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Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Probing the properties of atomic layer deposited ZrO2 films on p-Germanium substrates
American Institute of Physics | 2013|Keywords: high-k -
High-κ rare-earth oxides on GaN and ferroelectric properties of hafnia based thin films
DataCite | 2018|Keywords: high-k ; ferroelectric ; rare-earth oxides ; high-k ; Ferroelektrika ; Seltenerdoxide -
Effects of oxide thickness and temperature on dispersions in InGaAs MOS C-V characteristics
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Origin of Indium Diffusion in High‑k Oxide HfO2
American Chemical Society | 2016|Keywords: high-k oxides, III-V/high-k oxide interface -
Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2×1) surface
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Improvement of zirconium-doped hafnium oxide high-k dielectric properties by adding molybdenum
American Institute of Physics | 2013|Keywords: high-k dielectric, doped high-k -
Atomic layer deposited high-κ nanolaminates for silicon surface passivation
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Impact of surface treatments on high-κ dielectric integration with Ga-polar and N-polar GaN
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Long-term and short-term plasticity of Ta2O5/HfO2 memristor for hardware neuromorphic application
Elsevier | 2020|Keywords: High-k -
Nonvolatile memory devices with AlOx embedded Zr-doped HfO2 high-k gate dielectric stack
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
High-k dielectrics for future generation memory devices (Invited Paper)
Elsevier | 2009|Keywords: High-k -
Structural, morphological, FTIR and photoluminescence properties of gallium oxide thin films
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Hf-based high-k dielectrics for p-Ge MOS gate stacks
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Phase control of HfO2-based dielectric films for higher-k materials
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics -
Effects of thermal annealing on the charge localization characteristics of HfO2/Au/HfO2 stack
Elsevier | 2016|Keywords: High-k -
Electrical properties of anatase TiO2 films by atomic layer deposition and low annealing temperature
American Institute of Physics | 2014|Keywords: Special Issue: High-k Dielectrics
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