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Synonyms were used for: Molekülphysik
Search without synonyms: keywords:(Molekülphysik)
Used synonyms:
- molecular physics
- molecules
- molekularphysik
-
UV photoemission study of low temperature oxygen adsorption on GaAs(110)
American Institute of Physics | 1983|Keywords: oxygen molecules -
Ultraviolet laser‐induced interaction of Cl2 with GaAs(110)
American Institute of Physics | 1992|Keywords: CHLORINE MOLECULES -
The significance of reactive ions and reactive neutrals in ion‐beam‐assisted etching
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Thermodynamics of the homogeneous and heterogeneous decomposition of trimethylaluminum, monomethylaluminum, and dimethylaluminumhydride: Effects of scavengers and ultraviolet‐laser photolysis
American Institute of Physics | 1991|Keywords: HYDROGEN MOLECULES -
Synchrotron radiation‐excited chemical‐vapor deposition and etching
American Institute of Physics | 1987|Keywords: OXYGEN MOLECULES -
Study of sidewall passivation and microscopic silicon roughness phenomena in chlorine‐based reactive ion etching of silicon trenches
American Institute of Physics | 1990|Keywords: OXYGEN MOLECULES -
Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low‐energy Ar+ ions
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Spectroscopic studies of fluorescent emission in plasma etching of silicon nitride
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
Some etch properties of doped and undoped silicon oxide films formed by atmospheric pressure and plasma‐activated chemical vapor deposition
American Institute of Physics | 1985|Keywords: NITROGEN MOLECULES -
Si surface study after Ar ion‐assisted Cl2 etching
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections
American Institute of Physics | 1986|Keywords: OXYGEN MOLECULES -
Semiconductor damage from inert and molecular gas plasmas
American Institute of Physics | 1992|Keywords: OXYGEN MOLECULES -
Self‐aligned TiSi2 for bipolar applications
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
Selective reactive ion etching of GaAs on AlGaAs using CCl2F2 and He
American Institute of Physics | 1988|Keywords: CHLORINE MOLECULES -
Scaling of Si and GaAs trench etch rates with aspect ratio, feature width, and substrate temperature
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
Reduction of arsenic oxide contamination in molecular beam epitaxy vacuum chambers
American Institute of Physics | 1984|Keywords: hydrogen molecules -
Reactive‐ion etching of tungsten silicide using NF3 gas mixtures
American Institute of Physics | 1991|Keywords: HYDROGEN MOLECULES -
Reactive ion etching of InP using CH4/H2 mixtures: Mechanisms of etching and anisotropy
American Institute of Physics | 1989|Keywords: HYDROGEN MOLECULES -
Reactive ion etching of GaAs with high aspect ratios with Cl2–CH4–H2–Ar mixtures
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES, HYDROGEN MOLECULES -
Reactive ion etching of GaAs, AlGaAs, and GaSb in Cl2 and SiCl4
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Reactive ion beam etching of polyimide thin films
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
Rate constants for the etching of gallium arsenide by molecular iodine
American Institute of Physics | 1992|Keywords: IODINE MOLECULES -
Rare gas ion‐enhanced etching of InP by Cl2
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Rapid thermal oxidation of Si using a mixture of N2O and O2 at various partial pressure of N2O
American Institute of Physics | 1996|Keywords: OXYGEN MOLECULES -
Rapid direct writing of high‐aspect ratio trenches in silicon: Process physics
American Institute of Physics | 1988|Keywords: CHLORINE MOLECULES -
Radio frequency plasma etching of Si/SiO2 by Cl2/O2 : Improvements resulting from the time modulation of the processing gases
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES, OXYGEN MOLECULES -
Quantitative chemical topography of polycrystalline Si anisotropically etched in Cl2/O2 high density plasmas
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES, OXYGEN MOLECULES -
Protein patterning on the micro- and nanoscale by thermal nanoimprint lithography on a new functionalized copolymer
American Institute of Physics | 2009|Keywords: tridecafluoro-(1,1,2,2)-tetrahydrooctyl-trichlorosilane (F13-TCS) molecules -
Plasma etching of organic materials. II. Polyimide etching and passivation downstream of an O2–CF4–Ar microwave plasma
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
Photo‐metal organic vapor phase epitaxy: A low temperature method for the growth of CdxHg1−xTe
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
Photoionization of sputtered neutrals for reliable and sensitive depth profiles
American Institute of Physics | 1992|Keywords: MOLECULES -
Photoemission study of oxygen adsorption on ternary silicides
American Institute of Physics | 1992|Keywords: OXYGEN MOLECULES -
Photochemistry at adsorbate–metal interfaces: Issues and examples
American Institute of Physics | 1992|Keywords: OXYGEN MOLECULES -
Pattern profile control of polysilicon plasma etching
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
Patterned, photon‐driven cryoetching of GaAs and AlGaAs
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
Parametric modeling of focused ion beam induced etching
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Oxide formation on GaAs exposed to CF4+O2 plasma
American Institute of Physics | 1985|Keywords: OXYGEN MOLECULES -
On the possibility of MBE growth interface modification by hydrogen
American Institute of Physics | 1983|Keywords: hydrogen molecules -
Molecular level fabrication techniques and molecular electronic devices
American Institute of Physics | 1983|Keywords: molecules -
Mechanistic studies of oxygen plasma etching
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
Mass spectrometric studies of plasma etching of silicon nitride
American Institute of Physics | 1985|Keywords: NITROGEN MOLECULES -
Low‐energy electron beam enhanced etching of Si(100)‐(2×1) by molecular hydrogen
American Institute of Physics | 1992|Keywords: HYDROGEN MOLECULES -
Laser‐induced reactions of semiconductor surfaces
American Institute of Physics | 1992|Keywords: CHLORINE MOLECULES -
Laser ablative chemical etching of SiO2
American Institute of Physics | 1987|Keywords: HYDROGEN MOLECULES, CHLORINE MOLECULES -
Ion beam etching of InGaAs, InP, GaAs, Si, and Ge
American Institute of Physics | 1986|Keywords: OXYGEN MOLECULES -
Ion beam assisted etching of SiO2 and Si3N4
American Institute of Physics | 1988|Keywords: HYDROGEN MOLECULES -
Ion‐assisted etching of Si with Cl2: The effect of flux ratio
American Institute of Physics | 1994|Keywords: CHLORINE MOLECULES -
In situ patterning of GaAs by focused ion beam
American Institute of Physics | 1991|Keywords: CHLORINE MOLECULES -
In situ monitoring of GaAs etched with a Cl2/Ar discharge in an electron cyclotron resonance source
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
In situ investigation of TiN formation on top of TiSi2
American Institute of Physics | 1988|Keywords: NITROGEN MOLECULES
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