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Deposition of Bax Sr1-x TiO3 thin Films by Double RF Hollow Cathode Plasma Jet System
Online Contents | 2008| -
Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures
American Institute of Physics | 2017| -
BaxSr1 - xTiO3 Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique
Online Contents | 2005| -
Low pressure deposition of LixZnyO thin films by means of RF plasma jet system
Online Contents | 2004| -
Investigation of the RF plasma jet system for deposition of LiCoOx thin films
Online Contents | 2004| -
Barrier-torch discharge plasma source for surface treatment technology at atmospheric pressure
Online Contents | 2002| -
Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
Free accessIOP Institute of Physics | 2023| -
Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
American Institute of Physics | 2019| -
In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
American Institute of Physics | 2019| -
Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
British Library Online Contents | 2014| -
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
British Library Online Contents | 2019| -
Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems
British Library Online Contents | 2009|
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