. et al. | 2000
- 1184
-
Carbon shunting arc and its induced plasmaYukimura, Ken / Yoshioka, Kenji / Tani, Yuji et al. | 2000
- 1184
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Carbon shunting arc and its induced plasmaYukimura, Ken et al. | 2000
- 1187
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII)Masamune, Sadao et al. | 2000
- 1187
-
Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII)Masamune, Sadao / Yukimura, Ken et al. | 2000
- 1191
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Matching the injected ion beam into an rf Linac for a high-energy, high-current ion implanterSaadatmand, Kourosh et al. | 2000
- 1191
-
Matching the injected ion beam into an rf Linac for a high-energy, high-current ion implanterSaadatmand, Kourosh et al. | 2000
- 1194
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Measurement of the four-dimensional transverse emittance of an ion beamZeinoun, Issam et al. | 2000
- 1194
-
Measurement of the four-dimensional transverse emittance of an ion beamZeinoun, Issam / Benveniste, Victor / Saadatmand, Kourosh / Swenson, David et al. | 2000
- 1197
-
Study of ion source emittance of an ELS-PIG source used for ion implantationSwenson, D. R. / Saadatmand, K. / Zeinoun, I. et al. | 2000
- 1197
-
POSTER SESSION C - 3. ION SOURCES FOR VARIOUS KINDS OF APPLICATIONS - B. Materials Science - Study of ion source emittance of an ELS-PIG source used for ion implantationSwenson, D.R. et al. | 2000
- 1200
-
Electron cyclotron resonance light source assembly—A vacuum-ultraviolet radiation source based on an electron cyclotron resonance plasmaGru¨bling, P. / Hollandt, J. / Ulm, G. et al. | 2000
- 1200
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Electron cyclotron resonance light source assembly -- A vacuum-ultraviolet radiation source based on an electron cyclotron resonance plasmaGrübling, P. et al. | 2000
- 1203
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Studies on enhancement of x-ray flux in the compact electron cyclotron resonance plasma x-ray sourceBaskaran, R. et al. | 2000
- 1203
-
Studies on enhancement of x-ray flux in the compact electron cyclotron resonance plasma x-ray sourceBaskaran, R. / Selvakumaran, T. S. et al. | 2000
- 1206
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Production of multiply charged ion target for photoionization studies using synchrotron radiationOura, Masaki et al. | 2000
- 1206
-
Production of multiply charged ion target for photoionization studies using synchrotron radiationOura, Masaki / Yamaoka, Hitoshi / Kawatsura, Kiyoshi / Hayaishi, Tatsuji / Kimata, Junichi / Kojima, Takao M. / Kimura, Masahiro / Sekioka, Tsuguhisa / Terasawa, Mititaka et al. | 2000
- 1210
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Beam optics in inertial electrostatic confinement fusionOhnishi, Masami et al. | 2000
- 1210
-
Beam optics in inertial electrostatic confinement fusionOhnishi, Masami / Hoshino, Chikara / Yoshikawa, Kiyoshi / Masuda, Kai / Yamamoto, Yasushi et al. | 2000
- 1213
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Measurements on H- sources for spallation neutron source applicationThomae, R. et al. | 2000
- 1213
-
Measurements on H− sources for spallation neutron source applicationThomae, R. / Gough, R. / Keller, R. / Leitner, M. / Leung, K. / Meyer, D. / Williams, M. et al. | 2000
- 1216
-
Development of a high-current laser ion source for induction acceleratorsYoshida, M. / Hasegawa, J. / Fukata, S. / Oguri, Y. / Ogawa, M. / Nakajima, M. / Horioka, K. / Shiho, M. et al. | 2000
- 1216
-
POSTER SESSION C - 4. APPLICATIONS OF ION SOURCES AND BEAMS - Development of a high-current laser ion source for induction acceleratorsYoshida, M. et al. | 2000
- 1219
-
Negative hydrogen ion source for TOKAMAK neutral beam injector (invited)Okumura, Y. / Fujiwara, Y. / Kashiwagi, M. / Kitagawa, T. / Miyamoto, K. / Morishita, T. / Hanada, M. / Takayanagi, T. / Taniguchi, M. / Watanabe, K. et al. | 2000
- 1219
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Negative hydrogen ion source for TOKAMAK neutral beam injector (invited)Okumura, Y. et al. | 2000
- 1225
-
Negative hydrogen ion source development for large helical device neutral beam injector (invited)Takeiri, Y. / Kaneko, O. / Tsumori, K. / Oka, Y. / Osakabe, M. / Ikeda, K. / Asano, E. / Kawamoto, T. / Akiyama, R. et al. | 2000
- 1225
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Negative hydrogen ion source development for large helical device neutral beam injector (invited)Takeiri, Y. et al. | 2000
- 1231
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (II) - Hydrogen negative ion beam acceleration in a multiaperture five-stage electrostatic acceleratorWatanabe, K. et al. | 2000
- 1231
-
Hydrogen negative ion beam acceleration in a multiaperture five-stage electrostatic acceleratorWatanabe, K. / Fujiwara, Y. / Hanada, M. / Kashiwagi, M. / Kitagawa, T. / Miyamoto, K. / Morishita, T. / Okumura, Y. / Takayanagi, T. / Taniguchi, M. et al. | 2000
- 1234
-
Parametric study of negative ion production in cesium seeded hydrogen plasmasFukumasa, Osamu / Monji, Hideki et al. | 2000
- 1234
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (III) - Parametric study of negative ion production in cesium seeded hydrogen plasmasFukumasa, Osamu et al. | 2000
- 1237
-
Optically pumped polarized H− ion source for RHIC spin projectMori, Y. / Ikegami, K. / Takagi, A. / Zelenski, A. N. / Dutto, G. / Kadantsev, S. / Levy, C. D. P. / Wight, G. W. / Alessi, J. / Okamura, M. et al. | 2000
- 1237
-
POSTER SESSION C - NEGATIVE ION SOURCES FOR FUSION (III) - Optically pumped polarized H- ion source for RHIC spin projectMori, Y. et al. | 2000