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Synonyms were used for: Molekülphysik
Search without synonyms: keywords:(Molekülphysik)
Used synonyms:
- molecular physics
- molecules
- molekularphysik
-
Control of surface morphology and electronic properties of III-V semiconductors using molecular modification
American Institute of Physics | 2010|Keywords: thiol molecules -
GaSb‐oxide removal and surface passivation using an electron cyclotron resonance hydrogen source
American Institute of Physics | 1992|Keywords: HYDROGEN MOLECULES, NITROGEN MOLECULES -
Hollow cathode etching with CF4 gas mixtures
American Institute of Physics | 1985|Keywords: OXYGEN MOLECULES, HYDROGEN MOLECULES -
Quantitative chemical topography of polycrystalline Si anisotropically etched in Cl2/O2 high density plasmas
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES, OXYGEN MOLECULES -
Force field experiments of an epitaxial superstructure of 3,4,9,10-perylenetetra-carboxylic-dianhydride on Ag(111)
American Institute of Physics | 2010|Keywords: organic molecules -
Molecular level fabrication techniques and molecular electronic devices
American Institute of Physics | 1983|Keywords: molecules -
Fabrication of dissimilar metal electrodes with nanometer interelectrode distance for molecular electronic device characterization
American Institute of Physics | 2000|Keywords: MOLECULES -
Radio frequency plasma etching of Si/SiO2 by Cl2/O2 : Improvements resulting from the time modulation of the processing gases
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES, OXYGEN MOLECULES -
Reactive ion etching of GaAs with high aspect ratios with Cl2–CH4–H2–Ar mixtures
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES, HYDROGEN MOLECULES -
Protein patterning on the micro- and nanoscale by thermal nanoimprint lithography on a new functionalized copolymer
American Institute of Physics | 2009|Keywords: tridecafluoro-(1,1,2,2)-tetrahydrooctyl-trichlorosilane (F13-TCS) molecules -
A thermochemical model for the plasma etching of aluminum in BCl3/Cl2 and BBr3/Br2
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES, BROMINE MOLECULES -
Direct observation of fullerene‐adsorbed tips by scanning tunneling microscopy
American Institute of Physics | 1996|Keywords: MOLECULES -
Laser ablative chemical etching of SiO2
American Institute of Physics | 1987|Keywords: HYDROGEN MOLECULES, CHLORINE MOLECULES -
An in situ infrared study on the interaction of oxygen plasmas with Si and fluorine plasmas with SiO2 surfaces
American Institute of Physics | 1987|Keywords: FLUORINE MOLECULES, OXYGEN MOLECULES -
Rare gas ion‐enhanced etching of InP by Cl2
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Anisotropic etching of GaAs using a hot Cl2 molecular beam
American Institute of Physics | 1991|Keywords: CHLORINE MOLECULES -
SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections
American Institute of Physics | 1986|Keywords: OXYGEN MOLECULES -
Characteristics of maskless ion beam assisted etching of silicon using focused ion beams
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Photoionization of sputtered neutrals for reliable and sensitive depth profiles
American Institute of Physics | 1992|Keywords: MOLECULES -
Reactive‐ion etching of tungsten silicide using NF3 gas mixtures
American Institute of Physics | 1991|Keywords: HYDROGEN MOLECULES -
Characteristics of gas‐assisted focused ion beam etching
American Institute of Physics | 1993|Keywords: CHLORINE MOLECULES -
Chemical etching of GaAs and InP by chlorine: The thermodynamically predicted dependence on Cl2 pressure and temperature
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Cavernous undercuts appearing in reactive ion etched submicron‐wide deep trenches
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES -
Parametric modeling of focused ion beam induced etching
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Etch products from the reaction on Cl2 with Al(100) and Cu(100) and XeF2 with W(111) and Nb
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardment
American Institute of Physics | 1983|Keywords: nitrogen molecules, oxygen molecules -
Free molecular transport and deposition in cylindrical features
American Institute of Physics | 1990|Keywords: MOLECULES -
Rate constants for the etching of gallium arsenide by molecular iodine
American Institute of Physics | 1992|Keywords: IODINE MOLECULES -
Low‐energy electron beam enhanced etching of Si(100)‐(2×1) by molecular hydrogen
American Institute of Physics | 1992|Keywords: HYDROGEN MOLECULES -
Rapid direct writing of high‐aspect ratio trenches in silicon: Process physics
American Institute of Physics | 1988|Keywords: CHLORINE MOLECULES -
Mechanistic studies of oxygen plasma etching
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
Anomalous regimes for GaAs etching in Cl2–Ar plasmas
American Institute of Physics | 1988|Keywords: CHLORINE MOLECULES -
Reactive ion etching of InP using CH4/H2 mixtures: Mechanisms of etching and anisotropy
American Institute of Physics | 1989|Keywords: HYDROGEN MOLECULES -
Electronic and chemical properties of small silicon clusters in reactions with silane
American Institute of Physics | 1989|Keywords: DEUTERIUM MOLECULES -
Scaling of Si and GaAs trench etch rates with aspect ratio, feature width, and substrate temperature
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
Synchrotron radiation‐excited chemical‐vapor deposition and etching
American Institute of Physics | 1987|Keywords: OXYGEN MOLECULES -
Study of sidewall passivation and microscopic silicon roughness phenomena in chlorine‐based reactive ion etching of silicon trenches
American Institute of Physics | 1990|Keywords: OXYGEN MOLECULES -
High pressure thermal oxide/InP interface
American Institute of Physics | 1985|Keywords: OXYGEN MOLECULES -
In situ infrared spectroscopy of molecular‐beam epitaxy grown GaAs
American Institute of Physics | 1989|Keywords: MOLECULES -
In situ investigation of TiN formation on top of TiSi2
American Institute of Physics | 1988|Keywords: NITROGEN MOLECULES -
Effect of CO and CO2 addition to the CF4/O2 gas system on the etching of a low‐pressure chemical vapor deposition tungsten film
American Institute of Physics | 1995|Keywords: OXYGEN MOLECULES -
Plasma etching of organic materials. II. Polyimide etching and passivation downstream of an O2–CF4–Ar microwave plasma
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
UV photoemission study of low temperature oxygen adsorption on GaAs(110)
American Institute of Physics | 1983|Keywords: oxygen molecules -
In situ patterning of GaAs by focused ion beam
American Institute of Physics | 1991|Keywords: CHLORINE MOLECULES -
GaAs and AlGaAs crystallographic etching with low‐pressure chlorine radicals in an ultrahigh‐vacuum system
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES -
Spectroscopic studies of fluorescent emission in plasma etching of silicon nitride
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
In situ monitoring of GaAs etched with a Cl2/Ar discharge in an electron cyclotron resonance source
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
A monodisperse Si‐containing photoresist for a bilayer system
American Institute of Physics | 1986|Keywords: OXYGEN MOLECULES -
Some etch properties of doped and undoped silicon oxide films formed by atmospheric pressure and plasma‐activated chemical vapor deposition
American Institute of Physics | 1985|Keywords: NITROGEN MOLECULES
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