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Applying the HAZUS-MH software tool to assess seismic risk in downtown Ottawa, Canada
Online Contents | 2009| -
A minimum step fabrication process for the all‐silicon channeling mask
American Institute of Physics | 1987| -
A new high‐performance surface‐micromachined tunneling accelerometer fabricated using nanolithography
American Institute of Physics | 1996| -
30 nm resolution zero proximity lithography on high‐Z substrates
American Institute of Physics | 1992| -
The characterization and optimization of masked ion beam lithography with 〈100〉 silicon channeling masks
American Institute of Physics | 1987| -
A low magnification focused ion beam system with 8 nm spot size
American Institute of Physics | 1991| -
Sub‐20‐nm‐wide line fabrication in poly(methylmethacrylate) using a Ga+ microprobe
American Institute of Physics | 1989| -
Self‐aligned high electron mobility transistor gate fabrication using focused ion beams
American Institute of Physics | 1991|
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