1–20 of 20 hits
Sort by:
Sort by:
-
Method for sensing the self-assembly of polyelectrolyte monolayers using scanning probe microscope cantilever
National licenceAmerican Institute of Physics | 2006| -
Organic solid-state lasers with imprinted gratings on plastic substrates
National licenceAmerican Institute of Physics | 1998| -
Shape engineering: A novel optical proximity correction technique for attenuated phase-shift mask
American Institute of Physics | 2000| -
Moisture-induced capacitance-voltage instabilities in mesoporous silica thin films
National licenceAmerican Institute of Physics | 2005| -
Novel photocurable epoxy siloxane polymers for photolithography and imprint lithography applications
American Institute of Physics | 2008| -
Laser action from two-dimensional distributed feedback in photonic crystals
National licenceAmerican Institute of Physics | 1999| -
Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process
National licenceAmerican Institute of Physics | 2003| -
Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists
American Institute of Physics | 1999| -
Emission characteristics of two-dimensional organic photonic crystal lasers fabricated by replica molding
National licenceAmerican Institute of Physics | 1999| -
Synthesis and lithographic characterization of poly(4‐t‐butoxycarbonyloxystyrene‐sulfone)
American Institute of Physics | 1990| -
Process characteristics of an all‐organic chemically amplified deep‐ultraviolet resist
American Institute of Physics | 1991| -
Environmental stability of 193 nm single layer chemically amplified resists
American Institute of Physics | 1999| -
Effect of ambient pressure on resistance and resistance fluctuations in single-wall carbon nanotube devices
National licenceAmerican Institute of Physics | 2006| -
Lithographic evaluation of a positive‐acting chemically amplified resist system under conventional and projection electron‐beam exposures
American Institute of Physics | 1995| -
Resist design concepts for 193 nm lithography: Opportunities for innovation and invention
American Institute of Physics | 1997| -
Linewidth reduction using liquid ashing for sub-100 nm critical dimensions with 248 nm lithography
American Institute of Physics | 2001| -
193 nm single layer resist strategies, concepts, and recent results
American Institute of Physics | 1998| -
PTBSS: A high resolution single component aqueous base soluble chemically amplified resist
American Institute of Physics | 1991| -
Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates
American Institute of Physics | 2000|
- ««
- «
- 1
- »»
Hits per page
Send my search to (beta)
Send your search query (search terms without filters) to other databases, portals and catalogues to find more interesting hits.
Dimensions:
full data search
or
title and abstract search
Dimensions is a database for abstracts and citations that links information on research funding with the resulting publications, studies and patents.
TIB AV portal
In the TIB AV-Portal, audiovisual media from science and teaching can be foundand own scientific videos can be published.
Specialised Information Service for Mobility and Transport Research (FID move)
Open Research Knowledge Graph (ORKG)
The FID move can be used to search for subject-specific literature, research data and other information from mobility and transport research.
The Open Research Knowledge Graph provides structured descriptions of research content and makes it comparable.
Common Union Catalogue (GVK)
Freely accessible part of the collaborative K10plus catalogue with materials relevant for interlibrary loan and direct delivery services.