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Clinical Management of the Child and Teenager with Diabetes
British Library Online Contents | 1999| -
Foundation for the NIMH strategic plan for mood disorders research
British Library Online Contents | 2002| -
Optical characterization of attenuated phase shifters [3050-39]
British Library Conference Proceedings | 1997| -
Effects of precursor additives on the stability of plasma enhanced chemical vapor deposited a-GeC(O):H films
British Library Online Contents | 2002| -
Materials and Process Integration Issues in Metal Gate/High-k Stacks and Their Dependence on Device Performance
British Library Conference Proceedings | 2007| -
DUV stability of carbon films for attenuated phase-shift mask applications [3334-38]
British Library Conference Proceedings | 1998| -
Lithographic evaluation of a DUV carbon attenuated phase shift mask
British Library Conference Proceedings | 1998| -
Materials and Process Integration Issues in Metal Gate/High-k Stacks and Their Dependence on Device Performance
British Library Conference Proceedings | 2007| -
Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing [4186-47]
British Library Conference Proceedings | 2001| -
Effects of underlayer on performance of bilayer resists for 248-nm lithography [3333-107]
British Library Conference Proceedings | 1998| -
Diffusion and Distribution of Photoacid Generators in Thin Polymer Films
British Library Conference Proceedings | 2000| -
Effects of underlayer on performance of bilayer resists for 248 nm lithography
Tema Archive | 1998| -
On Educational Testing Software Interoperability Support
Online Contents | 2016|Contributors: Babich, K. S. -
Optical properties of epitaxial SrHfO~3 thin films grown on Si (6 pages)
British Library Online Contents | 2007| -
Optical properties of epitaxial SrHfO3 thin films grown on Si
National licenceAmerican Institute of Physics | 2007| -
Lithographic evaluation of a DUV carbon attenuated phase shift mask
British Library Online Contents | 1998| -
A Novel Graded Antireflective Coating with Built In Hardmask Properties Enabling 65nm and Below CMOS Device Patterning
British Library Conference Proceedings | 2003| -
Sub-150 nm Resolution Lithography with a 248 nm Bilayer Resist Process
British Library Conference Proceedings | 1999| -
Transfer etching of bilayer resists in oxygen-based plasmas
British Library Online Contents | 2000| -
Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20]
British Library Conference Proceedings | 2006| -
Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond [5039-15]
British Library Conference Proceedings | 2003| -
Hardmask technology for sub-100-nm lithographic imaging [5039-18]
British Library Conference Proceedings | 2003| -
Impact of thin resist processes on post-etch LER [5039-23]
British Library Conference Proceedings | 2003| -
ARTICLES - Effects of precursor additives on the stability of plasma enhanced chemical vapor deposited a-GeC(O):H films
Online Contents | 2002|Contributors: Babich, K. -
Transfer etching of bilayer resists in oxygen-based plasmas
British Library Conference Proceedings | 2000| -
Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications [4346-79]
British Library Conference Proceedings | 2001| -
Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing [4343-88]
British Library Conference Proceedings | 2001| -
Lithographic evaluation of a DUV carbon attenuated phase shift mask
Online Contents | 1998|Contributors: Babich, K. -
Optical properties of epitaxial SrHfO3 thin films grown on Si
Online Contents | 2007|Contributors: Babich, K. -
SrHfO3 as gate dielectric for future CMOS technology
Online Contents | 2007|Contributors: Babich, K.
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