Elucidating the role of imaging metrics for variability and after etch defectivity (Unknown)
- New search for: Franke, Joern-Holger
- New search for: Frommhold, Andreas
- New search for: Dauendorffer, Arnaud
- New search for: Nafus, Kathleen
- New search for: Rispens, Gijsbert
- New search for: Maslow, Mark
- Further information on Maslow, Mark:
- https://orcid.org/0000-0003-3296-9310
- New search for: Franke, Joern-Holger
- New search for: Frommhold, Andreas
- New search for: Dauendorffer, Arnaud
- New search for: Nafus, Kathleen
- New search for: Rispens, Gijsbert
- New search for: Maslow, Mark
In:
Journal of Micro/Nanopatterning, Materials, and Metrology
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21
, 2
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023201
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2022
- Article (Journal) / Electronic Resource
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Title:Elucidating the role of imaging metrics for variability and after etch defectivity
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Additional title:J. Micro/Nanopattern. Mater. Metrol.
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Contributors:Franke, Joern-Holger ( author ) / Frommhold, Andreas ( author ) / Dauendorffer, Arnaud ( author ) / Nafus, Kathleen ( author ) / Rispens, Gijsbert ( author ) / Maslow, Mark ( author )
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Published in:Journal of Micro/Nanopatterning, Materials, and Metrology ; 21, 2 ; 023201
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Publisher:
- New search for: Society of Photo-Optical Instrumentation Engineers
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Publication date:2022-05-30
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Keywords:
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Source:
Table of contents – Volume 21, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 020101
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Reflections on This Year’s Advanced Lithography + Patterning SymposiumLevinson, Harry J. et al. | 2022
- 020901
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Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?Erdmann, Andreas / Mesilhy, Hazem / Evanschitzky, Peter et al. | 2022
- 021201
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Special Section Guest Editorial: Next Generation Light Source, Materials, and Metrology/Inspection EquipmentHosler, Erik / Peterson, Brennan et al. | 2022
- 021202
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Development and evaluation of three-dimensional metrology of nanopatterns using electron microscopyShomrat, Neta / Chirko, Konstantin / Weisbord, Inbal / Avniel, Yan / Khristo, Sergey / Nessim, David / Litman, Alon / Segal-Peretz, Tamar et al. | 2022
- 021203
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In-line Raman spectroscopy for gate-all-around nanosheet device manufacturingSchmidt, Daniel / Durfee, Curtis / Li, Juntao / Loubet, Nicolas / Cepler, Aron / Neeman, Lior / Meir, Noga / Ofek, Jacob / Oren, Yonatan / Fishman, Daniel et al. | 2022
- 021204
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Source performance metrics for EUV mask inspectionJuschkin, Larissa / Wack, Daniel et al. | 2022
- 021205
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Decorrelation of optical critical dimensions in mid-infrared ellipsometric spectroscopy of high aspect ratio etch profilesFumani, Ahmad / Yan, Bin / Keller, Nick / Antonelli, G. Andrew / Ribaudo, Troy et al. | 2022
- 021206
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Review of nanosheet metrology opportunities for technology readinessBreton, Mary A. / Schmidt, Daniel / Greene, Andrew / Frougier, Julien / Felix, Nelson et al. | 2022
- 021207
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Chemically amplified resist CDSEM metrology exploration for high NA EUV lithographySeveri, Joren / Lorusso, Gian F. / De Simone, Danilo / Moussa, Alain / Saib, Mohamed / Duflou, Rutger / De Gendt, Stefan et al. | 2022
- 021208
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Latent image characterization by spectroscopic reflectometry in the extreme ultravioletSchröder, Sophia / Bahrenberg, Lukas / Lüttgenau, Bernhard / Glabisch, Sven / Brose, Sascha / Danylyuk, Serhiy / Stollenwerk, Jochen / Loosen, Peter / Holly, Carlo et al. | 2022
- 021209
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Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrologyYoon, Changhyeong / Park, Gwangsik / Han, Daehoon / Im, Sang-il / Jo, Sungmin / Kim, Jinseob / Kim, Wookrae / Choi, Changhoon / Lee, Myungjun et al. | 2022
- 021210
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High power light source for future extreme ultraviolet lithography based on energy-recovery linac free-electron laserKawata, Hiroshi / Nakamura, Norio / Sakai, Hiroshi / Kato, Ryukou / Hajima, Ryoichi et al. | 2022
- 023201
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Elucidating the role of imaging metrics for variability and after etch defectivityFranke, Joern-Holger / Frommhold, Andreas / Dauendorffer, Arnaud / Nafus, Kathleen / Rispens, Gijsbert / Maslow, Mark et al. | 2022
- 023801
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Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront descriptionde Winter, Laurens / Tudorovskiy, Timur / van Schoot, Jan / Troost, Kars / Stinstra, Erwin / Hsu, Stephen / Gruner, Toralf / Mueller, Juergen / Mack, Ruediger / Bilski, Bartosz et al. | 2022
- 024001
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Unbiased line edge roughness measurement using profile-averaging method for precise roughness parameters measurementKizu, Ryosuke / Misumi, Ichiko / Hirai, Akiko / Gonda, Satoshi et al. | 2022
- 024201
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Deep learning hotspots detection with generative adversarial network-based data augmentationCheng, Zeyuan / Behdinan, Kamran et al. | 2022
- 024401
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Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal designXu, Dongbo / Gillijns, Werner / Tan, Ling Ee / Philipsen, Vicky / Kim, Ryoung-Han et al. | 2022
- 024601
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Multiple regression analysis of postdevelop unbiased line width roughness and etch resistance for high-accuracy estimations of postetch pattern roughnessLee, Mihyun / Miyake, Masayuki / Otsuka, Noboru / Kawakami, Takanori / Kim, Hyun-Woo / Hong, Suk-Koo et al. | 2022
- 024901
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Investigation on the mechanical interface stability of curved high aspect ratio x-ray gratings made by deep x-ray lithographyRichter, Michael / Beckenbach, Thomas / Daerr, Heiner / Prevrhal, Sven / Börner, Martin / Gutekunst, Josephine / Zangi, Pouria / Last, Arndt / Korvink, Jan G. / Meyer, Pascal et al. | 2022