Extreme ultraviolet lasers: principles and potential for next-generation lithography (Unknown)
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In:
Journal of Micro/Nanolithography, MEMS and MOEMS
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11
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021119
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2012
- Article (Journal) / Electronic Resource
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Title:Extreme ultraviolet lasers: principles and potential for next-generation lithography
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Additional title:J. Micro/Nanolith. MEMS MOEMS
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Contributors:
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Published in:Journal of Micro/Nanolithography, MEMS and MOEMS ; 11, 2 ; 021119
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Publisher:
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Publication date:2012-05-10
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Keywords:
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Source:
Table of contents – Volume 11, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 020101
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How to write a good scientific paper: title, abstract, and keywordsMack, Chris et al. | 2012
- 021101
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Special Section Guest Editorial: EUV Sources for LithographyBakshi, Vivek / Yen, Anthony et al. | 2012
- 021102
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Extreme-ultraviolet source specifications: tradeoffs and requirementsMoors, Roel / Banine, Vadim / Swinkels, Geert / Wortel, Frans et al. | 2012
- 021103
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New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodesKoshelev, Konstantin / Krivtsun, Vladimir / Ivanov, Vladimir / Yakushev, Oleg / Chekmarev, Alexey / Koloshnikov, Vsevolod / Snegirev, Evegenii / Medvedev, Viacheslav et al. | 2012
- 021104
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Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sourcesSchriever, Guido / Semprez, Olivier / Jonkers, Jeroen / Yoshioka, Masaki / Apetz, Rolf et al. | 2012
- 021105
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Extreme-ultraviolet light source development to enable pre-production mask inspectionPartlow, Matthew J. / Besen, Matthew M. / Blackborow, Paul A. / Collins, Ron / Gustafson, Deborah / Horne, Stephen F. / Smith, Donald K. et al. | 2012
- 021106
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Brilliance scaling of discharge sources for extreme-ultraviolet and soft x-ray radiation for metrology applicationsBenk, Markus / Bergmann, Klaus et al. | 2012
- 021107
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High-radiance extreme-ultraviolet light source for actinic inspection and metrologyChoi, Peter / Zakharov, Sergey V. / Aliaga-Rossel, Raul / Bakouboula, Aldrice / Benali, Otman / Bove, Philippe / Cau, Michele / Duffy, Grainne / Iwase, Osamu / Lebert, Blair et al. | 2012
- 021108
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Development of laser-produced plasma sources for extreme ultraviolet lithographyO’Sullivan, Gerry / Li, Bowen et al. | 2012
- 021109
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Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospectsTomie, Toshihisa et al. | 2012
- 021110
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Development of stable extreme-ultraviolet sources for use in lithography exposure systemsFomenkov, Igor V. / La Fontaine, Bruno / Brown, Daniel / Ahmad, Imtiaz / Baumgart, Peter / Böwering, Norbert R. / Brandt, David C. / Bykanov, Alexander N. / De Dea, Silvia / Ershov, Alex I. et al. | 2012
- 021111
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Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithographyFujimoto, Junichi / Abe, Tamotsu / Tanaka, Satoshi / Ohta, Takeshi / Hori, Tsukasa / Yanagida, Tatsuya / Nakarai, Hiroaki / Mizoguchi, Hakaru et al. | 2012
- 021112
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RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiationKoshelev, Konstantin N. / Ivanov, Vladimir V. / Novikov, Vladimir G. / Medvedev, Viacheslav / Grushin, Alexander S. / Krivtsun, Vladimir M. et al. | 2012
- 021113
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Scaling of high average power, short-pulseCO 2lasersEndo, Akira et al. | 2012
- 021114
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Laser-produced plasma light source for extreme-ultraviolet lithography applicationsAbhari, Reza S. / Rollinger, Bob / Giovannini, Andrea Z. / Morris, Oran / Henderson, Ian / Ellwi, Samir S. et al. | 2012
- 021115
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Free-standing spectral purity filters for extreme ultraviolet lithographyChkhalo, Nikolay I. / Drozdov, Mikhail N. / Kluenkov, Evgeny B. / Lopatin, Aleksei Ya. / Luchin, Valerii I. / Salashchenko, Nikolay N. / Tsybin, Nikolay N. / Sjmaenok, Leonid A. / Banine, Vadim E. / Yakunin, Andrei M. et al. | 2012
- 021116
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Out-of-band radiation mitigation at 10.6 μ m by molecular absorbers in laser-produced plasma extreme ultraviolet sourcesMbanaso, Chimaobi / Antohe, Alin / Bull, Horace / Goodwin, Frank / Hershcovitch, Ady / Denbeaux, Gregory et al. | 2012
- 021117
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Debris transport analysis at the intermediate focus of an extreme ultraviolet light sourceSporre, John / Ruzic, David N. et al. | 2012
- 021118
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Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrorsSoer, Wouter A. / van Herpen, Maarten M. J. W. / Jak, Martin J. J. / Gawlitza, Peter / Braun, Stefan / Salashchenko, Nikolay N. / Chkhalo, Nikolay I. / Banine, Vadim Y. et al. | 2012
- 021119
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Extreme ultraviolet lasers: principles and potential for next-generation lithographyBalmer, Juerg E. / Bleiner, Davide / Staub, Felix et al. | 2012
- 021120
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Van de Graaf-based 13.5 nm inverse-Compton light sourceMadey, John M. J. / Elias, Luis R. / Szarmes, Eric B. et al. | 2012
- 021121
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Tabletop storage ring MIRRORCLE extreme ultraviolet lithography sourceYamada, Hironari / Minkov, Dorian / Hayashi, Taichi / Hasegawa, Daisuke et al. | 2012
- 021122
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Potential of the FLASH free electron laser technology for the construction of a kW-scale light source for next-generation lithographySchneidmiller, Evgeny A. / Vogel, Vladimir F. / Weise, Hans / Yurkov, Mikhail V. et al. | 2012
- 021123
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Source for extreme ultraviolet lithography based on plasma sustained by millimeter-wave gyrotron radiationChkhalo, Nikolay I. / Golubev, Sergei V. / Mansfeld, Dmitry / Salashchenko, Nikolay N. / Sjmaenok, Leonid A. / Vodopyanov, Alexander V. et al. | 2012
- 021124
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Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengthsSakaue, Kazuyuki / Endo, Akira / Washio, Masakazu et al. | 2012
- 021201
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Special Section Guest Editorial: Reliability, Packaging, Testing, and Characterization of MOEMS and MEMS IIIGarcía-Blanco, Sonia M. / Ramesham, Rajeshuni et al. | 2012
- 021202
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Packaging of MEMS and MOEMS for harsh environmentsKähler, Julian / Stranz, Andrej / Waag, Andreas / Peiner, Erwin et al. | 2012
- 021203
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Effect of added mass using resonant peak shifting techniqueBurra, Rajesh Kumar / Vankara, Jyothi / Reddy, D. V. Rama Kota et al. | 2012
- 021204
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Reliability test methodology for MEMS and MOEMS under electrical overstress and electrostatic discharge stressSangameswaran, Sandeep / De Coster, Jeroen / Groeseneken, Guido / De Wolf, Ingrid et al. | 2012
- 021205
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Parameter extraction of MEMS comb-drive near-resonance equivalent circuit: physically-based technique for a unique solutionSabry, Yasser / Medhat, Mostafa / Saadany, Bassam / Bourouina, Tarik / Khalil, Diaa et al. | 2012
- 021206
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Frequency effects and life prediction of polysilicon microcantilever beams in bending fatigueHung, Jeng-Nan / Hocheng, Hong et al. | 2012
- 021207
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Analytical design of polymer-encapsulated radio frequency microelectromechanical devicesMonajemi, Pejman et al. | 2012
- 023001
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Conformal coating of poly-glycidyl methacrylate as lithographic polymer via initiated chemical vapor depositionYoshida, Shinya / Kobayashi, Tatsuya / Kumano, Masafumi / Esashi, Masayoshi et al. | 2012
- 023002
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Homogeneous one-dimensional optical lattice generation using a digital micromirror device-based high-precision beam shaperLiang, Jinyang / Kohn, Rudolph N. / Becker, Michael F. / Heinzen, Daniel J. et al. | 2012
- 023003
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MOEMS miniature spectrometers using tuneable Fabry-Perot interferometersRissanen, Anna / Akujärvi, Altti / Antila, Jarkko / Blomberg, Martti / Saari, Heikki et al. | 2012
- 023004
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Experimental analysis of pattern line width in digital maskless lithographyRyoo, Hoonchul / Kang, Dong Won / Song, Yo-Tak / Hahn, Jae W. et al. | 2012
- 023005
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Robust auto-alignment technique for orientation-dependent etching of nanostructuresMcGray, Craig D. / Kasica, Richard / Orji, Ndubuisi G. / Dixson, Ronald / Cresswell, Michael W. / Allen, Richard A. / Geist, Jon et al. | 2012
- 023006
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Mechanical characterization of SU-8 thin films through varying effective aspect ratios for microelectromechanical systems applicationChu, Jinkui / Gao, Jiali / Guan, Le / Zhang, Guoqing / Liu, Ze et al. | 2012
- 023007
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Time-dependent electron-beam-induced photoresist shrinkage effectsBunday, Benjamin / Cordes, Aaron / Hartig, Carsten / Allgair, John / Vaid, Alok / Solecky, Eric / Rana, Narender et al. | 2012
- 023008
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Quantitative measurement of voltage contrast in scanning electron microscope images for in-line resistance inspection of incomplete contactMatsui, Miyako / Yano, Tasuku / Odaka, Takayuki / Nagaishi, Hiroshi / Sakurai, Koichi et al. | 2012
- 023009
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Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lensDuan, Lifeng / Wang, Xiangzhao / Yan, Guanyong / Bourov, Anatoly et al. | 2012
- 023010
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Evaluation of surface control and durability of carbon nanotube and indium tin oxide coated polyethylene terephthalate transparent electrodes under different drying conditionsPark, Joung-Man / Kwon, Dong-Jun / Wang, Zuo-Jia / Gu, Ga-Young / DeVries, Lawrence et al. | 2012
- 023011
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Particle contamination effects in extreme ultraviolet lithography: enhanced theory for the analytical determination of critical particle sizesBrandstetter, Gerd / Govindjee, Sanjay et al. | 2012
- 023012
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Rotary microelectromechanical system comb-drive actuator with smooth sidewall for photonic applicationsHuda, Mohammad Quamrul / Fahim Amin, Talukder Mohammad / Ning, Yuebin / McKinnon, Graham / Tulip, John / Jäger, Wolfgang et al. | 2012
- 023013
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Fabrication of nanoresonator biosensing arrays using nanoimprint lithographyJanzen, Alex / Poshtiban, Sommayyeh / Singh, Amit / Evoy, Stephane et al. | 2012
- 023014
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Laser-based microstructuring of surfaces using low-cost microlens arraysNieto, Daniel / Vara, Gemma / Diez, Jose Antonio / O’Connor, Gerard M. / Arines, Justo / Gómez-Reino, Carlos / Flores-Arias, María Teresa et al. | 2012
- 029801
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Errata: Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction–diffusion systemsMack, Chris A. et al. | 2012
- 029802
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Errata: RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiationKoshelev, Konstantin N. / Ivanov, Vladimir V. / Novikov, Vladimir G. / Medvedev, Viacheslav / Grushin, Alexander S. / Krivtsun, Vladimir M. et al. | 2012