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Shake up satellites and fluorescence property of carbon nitride and hydrogenated carbon nitride: Annealing effect
British Library Online Contents | 2013| -
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers
American Institute of Physics | 2017| -
Investigation of relative sputtering yields during ionoluminescence of Si
British Library Online Contents | 1999| -
Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films (8 pages)
British Library Online Contents | 2010| -
Comparative Plasma Chemical Reaction Studies of CH4/Ar and C2Hm/Ar (m = 2,4,6) Gas Mixtures in a Dielectric Barrier Discharge
British Library Online Contents | 2014| -
Kinetic aspects of the formation of aluminium oxide by use of a microwave-induced plasma
National licenceSpringer Verlag | 2002| -
Partial dissociative ionization of by electron impact using an ejected electron-ion coincidence technique
National licenceAmerican Physical Society | 2003| -
Modeling of altered layer formation during reactive ion etching of GaAs
British Library Online Contents | 2012| -
Kinetic aspects of the formation of aluminium oxide by use of a microwave-induced plasma
Online Contents | 2002| -
Partial dissociative ionization of SF~6 by electron impact using an ejected electron-ion coincidence technique (6 pages)
British Library Online Contents | 2003| -
Role of Nitrogen in the Formation of HC-N Films by CH~4/N~2 Barrier Discharge Plasma: Aliphatic Tendency
British Library Online Contents | 2009| -
Ejected electron-ion coincidence measurements of multiple ionization of argon by 10-24 keV electron impact
British Library Online Contents | 2002| -
Bombardment-induced light emission from a Si(100) target
National licenceAmerican Physical Society | 1997|
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