Numerical simulations of thin film thermal flow (English)
- New search for: Liao, H.
- New search for: Liao, H.
- New search for: Cale, T.S.
In:
Thin solid films
;
253
, 1-2
; 419-424
;
1994
-
ISSN:
- Article (Journal) / Print
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Title:Numerical simulations of thin film thermal flow
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Contributors:Liao, H. ( author ) / Cale, T.S.
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Published in:Thin solid films ; 253, 1-2 ; 419-424
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Place of publication:Amsterdam [u.a.] Elsevier
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Publication date:1994
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ISSN:
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ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 33.68
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- New search for: 535/3485
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Source:
Table of contents – Volume 253, Issue 1-2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Annealing and Sb-doping of SnO films produced by filtered vacuum arc deposition: structure and electro-optical propertiesKaplan, L. / Ben-Shalom, A. / Boxman, R.L. / Goldsmith, S. / Rosenberg, U. / Nathan, M. et al. | 1994
- 9
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Preparation of conductive ZnO:Al films by a facing target system with a strong magnetic fieldTominaga, Kikuo / Kataoka, Masahiro / Ueda, Tetsuya / Chong, Munfei / Shintani, Yoshihiro / Mori, Ichiro et al. | 1994
- 14
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Preparation of milky transparent conducting ZnO films with textured surface by atmospheric chemical vapour deposition using Zn (C5H7O2)2Minami, T. / Sato, H. / Sonohara, H. / Takata, S. / Miyata, T. / Fukuda, I. et al. | 1994
- 20
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Optical quantum size effects in diamond-like carbon superlattice structuresSilva, S.R.P. / Amaratunga, G.A.J. / Rusli / Haq, S. / Salje, E.K. et al. | 1994
- 25
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Optical analysis of complex multilayer structures using multiple data typesJohs, Blaine D. / McGahan, William A. / Woollam, John A. et al. | 1994
- 28
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Laser-assisted deposition of optical coatingsThomsen-Schmidt, P. / Schäfer, D. / Steiger, B. / Brauße, H. / Johansen, H. / Martini, T. et al. | 1994
- 33
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Decorative optical coatingsReiners, Georg / Beck, Uwe / Jehn, Hermann A. et al. | 1994
- 41
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Spatially resolved densification of solution deposited zirconium dioxide films by laser irradiationExarhos, Gregory J. / Li Qiong Wang / Dennis, Tasshi et al. | 1994
- 47
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Effects of ion beam irradiation on the properties and epitaxial growth of aluminium nitride film by the ion beam assisted deposition processKim, Ig-Hyeon / Kim, Seon-Hyo et al. | 1994
- 53
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BaxSr1−xTiO3 thin films by a chemical processBurhanuddin, Z.A. / Tomar, M.S. / Dayalan, E. et al. | 1994
- 57
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Modified Forouhi and Bloomer dispersion model for the optical constants of amorphous hydrogenated carbon thin filmsMcGahan, William A. / Makovicka, Tim / Hale, Jeffrey / Woollam, John A. et al. | 1994
- 62
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Amorphous Si thin films prepared by vacuum arc depositionArbilly, D. / Boxman, R.L. / Goldsmith, S. / Rothwarf, A. / Kaplan, L. et al. | 1994
- 67
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Characterization of polycrystalline thin film heterojunctionsAparna, Y. / Naidu, B.Srinivasulu / Reddy, P.Jayarama et al. | 1994
- 72
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Cross-section transmission electron microscopy observations of c-BN films deposited on Si by ion-beam-assisted depositionYamashita, H. et al. | 1994
- 72
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Cross-sectional transmission electron microscopy observations of c-BN films deposited on Si by ion-beam-assisted depositionYamashita, H. / Kuroda, K. / Saka, H. / Yamashita, N. / Watanabe, T. / Wada, T. et al. | 1994
- 78
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Synthesis and structural characterization of boron nitride thin filmsElena, M. / Guzman, L. / Calliari, L. / Moro, L. / Steiner, A. / Miotello, A. / Bonelli, M. / Capelletti, R. / Ossi, P.M. et al. | 1994
- 85
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Physical properties of nitrogenated amorphous carbon films produced by ion-beam-assisted depositionRossi, François / Andre, Bernard / van Veen, A. / Mijnarends, P.E. / Schut, H. / Labohm, F. / Delplancke, Marie Paule / Dunlop, Hugh / Anger, Eric et al. | 1994
- 90
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Carbon nitride formation by low-energy nitrogen implantation into graphiteGouzman, I. / Brener, R. / Hoffman, A. et al. | 1994
- 95
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Diamond coatings from a solid carbon sourceJou, Shyankay / Doerr, Hans J. / Bunshah, Rointan F. et al. | 1994
- 103
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Optimizing the gas phase chemistry in a d.c. arcjet diamond chemical vapor deposition reactorReeve, Scott W. / Weimer, Wayne A. et al. | 1994
- 109
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Deposition of white diamond thin films by increasing the total pressure in a microwave-plasma-enhanced chemical vapour deposition systemKim, S.H. / Park, Y.S. / Lee, J.-W. et al. | 1994
- 109
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Deposition of white diamond thin films by increasing the total pressure in a microwave-plasma-enhanced vapour deposition systemKim, S.H. et al. | 1994
- 114
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Nucleation studies of thin diamond films on model substratesPatscheider, Jörg / Oral, Baybars et al. | 1994
- 119
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Internal stress of chemical vapour deposition diamond film on siliconChiou, Y.H. / Hwang, C.T. / Han, M.Y. / Jou, J.H. / Chang, Y.S. / Shih, H.C. et al. | 1994
- 125
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Elastic modulus of diamond-like carbon films prepared by pulsed vacuum arcSchultrich, B. / Scheibe, H.-J. / Grandremy, G. / Schneider, D. / Siemroth, P. et al. | 1994
- 130
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Effects of ambient conditions on the adhesion of cubic boron nitride films on silicon substratesCardinale, G.F. / Mirkarimi, P.B. / McCarty, K.F. / Klaus, E.J. / Medlin, D.L. / Clift, W.M. / Howitt, D.G. et al. | 1994
- 136
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Comparative study of trimethylboron doping of hot filament chemically vapour deposited and microwave plasma chemically vapour deposited diamond filmsPolo, M.C. / Cifre, J. / Puigdollers, J. / Esteve, J. et al. | 1994
- 141
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Electrical properties of diamond thin films grown by chemical vapor deposition techniqueKulkarni, A.K. / Shrotriya, A. / Cheng, P. / Rodrigo, H. / Bashyam, R. / Keeble, D.J. et al. | 1994
- 146
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Use of space-charge-limited current to evaluate the electronic density of states in diamond-like carbon thin filmsSilva, S.R.P. / Amaratunga, G.A.J. et al. | 1994
- 151
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Fabrication of an electron multiplier utilizing diamond filmsMearini, G.T. / Krainsky, I.L. / Wang, Y.X. / Dayton, J.A. Jr. / Ramesham, R. / Rose, M.F. et al. | 1994
- 157
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The effects of impurities on the IR absorption of chemically vapour deposited diamondMcNamara, K.M. et al. | 1994
- 157
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The effect of impurities on the IR absorption of chemically vapor deposited diamondMcNamara, K.M. / Scruggs, B.E. / Gleason, K.K. et al. | 1994
- 162
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Optical characterization of diamond synthesized using CH4CO2 gas mixtures without supplying hydrogen gasChen, Chia-Fu / Chen, Sheng-Hsiung / Hong, Tsao-Ming / Leu, Jen-Shiang et al. | 1994
- 168
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Study of the loss of pattern definition in diamond growthChen, Chia-Fu / Chen, Sheng-Hsiung et al. | 1994
- 173
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Coatings tribology: a concept, critical aspects and future directionsHolmberg, Kenneth / Mathews, Allan et al. | 1994
- 179
-
Electrostatic-based model for alumina surfacesStreitz, F.H. / Mintmire, J.W. et al. | 1994
- 185
-
Molecular dynamics simulations of friction in self-assembled monolayersTupper, Kenneth J. / Brenner, Donald W. et al. | 1994
- 190
-
Atomic-scale friction measurements on silver and chemisorbed oxygen surfacesMak, C. / Daly, C. / Krim, J. et al. | 1994
- 194
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Triboscopic description of local wear phenomena under an AFM tipLoubet, J.L. / Belin, M. / Durand, R. / Pascal, H. et al. | 1994
- 199
-
Plastic deformation in atomic size contactsAgraït, N. / Rodrigo, J.G. / Rubio, G. / Sirvent, C. / Vieira, S. et al. | 1994
- 204
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Mechanical property characterization of thin films using spherical tipped indentersSwain, M.V. / Menčík, J. et al. | 1994
- 212
-
Effects of activated reactive evaporation process parameters on the microhardness of polycrystalline silicon carbide thin filmsCha, YongHwa Chris / Kim, Guho / Doerr, Hans J. / Bunshah, Rointan F. et al. | 1994
- 218
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Enhanced mechanical hardness in compositionally modulated and epitaxial thin filmsDaniels, B.J. / Nix, W.D. / Clemens, B.M. et al. | 1994
- 223
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Microstructure and thermal conductivity of epitaxial AlN thin filmsKuo, P.K. / Auner, G.W. / Wu, Z.L. et al. | 1994
- 228
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Holographic and spectroscopic characterization of spiropyran doped poly(methyl methacrylate) filmsXue, S.S. / Manivannan, G. / Lessard, R.A. et al. | 1994
- 233
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Emittance characterization of thermal control paints, coatings and surfaces using a calorimetric techniqueJaworske, Donald A et al. | 1994
- 238
-
Characterization of thin film ZnO/ZnCdS/CuGaSe2 heterojunctionsReddy, K.T.Ramakrishna / Reddy, P.Jayarama et al. | 1994
- 243
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Characterization of laser-ablated boron nitride thin films on siliconPryor, R.W. / Wu, Z.L. / Padmanabhan, K.R. / Villanueva, S. / Thomas, R.L. et al. | 1994
- 247
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Atmosphere influence on in-situ ion beam analysis of thin film growthLin, Yuping / Krauss, Alan R. / Chang, Robert P.H. / Auciello, Orlando H. / Gruen, Dieter M. / Schultz, J.Albert et al. | 1994
- 254
-
Opening and closing of channels during phase transitions in AlMn thin filmsReyes-Gasga, J. / García, R. et al. | 1994
- 257
-
Growth of low and high refractive index dielectric layers as studied by in situ ellipsometryNguyen Van, V. / Fisson, S. / Frigerio, J.M. / Rivory, J. / Vuye, G. / Wang, Y. / Abelès, F. et al. | 1994
- 262
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Numerical ellipsometry: enhancement of new algorithms for real-time, in situ film growth monitoringUrban III, F.K. et al. | 1994
- 262
-
Numerical ellipsometry: enhancement of new algorithm for real-time, in situ film growth monitoringUrban, Frank K. III / Comfort, John Craig et al. | 1994
- 269
-
Use of valence band Auger electron spectroscopy to study thin film growth: oxide and diamond-like carbon filmsSteffen, H.J. et al. | 1994
- 277
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A new interpretation of the binding energies in X-ray photoelectron studies of oxidesBarr, Tery L. / Seal, Sudipta / Li Mei Chen / Chi Chang Kao et al. | 1994
- 285
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Effects of hydrogen annealing, sulfur segregation and diffusion on the cyclic oxidation resistance of superalloys: a reviewSmialek, J.L. / Jayne, D.T. / Schaeffer, J.C. / Murphy, W.H. et al. | 1994
- 293
-
Interfacial reactions in dynamically heated Si/Me/Si sandwich layersZalar, A. / Hofmann, S. / Pimentel, F. / Panjan, P. et al. | 1994
- 299
-
Characterization of TiO2/SiO2 multilayers by high resolution transmission electron microscopy and electron energy loss spectroscopyYu-Zhang, K. / Boisjolly, G. / Rivory, J. / Kilian, L. / Colliex, C. et al. | 1994
- 303
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Surface morphology examination of sol-gel deposited TiO2 filmsAnast, M. / Jamting, Å. / Bell, J.M. / Ben-Nissan, B. et al. | 1994
- 303
-
Structural morphology examination of sol-gel deposited TiO2 filmsAnast, M. et al. | 1994
- 308
-
Aspects of the surface roughness of ceramic bonding tools on a nanometer scale investigated with atomic force microscopyBurger, J. / Dietler, G. / Binggeli, M. / Christoph, R. / Marti, O. et al. | 1994
- 311
-
Microstructural investigation of the κ-Al2O3 → α-Al2O3 transformation in multilayer coatings of chemically vapour deposited κ-Al2O3Lindulf, N. / Halvarsson, M. / Nordén, H. / Vuorinen, S. et al. | 1994
- 311
-
Microstructural investigation of the k-Al2O3 --> a-Al2O3 transformation in multilayer coatings of chemically vapour deposited k--Al2O3Lindulf, N. et al. | 1994
- 318
-
Advanced image processing in scanning probe microscopyUrban, F.K. III / Romine, P. / Islam, Md.S. et al. | 1994
- 326
-
Modelling of surface roughness in variable-angle spectroscopic ellipsometry, using numerical processing of atomic force microscopy imagesUrban, F.K. III / Ruzakowski Athey, P. / Islam, Md.S. et al. | 1994
- 333
-
Photoacoustic studies of laser damage in oxide thin filmsReichling, M. / Siegel, J. / Matthias, E. / Lauth, H. / Hacker, E. et al. | 1994
- 339
-
Investigations on n-CdO/p-CdTe thin film heterojunctionsSravani, C. / Reddy, K.T.R. / Hussain, O.Md. / Reddy, P.Jayarama et al. | 1994
- 344
-
Microstructure and mechanical properties of sputtered platinum filmsTokura, H. / Window, B. / Neely, D. / Swain, M. et al. | 1994
- 349
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Residual stress in stabilized zirconia thin films prepared by r.f. magnetron sputteringScardi, P. / Polonioli, P. / Ferrari, S. et al. | 1994
- 356
-
Residual stress distribution in electroplated ZnNi alloy layer determined by X-ray diffractionSasaki, Toshihiko / Hirose, Yukio et al. | 1994
- 362
-
Pin-pull adhesion measurements of copper films on ion-bombarded aluminaErck, R.A. et al. | 1994
- 367
-
Al planarization processes for multilayer metallization of quarter micrometer devicesXu, Zheng / Kieu, Hoa / Raaijmakers, Ivo J. / Tepman, Avi et al. | 1994
- 372
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The effects of collimation on intrinsic stress in sputter-deposited metallic thin filmsJanacek, T. / Liu, D. / Dew, S.K. / Brett, M.J. / Smy, T.J. et al. | 1994
- 377
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Formation of low pressure chemically vapour deposited W thin film on silicon dioxide for gate electrode applicationJae Hyun Sone / Kim, Sun-Oo / Kim, Ki-Joan / Hyoung Sub Kim / Hyeong Joon Kim et al. | 1994
- 382
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Cu deposition using a permanent magnet electron cyclotron resonance microwave plasma sourceBerry, Lee A. / Gorbatkin, S.M. / Rhoades, R.L. et al. | 1994
- 386
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Bombardment and gas rarefaction effects on the properties of sputtered Ti thin filmsTsai, W. / Brett, M.J. / Dew, S.K. / Liu, D. / Smy, T. / Tait, R.N. et al. | 1994
- 386
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Bombardment and gas rarefraction effects on the properties of sputtered Ti thin filmsTsai, W. et al. | 1994
- 391
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Selective electroless copper plating on silicon seeded by copper ion implantationBhansali, S. / Sood, D.K. / Zmood, R.B. et al. | 1994
- 395
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TiN-capped TiSi2 formation in W/TiSi2 process for a quarter-micron complementary metal-oxide-semiconductorMatsubara, Y. / Sekine, M. / Kodama, N. / Noguchi, K. / Okumura, K. et al. | 1994
- 402
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Gold and zinc thin films deposited by the ionized cluster beam techniqueFeng, S.W. / Nainaparampil, J.J. / Tabet, M.F. / Urban, F.K. III et al. | 1994
- 407
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Au/(TiW) and Au/Cr metallization of chemically vapor-deposited diamond substrates for multichip module applicationsMeyyappan, Ilango / Malshe, A.P. / Naseem, H.A. / Brown, W.D. et al. | 1994
- 413
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Electrical properties of the p+-gate electrode of an a-Si/poly-Si double layerKim, Sun-Oo / Kim, Ki-Joon / Kim, Hyoung Sub / Kang, Sug Bong / Sone, Jae Hyun / Byun, Jeong Soo / Kim, Hyeong Joon et al. | 1994
- 419
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Numerical simulations of thin film thermal flowLiao, Hung / Cale, Timothy S. et al. | 1994
- 425
-
Properties of silicon nitride films prepared by magnetron sputteringHirohata, Y. / Shimamoto, N. / Hino, T. / Yamashima, T. / Yabe, K. et al. | 1994
- 430
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UV-radiation-induced degradation of fluorinated polyimide filmsChang, Li-Hsin / Saha, Naresh C. et al. | 1994
- 435
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The effects of substrate and annealing ambient on the electrical properties of Ta2O5 thin films prepared by plasma enhanced chemical vapor depositionKim, Sun-Oo / Kim, Hyeong Joon et al. | 1994
- 440
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Comparison of chemical vapor deposition of TiN using tetrakis-diethylamino-titanium and tetrakis-dimethylamino-titaniumSun, S.C. / Tsai, M.H. et al. | 1994
- 445
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Single-phase polycrystalline Ti1-xWxN alloys (0 <= x <= 0.7) grown by UHV reactive magnetron sputtering: microstructure and physical propertiesMoser, J.H. et al. | 1994
- 445
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Single-phase polycrystalline Ti1−xWxN alloys (0⩽x⩽0.7) grown by UHV reactive magnetron sputtering: microstructure and physical propertiesMoser, J.H. / Tian, F. / Haller, O. / Bergstrom, D.B. / Petrov, I. / Greene, J.E. / Wiemer, C. et al. | 1994
- 451
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Effect of dimension sealing on the nucleation of C54 TiSi2Ma, Z. et al. | 1994
- 451
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Effect of dimension scaling on the nucleation of C54 TiSi2Ma, Z. / Allen, L.H. / Allman, D.D.J. et al. | 1994
- 456
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Kinetics of Ni/a-Ge bilayer reactionsPatterson, J.Ken / Park, B.J. / Ritley, K. / Xiao, H.Z. / Allen, L.H. / Rockett, A. et al. | 1994
- 462
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High resistivity Co and Ti silicide formation on silicon-on-insulator substratesHsia, S.L. / McGuire, G.E. / Tan, T.Y. / Smith, P.L. / Lynch, W.T. et al. | 1994
- 467
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Thickness dependence of the properties and thermal stability of PtSi filmsDas, S.R. / Sheergar, K. / Xu, D.-X. / Naem, A. et al. | 1994
- 473
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Chemical vapor deposition of TiSi2 using SiH4 and TiCl4Mendicino, M.A. / Southwell, R.P. / Seebauer, E.G. et al. | 1994
- 479
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Thermal stability of silicide on polycrystalline SiHong, Q.Z. / Hong, Stella Q. / D'Heurle, F.M. / Harper, J.M.E. et al. | 1994
- 485
-
Electrical and structural properties of buried CoSi2 layers in Si(100) grown by molecular beam allotaxyDolle, M. / Gassig, U. / Bay, H.L. / Schüppen, A. / Mantl, S. et al. | 1994
- 490
-
Morphology of AlNiGe ohmic contacts to n-GaAs as a function of contact compositionLin, X.W. / Lampert, W.V. / Swider, W. / Haas, T.W. / Holloway, P.H. / Washburn, J. / Liliental-Weber, Z. et al. | 1994
- 496
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Non-alloyed, refractory metal contact optimization with shallow implantations of Zn and MgLovejoy, M.L. / Zolper, J.C. / Sherwin, M.E. / Baca, A.G. / Shul, R.J. / Rieger, D.J. / Klem, J.F. et al. | 1994
- 501
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Development of a gate metal etch process for gallium arsenide wafersBammi, Rahul / Cale, Timothy S. / Grivna, Gordon et al. | 1994
- 508
-
Realistic electromigration lifetime projection of VLSI interconnectsKawasaki, Hisao / Lee, Charles / Yu, Tat-Kwan et al. | 1994
- 513
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Effects of electro- and stress migration forces on the 1-fa noise of patterned thin metal filmsCottle, J.G. et al. | 1994
- 513
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Effect of electro- and stress migration forces on the noise of patterned thin metal filmsCottle, James G. / Klonaris, Nick et al. | 1994
- 518
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Properties of boron coatings used as plasma facing material of fusion deviceHino, T. / Iwamoto, K. / Hirohata, Y. / Yamashina, T. / Sagara, A. / Noda, N. / Inoue, N. / Kubota, Y. / Natsir, N. / Motojima, O. et al. | 1994
- 522
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Transport through multicomponent dual frequency plasma sheathsMyers, Frank R. / Peters, Michael W. / Ramaswami, Manjula / Cale, Timothy S. et al. | 1994
- 529
-
A.c. properties of ZnO thin films prepared by r.f. magnetron sputteringMahmood, F.S. / Gould, R.D. et al. | 1994
- 535
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Author Index| 1994
- 535
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Author index of volume 253| 1994
- 537
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Subject index of volume 253| 1994
- 537
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Subject Index| 1994
- iii
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Editorial Board| 1994
- v
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Publication schedule| 1994