Photocatalytic properties of Cr-doped TiO2 films prepared by oxygen cluster ion beam assisted deposition (Unknown)
- New search for: Takaoka, G.H.
- New search for: Takaoka, G.H.
- New search for: Nose, T.
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In:
Vacuum
;
83
, 3
; 679-682
;
2009
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ISSN:
- Article (Journal) / Print
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Title:Photocatalytic properties of Cr-doped TiO2 films prepared by oxygen cluster ion beam assisted deposition
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Contributors:
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Published in:Vacuum ; 83, 3 ; 679-682
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Publisher:
- New search for: Elsevier Science
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Place of publication:Kidlington
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Publication date:2009
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ISSN:
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ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:Unknown
- New search for: 52.78 / 33.09 / 58.19
- Further information on Basic classification
- New search for: 275/3422
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Keywords:
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Source:
Table of contents – Volume 83, Issue 3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 459
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Angular dependence of sputtering effects by ethanol cluster ion irradiation on solid surfacesTakaoka, G.H. / Okada, T. / Kawashita, M. et al. | 2008
- 463
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Are dominant sputtering products from metal targets really monatomic?Sasaki, K. / Nafarizal, N. / Gao, J.-S. / Shibagaki, K. et al. | 2008
- 467
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Effect of background gas environment on oxygen incorporation in TiN films deposited using UHV reactive magnetron sputteringNakano, Takeo / Hoshi, Ken'ichiroh / Baba, Shigeru et al. | 2008
- 470
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Wide erosion nickel magnetron sputtering using an eccentrically rotating center magnetIseki, Takayuki / Maeda, Hiroaki / Itoh, Takashi et al. | 2008
- 475
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Development of a magnetron sputtering system with an extraordinary strong magnetic field near the targetIkuta, Hiroshi / Yokouchi, Kohei / Ohta, Isao / Yanagi, Yousuke / Itoh, Yoshitaka et al. | 2008
- 479
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Application of TiAl laminate to a sputtering target for TiAlN filmsYamazaki, Toshinari / Okumura, Yoshio / Desaki, Kenjiro / Kikuta, Toshio / Anada, Hiroshi / Nakatani, Noriyuki et al. | 2008
- 483
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Formation process of Al2O3 thin film by reactive sputteringChiba, Y. / Abe, Y. / Kawamura, M. / Sasaki, K. et al. | 2008
- 486
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Effect of deposition conditions on the response and durability of an Mg4Ni film switchable mirrorBao, Shanhu / Yamada, Yasusei / Tajima, Kazuki / Okada, Masahisa / Yoshimura, Kazuki et al. | 2008
- 490
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Effect of argon plasma etching damage on electrical characteristics of gallium nitrideKawakami, Retsuo / Inaoka, Takeshi et al. | 2008
- 493
-
Reduction of hydrogen and helium retention in stainless steel by argon glow dischargeHino, Tomoaki / Higashi, Yoshihiro / Ymauchi, Yuji / Komori, Akio / Nishimura, Kiyohiko / Ashikawa, Naoko et al. | 2008
- 497
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Surface modification of steel surfaces by electron beam excited plasma processingAbraha, P. / Yoshikawa, Y. / Katayama, Y. et al. | 2008
- 501
-
Rapid treatment of polyimide film surfaces using high-density microwave plasma for enhancement of Cu layer adhesionTakagi, Y. / Gunjo, Y. / Toyoda, H. / Sugai, H. et al. | 2008
- 506
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Surface wettability of silicon rubber after irradiation with a glow discharge plasmaHino, Tomoaki / Igarashi, Yusuke / Ymauchi, Yuji / Nishikawa, Masana et al. | 2008
- 510
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Preparation of various DLC films by T-shaped filtered arc deposition and the effect of heat treatment on film propertiesKamiya, Masao / Tanoue, Hideto / Takikawa, Hirofumi / Taki, Makoto / Hasegawa, Yushi / Kumagai, Masao et al. | 2008
- 515
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Growth control of carbon nanotubes by plasma enhanced chemical vapor depositionSato, Hideki / Sakai, Takamichi / Suzuki, Atsushi / Kajiwara, Kazuo / Hata, Koichi / Saito, Yahachi et al. | 2008
- 518
-
New target materials for innovative applications on glassMatthews, Steven / De Bosscher, Wilmert / Blondeel, Anja / Van Holsbeke, John / Delrue, Hilde et al. | 2008
- 522
-
Plasma processes at atmospheric and low pressuresBárdos, Ladislav / Baránková, Hana et al. | 2008
- 528
-
Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputteringAbe, Yoshio / Itadani, Naruhiro / Kawamura, Midori / Sasaki, Katsutaka / Itoh, Hidenobu et al. | 2008
- 531
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Pulsed laser deposition synthesis of superconducting (Cu,C)–Ba–O thin filmsYamamoto, Tetsuro / Kikunaga, Kazuya / Takeshita, Kazunori / Obara, Kozo / Okuda, Tetsuji / Kikuchi, Naoto / Tanaka, Yasumoto / Tokiwa, Kazuyasu / Watanabe, Tsuneo / Terada, Norio et al. | 2008
- 534
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Effect of process parameters on the growth and properties of impurity-doped zinc oxide transparent conducting thin films by RF magnetron sputteringHoung, Boen / Hsi, Chi Shiung / Hou, Bing Yi / Fu, Shen Li et al. | 2008
- 540
-
Optical and photoconductivity properties of ZnO thin films grown by pulsed filtered cathodic vacuum arc depositionKavak, H. / Senadım Tuzemen, E. / Ozbayraktar, L.N. / Esen, R. et al. | 2008
- 544
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Improvement in moisture durability of ZnO transparent conductive films with Ga heavy doping processKishimoto, Yutaka / Nakagawara, Osamu / Seto, Hiroyuki / Koshido, Yoshihiro / Yoshino, Yukio et al. | 2008
- 548
-
Fabrication of low resistivity tin-doped indium oxide films with high electron carrier densities by a plasma sputtering methodKono, Akihiko / Feng, Zongbao / Nouchi, Norimoto / Shoji, Fumiya et al. | 2008
- 552
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The properties of transparent conductive In–Ga–Zn oxide films produced by pulsed laser depositionInoue, Kenichi / Tominaga, Kikuo / Tsuduki, Takashi / Mikawa, Michio / Moriga, Toshihiro et al. | 2008
- 557
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In2O3–ZnO transparent conductive oxide film deposition on polycarbonate substratesMoriga, Toshihiro / Shimomura, Koji / Takada, Daisuke / Suketa, Hiroshi / Takita, Keisuke / Murai, Kei-ichiro / Tominaga, Kikuo et al. | 2008
- 561
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Influence of Ga2O3 addition on transparent conductive oxide films of In2O3–ZnOTominaga, Kikuo / Takada, Daisuke / Shimomura, Kouji / Suketa, Hiroshi / Takita, Keisuke / Murai, Keiichirou / Moriga, Toshihito et al. | 2008
- 564
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Characterization of organic polymer thin films deposited by rf magnetron sputteringOya, Toshiyuki / Kusano, Eiji et al. | 2008
- 569
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Development of sputtered nanoscale titanium oxide coating on osseointegrated implant devices and their biological evaluationYang, Yunzhi / Park, Sangwon / Liu, Yongxing / Lee, Kwangmin / Kim, Hyun-Seung / Koh, Jeong-Tae / Meng, Xianwei / Kim, Kyohan / Ji, Hongbin / Wang, Xiaodu et al. | 2008
- 575
-
Study of the surface morphology of platinum thin films on powdery substrates prepared by the barrel sputtering systemTaguchi, Akira / Inoue, Mitsuhiro / Hiromi, Chikako / Tanizawa, Masaaki / Kitami, Tomohito / Abe, Takayuki et al. | 2008
- 579
-
Structure and mechanical properties of ZrO2 films deposited by gas flow sputteringIwatsubo, Satoshi / Ishii, Kiyoshi et al. | 2008
- 582
-
Synthesis and characterization of BN thin films prepared by plasma MOCVD with organoboron precursorsYasui, Haruyuki / Awazu, Kaoru / Ikenaga, Noriaki / Sakudo, Noriyuki et al. | 2008
- 585
-
Effect of heating on the residual stresses in TiN films investigated using synchrotron radiationMatsue, Tatsuya / Hanabusa, Takao / Kusaka, Kazuya / Sakata, Osami et al. | 2008
- 589
-
Evaluation of hafnium nitride thin films sputtered from a hafnium nitride targetKanzawa, T. / Setojima, N. / Miyata, Y. / Gotoh, Y. / Tsuji, H. / Ishikawa, J. et al. | 2008
- 592
-
Characterization of tantalum oxy-nitrides deposited by ECR sputteringKato, Koji / Toyota, Hiroshi / Jin, Yoshito / Ono, Toshiro et al. | 2008
- 596
-
Effect of different atmospheres on the electrical stabilization of NiO filmsJang, Wei-Luen / Lu, Yang-Ming / Hwang, Weng-Sing et al. | 2008
- 599
-
First-principles calculations-based model for the reactive ion etching of metal oxide surfacesDavid, Melanie / Muhida, Rifki / Roman, Tanglaw / Nakanishi, Hiroshi / Diño, Wilson / Kasai, Hideaki / Takano, Fumiyoshi / Shima, Hisashi / Akinaga, Hiro et al. | 2008
- 602
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Reactive DC sputter-deposited tantalum oxide thin film for all-solid-state switchable mirrorTajima, Kazuki / Yamada, Yasusei / Bao, Shanhu / Okada, Masahisa / Yoshimura, Kazuki et al. | 2008
- 606
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Optimum structure of metal oxide under-layer used in Ag-based multilayerKato, Kazuhiro / Omoto, Hideo / Takamatsu, Atsushi et al. | 2008
- 610
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Agglomeration behavior of Ag films suppressed by alloying with some elementsSugawara, K. / Minamide, Y. / Kawamura, M. / Abe, Y. / Sasaki, K. et al. | 2008
- 614
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Fabrication of transparent CuCrO2:Mg/ZnO p–n junctions prepared by pulsed laser deposition on glass substrateChiu, T.-W. / Tonooka, K. / Kikuchi, N. et al. | 2008
- 618
-
The effects of plasma pre-treatment and post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor depositionTzeng, Shinn-Shyong / Wu, Ying-Jie / Hsu, Jiong-Shiun et al. | 2008
- 622
-
Influence of hydrogen on the mechanical properties and microstructure of DLC films synthesized by r.f.-PECVDHsu, Jiong-Shiun / Tzeng, Shinn-Shyong / Wu, Ying-Jie et al. | 2008
- 625
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Morphology of carbon nanotubes synthesized by thermal CVD under high magnetic field up to 10TYokomichi, Haruo / Ichihara, Masaki / Nimori, Shigeki / Kishimoto, Naoki et al. | 2008
- 629
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Improved electrochemical capacitive characteristics by controlling the carbon nanotube morphology and electrolyte solution concentrationWeng, T.-W. / Huang, W. / Lee, K.-Y. et al. | 2008
- 633
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Surface coating of microparticles with tungsten carbide by using the barrel sputtering systemAkamaru, Satoshi / Yamamoto, Hironari / Abe, Takayuki et al. | 2008
- 637
-
Measurement of electromigration-induced stress in aluminum alloy interconnectionKusaka, Kazuya / Hanabusa, Takao / Shingubara, Shoso / Matsue, Tatsuya / Sakata, Osami et al. | 2008
- 641
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Enhanced nanoparticle formation by indentation and annealing on 2MeV Cu ion-implanted SiO2Pan, Jin / Wang, H. / Takeda, Y. / Umeda, N. / Kono, K. / Amekura, H. / Kishimoto, N. et al. | 2008
- 645
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Void formation in silica glass induced by thermal oxidation after Zn+ ion implantationUmeda, N. / Amekura, H. / Kishimoto, N. et al. | 2008
- 649
-
Fabrication of Ni2In3 alloy nanotubesKitazawa, Sin-iti et al. | 2008
- 653
-
Scattering of fast protons on densely stepped surfaces of ionic crystalsFukazawa, Yuuko / Mitsuhara, Kei / Shiomi, Yuuki / Matsumoto, Yuugo / Susuki, Yasufumi et al. | 2008
- 658
-
Physical and electrochemical properties of Pt–Ru/C samples prepared on various carbon supports by using the barrel sputtering systemInoue, Mitsuhiro / Akamaru, Satoshi / Taguchi, Akira / Abe, Takayuki et al. | 2008
- 664
-
Effect of Zr content on mechanical properties of Ti–Ni–Zr shape memory alloy films prepared by dc magnetron sputteringInoue, Shozo / Sawada, Naoki / Namazu, Takahiro et al. | 2008
- 668
-
Barrier-free Cu metallization with a novel copper seed layer containing various insoluble substancesChu, J.P. / Lin, C.H. / John, V.S. et al. | 2008
- 672
-
Characteristics of an AlN-based bulk acoustic wave resonator in the super high frequency rangeUmeda, Keiichi / Kawamura, Hideki / Takeuchi, Masaki / Yoshino, Yukio et al. | 2008
- 675
-
Fabrication of high frequency ZnO thin film SAW devices on silicon substrate with a diamond-like carbon buffer layer using RF magnetron sputteringShih, Wen-Ching / Huang, Rei-Ching et al. | 2008
- 679
-
Photocatalytic properties of Cr-doped TiO2 films prepared by oxygen cluster ion beam assisted depositionTakaoka, G.H. / Nose, T. / Kawashita, M. et al. | 2008
- 683
-
Enhancement of visible light-induced hydrophilicity on nitrogen and sulfur-codoped TiO2 thin filmsSakai, Yuka W. / Obata, Ken / Hashimoto, Kazuhito / Irie, Hiroshi et al. | 2008
- 688
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Photocatalytic performance of very thin TiO2/SnO2 stacked-film prepared by magnetron sputteringOkada, Masahisa / Tajima, Kazuki / Yamada, Yasusei / Yoshimura, Kazuki et al. | 2008
- 691
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Multilevel-type multilayer X-ray lens (Fresnel zone plate) by sputter depositionTamura, Shigeharu / Yasumoto, Masato / Kamijo, Nagao / Takeuchi, Akihisa / Uesugi, Kentaro / Suzuki, Yoshio et al. | 2008
- 695
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Surface modification of carbon electrodes using an argon plasmaTashima, D. / Sakamoto, A. / Taniguchi, M. / Sakoda, T. / Otsubo, M. et al. | 2008
- 699
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New hydrogen sensor based on sputtered Mg–Ni alloy thin filmYoshimura, Kazuki / Bao, Shanhu / Uchiyama, Naoki / Matsumoto, Hiroyuki / Kanai, Tomomi / Nakabayashi, Seigo / Kanayama, Hiroshi et al. | 2008
- 703
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Cylindrical film deposition system for three-dimensional titanium–nickel shape memory alloy microstructureKomatsubara, Mamoru / Namazu, Takahiro / Nagasawa, Hiroyuki / Tsurui, Takafumi / Inoue, Shozo et al. | 2008
- 708
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Growth of ultrathin barrier layers with sub-5-nm metallic seeds fabricated by sequential treatments of vacuum plasma and electrochemical solutionHsu, C.S. / Chen, S.T. / Hsieh, Y.H. / Chen, G.S. et al. | 2008
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