Reproducible large-area microfabrication of sub-100 nm apertures on hollow tips (English)
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In:
Journal of the Electrochemical Society
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147
, 5
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1970-1972
;
2000
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ISSN:
- Article (Journal) / Print
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Title:Reproducible large-area microfabrication of sub-100 nm apertures on hollow tips
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Contributors:
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Published in:Journal of the Electrochemical Society ; 147, 5 ; 1970-1972
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Publisher:
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Publication date:2000
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Size:3 Seiten, 9 Quellen
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Keywords:
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Source:
Table of contents – Volume 147, Issue 5
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1619
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Batteries and Energy Conversion - Existence of Two Sets of Kinetic Parameters in the Correlation of the Hydrogen Electrode ReactionGennero de Chialvo, M.R. et al. | 2000
- 1623
-
Batteries and Energy Conversion - Synthesis and Electrode Properties of Metastable Li2Mn4O9-d Spinel OxidesChoi, S. et al. | 2000
- 1630
-
Batteries and Energy Conversion - Electrochemical Oxidation of H2 and CO in a H2-H2O-CO-CO2 system at the Interface of a Ni-YSZ Cermet Electrode and YSZ ElectrolyteMatsuzaki, Y. et al. | 2000
- 1636
-
A semianalytical method for predicting primary and secondary current density distributions: linear and nonlinear boundary conditionsSubramanian, V.R. / White, R.E. et al. | 2000
- 1636
-
Batteries and Energy Conversion - A Semianalytical Method for Predicting Primary and Secondary Current Density Distributions: Linear and Nonlinear Boundary ConditionsSubramanian, V.R. et al. | 2000
- 1645
-
Ionic conduction mechanisms of polyvinylidenefluoride-hexafluoropropylene type polymer electrolytes with LiN(CF3SO2)2Saito, Y. / Capiglia, C. / Yamamoto, H. / Mustarelli, P. et al. | 2000
- 1645
-
Batteries and Energy Conversion - Ionic Conduction Mechanisms of Polyvinylidenefluoride-Hexafluoropropylene Type Polymer Electrolytes with LiN(CF3SO2)2Saito, Y. et al. | 2000
- 1651
-
Batteries and Energy Conversion - Electronic Structure of Transition Metal Ions in Deintercalated and Reintercalated LiCo0.5Ni0.5O2Montoro, L.A. et al. | 2000
- 1658
-
Batteries and Energy Conversion - In Situ X-Ray Study of the Electrochemical Reaction of Li with h-Cu6Sn5Larcher, D. et al. | 2000
- 1663
-
Batteries and Energy Conversion - On the Structure and Electrochemical Reaction with Lithium of Tin(II) Phosphate ChlorideFernández Madrigal, F.J. et al. | 2000
- 1663
-
On the structure and electrochemical reactions with lithium of tin(II) phosphate chlorideFernandez Madrigal, F.J. / Perez Vicente, C. / Tirado, J.L. et al. | 2000
- 1668
-
Batteries and Energy Conversion - High-Temperature Mechanical Behavior of the Solid-State Electrolyte: La0.8Sr0.2Ga0.85Mg0.15O2.825Wolfenstine, J. et al. | 2000
- 1671
-
Batteries and Energy Conversion - Tin-Containing Anode Materials in Combination with Li2.6Co0.4N for Irreversibility CompensationYang, J. et al. | 2000
- 1677
-
Batteries and Energy Conversion - Conductivity and Water Uptake of Aromatic-Based Proton Exchange Membrane ElectrolytesKopitzke, R.W. et al. | 2000
- 1682
-
Batteries and Energy Conversion - Application of Electrophoretic Deposition Technique to Solid Oxide Fuel CellsNegishi, H. et al. | 2000
- 1688
-
Batteries and Energy Conversion - Liquid-Solid Phase Diagrams of Binary Carbonates for Lithium BatteriesDing, M.S. et al. | 2000
- 1688
-
Liquid-solid phase diagrams of binary carbonates for lithium batteriesDing, M.S. / Xu, K. / Jow, T.R. et al. | 2000
- 1695
-
Batteries and Energy Conversion - Vibrational Assignments of Lithium Alkyl Carbonate and Lithium Alkoxide in the Infrared Spectra An Ab initio MO StudyMatsuta, S. et al. | 2000
- 1703
-
Batteries and Energy Conversion - Study of the Reaction of Lithium with Isostructural A2B and Various AlxB AlloysLarcher, D. et al. | 2000
- 1709
-
Electrochemical and structural characterization of LiNi1-yCoyO2 (0Lee, Kyung-Keun / Kim, Kwang-Bum et al. | 2000
- 1709
-
Batteries and Energy Conversion - Electrochemical and Structural Characterization of LiNi1-yCoyO2 (0 <= <= 0.2) Positive Electrodes during Initial CyclingLee, K.-K. et al. | 2000
- 1718
-
Batteries and Energy Conversion - Impedance Spectroscopy Study of PEO-Based Nanocomposite Polymer ElectrolytesScrosati, B. et al. | 2000
- 1722
-
Synthesis and electrochemical characterization of divalent cation-incorporated lithium nickel oxideChang, Chun-Chieh / Kim, Jin-Yong / Kumta, P.N. et al. | 2000
- 1722
-
Batteries and Energy Conversion - Synthesis and Electrochemical Characterization of Divalent Cation-Incorporated Lithium Nickel OxideChang, C.-C. et al. | 2000
- 1730
-
New cathode materials for solid oxide fuel cells. Ruthenium pyrochlores and perovskitesTakeda, T. / Kanno, R. / Kawamoto, Y. / Takeda, Y. / Yamamoto, O. et al. | 2000
- 1730
-
Batteries and Energy Conversion - New Cathode Materials for Solid Oxide Fuel Cells. Ruthenium Pyrochlores and PerovskitesTakeda, T. et al. | 2000
- 1734
-
Corrosion, Passivation, and Anodic Films - Inhibition Effects of N,N-Dimethylalkyamines and Octanethiol on Iron Corrosion in Anhydrous Acetonitrile Solution Containing FeCl3Aramaki, K. et al. | 2000
- 1740
-
Corrosion, Passivation, and Anodic Films - Arsenic Oxide Microcrystals in Anodically Processed GaAs Electrochemical Growth, Spectroscopy, and MorphologyLi, X. et al. | 2000
- 1747
-
Morphological development of oxygen bubbles in anodic aluminaZhou, X. / Thompson, G.E. / Habazaki, H. / Paez, M.A. / Shimizu, K. / Skeldon, P. / Wood, G.C. et al. | 2000
- 1747
-
Corrosion, Passivation, and Anodic Films - Morphological Development of Oxygen Bubbles in Anodic AluminaZhou, X. et al. | 2000
- 1751
-
Corrosion, Passivation, and Anodic Films - The Atmospheric Corrosion of Zinc in the Presence of NaCl. The influence of Carbon Dioxide and TemperatureLindström, R. et al. | 2000
- 1758
-
Corrosion, Passivation, and Anodic Films - The Influence of Benzotriazole and Tolyltriazole on the Copper Electrodeposition on Polycrystalline Platinum from Acidic Chloride SolutionsScendo, M. et al. | 2000
- 1763
-
Corrosion, Passivation, and Anodic Films - Explanation for Initiation of Pitting Corrosion of Stainless Steels at Sulfide InclusionsWillianzs, D.E. et al. | 2000
- 1767
-
Corrosion, Passivation, and Anodic Films - Effects of Sulfide Ions on the Integrity of the Protective Film of Benzotriazole on Alfa Brass in Salt WaterAshour, E.A. et al. | 2000
- 1770
-
Corrosion, Passivation, and Anodic Films - Anodic Dissolution of 304 Stainless Steel Using Atomic Emission SpectroelectrochemistryOgle, K. et al. | 2000
- 1781
-
Corrosion, Passivation, and Anodic Films - Development of a New Electrodeposition Process for Plating of Zn-Ni-X (XDurairajan, A. et al. | 2000
- 1787
-
Electrochemical-Chemical Deposition and Etching - Formation Mechanisms and Characterizaton of Black and White Cobalt Electrodeposition onto Stainless SteelBarrera, E. et al. | 2000
- 1797
-
Electrochemistry and photoetching of n-GaNHuygens, I.M. / Strubbe, K. / Gomes, W.P. et al. | 2000
- 1797
-
Electrochemical-Chemical Deposition and Etching - Electrochemistry and Photoetching of n-GaNHuygens, I.M. et al. | 2000
- 1803
-
Electrochemical-Chemical Deposition and Etching - In Situ Mass Spectrometric Study of Pyrite (FeS2) Thin Film Deposition with Metallorganic Chemical Vapor DepositionReijnen, L. et al. | 2000
- 1803
-
In situ mass spectrometric study of pyrite (FeS2) thin film deposition with metallorganic chemical vapor depositionReijnen, L. / Meester, B. / Goossens, A. / Schoonman, J. et al. | 2000
- 1807
-
Electrochemical-Chemical Deposition and Etching - Etch Characteristics of Pt Using Cl2-Ar-O2 Gas MixturesKwon, K.-H. et al. | 2000
- 1810
-
High resolution 3D microstructures made by localized electrodeposition of nickelJansson, A. / Thornell, G. / Johansson, S. et al. | 2000
- 1810
-
Electrochemical-Chemical Deposition and Etching - High Resolution 3D Microstructures Made by Localized Electrodeposition of NickelJannson, A. et al. | 2000
- 1818
-
Electrochemical-Chemical Deposition and Etching - Surface Kinetics of Polyphenylene Oxide Etching in a CF4-O2-Ar Downstream Microwave PlasmaHsu, K.C. et al. | 2000
- 1818
-
Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasmaHsu, K.C. / Koretsky, M.D. et al. | 2000
- 1825
-
Electrochemical-Chemical Deposition and Etching - Electrochemical Deposition of ZnSe and (Zn,Cd)Se Films from Nonaqueous SolutionsGal, D. et al. | 2000
- 1825
-
Electrochemical deposition of ZnSe and (Zn,Cd)Se films from nonaqueous solutionsGal, D. / Hodes, G. et al. | 2000
- 1829
-
Effects of SiH2Cl2 on the deposition and properties of amorphous and microcrystalline silicon fabricated from very high frequency glow dischargesMulato, M. / Wagner, S. / Zanatta, A.R. et al. | 2000
- 1829
-
Electrochemical-Chemical Deposition and Etching - Effects of SiH2Cl2 on the Deposition and Properties of Amorphous and Microcrystalline Silicon Fabricated from Very High Frequency Glow DischargesMulato, M. et al. | 2000
- 1835
-
Electrochemical-Chemical Deposition and Etching - Nucleation and Growth of Epitaxial Cadmium Selenide Electrodeposited on InP and GaAs Single CrystalsBeaunier, L. et al. | 2000
- 1835
-
Nucleation and growth of epitaxial cadmium selenide electrodeposited on InP and GaAs single crystalsBeaunier, L. / Cachet, H. / Froment, M. / Maurin, G. et al. | 2000
- 1840
-
Electrochemical-Chemical Deposition and Etching - Electrodeposition of b-Brass from Cyanide Baths with Accumulative Underpotential Deposition of ZnFujiwara, Y. et al. | 2000
- 1847
-
Electrochemical-Chemical Deposition and Etching - Selective Area Chemical Vapor Deposition of Si1-xGex Thin Film Alloys by the Alternating Cyclic Method: Experimental Data I. Deposition ParametersSoman, R. et al. | 2000
- 1854
-
Selective area chemical vapor deposition of Si1-xGex thin film alloys by the alternating cyclic method: experimental data. II. Morphology and composition as a function of deposition parametersSoman, R. / Reisman, A. / Temple, D. / Alberti, R. / Pace, C. et al. | 2000
- 1854
-
Electrochemical-Chemical Deposition and Etching - Selective Area Chemical Vapor Deposition of Si1-xGx Thin Film Alloys by the Alternating Cyclic Method: Experimental Data II. Morphology and Composition as a Function of Deposition ParametersSoman, R. et al. | 2000
- 1859
-
Cl2-based dry etching of GaN and InGaN using inductively coupled plasma. The effects of gas additivesLee, Ji-Myon / Chang, Ki-Myung / Lee, In-Hwan / Park, Seong-Ju et al. | 2000
- 1859
-
Electrochemical-Chemical Deposition and Etching - Cl2-Based Dry Etching of GaN and InGaN Using Inductively Coupled Plasma The Effects of Gas AdditivesLee, J.-M. et al. | 2000
- 1864
-
Electrochemical Synthesis and Engineering - Pulsed Electroreduction of CO2 on Cu-Ag Alloy ElectrodesIshimaru, S. et al. | 2000
- 1868
-
Electrochemical Synthesis and Engineering - Cathodically Promoted Stereoselective Addition of 1,3-Dinitro Compounds to LevoglucosenoneNiazimbetova, Z.I. et al. | 2000
- 1872
-
Electrochemical characterization of poly(3,4-ethylene dioxythiophene) based conducting hydrogel networksGhosh, S. / Inganas, O. et al. | 2000
- 1872
-
Physical and Analytical Electrochemistry - Electrochemical Characterization of Poly(3,4-ethylene dioxythiophene) Based Conducting Hydrogel NetworksGhosh, S. et al. | 2000
- 1878
-
Influence of geometry on the electrochemical response of carbon interdigitated microelectrodesKostecki, R. / Song, X.Y. / Kinoshita, K. et al. | 2000
- 1878
-
Physical and Analytical Electrochemistry - Influence of Geometry on the Electrochemical Response of Carbon Interdigitated MicroelectrodesKostecki, R. et al. | 2000
- 1882
-
Molecular or atomic oxygen as the transported species in oxidation of siliconAkermark, T. et al. | 2000
- 1882
-
Dielectric Science and Materials - Molecular or Atomic Oxygen as the Transported Species in Oxidation of Silicon| 2000
- 1888
-
Dielectric Science and Materials - Precise Control of Nitrogen Profiles and Nitrogen Bond States for Highly Reliable N2O-Grown OxynitrideTeramoto, A. et al. | 2000
- 1888
-
Precise control of nitrogen profiles and nitrogen bond states for highly reliable N2O-grown oxynitrideTeramoto, A. / Umeda, H. / Tamura, H. / Nishida, Y. / Sayama, H. / Terada, K. / Kawase, K. / Ohno, Y. / Shigetomia, A. et al. | 2000
- 1893
-
Dielectric Science and Materials - Depth Profile Analysis of Ultrathin Silicon Oxynitride Films by ToF-SIMSDouglas, M.A. et al. | 2000
- 1903
-
Semiconductor Devices, Materials, and Processing - Investigating Slurry Transport Beneath a Wafer during Chemical Mechanical Polishing ProcessesCoppeta, J. et al. | 2000
- 1910
-
Semiconductor Devices, Materials, and Processing - Anodic Oxidation of GaSb in Acid-Glycol-Water ElectrolytesSulima, O.V. et al. | 2000
- 1910
-
Anodic oxidation of GaSb in acid-glycol-water electrolytesSulima, O.V. / Bett, A.W. / Wagner, J. et al. | 2000
- 1915
-
Semiconductor Devices, Materials, and Processing - Evaluation of Time-of-Flight Secondary Ion Mass Spectrometry for Metal Contamination Monitoring on Si Wafer SurfacesWitte, H.De et al. | 2000
- 1920
-
Semiconductor Devices, Materials, and Processing - Mathematical Simulation of Soft Baking in Photoresist ProcessingHsu, J.-P. et al. | 2000
- 1925
-
Semiconductor Devices, Materials, and Processing - Chemical and Structural Studies of the Oxidation Resistance of Plasma-Treated Copper LeadframesWong, A.S.W. et al. | 2000
- 1925
-
Chemical and structural studies of the oxidation resistance of plasma-treated copper leadframesWong, A.S.W. / Gopal Krishnan, R. / Sarkar, G. / Wang, L.F. et al. | 2000
- 1930
-
Semiconductor Devices, Materials, and Processing - Low-Cost p--p- Epitaxial Silicon Wafers for Densely Packed Metal-Oxide-Semiconductor DevicesShimizu, H. et al. | 2000
- 1936
-
Semiconductor Devices, Materials, and Processing - Fluorine Barrier Properties of Bias-Sputtered Tungsten FilmsHerner, S.B. et al. | 2000
- 1936
-
Fluorine barrier properties of bias-sputtered tungsten filmsHerner, S.B. / Zhang, H.M. / Sun, B. / Tanaka, Y. / Shi, W. / Yang, S.X. / Lum, R. / Littau, K.A. / Saleh, A. et al. | 2000
- 1940
-
Semiconductor Devices, Materials, and Processing - Diffusion Barrier Properties of Sputtered TiB2 Between Cu and SiChen, J.S. et al. | 2000
- 1940
-
Diffusion barrier properties of sputtered TiB2 between Cu and SiChen, J.S. / Wang, J.L. et al. | 2000
- 1945
-
Semiconductor Devices, Materials, and Processing - Growth of Large-Grain Silicon layers by Atmospheric Iodine Vapor TransportWang, T.H. et al. | 2000
- 1950
-
Semiconductor Devices, Materials, and Processing - Silane Flow Rate Dependence of SiOx Cap layer Induced Impurity-Free Intermixing of GaAs-AlGaAs Quantum WellsDeenapanray, P.N.K. et al. | 2000
- 1950
-
Silane flow rate dependence of SiOx cap layer induced impurity-free intermixing of GaAs/AlGaAs quantum wellsDeenapanray, P.N.K. / Tan, H.H. / Cohen, M.I. / Gaff, K. / Petravic, M. / Jagadish, C. et al. | 2000
- 1957
-
Semiconductor Devices, Materials, and Processing - Using NH3 Plasma Treatment to Improve the Characteristics of Hydrogen Silsesquioxane for Copper Interconnection ApplicationChang, K.-M. et al. | 2000
- 1957
-
Using NH3 plasma treatment to improve the characteristics of hydrogen silsesquioxane for copper interconnection applicationChang, Kow-Ming / Deng, I-Chung / Yeh, Sy-Jer / Tsai, Yao-Pin et al. | 2000
- 1962
-
High-quality thermal oxide grown on high-temperature-formed SiGeWu, Y.H. / Chen, S.B. / Chin, A. / Chen, W.J. et al. | 2000
- 1962
-
Semiconductor Devices, Materials, and Processing - High-Quality Thermal Oxide Grown on High-Temperature-Formed SiGeWu, Y.H. et al. | 2000
- 1965
-
Simultaneous determination of activity coefficient and diffusion coefficient of boron in single crystalline siliconFukuyama, H. / Takasago, J. / Kawagishi, K. / Susa, M. / Nagata, K. et al. | 2000
- 1965
-
Semiconductor Devices, Materials, and Processing - Simultaneous Determination of Activity Coefficient and Diffusion Coefficient of Boron in Single Crystalline SiliconFukuyama, H. et al. | 2000
- 1970
-
Semiconductor Devices, Materials, and Processing - Reproducible Large-Area Microfabrication of Sub-100 nm Apertures on Hollow lipsMihalcea, C. et al. | 2000
- 1970
-
Reproducible large-area microfabrication of sub-100 nm apertures on hollow tipsMihalcea, C. / Vollkopf, A. / Oesterschulze, E. et al. | 2000
- 1973
-
Semiconductor Devices, Materials, and Processing - Chemically Treated InP(100) Surfaces in Aqueous HCl SolutionsKikuchi, D. et al. | 2000
- 1979
-
Scanning transmission electron microscopy-energy dispersive X-ray/electron energy loss spectroscopy studies on SiC-on-insulator structuresIshimaru, M. / Dickerson, R.M. / Sickafus, K.E. et al. | 2000
- 1979
-
Semiconductor Devices, Materials, and Processing - Scanning Transmission Electron Microscopy-Energy Dispersive X-Ray-Electron Energy Loss Spectroscopy Studies on SiC-on-Insulator StructuresIshimaru, M. et al. | 2000
- 1982
-
Semiconductor Devices, Materials, and Processing - "Volcano" Reactions in Oxide Vias Between Tungsten CVD and Bias Sputtered Tin-Ti FilmsHerner, S.B. et al. | 2000
- 1988
-
Sensors and Displays: Principles, Materials, and Processing - Photoluminemence Behavior of Tb3+-Activated YBO3 PhosphorsSohn, K.-S. et al. | 2000
- 1993
-
Sensors and Displays: Principles, Materials, and Processing - Thin-Film BaMgAl10O17:Eu Phosphor Prepared by Spray PyrolysisGolego, N. et al. | 2000
- 1997
-
Luminescence of Tm3+ ion in LiNbO3 crystalTsuboi, T. et al. | 2000
- 1997
-
Sensors and Displays: Principles, Materials, and Processing - Luminescence of TM3+ Ion in LiNbO3 CrystalTsuboi, T. et al. | 2000
- 2002
-
Microchannel surface area enhancement using porous thin filmsHarris, K.D. / Brett, M.J. / Smy, T.J. / Backhouse, C. et al. | 2000
- 2002
-
Sensors and Displays: Principles, Materials, and Processing - Microchannel Surface Area Enhancement Using Porous Thin FilmsHarris, K.D. et al. | 2000
- 2007
-
Solid-State Topics: General - Perovskites as Cathodes for Nitric Oxide ReductionKammer Hansen, K. et al. | 2000