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Synonyms were used for: Molekülphysik
Search without synonyms: keywords:(Molekülphysik)
Used synonyms:
- molecular physics
- molecules
- molekularphysik
-
Above‐bandgap optical anisotropies in the reflectance spectra of some cubic semiconductors
American Institute of Physics | 1985|Keywords: BROMINE MOLECULES -
A monodisperse Si‐containing photoresist for a bilayer system
American Institute of Physics | 1986|Keywords: OXYGEN MOLECULES -
Angular dependence of etching yield of single crystal Si in Cl2 reactive ion beam etching
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
An in situ infrared study on the interaction of oxygen plasmas with Si and fluorine plasmas with SiO2 surfaces
American Institute of Physics | 1987|Keywords: FLUORINE MOLECULES, OXYGEN MOLECULES -
An investigation of CH4/H2 reactive ion etching damage to thin heavily doped GaAs metal–semiconductor field effect transistor layers during gate recessing
American Institute of Physics | 1990|Keywords: HYDROGEN MOLECULES -
Anisotropic etching of Al by a directed Cl2 flux
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Anisotropic etching of GaAs using a hot Cl2 molecular beam
American Institute of Physics | 1991|Keywords: CHLORINE MOLECULES -
Anomalous regimes for GaAs etching in Cl2–Ar plasmas
American Institute of Physics | 1988|Keywords: CHLORINE MOLECULES -
A simple model of the chemically assisted ion beam etching yield of GaAs with Cl2 at medium current densities
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
A thermochemical model for the plasma etching of aluminum in BCl3/Cl2 and BBr3/Br2
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES, BROMINE MOLECULES -
Cavernous undercuts appearing in reactive ion etched submicron‐wide deep trenches
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES -
Characteristics of gas‐assisted focused ion beam etching
American Institute of Physics | 1993|Keywords: CHLORINE MOLECULES -
Characteristics of maskless ion beam assisted etching of silicon using focused ion beams
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Characterization of photochemical processing
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
Chemical etching of GaAs and InP by chlorine: The thermodynamically predicted dependence on Cl2 pressure and temperature
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Chlorine surface interaction and laser‐induced surface etching reactions
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Comparison of etching processes of silicon and germanium in SF6–O2 radio‐frequency plasma
American Institute of Physics | 1995|Keywords: OXYGEN MOLECULES -
Control of surface morphology and electronic properties of III-V semiconductors using molecular modification
American Institute of Physics | 2010|Keywords: thiol molecules -
Direct observation of fullerene‐adsorbed tips by scanning tunneling microscopy
American Institute of Physics | 1996|Keywords: MOLECULES -
Effect of CO and CO2 addition to the CF4/O2 gas system on the etching of a low‐pressure chemical vapor deposition tungsten film
American Institute of Physics | 1995|Keywords: OXYGEN MOLECULES -
Effect of wafer temperature during plasma exposure on charging damage
American Institute of Physics | 1996|Keywords: OXYGEN MOLECULES -
Effects of Ar+ angle of incidence on the etching of Si with Cl2 and low‐energy Ar+ ions
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES -
Effects of Cl incorporation during Si oxidation
American Institute of Physics | 1994|Keywords: CHLORINE MOLECULES -
Electron beam induced modification of GaAs surfaces for maskless thermal Cl2 etching
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Electron‐beam lithography and chemically assisted ion beam etching for the fabrication of grating surface‐emitting broad‐area AlGaAs lasers
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Electronic and chemical properties of small silicon clusters in reactions with silane
American Institute of Physics | 1989|Keywords: DEUTERIUM MOLECULES -
Electrostatic probe analysis of microwave plasmas used for polymer etching
American Institute of Physics | 1987|Keywords: OXYGEN MOLECULES -
Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardment
American Institute of Physics | 1983|Keywords: nitrogen molecules, oxygen molecules -
Etch products from the reaction on Cl2 with Al(100) and Cu(100) and XeF2 with W(111) and Nb
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Fabrication of dissimilar metal electrodes with nanometer interelectrode distance for molecular electronic device characterization
American Institute of Physics | 2000|Keywords: MOLECULES -
Force field experiments of an epitaxial superstructure of 3,4,9,10-perylenetetra-carboxylic-dianhydride on Ag(111)
American Institute of Physics | 2010|Keywords: organic molecules -
Free molecular transport and deposition in cylindrical features
American Institute of Physics | 1990|Keywords: MOLECULES -
GaAs and AlGaAs crystallographic etching with low‐pressure chlorine radicals in an ultrahigh‐vacuum system
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES -
GaSb‐oxide removal and surface passivation using an electron cyclotron resonance hydrogen source
American Institute of Physics | 1992|Keywords: HYDROGEN MOLECULES, NITROGEN MOLECULES -
High pressure thermal oxide/InP interface
American Institute of Physics | 1985|Keywords: OXYGEN MOLECULES -
High‐resolution fabrication process for silicon ion masks
American Institute of Physics | 1988|Keywords: BROMINE MOLECULES -
Hollow cathode etching with CF4 gas mixtures
American Institute of Physics | 1985|Keywords: OXYGEN MOLECULES, HYDROGEN MOLECULES -
Identification of the volatile reaction products of the Cl2+GaAs etching reaction
American Institute of Physics | 1993|Keywords: CHLORINE MOLECULES -
Influence of hydrogen evolution from plasma‐deposited silicon nitride on underlying aluminum deformations
American Institute of Physics | 1993|Keywords: HYDROGEN MOLECULES -
In situ infrared spectroscopy of molecular‐beam epitaxy grown GaAs
American Institute of Physics | 1989|Keywords: MOLECULES -
In situ investigation of TiN formation on top of TiSi2
American Institute of Physics | 1988|Keywords: NITROGEN MOLECULES -
In situ monitoring of GaAs etched with a Cl2/Ar discharge in an electron cyclotron resonance source
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
In situ patterning of GaAs by focused ion beam
American Institute of Physics | 1991|Keywords: CHLORINE MOLECULES -
Ion‐assisted etching of Si with Cl2: The effect of flux ratio
American Institute of Physics | 1994|Keywords: CHLORINE MOLECULES -
Ion beam assisted etching of SiO2 and Si3N4
American Institute of Physics | 1988|Keywords: HYDROGEN MOLECULES -
Ion beam etching of InGaAs, InP, GaAs, Si, and Ge
American Institute of Physics | 1986|Keywords: OXYGEN MOLECULES -
Laser ablative chemical etching of SiO2
American Institute of Physics | 1987|Keywords: HYDROGEN MOLECULES, CHLORINE MOLECULES -
Laser‐induced reactions of semiconductor surfaces
American Institute of Physics | 1992|Keywords: CHLORINE MOLECULES -
Low‐energy electron beam enhanced etching of Si(100)‐(2×1) by molecular hydrogen
American Institute of Physics | 1992|Keywords: HYDROGEN MOLECULES
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