High quality, high deposition rate SiO2 films at low temperatures using silicon fluorides and plasma assisted deposition techniques (English)
- New search for: Falcony, C.
- New search for: Falcony, C.
- New search for: Alonso, J.C.
- New search for: Ortiz, A.
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In:
Journal of vacuum science and technology / A
;
11
, 6
; 2945-2949
;
1993
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ISSN:
- Article (Journal) / Print
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Title:High quality, high deposition rate SiO2 films at low temperatures using silicon fluorides and plasma assisted deposition techniques
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Contributors:
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Published in:Journal of vacuum science and technology / A ; 11, 6 ; 2945-2949
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Publisher:
- New search for: Inst.
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Place of publication:New York, NY
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Publication date:1993
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ISSN:
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ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 52.78 / 33.09
- Further information on Basic classification
- New search for: 770/3422
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Keywords:
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Source:
Table of contents – Volume 11, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2883
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Multiple steady states in electron cyclotron resonance plasma reactorsAydil, Eray S. / Gregus, Jeffrey A. / Gottscho, Richard A. et al. | 1993
- 2893
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Study of the effect of a probe on the plasma in the source region of an electron cyclotron resonance dischargeBowden, M. D. / Kimura, F. / Muta, H. / Uchino, K. / Muraoka, K. / Maeda, M. et al. | 1993
- 2897
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Effects of substrate bias frequency in an electron cyclotron resonance plasma reactorCaughman, J. B. O. / Holber, W. M. et al. | 1993
- 2903
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Copper deposition by electron cyclotron resonance plasmaHolber, W. M. / Logan, J. S. / Grabarz, H. J. / Yeh, J. T. C. / Caughman, J. B. O. / Sugerman, A. / Turene, F. E. et al. | 1993
- 2903
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Cooper deposition by electron cyclotron resonance plasmaHolber, W.M. / Logan, J.S. / Grabarz, H.J. / Yeh, J.T.C. / Caughman, J.B.O. / Sugerman, A. / Turenee, F.E. et al. | 1993
- 2911
-
Direct current bias as an ion current monitor in the transformer coupled plasma etcherRa, Yunju / Chen, Ching‐Hwa et al. | 1993
- 2914
-
Photo‐enhanced chemical vapor deposition: System design considerationsLian, S. / Fowler, B. / Krishnan, S. / Jung, L. / Li, C. / Manna, I. / Samara, D. / Banerjee, S. et al. | 1993
- 2924
-
Reaction pathways for ArF excimer laser assisted tungsten chemical vapor deposition from a WF6–H2 gas mixtureHeszler, P. / Carlsson, J. O. / Mogyorósi, P. et al. | 1993
- 2931
-
Laser‐assisted chemical vapor deposition of InN on Si(100)Bu, Y. / Ma, L. / Lin, M. C. et al. | 1993
- 2938
-
Influence of ion beam modification on the oxidation behavior of intermetallic compound Ni3Al(0.1B)Liu, Xianghuai / Zheng, Zhihong / Huang, Wei / Lin, Zixin / Wang, Xi / Yang, Genqing / Zou, Shichang / Taniguchi, S. / Shibata, T. et al. | 1993
- 2941
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Effects of O2, air, and CF4 plasmas on poly(etherketone) surfacesOnyiriuka, E. C. et al. | 1993
- 2945
-
High quality, high deposition rate SiO2 films at low temperatures using silicon fluorides and plasma assisted deposition techniquesFalcony, C. / Alonso, J. C. / Ortiz, A. / Garcia, M. / Zironi, E. P. / Rickards, J. et al. | 1993
- 2950
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Growth kinetics of Si hemispherical grains on clean amorphous‐Si surfacesSakai, Akira / Tatsumi, Toru / Ishida, Koichi et al. | 1993
- 2954
-
Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactorCharles, C. / Giroult‐Matlakowski, G. / Boswell, R. W. / Goullet, A. / Turban, G. / Cardinaud, C. et al. | 1993
- 2964
-
Structure and tribology of hard carbon films synthesized by ion beam depositionHe, Xiaoming / Li, Wenzhi / Li, Hengde et al. | 1993
- 2970
-
Relationship of crystallographic orientation and impurities to stress, resistivity, and morphology for sputtered copper filmsBurnett, Andrew F. / Cech, Jay M. et al. | 1993
- 2975
-
Highly transparent and conductive group IV impurity‐doped ZnO thin films prepared by radio frequency magnetron sputteringSato, Hirotoshi / Minami, Tadatsugu / Takata, Shinzo et al. | 1993
- 2980
-
Sustained self‐sputtering using a direct current magnetron sourcePosadowski, Witold M. / Radzimski, Zbigniew J. et al. | 1993
- 2985
-
Sputter distribution of a large scale ion beam coaterAlbertinetti, N. / Minden, H. T. et al. | 1993
- 2989
-
Influence of the plasma on substrate heating during low-frequency reactive sputtering of AlNGlocker, David A. et al. | 1993
- 2989
-
Influence of the plasma on substrate heating during low‐frequency reactive sputtering of AINGlocker, David A. et al. | 1993
- 2994
-
Diamond synthesis by sputteringMatsuoka, Morito / Hoshino, Koichi / Ono, Ken’ichi et al. | 1993
- 3002
-
Temperature control and measurement for diamond single crystals in ultrahigh vacuumSmentkowski, V. S. / Yates, J. T. et al. | 1993
- 3007
-
Material properties and tribological performance of hydrogenated sputter carbon overcoat on rigid diskLee, H. J. / Zubeck, R. / Hollars, D. / Lee, J. K. / Smallen, M. / Chao, A. et al. | 1993
- 3014
-
Deposition system for the synthesis of modulated, ultrathin‐film compositesFister, Loreli / Li, Xiao‐Mei / McConnell, John / Novet, Thomas / Johnson, David C. et al. | 1993
- 3020
-
In situ substrate temperature measurement in high‐Tc superconducting film depositionChoi, B. I. / Anderson, Alfredo C. / Westerheim, A. C. / Flik, M. I. et al. | 1993
- 3026
-
Particle contamination in low pressure organometallic chemical vapor deposition reactors: Methods of particle detection and causes of particle formation using a liquid alane (AlH3) precursorSimmonds, Michael G. / Gladfelter, Wayne L. / Li, Haojiang / McMurry, Peter H. et al. | 1993
- 3034
-
Conversion electron Mössbauer characterization of Fe–Ti and Fe–TiN interfaces in dependence on pretreatments and bias voltage in physical vapor depositiona)Hanžel, Darko / Meisel, W. / Hanžel, D. / Griesbach, P. / Navinšek, B. / Panjan, P. / Gütlich, P. et al. | 1993
- 3034
-
Conversion electron Moessbauer characterization of Fe-TI and Fe-TIN interfaces in dependence on pretreatments and bias voltage in physical vapor depositionHanzel, D. / Meisel, W. / Griesbach, P. et al. | 1993
- 3034
-
Conversion electron Mössbauer characterization of Fe-Ti and Fe-TiN interfaces in dependence on pretreatments and bias voltage in physical vapor depositionHanzel, Darko et al. | 1993
- 3040
-
Kinetic model for the chemical vapor deposition of tungsten in the silane reduction processHsieh, Julian J. et al. | 1993
- 3047
-
Vapor deposition of parylene‐F by pyrolysis of dibromotetrafluoro‐p‐xyleneYou, L. / Yang, G.‐R. / Lang, C.‐I. / Moore, J. A. / Wu, P. / McDonald, J. F. / Lu, T.‐M. et al. | 1993
- 3053
-
Predicting intrawafer film thickness uniformity in an ultralow pressure chemical vapor deposition reactorRaupp, Gregory B. / Levedakis, Dimitris A. / Cale, Timothy S. et al. | 1993
- 3053
-
Predicting intrawater film thickness uniformity in an ultralow pressure chemical vapor deposition reactorRaupp, G. B. / Levedakis, D. A. / Cale, T. S. et al. | 1993
- 3062
-
Structural and optical studies in oxygenated amorphous CdTe filmsEspinoza‐Beltran, F. J. / Zelaya, O. / Sanchez‐Sinencio, F. / Mendoza‐Alvarez, J. G. / Farias, M. H. / Baños, L. et al. | 1993
- 3067
-
Stress stabilization of b-tantalum and its crystal structureKondo, Kazuaki et al. | 1993
- 3067
-
Stress stabilization of β‐tantalum and its crystal structureKondo, Kazuaki / Nakabayashi, Masaaki / Kawakami, Ken’ichi / Chijimatsu, Tatsuo / Nakaishi, Masafumi / Yamada, Masao / Yamabe, Masaki / Sugishima, Kenji et al. | 1993
- 3067
-
Stress stabilization of beta -tantalum and its crystal structureKondo, K. / Nakabayashi, M. / Kawakami, K. / Chijimatsu, T. / Nakaishi, M. / Yamada, M. / Yamabe, M. / Sugishima, K. et al. | 1993
- 3072
-
Repair of a liquid metal ion emitter by a liquid metal ion emitterRüdenauer, F. G. / Fehringer, H. M. / Steiger, W. / Sieber, A. et al. | 1993
- 3072
-
Repair of a liquid ion emitter by a liquid metal ion emitterRodenauer, F.G. / Fehringer, H.M. / Steiger, W. / Sieber, A. et al. | 1993
- 3076
-
Interface studies between transition metals and poly(vilylidene fluoride)Pan, F.‐M. / Huang, J.‐L. / Liaw, C.‐F. et al. | 1993
- 3081
-
New approach to quantitative surface photovoltage spectroscopy analysisKronik, L. / Shapira, Yoram et al. | 1993
- 3085
-
Evolution of atomic‐scale surface structures during ion bombardment: A fractal simulationShaheen, M. A. / Ruzic, D. N. et al. | 1993
- 3092
-
Magnetic force microscope combined with a scanning electron microscopeKikukawa, Atsushi / Hosaka, Sumio / Honda, Yukio / Koyanagi, Hajime et al. | 1993
- 3099
-
Modification of the x‐ray photoemission spectrum of in situ deposited thin films of Y1Ba2Cu3O7−y for various oxygen treatmentsBroussard, P. R. / Cestone, V. C. et al. | 1993
- 3106
-
Temperature‐dependent x‐ray photoelectron diffraction of Pb(100): Experimental results and the single‐scattering cluster modelMurphy, E. A. / Elsayed‐Ali, H. E. / Park, Ken T. / Gao, Y. et al. | 1993
- 3111
-
Measurement of CO pressures in the ultrahigh vacuum regime using resonance‐enhanced multiphoton‐ionization time‐of‐flight mass spectroscopyLooney, J. Patrick / Harrington, Joel E. / Smyth, Kermit C. / O’Brian, Thomas R. / Lucatorto, Thomas B. et al. | 1993
- 3121
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Hybrid Cu–Al beam pipe for KEK B factoryIshimaru, Hajime / Momose, Takashi / Suetsugu, Yusuke / Hirayama, Hideo et al. | 1993
- 3126
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Perspectives and limitations of vacuum microtubesMil’shtein, S. / Paludi, C. A. / Chau, P. / Awrach, J. et al. | 1993
- 3130
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Film deposition with a facing magnets magnetron sputtering methodFan, Qihua / Chen, Xiaohong / Chen, Hongyou / Hong, Yuan et al. | 1993
- 3133
-
Calibration of type‐C thermocouples to liquid helium temperatureMitchell, William J. / Xie, Jun / Weinberg, W. Henry et al. | 1993
- 3135
-
A permanent, retractable screen for charge neutralization of insulating specimens during x‐ray photoelectron spectroscopy analysisDavis, G. D. / Anderson, C. R. / Clearfield, H. M. et al. | 1993
- 3138
-
Inexpensive spot‐profile analysis reflection high energy electron diffractionIdzerda, Yves et al. | 1993
- 3141
-
Movable mask for Riber Si molecular beam epitaxy systemZhou, T. C. et al. | 1993
- 3143
-
Summary of the Physics and Astronomy Classification Scheme--1993| 1993
- 3144
-
PACS Headings Used in the Present Index| 1993
- 3146
-
Subject Index to Volume 11| 1993
- 3171
-
Author Index to Volume 11| 1993
- 3215
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Materials Index to Volume 11| 1993