Monte-Carlo Simulations of Image Analysis for flexible and high-resolution Registration Metrol (English)
- New search for: Arnz, M.
- New search for: Klose, G.
- New search for: Troll, G.
- New search for: Beyer, D.
- New search for: Mueller, A.
- New search for: Arnz, M.
- New search for: Klose, G.
- New search for: Troll, G.
- New search for: Beyer, D.
- New search for: Mueller, A.
In:
EMLC 2009
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7
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2009
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ISBN:
- Conference paper / Electronic Resource
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Title:Monte-Carlo Simulations of Image Analysis for flexible and high-resolution Registration Metrol
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Contributors:Arnz, M. ( author ) / Klose, G. ( author ) / Troll, G. ( author ) / Beyer, D. ( author ) / Mueller, A. ( author )
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Conference:EMLC 2009 - 25th European Mask and Lithography Conference ; 2009 ; Dresden, Germany
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Published in:EMLC 2009 ; 7GMM-Fachbericht ; 59 ; 7
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Publisher:
- New search for: VDE VERLAG GMBH
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Publication date:2009-01-01
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Size:7 pages
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ISBN:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
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Design Verification for sub 70 nm DRAM nodes via Metal Fix using E-Beam Direct WriteKeil, K. / Jaschinsky, P. / Hohle, C. / Choi, K.-H. / Schneider, R. / Tesauro, M. / Thrum, F. / Zimmermann, R. / Kretz, J. et al. | 2009
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CDP - Application of focus drillingGeisler, S. / Bauer, J. / Haak, U. / Schulz, K. / Old, G. / Matthus, E. et al. | 2009
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High Resolution Cell ProjectionWeidenmueller, U. / Hahmann, P. / Lemke, M. / Schnabel, B. / Pain, L. / Manakli, S. et al. | 2009
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Registration Metrology on Double Patterning ReticlesSchmidt, Karl-Heinrich / Röth, Klaus-Dieter / Laske, Frank / Bender, Jochen / Adam, Dieter / Ache, Oliver et al. | 2009
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New writing strategy in electron beam direct write lithography to improve critical dense lines patterning for sub-45nm nodesMartin, L. / Manakli, S. / Icard, B. / Pradelles, J. / Orobtchouk, Régis / Poncet, Alain / Pain, L. et al. | 2009
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Deflection Unit for Multi-Beam Mask MakingLetzkus, Florian / Butschke, Joerg / Irmscher, Mathias / Jurisch, Michael / Klingler, Wolfram / Platzgummer, Elmar / Klein, Christof / Loeschner, Hans / Springer, Reinhard et al. | 2009
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Mask parameter variation in the context of the overall variation budget of an advanced logic wafer FabSeltmann, Rolf / Burbach, Gert / Parge, Anne / Busch, Jens / Hertzsch, Tino / Poock, Andre / Weisbuch, Francois / Holfeld, Andre et al. | 2009
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Monte-Carlo simulations of image analysis for flexible and high-resolution registration metrologyArnz, M. / Klose, G. / Troll, G. / Beyer, D. / Mueller, A. et al. | 2009
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Particle transport and reattachment on a mask surfaceNesladek, Pavel / Osborne, Steve / Kohl, Christian et al. | 2009
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Residual-free imprint for sensor definitionMayer, A. / Bogdanski, N. / Möllenbeck, S. / Scheer, H.-C. et al. | 2009
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High speed (greater than 100 Gbps) key components for a scalable optical data link, to be implemented in future maskless lithography applicationsParaskevopoulos, A. / Voss, S.H. / Talmi, M. / Walf, G. et al. | 2009
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New methods and processes based on advanced vacuum technology for photomask decontaminationForay, J. M. / Bellet, B. / HadjRabah, S. / Palisson, J. / Veran, E. / Davenet, M. / Favre, A. / Sergent, P. / Tissier, M. / Baudiquez, V. et al. | 2009
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Increasing inspection equipment productivity by utilizing Factory Automation SW on TeraScan 5XX systemsJakubski, Thomas / Piechocinski, Michal / Moses, Raphael / Bugata, Bharathi / Schmalfuss, Heiko / Köhler, Ines / Lisowski, Jan / Klobes, Jens / Fenske, Robert et al. | 2009
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SEM image contrast modeling for mask and wafer metrologyFrase, C. G. / Gnieser, D. / Johnsen, K.-P. / Häßler-Grohne, W. / Tutsch, R. / Bosse, H. et al. | 2009
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EUV and DUV scatterometry for CD and edge profile metrology on EUV masksBodermann, Bernd / Wurm, Matthias / Diener, Alexander / Scholze, Frank / Groß, Hermann et al. | 2009
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A Solution to Meet New Challenges on EBDW Data PrepGaller, R. / Melzer, D. / Nowotny, J. / Kroenert, K. / Krueger, M. / Suelzle, M. / Papenfuss, B. / Wagner, C. / Baetz, U. / Buerger, B. et al. | 2009
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MeRiT repair verification using in-die phase metrology PhameButtgereit, Ute / Birkner, Robert / Stelzner, Robert et al. | 2009
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The task of EUV-reflectometry for HVM of EUV-masks: first stepsFarahzadi, Azadeh / Wies, Christian / Lebert, Rainer et al. | 2009
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Extended Abbe approach for fast and accurate lithography imaging simulationsEvanschitzky, P. / Erdmann, A. / Fühner, T. et al. | 2009
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Mask contribution on CD & OVL errors budgets for Double Patterning LithographyServin, I. / Lapeyre, C. / Barnola, S. / Connolly, B. / Ploss, R. / Nakagawa, K. / Buck, P. / McCallum, M. et al. | 2009
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Resolution capability of EBM-6000 and EBM-7000 for Nano-imprint templateYoshitake, S. / Kamikubo, T. et al. | 2009
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Mounting Methodologies to Measure EUV Reticle NonflatnessBattula, Venkata Siva / Zeuske, Jacob R. / Engelstad, Roxann L. / Vukkadala, Pradeep / Mikkelson, Andrew R. / Peski, Chris K. Van et al. | 2009
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Contamination control for ArF photo masksGordon, Joseph S. / Silova, Marianna / Connolly, Brid / Huijbregtse, Jeroen / Maxim, Nicolae / Frisa, Larry / Chovino, Christian / Weins, Colleen et al. | 2009
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EUV imaging performance – moving towards productionSetten, Eelco van / Lok, Sjoerd / Dijk, Joep van / Kaya, Cemil / Schenau, Koen van Ingen / Feenstra, Kees / Meiling, Hans / Wagner, Christian et al. | 2009
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Monte-Carlo Simulations of Image Analysis for flexible and high-resolution Registration MetrolArnz, M. / Klose, G. / Troll, G. / Beyer, D. / Mueller, A. et al. | 2009
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Improving yield and cycle time at the inspection process by means of a new defects disposition techniqueVilla, Ernesto / Sartelli, Luca / Miyashita, Hiroyuki / Sundermann, Frank / Gough, Stuart / Dufaye, Felix / Sippel, Astrid et al. | 2009
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Error-budget paradigms and laser mask pattern generator evolutionHamaker, H. Christopher / Jolley, Matthew J. / Berwick, Andrew D. et al. | 2009
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Ion Beam Deposition for Defect-Free EUVL Mask BlanksKearney, Patrick / Lin, C. C. / Yun, Henry / Randive, Rajul / Reiss, Ira / Hayes, Alan / Mirkarimi, Paul et al. | 2009
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SEMATECH Mask ProgramYun, Henry / Rastegar, Abbas / Kearney, Patrick / Orvek, Kevin et al. | 2009
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UV NIL template making and imprint evaluationSasaki, Shiho / Hiraka, Takaaki / Mizuochi, Jun / Sakai, Yuko / Yusa, Satoshi / Morikawa, Yasutaka / Mohri, Hiroshi / Hayashi, Naoya et al. | 2009
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High speed (>100 Gbps) key components for a scalable optical data link, to be implemented in future maskless lithography applicationsParaskevopoulos, A. / Voss, S.-H. / Talmi, M. / Walf, G. et al. | 2009
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CRYSTAL Project: A Contribution to control Cycle Time excursion in Litho areaTissier, Michel / Beisser, Eric / Davenet, Magali / Garcia, Patrick / Au, David / Quere, Yves / Finck, François / Silova, Mariana / Hoellein, Ingo et al. | 2009
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Molecular dynamics study on mold fracture by nano scale defects in nanoimprint lithographyTada, K. / Yasuda, M. / Fujii, N. / Kawata, H. / Hirai, Y. et al. | 2009
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Sub-30 nm defect removal on EUV substratesRastegar, Abbas / Eichenlaub, Sean / Kadaksham, Arun John / House, Matt / Cha, Brian / Yun, Henry et al. | 2009
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Reduced Pellicle Impact on Overlay using High Order Intrafield Grid CorrectionsKruif, Robert de / Rhee, Tasja van / Heijden, Eddy van der et al. | 2009
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MeRiT(R) repair verification using in-die phase metrology Phame(R)Buttgereit, Ute / Birkner, Robert / Stelzner, Robert et al. | 2009
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Nuisance Event Reduction Using Sensitivity Control Layers (SCL) for Advanced Photomask InspectionHedges, Shad / Le, Chin / Eickhoff, Mark / Wylie, Mark / Simmons, Tim / Vellanki, Venu / McMurran, Jeff et al. | 2009
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Lithography Development and Research Challenges for the = 22 nm Half-pitchWurm, Stefan et al. | 2009
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Decomposition Algorithm for Double Patterning of Contacts and Via LayersEl-Gamal, A. / Al-Imam, M. et al. | 2009
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Electron beam inspection methods for imprint lithography at 32 nmSelinidis, Kosta / Thompson, Ecron / Sreenivasan, S. V. / Resnick, Douglas J. et al. | 2009
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Mask Industry Assessment Trend AnalysisHughes, Greg / Yun, Henry et al. | 2009
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MAPPER: High Throughput Maskless LithographyKuiper, V. / Kampherbeek, B. J. / Wieland, M. J. / Boer, G. de / Berge, G. F. ten / Boers, J. / Jager, R. / Peut, T. van de / Peijster, J. J. M. / Slot, E. et al. | 2009
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EUV Actinic Defect Inspection and Defect Printability at sub-32 nm Half-pitchHuh, Sungmin / Kearney, Patrick / Wurm, Stefan / Goodwin, Frank / Han, Hakseung / Goldberg, Kenneth / Mochi, Iacopo / Gullikson, Eric et al. | 2009
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Effects of mask absorber thickness on printability in EUV lithography with high resolution resistKamo, Takashi / Aoyama, Hajime / Tanaka, Toshihiko / Suga, Osamu et al. | 2009
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Innovative processes investigation for photomask pod conditioning and dryingForay, J. M. / Rude, C. / Palisson, J. / Davenet, M. / Favre, A. / Cheung, D. / Dufaye, F. / Gough, S. / Richteiger, P. / Baudiquez, V. et al. | 2009
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Advanced proximity matching with Pattern MatcherSerebryakov, Alexander / Brige, Lionel / Boisseau, Emmanuel / Peloquin, Eric / Coutellier, Vincent / Planchot, Jonathan et al. | 2009
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Mask salvage in the age of capital contractionKimmel, Kurt R. et al. | 2009
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Lithography light source challenges for Double Patterning and EUVLFarrar, Nigel R. / Lalovic, Ivan / Brandt, David / Brown, Daniel et al. | 2009