Ferroelectric thin film fabrication by direct UV-lithography (English)
- New search for: Benkler, Manuel
- New search for: Paul, F.
- New search for: Schott, J.
- New search for: Hanemann, T.
- New search for: Benkler, Manuel
- New search for: Paul, F.
- New search for: Schott, J.
- New search for: Hanemann, T.
In:
Microsystem Technologies
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20
, 10-11
; 1859-1867
;
2013
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ISSN:
- Article (Journal) / Electronic Resource
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Title:Ferroelectric thin film fabrication by direct UV-lithography
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Contributors:
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Published in:Microsystem Technologies ; 20, 10-11 ; 1859-1867
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Publisher:
- New search for: Springer Berlin Heidelberg
- New search for: Springer
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Place of publication:Berlin
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Publication date:2013
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ISSN:
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ZDBID:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
- New search for: 50.94
- Further information on Basic classification
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Keywords:
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Classification:
BKL: 50.94 Mikrosystemtechnik, Nanotechnologie -
Source:
Table of contents – Volume 20, Issue 10-11
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1771
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Editorial special issue HARMNST 2013Mohr, Jürgen / Göttert, Jost / Michel, Bernd et al. | 2014
- 1773
-
Nanoimprint lithography and micro-embossing in LiGA technology: similarities and differencesSchift, Helmut et al. | 2013
- 1783
-
SAM meets MEMS: reliable fabrication of stable Au-patterns embedded in PDMS using dry peel-off processByun, Ikjoo / Coleman, Anthony W. / Kim, Beomjoon et al. | 2013
- 1791
-
ViPER: simulation software for high aspect ratio plasma etching of siliconIshchuk, Valentyn / Volland, Burkhard E. / Rangelow, Ivo W. et al. | 2013
- 1797
-
High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithographyDivan, Ralu / Makarova, Olga V. / Skoog, Shelby / Narayan, Roger / Sumant, Anirudha V. / Tang, Cha-Mei / Moldovan, Nicolaie et al. | 2013
- 1803
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IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatingsSchönfeld, M. / Schubert, S. / Saupe, J. / Grimm, J. et al. | 2013
- 1807
-
Large tuning ratio high aspect ratio variable capacitors using leveraged bendingAchenbach, S. / Haluzan, D. T. / Klymyshyn, D. M. / Börner, M. / Mohr, J. et al. | 2013
- 1815
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Arrays of high-aspect ratio microchannels for high-throughput isolation of circulating tumor cells (CTCs)Hupert, Mateusz L. / Jackson, Joshua M. / Wang, Hong / Witek, Małgorzata A. / Kamande, Joyce / Milowsky, Matthew I. / Whang, Young E. / Soper, Steven A. et al. | 2013
- 1827
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Fabrication of porous anodic aluminum oxide by hybrid pulse anodization at relatively high potentialChung, C. K. / Liao, M. W. / Khor, O. K. et al. | 2013
- 1833
-
$ 2^{N} $ Period submicron grating at the inner wall of a metal cylinderHirshy, H. / Scholz, S. G. / Jourlin, Y. / Tonchev, S. / Reynaud, S. / Boukenter, A. / Parriaux, O. et al. | 2013
- 1839
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Advanced mask aligner lithography (AMALITH) for thick photoresistVoelkel, Reinhard / Vogler, Uwe / Bramati, Arianna / Hennemeyer, Marc / Zoberbier, Ralph / Voigt, Anja / Grützner, Gabi / Ünal, Nezih / Hofmann, Ulrich et al. | 2013
- 1843
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Design and fabrication of microlens arrays as beam relay for free-space optical interconnectionMiao, Zhengyu / Wang, Wanjun et al. | 2013
- 1849
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High aspect ratio gold nanopillars on microelectrodes for neural interfacesNick, C. / Quednau, S. / Sarwar, R. / Schlaak, H. F. / Thielemann, C. et al. | 2013
- 1859
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Ferroelectric thin film fabrication by direct UV-lithographyBenkler, Manuel / Paul, F. / Schott, J. / Hanemann, T. et al. | 2013
- 1869
-
Fabrication of a high aspect ratio (HAR) micropillar filter for a magnetic bead-based immunoassayRuffert, C. / Ramadan, Q. / Gijs, M. A. M. et al. | 2013
- 1875
-
Microstructuring of non-conductive silicon carbide by electrical discharge machiningZeller, Florian / Hösel, Tim / Müller, Claas / Reinecke, Holger et al. | 2013
- 1881
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A Monte Carlo study of the primary absorbed energy redistribution in X-ray lithographyMeyer, P. / Pantenburg, F. J. et al. | 2013
- 1891
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Challenges with high aspect ratio nanoimprintScheer, Hella-Christin / Mayer, A. / Dhima, K. / Wang, S. / Steinberg, C. et al. | 2013
- 1899
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Evaluation of Young’s modulus of imprinted hydrogen silsesquioxane pillar after residual layer removal by reactive ion etchingKang, Yuji / Haruyama, Yuichi / Matsui, Shinji et al. | 2013
- 1905
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Rapid soda-lime glass etching process for producing microfluidic channels with higher aspect ratioLin, Che-Hsin / Chen, Kuan-Wei / Li, Tang-Yu et al. | 2013
- 1913
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Micro porous polymer foil for application in evaporation coolingDrabiniok, Evelyn / Neyer, Andreas et al. | 2013
- 1919
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Rapid-manufacturing of micro-structured devices based on MWCNTs/PP composites by using hot embossing replication processZhang, Jie / Sahli, Mohamed / Gelin, Jean-Claude / Khan-Malek, Chantal et al. | 2013
- 1925
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Low cost method for hot embossing of microstructures on PMMA by SU-8 mastersShamsi, Alireza / Amiri, Ali / Heydari, Payam / Hajghasem, Hasan / Mohtashamifar, Mansour / Esfandiari, Mehrnaz et al. | 2013
- 1933
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Rapid and low cost replication of complex microfluidic structures with PDMS double casting technologyYang, Luxia / Hao, Xiaojian / Wang, Chunshui / Zhang, Binzhen / Wang, Wanjun et al. | 2013
- 1941
-
Nano-microscale moulding of some metal plates with high strength Ni–W alloy mouldsYamasaki, Tohru / Yamada, Masahiro / Adachi, Hiroki / Nabeshima, Takayuki / Yokoyama, Yoshihiko et al. | 2013
- 1949
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High-aspect-ratio nanoimprinted structures for a multi-pole magnetic scaleXu, Zhi-Hao / Wu, Chien-Li / Sung, Cheng-Kuo / Wang, Sheng-Ching / Chin, Tsung-Shune et al. | 2013
- 1955
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“LIGA2.X” process for mass production of single polymeric LIGA micro partsHeneka, J. / Guttmann, M. / Plewa, K. / Mohr, J. / Hanemann, T. / Saile, V. et al. | 2013
- 1961
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Direct imprinting of organic–inorganic hybrid materials into high aspect ratio sub-100 nm structuresCadarso, V. J. / Kiefer, T. / Auzelyte, V. / Atasoy, H. / Gruetzner, G. / Brugger, J. et al. | 2013
- 1967
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Hot embossing of transparent high aspect ratio micro partsKolew, A. / Heilig, M. / Schneider, M. / Münch, D. / Ezzat, R. / Schneider, N. / Worgull, M. et al. | 2013
- 1975
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Mechanical material characterization of photosensitive polymersVogel, J. / Feige, H.-J. / Saupe, J. / Schubert, S. / Grimm, J. et al. | 2013
- 1981
-
Simulation and fabrication of a branch-channel rhombic micromixer for low pressure drop and short mixing lengthChung, C. K. / Chang, C. K. / Lai, C. C. et al. | 2013
- 1987
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Application of metal film protection to microfluidic chip fabrication using $ CO_{2} $ laser ablationChung, C. K. / Tu, K. Z. et al. | 2013
- 1993
-
Fabrication of gold nanoparticle pattern using imprinted hydrogen silsesquioxane pattern for surface-enhanced Raman scatteringKang, Yuji / Fukuoka, Takao / Takahashi, Ryo / Utsumi, Yuichi / Haruyama, Yuichi / Matsui, Shinji et al. | 2013
- 2001
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Replication of sub-100 nm structures using h- and s-PDMS composite stampsHuelsen, Christoph / Probst, Juergen / Loechel, Bernd et al. | 2013
- 2005
-
Fabrication of micro pore optics with smooth sidewall using X-ray lithographyZhang, Tianchong / Yi, Futing / Wang, Bo / Liu, Jing / Ashmkhan, Marina / Zhang, Xinshuai et al. | 2013
- 2011
-
Replication processes for metal and ceramic micro partsPiotter, Volker / Honza, E. / Klein, A. / Mueller, T. / Plewa, K. / Prokop, J. et al. | 2013
- 2017
-
Infrared heated μ-blistering, a new fabrication technology for HARMSTSchmidt, Thomas / Mueller, Claas / Reinecke, Holger et al. | 2014
- 2023
-
Characterization method for new resist formulations for HAR patterns made by X-ray lithographyKunka, Danays / Mohr, Jürgen / Nazmov, Vladimir / Meiser, Jan / Meyer, Pascal / Amberger, Maximilian / Koch, Frieder / Schulz, Joachim / Walter, Marco / Duttenhofer, Thomas et al. | 2013
- 2031
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LIGA micro-openings for coherence characterization of X-raysNazmov, V. / Kluge, M. / Last, A. / Marschall, F. / Mohr, J. / Vogt, H. / Simon, R. et al. | 2014
- 2037
-
Photo-lithographic patterning of biomimetic molecularly imprinted polymer thin films onto silicon wafersBoysen, Reinhard I. / Schwarz, Lachlan J. / Li, Shuyan / Chowdhury, Jamil / Hearn, Milton T. W. et al. | 2014
- 2045
-
X-ray zone plates with 25 aspect ratio using a 2-μm-thick ultrananocrystalline diamond moldWojcik, Michael J. / Mancini, Derrick C. / Divan, Ralu / Ocola, Leonidas E. et al. | 2014
- 2051
-
3D nanometer features by ultra precision machiningHaskic, Kurt / Kühne, Stefan / Löchel, Bernd / Schmidt, Martin et al. | 2014
- 2055
-
Development of high aspect ratio X-ray parabolic compound refractive lens at Indus-2 using X-ray lithographyDhamgaye, V. P. / Tiwari, M. K. / Garg, C. K. / Tiwari, P. / Sawhney, K. J. S. / Lodha, G. S. et al. | 2014
- 2061
-
Status of laminar grating manufacturing via lithography at HZBLemke, S. / Seliger, T. / Rudolph, I. / Kutz, O. / Goettert, Ph. / Nelles, B. / Senf, F. / Loechel, B. et al. | 2014
- 2065
-
Orthogonal and fine lithographic structures attained from the next generation proton beam writing facilityYao, Y. / Santhana Raman, P. / van Kan, J. A. et al. | 2014
- 2071
-
Fabrication and characterization of polymer microprismsForfang, William Brian Derek / Conner, Timothy Glenn / You, Byoung Hee / Park, Taehyun / Song, In-Hyouk et al. | 2014
- 2079
-
Resist evaluation for proton beam writing, Ni mold fabrication and nano-replicationWang, Y. H. / Malar, P. / van Kan, J. A. et al. | 2014
- 2089
-
Potential of BPN as a new negative photoresist for a very thick layer with high aspect ratioBourrier, David / Ghannam, A. / Dilhan, M. / Granier, H. et al. | 2014
- 2097
-
High aspect ratio submicrometer two-dimensional structures fabricated by one-photon absorption direct laser writingDo, Mai Trang / Li, Qinggele / Nguyen, Thi Thanh Ngan / Benisty, Henri / Ledoux-Rak, Isabelle / Lai, Ngoc Diep et al. | 2014
- 2103
-
Fabrication and characterization of machined 3D diffractive optical elementsKühne, Stefan / Haskic, Kurt / Lemke, Stephanie / Schmidt, Martin et al. | 2014