The induction plasma chemical reactor: Part I. Equilibrium model (English)
National licence
- New search for: Zhao, G. Y.
- New search for: Mostaghimi, J.
- New search for: Boulos, M. I.
- New search for: Zhao, G. Y.
- New search for: Mostaghimi, J.
- New search for: Boulos, M. I.
In:
Plasma Chemistry and Plasma Processing
;
10
, 1
;
133-150
;
1990
- Article (Journal) / Electronic Resource
-
Title:The induction plasma chemical reactor: Part I. Equilibrium model
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Contributors:
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Published in:Plasma Chemistry and Plasma Processing ; 10, 1 ; 133-150
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Publisher:
- New search for: Kluwer Academic Publishers-Plenum Publishers
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Place of publication:New York
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Publication date:1990-03-01
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Size:18 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 10, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Important announcement| 1990
- 3
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The mechanism of plasma-induced deposition of amorphous silicon from silaneVepřek, S. / Heintze, M. et al. | 1990
- 27
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Mass spectrometric study of SF6-N2 plasma during etching of silicon and tungstenMutsukura, Nobuki / Turban, Guy et al. | 1990
- 49
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Fast deposition of amorphous hydrogenated carbon films using a supersonically expanding arc plasmaKroesen, G. M. W. / Schram, D. C. / Sande, M. J. F. et al. | 1990
- 71
-
Hydrodynamics and heat transfer in a plasma spouted bed reactorFlamant, G. et al. | 1990
- 87
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Numerical simulation of a free-burning argon arc with copper evaporation from the anodeZhao, G. Y. / Dassanayake, M. / Etemadi, K. et al. | 1990
- 99
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Characteristics of transferred-arc plasmas at high TiCl4 concentrationsTsantrizos, P. / Gauvin, W. H. et al. | 1990
- 115
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Gas and liquid phases interaction at the FeO·Cr2O3 cathode of a direct-current arc dischargeLange, H. / Meubus, P. et al. | 1990
- 133
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The induction plasma chemical reactor: Part I. Equilibrium modelZhao, G. Y. / Mostaghimi, J. / Boulos, M. I. et al. | 1990
- 151
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The induction plasma chemical reactor: Part II. Kinetic modelZhao, G. Y. / Mostaghimi, J. / Boulos, M. I. et al. | 1990
- 167
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Modeling of an inductively coupled plasma at reduced pressuresPaik, S. H. / Pfender, E. et al. | 1990
- 189
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One-dimensional analysis of the wall region for a multiple-temperature argon plasmaBose, Tarit K. et al. | 1990