Direct-Write Electron Beam Patterning Reregistration And Metrology (English)
- New search for: Glendinning, William B.
- New search for: Goodreau, Wayne M.
- New search for: Glendinning, William B.
- New search for: Goodreau, Wayne M.
In:
Proc. SPIE
;
0480
; 141
;
1984
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ISBN:
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ISSN:
- Conference paper / Electronic Resource
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Title:Direct-Write Electron Beam Patterning Reregistration And Metrology
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Contributors:Glendinning, William B. ( author ) / Goodreau, Wayne M. ( author )
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Conference:Integrated Circuit Metrology II ; 1984 ; Arlington,United States
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Published in:Proc. SPIE ; 0480 ; 141
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Publisher:
- New search for: SPIE
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Publication date:1984-10-15
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ISBN:
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ISSN:
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DOI:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2
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An Ellipsometry System For High Accuracy Metrology Of Thin FilmsCandela, George A. / Chandler-Horowitz, Deane et al. | 1984
- 9
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Infrared Ellipsometry On Silicon WafersLeonard, Thomas A. / Loomis, John S. et al. | 1984
- 14
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Semiconductor Wafer InspectionBaker, Lionel R. et al. | 1984
- 22
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Photoresist Thickness Measurements Using Energy Dispersive X-Ray SpectroscopyMieth, M. / Barker, R. A. / Packer, S. L. et al. | 1984
- 30
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Optical Measurement Uncertainties And, Process TolerancesGrant, Peter / Fahey, Tim et al. | 1984
- 33
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Analysis Of Linewidth Measurement Techniques For The Purpose Of Automation.Kirk, Chris P. / Moore, Derek S. / Nelson, John C. et al. | 1984
- 40
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Aim-An Automated Inspection Microscope For Measuring Critical DimensionsLeMaster, Ronald J. et al. | 1984
- 49
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A New Technique For Linewidth Measurement On 1 Pm Geometry Process Wafers Using FluorescenceChisholm, James J. et al. | 1984
- 57
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A Fluorescent Linewidth Measurement System For Vlsi FabricationErasmus, Stephen J. / Reed, Michael L. / Kaempf, Ulrich et al. | 1984
- 65
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Optical Linewidth Measurement On Patterned Metal LayersNyyssonen, D. et al. | 1984
- 71
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Fourier Transform Method For Optical Linewidth MeasurementGuillaume, M . E. / Noailly, N. M. / Reynaud, J. C. / Buevoz, J. L. et al. | 1984
- 78
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A Double Pass Attachment For The Linear And Plane Mirror InterferometerBaldwin, Richard R. / Siddall, Graham J. et al. | 1984
- 86
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Precision Linewidth Measurement Using A Scanning Electron MicroscopeSeiler, Dieter G. / Sulway, D. V. et al. | 1984
- 94
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Sem Metrology: Effects Due To Topography And CompositionMonahan, K. / Gates, D. / Mah, W. / Richardson, B. / Wilcox, J. et al. | 1984
- 101
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Development Of Sem-Based Dedicated Ic Metrology SystemRussell, P. E. / Namae, T. / Shimada, M. / Someya, T. et al. | 1984
- 109
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Critical Dimension Measurement In The Scanning Electron MicroscopePostek, Michael T. et al. | 1984
- 120
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Application Of Electron - Optical Instruments For Measuring Small Pattern Features In MicrolithographyPlontke, Reiner et al. | 1984
- 126
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Overlay Analysis Of Step-And-Repeat Lithographic Systems For Mask MakingHsia, L. C. / Su, L. S. / West, R. L. et al. | 1984
- 133
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Measurement Of Optical Performance Of Photolithographic LensesWebb, James E. et al. | 1984
- 141
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Direct-Write Electron Beam Patterning Reregistration And MetrologyGlendinning, William B. / Goodreau, Wayne M. et al. | 1984
- 145
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Absolute 2-D Sub-Micron Metrology For Electron Beam LithographyRaugh, Michael R. et al. | 1984
- 164
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Moire Technique For Overlay MetrologyBrunner, T. A. / Smith, S. D. et al. | 1984