Experiences from nonevaporable getter-coated vacuum chambers at the MAX II synchrotron light source (English)
- New search for: Hansson, A
- New search for: Hansson, A
- New search for: Wallén, E
- New search for: Berglund, M
- New search for: Kersevan, R
- New search for: Hahn, M
In:
Journal of vacuum science and technology / A
;
28
, 2
; 220-226
;
2010
-
ISSN:
- Article (Journal) / Print
-
Title:Experiences from nonevaporable getter-coated vacuum chambers at the MAX II synchrotron light source
-
Contributors:
-
Published in:Journal of vacuum science and technology / A ; 28, 2 ; 220-226
-
Publisher:
- New search for: Inst.
-
Place of publication:New York, NY
-
Publication date:2010
-
ISSN:
-
ZDBID:
-
Type of media:Article (Journal)
-
Type of material:Print
-
Language:English
- New search for: 52.78 / 33.09
- Further information on Basic classification
- New search for: 770/3422
-
Keywords:
-
Classification:
-
Source:
Table of contents – Volume 28, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 161
-
Modifying the composition of hydrogen-terminated silicon nanoparticles synthesized in a nonthermal rf plasmaHolm, Jason / Roberts, Jeffrey T. et al. | 2010
- 170
-
Photoconduction in silicon rich oxide films obtained by low pressure chemical vapor depositionLuna-López, J. A. / Aceves-Mijares, M. / Carrillo-López, J. / Morales-Sánchez, A. et al. | 2010
- 175
-
Coexistence of epitaxial Ta(111) and Ta(110) oriented magnetron sputtered thin film on c-cut sapphireGnanarajan, S. / Lam, S. K. H. / Bendavid, A. et al. | 2010
- 182
-
Comparison of compressive and tensile relaxed composition-graded GaAsP and (Al)InGaP substratesMori, M. J. / Boles, S. T. / Fitzgerald, E. A. et al. | 2010
- 189
-
Fast and smooth etching of indium tin oxides in inductively coupled plasmasAndagana, H. B. / Cao, X. A. et al. | 2010
- 193
-
Influence of the magnetron on the growth of aluminum nitride thin films deposited by reactive sputteringIriarte, G. F. et al. | 2010
- 199
-
In situ observation of change in surface atomic arrangement of system during phase transition at high temperatureNagatomi, T. / Nakanishi, Y. / Takai, Y. et al. | 2010
- 207
-
Oxygen plasma damage to blanket and patterned ultralow- kappa surfacesBao, J. / Shi, H. / Huang, H. / Ho, P.S. / McSwiney, M.L. / Goodner, M.D. / Moinpour, M. / Kloster, G.M. et al. | 2010
- 207
-
Oxygen plasma damage to blanket and patterned ultralow- surfacesBao, J. / Shi, H. / Huang, H. / Ho, P. S. / McSwiney, M. L. / Goodner, M. D. / Moinpour, M. / Kloster, G. M. et al. | 2010
- 216
-
Rapid thermal annealing of ZnO thin films grown at room temperatureJang, Young Rae / Yoo, Keon-Ho / Park, Seung Min et al. | 2010
- 220
-
Experiences from nonevaporable getter-coated vacuum chambers at the MAX II synchrotron light sourceHansson, A. / Wallén, E. / Berglund, M. / Kersevan, R. / Hahn, M. et al. | 2010
- 226
-
Etch mechanism of and thin films in HBr-based inductively coupled plasmasKwon, Kwang-Ho / Efremov, Alexander / Kim, Moonkeun / Min, Nam Ki / Jeong, Jaehwa / Hong, MunPyo / Kim, Kwangsoo et al. | 2010
- 232
-
Measurement of adsorption isotherms in the gas phase on native titanium dioxide surfaces by quartz crystal microbalance techniqueMarx, A. / Langel, W. et al. | 2010
- 238
-
Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxideSchmidt, Benjamin W. / Sweet, William J. / Bierschenk, Eric J. / Gren, Cameron K. / Hanusa, Timothy P. / Rogers, Bridget R. et al. | 2010
- 244
-
Tribological and mechanical properties of nanocomposite thin filmsMusil, J. / Novák, P. / Čerstvý, R. / Soukup, Z. et al. | 2010
- 250
-
Etching of in plasmas. I. Numeric kinetics modeling and Monte Carlo simulation in a three-dimensional profile simulatorGuo, Wei / Sawin, Herbert H. et al. | 2010
- 259
-
Etching of in plasmas. II. Simulation of surface roughening and local polymerizationGuo, Wei / Sawin, Herbert H. et al. | 2010
- 271
-
Sr flux stability against oxidation in oxide-molecular-beam-epitaxy environment: Flux, geometry, and pressure dependenceKim, Y. S. / Bansal, Namrata / Chaparro, Carlos / Gross, Heiko / Oh, Seongshik et al. | 2010
- 277
-
Etching studies of silica glasses in inductively coupled plasmas: Implications for microfluidic devices fabricationLallement, L. / Gosse, C. / Cardinaud, C. / Peignon-Fernandez, M.-C. / Rhallabi, A. et al. | 2010
- 287
-
Surface-charging effect of capacitively coupled plasmas driven by combined dc/rf sourcesZhang, Quan-Zhi / Jiang, Wei / Zhao, Shu-Xia / Wang, You-Nian et al. | 2010
- 293
-
Amorphization of Si(100) by -ion bombardment studied with spectroscopic and time-resolved second-harmonic generationGevers, P. M. / Gielis, J. J. H. / Beijerinck, H. C. W. / van de Sanden, M. C. M. / Kessels, W. M. M. et al. | 2010
- 302
-
TaN metal gate etch mechanisms in -based plasmasShamiryan, Denis / Danila, Andrey / Baklanov, Mikhail R. / Boullart, Werner et al. | 2010
- 306
-
Quantum turbulence at room temperatureLlaguno, C. / Muriel, A. et al. | 2010
- 309
-
Self-bias voltage diagnostics for the amorphous-to-microcrystalline transition in a-Si:H under a hydrogen-plasma treatmentHadjadj, A. / Pham, N. / Roca i Cabarrocas, P. / Jbara, O. et al. | 2010
- 314
-
Combinatorial characterization of transparent conductive properties of Ga-doped ZnO films cosputtered from electron cyclotron resonance and rf magnetron plasma sourcesAkazawa, Housei et al. | 2010
- 322
-
Plasma kinetics of magnetron discharge by two-dimensional multifluid modelingCostin, C. / Minea, T. M. / Popa, G. / Gousset, G. et al. | 2010
- 329
-
Effects of working pressure on physical properties of tungsten-oxide thin films sputtered from oxide targetRiech, I. / Acosta, M. / Peña, J. L. / Bartolo-Pérez, P. et al. | 2010
- 334
-
Model for aspect ratio dependent etch modulated processingGilgunn, Peter J. / Alfaro, J. Fernando / Fedder, Gary K. et al. | 2010
- 347
-
Characterization of worn Ti–Si cathodes used for reactive cathodic arc evaporationZhu, J. Q. / Eriksson, A. / Ghafoor, N. / Johansson, M. P. / Sjölén, J. / Hultman, L. / Rosén, J. / Odén, M. et al. | 2010
- 354
-
β-Ga2O3 growth by plasma-assisted molecular beam epitaxyTsai, Min-Ying et al. | 2010
- 354
-
growth by plasma-assisted molecular beam epitaxya)Tsai, Min-Ying / Bierwagen, Oliver / White, Mark E. / Speck, James S. et al. | 2010
- 354
-
beta -Ga~2O~3 growth by plasma-assisted molecular beam epitaxyTsai, M.-Y. / Bierwagen, O. / White, M.E. / Speck, J.S. et al. | 2010
- 360
-
Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurementsCurley, G. A. / Gatilova, L. / Guilet, S. / Bouchoule, S. / Gogna, G. S. / Sirse, N. / Karkari, S. / Booth, J. P. et al. | 2010
- 373
-
Surface modification of phyllosilicate minerals by fluorination methodsTressaud, Alain / Labrugère, Christine / Durand, Etienne / Serier, Hélène / Demyanova, Larisa P. et al. | 2010
- 382
-
CUMULATIVE AUTHOR INDEX| 2010
- L1
-
X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profilingMiyayama, T. / Sanada, N. / Suzuki, M. / Hammond, J. S. / Si, S.-Q. D. / Takahara, A. et al. | 2010
-
Letters - X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profilingMiyayama, T et al. | 2010