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Synonyms were used for: Chemistry
Search without synonyms: International Journal of New Chemistry
Used synonyms:
- allgemeine chemie
- chemie
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SiCl4/Cl2 plasmas: A new chemistry to etch high-k materials selectively to Si-based materials
American Institute of Physics | 2012|issues remain associated with these processes. In this work, we introduced a new high-k plasma etching chemistry: SiCl4/Cl2 ... -
Enhanced silicon nitride etching in the presence of F atoms: Quantum chemistry simulation
American Institute of Physics | 2018|containing chemistry is widely used to etch silicon based materials, and one of the methods to increase the etch selectivity is to use reactants ... -
New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
American Institute of Physics | 2018|A comparative chemical analysis of InxSy and In2(S,O)3 thin films grown by atomic layer
... -
Surface temperature: A key parameter to control the propanethiol plasma polymer chemistry
American Institute of Physics | 2014|In this work, the influence of the substrate temperature (Ts) on the chemical composition of propanethiol plasma polymers was
... -
Surface chemistry at metallic step defect sites
American Institute of Physics | 1995|The role of step sites on metal surfaces in promoting chemical reactions is discussed showing experimental data from the author’s
... -
Surface chemistry models for low temperature Si epitaxy process simulation in a single-wafer reactor
Free accessAmerican Institute of Physics | 2024|) and phosphine. Based on existing DCS-based Si chemistry models for higher process temperatures, we developed a new kinetic chemistry model for ...Keywords: Epitaxial Growth of Materials -
Effects of surface chemistry on ALD barrier formation on low- dielectrics
American Institute of Physics | 2005|In situ x-ray photoelectron spectroscopy (XPS) was employed to study the effects of the substrate surface chemistry on
...Keywords: PAPERS FROM THE 51ST INTERNATIONAL SYMPOSIUM OF AVS -
Interfacial chemistry and electronic structure of epitaxial lattice-matched TiN/Al0.72Sc0.28N metal/semiconductor superlattices determined with soft x-ray scattering
American Institute of Physics | 2020|structure and the chemistry of bond formation. Employing a combination of soft x-ray scattering techniques such as x-ray diffraction and synchrotron ... -
Etching characteristics of thin films in gas chemistry
American Institute of Physics | 2006|(LNO) electrode was intensively studied as electrodes because LNO has a pseudocubic perovskite crystal structure with a lattice parameter of ...Keywords: PAPERS FROM THE 52ND INTERNATIONAL SYMPOSIUM OF AVS -
Chemistry and physics of the ‘‘liquid’’/solid interface: A surface science perspective
American Institute of Physics | 1993|electrochemical charge transfer reactions in vacuum are reviewed. On the basis of these results a new, three‐dimensional model of the metal/electrolyte ... -
International standardization and metrology as tools to address the comparability and reproducibility challenges in XPS measurements
Free accessAmerican Institute of Physics | 2020|The status of standardization related to x-ray photoelectron spectroscopy (XPS, ESCA) at ASTM International (Subcommittee E42.03) and
... -
Aspects of nitrogen surface chemistry relevant to TiN chemical vapor deposition
American Institute of Physics | 1996|NH3 is an important component of many chemical vapor deposition (CVD) processes for TiN films, which are used for diffusion
... -
A thermal desorption and x‐ray photoelectron spectroscopy study of the surface chemistry of iron pentacarbonyl
American Institute of Physics | 1989|We have studied the surface chemistry of iron pentacarbonyl by using thermal programmed desorption and x‐ray photoelectron spectroscopy
...Keywords: CHEMISTRY -
Electron‐induced surface chemistry: Production and characterization of NH2 and NH species on Pt(111)
American Institute of Physics | 1996|new NH3 desorption peak (210 K) attributed to hydrogenation of NH2. High resolution electron energy loss spectroscopy ... -
The surface chemistry of zinc dialkyldithiophosphate, an antiwear additive, on oxidized iron and steel foils
American Institute of Physics | 1988|The chemisorption and thermal chemistry of zinc dialkyldithiophosphate (ZDP) were studied on iron oxide and AISI 52100 steel substrates
...Keywords: CHEMISTRY -
New spiral molecular drag stage design for high compression ratio, compact turbomolecular-drag pumps
American Institute of Physics | 2010|in parallel and a high compression ratio, but this is obtained with the use of a less compact drum-shaped impeller. In this article, a new ...Keywords: PAPERS FROM THE 56TH INTERNATIONAL SYMPOSIUM OF AVS -
Surface three-dimensional velocity map imaging: A new technique for the study of photodesorption dynamics
American Institute of Physics | 2010|The authors describe the application of a combination of velocity map imaging and time-of-flight (TOF) techniques to obtain three
...Keywords: PAPERS FROM THE 56TH INTERNATIONAL SYMPOSIUM OF AVS -
New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition
American Institute of Physics | 2020|coating and complete fill of a deep trench, can be achieved using one of three approaches, depending on the precursor chemistry. (vii) The science ... -
Adaptation of dependex fittings to International Standards Organization fittings
American Institute of Physics | 1989|traditional nuclear research laboratories have a frequent need for adapters in order to attach equipment with new standards to their systems. We show ... -
Understanding of a new approach for silicon nitride spacer etching using gaseous hydrofluoric acid after hydrogen ion implantation
American Institute of Physics | 2017|, a new process was developed. It consists of two steps: in a first step, the silicon nitride film is modified by light ion implantation ...
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