High-K materials and metal gates for CMOS applications (English)
- New search for: Robertson, John
- New search for: Robertson, John
- New search for: Wallace, Robert M
In:
Materials science and engineering / R
;
88
; 1-41
;
2015
-
ISSN:
- Article (Journal) / Print
-
Title:High-K materials and metal gates for CMOS applications
-
Contributors:Robertson, John ( author ) / Wallace, Robert M
-
Published in:Materials science and engineering / R ; 88 ; 1-41
-
Publisher:
- New search for: Elsevier Sequoia
-
Place of publication:Lausanne
-
Publication date:2015
-
ISSN:
-
ZDBID:
-
DOI:
-
Type of media:Article (Journal)
-
Type of material:Print
-
Language:English
- New search for: 51.00
- Further information on Basic classification
-
Keywords:
-
Classification:
BKL: 51.00 Werkstoffkunde: Allgemeines -
Source:
Table of contents – Volume 88
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
-
High-K materials and metal gates for CMOS applicationsRobertson, John / Wallace, Robert M. et al. | 2014
- IFC
-
Editorial board| 2015